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41. 发明申请

US20110309260A1 CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：室外设备和极光紫外线发光系统
公开(公告)号：US20110309260A1
公开(公告)日：2011-12-22
申请号：US13122354
申请日：2011-03-11
申请人： Toshihiro Nishisaka , Yukio Watanabe , Tamotsu Abe , Osamu Wakabayashi
发明人： Toshihiro Nishisaka , Yukio Watanabe , Tamotsu Abe , Osamu Wakabayashi
IPC分类号： G21K5/00 , G01J1/42
CPC分类号： H05G2/008 , G03B27/54 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/003
摘要： A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.
摘要翻译：与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生极紫外光的室; 设置在室中的用于收集极紫外光的收集器反射镜; 用于将收集器镜固定到腔室的支撑件; 以及设置到室的输出端口，用于允许由集光镜收集的极紫外光通过其引入外部设备。

42. 发明申请

US20110297852A1 MIRROR AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 审中-公开
标题翻译：镜子和极光超紫外光发生系统
公开(公告)号：US20110297852A1
公开(公告)日：2011-12-08
申请号：US13124063
申请日：2011-03-22
申请人： Hidenobu Kameda , Osamu Wakabayashi , Masato Moriya
发明人： Hidenobu Kameda , Osamu Wakabayashi , Masato Moriya
IPC分类号： G21K5/00 , G02B7/192
CPC分类号： G21K1/062 , B82Y10/00 , G02B5/0891 , G03F7/70891 , G03F7/70983 , G21K2201/067
摘要： A mirror is provided which may include: a substrate; a thermal diffusion layer provided on a principal surface of the substrate, the thermal diffusion layer having a higher thermal conductivity than the substrate; and a reflective layer provided on the thermal diffusion layer, the reflective layer having a lower thermal conductivity than the thermal diffusion layer.
摘要翻译：提供了一种可以包括：基底的反射镜; 设置在所述基板的主表面上的热扩散层，所述热扩散层具有比所述基板更高的热导率; 以及设置在所述热扩散层上的反射层，所述反射层具有比所述热扩散层低的热导率。

43. 发明授权

US07965756B2 Optical element for gas laser and gas laser apparatus using the same 有权
标题翻译：用于气体激光的光学元件和使用其的气体激光装置
公开(公告)号：US07965756B2
公开(公告)日：2011-06-21
申请号：US12545495
申请日：2009-08-21
申请人： Osamu Wakabayashi , Shinji Nagai , Kouji Kakizaki , Satoshi Tanaka
发明人： Osamu Wakabayashi , Shinji Nagai , Kouji Kakizaki , Satoshi Tanaka
IPC分类号： H01S3/22
CPC分类号： H01S3/005 , G02B1/02 , H01S3/0057 , H01S3/08009 , H01S3/08054 , H01S3/10061 , H01S3/2251
摘要： At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.
摘要翻译：进入平面或出射平面的光中的至少任一个平行于CaF 2晶体的（111）晶面，并且从入射平面入射的激光束穿过位于[111]轴和第一方位角 [001]轴围绕[111]轴的旋转轨迹的轴线，包括[111]轴和第一方位轴，位于旋转轨迹中的[111]轴和第二方位角轴之间的平面围绕[111]轴的[010]轴线，并且包括[111]轴和第二方位角轴或位于[111]轴和第三方位角之间的平面围绕[111]轴并且包括[111]轴和第三方位角轴并从出射平面离开。

44. 发明申请

US20100192973A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND CLEANING METHOD 审中-公开
标题翻译：极光紫外线光源装置和清洁方法
公开(公告)号：US20100192973A1
公开(公告)日：2010-08-05
申请号：US12688139
申请日：2010-01-15
申请人： Yoshifumi Ueno , Osamu Wakabayashi
发明人： Yoshifumi Ueno , Osamu Wakabayashi
IPC分类号： B08B7/00 , H05H1/00 , B05D3/06
CPC分类号： G02B27/0006 , B08B7/0042 , G02B19/0028 , G02B19/0052 , G02B19/0095 , G02B26/101 , G02B27/0955 , G02B27/20 , G03F7/70033 , G03F7/70525 , G03F7/7085 , G03F7/70916 , G03F7/70925 , G03F7/70941 , H05G2/003 , H05G2/008
摘要： An extreme ultraviolet light source apparatus that can eliminate debris adhering to a component such as optical elements provided within a chamber. The extreme ultraviolet light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target material supply unit for supplying a target material into the chamber; a driver laser unit for irradiating the target material with a driver pulse laser beam to generate plasma; a cleaning laser unit for emitting a cleaning pulse laser beam; and a control unit for controlling an irradiation position of the cleaning pulse laser beam emitted from the cleaning laser unit so as to irradiate a component provided within the chamber with the cleaning pulse laser beam to remove debris adhering to a surface of the component.
摘要翻译：一种极紫外光源装置，其可以消除附着在诸如设置在室内的光学元件的部件的碎屑。所述极紫外光源装置具有：产生极紫外光的室; 目标材料供应单元，用于将目标材料供应到所述室中; 用于用驱动脉冲激光束照射目标材料以产生等离子体的驱动器激光单元; 用于发射清洁脉冲激光束的清洁激光单元; 以及控制单元，用于控制从清洁激光单元发射的清洁脉冲激光束的照射位置，以便用清洁脉冲激光束照射设置在室内的部件，以去除附着在部件表面上的碎屑。

45. 发明申请

US20100176310A1 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US20100176310A1
公开(公告)日：2010-07-15
申请号：US12385835
申请日：2009-04-21
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： H01J99/00
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/7085 , G03F7/70883 , H05G2/008
摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.
摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。

46. 发明申请

US20090232171A1 Laser system 有权
标题翻译：激光系统
公开(公告)号：US20090232171A1
公开(公告)日：2009-09-17
申请号：US12382109
申请日：2009-03-09
申请人： Tamotsu Abe , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
发明人： Tamotsu Abe , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
IPC分类号： H01S3/10
CPC分类号： H01S3/2316 , H01S3/076 , H01S3/10007 , H01S3/2232
摘要： The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.
摘要翻译：在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器，用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器，以及用于控制激光振荡器进行突发的控制单元在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。

47. 发明申请

US20060239309A1 Two-stage laser pulse energy control device and two-stage laser system 有权
标题翻译：两级激光脉冲能量控制装置和两级激光系统
公开(公告)号：US20060239309A1
公开(公告)日：2006-10-26
申请号：US10568091
申请日：2004-08-09
申请人： Tatsuya Ariga , Osamu Wakabayashi , Kouji Kakizaki
发明人： Tatsuya Ariga , Osamu Wakabayashi , Kouji Kakizaki
IPC分类号： H01S3/13 , H01S3/00 , H01S3/22 , H01S3/223
CPC分类号： G03F7/70041 , H01S3/097 , H01S3/09702 , H01S3/10007 , H01S3/104 , H01S3/1301 , H01S3/134
摘要： A charging voltage Vosc applied to a main capacitor C0 disposed in an oscillating high-voltage pulse generator 12 of an oscillating laser 100 is subject to constant control such that a pulse energy Posc of the oscillating laser 100 becomes a lower limit energy Es0 or more of an amplification saturation region. And, a charging voltage Vamp applied to a main capacitor C0 disposed in an amplifying high-voltage pulse generator 32 of an amplifying laser 300 is controlled, and pulse energy Pamp of the amplifying laser 300 is determined as target energy Patgt. Thus, the pulse energy of a two-stage laser is controlled to stabilize the pulse energy.
摘要翻译：施加到设置在振荡激光器100的振荡高电压脉冲发生器12中的主电容器C 0的充电电压Vosc受到恒定的控制，使得振荡激光器100的脉冲能量Posc成为下限能量Es 0或更多的是放大饱和区域。并且，控制施加到放大激光器300的放大高压脉冲发生器32中的主电容器C 0的充电电压Vamp，将放大激光器300的脉冲能量Pamp确定为目标能量Patgt。因此，控制两级激光器的脉冲能量以稳定脉冲能量。

48. 发明授权

US06879617B2 Two stage laser system 有权
标题翻译：两级激光系统
公开(公告)号：US06879617B2
公开(公告)日：2005-04-12
申请号：US10438737
申请日：2003-05-14
申请人： Tatsuya Ariga , Kyohei Seki , Osamu Wakabayashi
发明人： Tatsuya Ariga , Kyohei Seki , Osamu Wakabayashi
IPC分类号： H01S3/131 , H01S3/036 , H01S3/08 , H01S3/134 , H01S3/225 , H01S3/23 , H01S3/22
CPC分类号： H01S3/10092 , H01S3/036 , H01S3/08004 , H01S3/08009 , H01S3/08059 , H01S3/134 , H01S3/225 , H01S3/2258 , H01S3/2316
摘要： The present invention relates to a two stage laser system in which a desired spectral line width can be obtained at high output even when the integrated spectral characteristic of oscillator laser does not have the desired spectral line width, comprising an oscillator laser device 10 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and emits laser beam which is band-narrowed by means of a band narrowing module 3 arranged in a laser resonator, and an amplifier laser device 20 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and amplifies laser pulse injected from said oscillator laser device 10. In the system, a synchronous time interval having a predetermined spectral line width exists in laser pulse from the oscillator laser 10, and the system is set such that a discharge occurs in the amplifier laser 20 within the synchronous time interval.
摘要翻译：本发明涉及一种二阶段激光系统，其中即使当振荡器激光器的积分光谱特性不具有期望的谱线宽度时，也可以以高输出获得期望的谱线宽度，包括具有放电的振荡器激光装置10 在激光室1内的充满了含有F2的激光气体的激光器2内的电极2，并且发射通过设置在激光谐振器中的带窄化模块3而带宽化的激光束，以及在激光器内具有放电电极2的放大器激光装置20 室1充满含有F2的激光气体，并放大从所述振荡器激光装置10注入的激光脉冲。在该系统中，具有预定光谱线宽的同步时间间隔存在于来自振荡器激光器10的激光脉冲中，并且系统被设置为在同步时间间隔内在放大器激光器20中发生放电。

49. 发明授权

US06819699B1 Arf excimer laser device, scanning type exposure device and ultraviolet laser device 有权
标题翻译： Arf准分子激光装置，扫描型曝光装置和紫外线激光装置
公开(公告)号：US06819699B1
公开(公告)日：2004-11-16
申请号：US09518639
申请日：2000-03-03
申请人： Tatsuo Enami , Osamu Wakabayashi , Katsutomo Terashima , Kiwamu Takehisa , Tsukasa Hori , Hakaru Mizoguchi
发明人： Tatsuo Enami , Osamu Wakabayashi , Katsutomo Terashima , Kiwamu Takehisa , Tsukasa Hori , Hakaru Mizoguchi
IPC分类号： H01S322
CPC分类号： H01S3/225
摘要： A buffer gas contained in a laser gas used for an ArF excimer laser mainly consists of He, and Xe is preferably added to the laser gas. Mixture piping divided by valves is disposed on piping running from a chamber to an excimer laser gas cylinder, the mixture piping and a Xe gas cylinder are connected, gas exhaust by a gas exhaust module and opening and closing of the valves are controlled by a gas controller to add a trace quantity of xenon gas to the excimer laser gas. Thus, to remedy a burst characteristic and a spike characteristic of the ultraviolet laser device by adding a trace quantity of xenon gas, the xenon gas can be supplied efficiently into the chamber without modifying existing laser gas supply equipment.
摘要翻译：用于ArF准分子激光器的激光气体中所含的缓冲气体主要由He构成，优选将Xe添加到激光气体中。由阀门分隔的混合管道设置在从室到准分子激光气瓶的管道上，混合管道和Xe气瓶连接，气体排气模块排气和阀门的打开和关闭由气体控制器向准分子激光气体添加痕量的氙气。因此，为了通过添加痕量的氙气来补偿紫外激光装置的突发特性和尖峰特性，可以将氙气有效地供应到腔室中而不改变现有的激光气体供应装置。

50. 发明授权

US06636297B2 Vacuum ultraviolet laser wavelength measuring apparatus 失效
标题翻译：真空紫外线激光波长测量仪
公开(公告)号：US06636297B2
公开(公告)日：2003-10-21
申请号：US09842230
申请日：2001-04-26
申请人： Osamu Wakabayashi , Tatsuo Enami , Shinji Nagai
发明人： Osamu Wakabayashi , Tatsuo Enami , Shinji Nagai
IPC分类号： G01J300
CPC分类号： G01J9/00 , G01J1/4257
摘要： A vacuum ultraviolet laser wavelength measuring apparatus capable of accurately measuring wavelength characteristics of a laser beam. The wavelength measuring apparatus has spectral devices for generating an optical pattern corresponding to wavelength characteristics of an incident laser beam and measuring wavelength characteristics of a laser beam in a vacuum ultraviolet region oscillating from a vacuum ultraviolet laser on the basis of the optical pattern. The apparatus has a fluorescent screen for generating a fluorescent pattern having an intensity distribution corresponding to an intensity distribution of the incident optical pattern, a pattern detector for measuring the intensity distribution of the fluorescent pattern, and arithmetic unit for calculating the wavelength characteristics of the laser beam on the basis of the measured intensity distribution.
摘要翻译：一种能够精确地测量激光束的波长特性的真空紫外激光波长测量装置。波长测量装置具有用于产生与入射激光束的波长特性相对应的光学图案的光谱装置，并且基于光学图案测量从真空紫外激光器振荡的真空紫外区域中的激光束的波长特性。该装置具有用于产生具有对应于入射光学图案的强度分布的强度分布的荧光图案的荧光屏，用于测量荧光图案的强度分布的图案检测器和用于计算激光器的波长特性的算术单元基于测量的强度分布。

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