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41. 发明授权

US4912408A Distance measuring system using superconducting quantum interference device 失效
标题翻译：使用超导量子干涉装置的距离测量系统
公开(公告)号：US4912408A
公开(公告)日：1990-03-27
申请号：US199706
申请日：1988-05-27
申请人： Takeshi Sawada , Ryo Kuroda , Noriyuki Nose , Yukichi Niwa
发明人： Takeshi Sawada , Ryo Kuroda , Noriyuki Nose , Yukichi Niwa
IPC分类号： G01B7/00 , G01D5/14 , G01D5/18 , H01L39/00
CPC分类号： G01D5/145 , G01D5/18 , Y10S505/843 , Y10S505/872
摘要： Disclosed is a distance measuring system suitably usable in a semiconductor microcircuit manufacturing lithographic apparatus such as an aligner or a stepper, for measuring the position or the distance of movement of a movable object such as a mask stage or a wafer stage. The system includes a magnetic field producing portion such as a magnet for producing a predetermined magnetic field, a superconducting quantum interference device coupled to the mask stage or the wafer stage. Further, there are provided a magnetic flux detecting portion for outputting signals corresponding to changes in the magnetic flux, in the magnetic field, passing through the superconducting quantum interference device and a signal processing unit for processing the output signals of the magnetic flux detecting portion to detect the position or the distance of movement of the mask stage or the wafer stage. Also, a shielding member is provided to shield at least the magnetic field producing portion and the magnetic flux detecting portion against an external magnetic field, by use of a superconductor. The distance measuring system of the present invention assures accurate measurement with a high resolution, for a wide movable range of the movable member such as a range not less than 100 mm.
摘要翻译：公开了适用于半导体微电路制造光刻设备（例如对准器或步进器）中的距离测量系统，用于测量诸如掩模台或晶片台之类的可移动物体的位置或距离。该系统包括磁场产生部分，例如用于产生预定磁场的磁体，连接到掩模台或晶片台的超导量子干涉装置。此外，提供了一个磁通量检测部分，用于输出与通过超导量子干涉装置的磁场中的磁通量的变化相对应的信号，以及用于处理磁通检测部分的输出信号的信号处理单元检测掩模台或晶片台的位置或移动距离。此外，设置屏蔽构件，以通过使用超导体来抵御外部磁场来屏蔽至少磁场产生部分和磁通量检测部分。本发明的距离测量系统可确保在可移动部件的宽的可移动范围内具有高分辨率的精确测量，例如不小于100mm的范围。

42. 发明授权

US4842408A Phase shift measuring apparatus utilizing optical meterodyne techniques 失效
标题翻译：使用光学测距技术的相移测量装置
公开(公告)号：US4842408A
公开(公告)日：1989-06-27
申请号：US47258
申请日：1987-05-08
申请人： Minoru Yoshii , Noriyuki Nose , Yukichi Niwa , Yoshimichi Okada
发明人： Minoru Yoshii , Noriyuki Nose , Yukichi Niwa , Yoshimichi Okada
IPC分类号： G01J9/04 , G01N21/45
CPC分类号： G01J9/04 , G01N21/45
摘要： A phase shift measuring apparatus for detecting a phase shift of a light wave passing through an object to be measured, including:supplying device for supplying first and second light waves having different frequencies;optical device for directing the first light wave toward the object and combining the first light wave passing through the object and the second light wave to obtain a composite light wave;detecting device for receiving the composite light wave and detecting a measured beat signal; andmeasuring device for comprising the measured beat signal with a predetermined reference beat signal to measure a phase shift of the first light wave.A gradient index, a thickness distribution, and the like of an object can be obtained from the measured phase shift.
摘要翻译：一种用于检测通过被测量物体的光波的相移的相移测量装置，包括：用于提供具有不同频率的第一和第二光波的供应装置; 光学装置，用于将第一光波引导到物体并组合通过物体的第一光波和第二光波，以获得复合光波; 用于接收所述复合光波并检测测量的拍频信号的检测装置; 以及测量装置，用于包括具有预定参考节拍信号的所测量的节拍信号，以测量第一光波的相移。可以从所测量的相移中获得物体的梯度指数，厚度分布等。

43. 发明授权

US4544269A Device for measuring light incident on an optical system 失效
标题翻译：用于测量入射在光学系统上的光的装置
公开(公告)号：US4544269A
公开(公告)日：1985-10-01
申请号：US284114
申请日：1981-07-16
申请人： Noriyuki Nose , Kiyonobu Endo
发明人： Noriyuki Nose , Kiyonobu Endo
IPC分类号： G01J1/04 , G01J1/42 , G03B7/099 , G02B5/18
CPC分类号： G01J1/04 , G01J1/0407 , G01J1/0477 , G01J1/4214 , G01J1/4228 , G03B7/09976
摘要： A device for measuring light incident on an optical system comprises an optical system defining an optical path, a plurality of diffraction lattices arranged in the optical path, each of the diffraction lattices comprising a plurality of periodically arranged semireflecting oblique surfaces, and photodetector means for detecting each of the diffracted lights from the diffraction lattices distinctively. The diffraction lattices are each of different predetermined areas; however, when even light is input, each lattice diffracts the same total quantity of light to its respective detector.
摘要翻译：用于测量入射在光学系统上的光的装置包括限定光路的光学系统，布置在光路中的多个衍射栅格，每个衍射栅格包括多个周期性布置的半反射倾斜表面，以及用于检测来自衍射晶格的每个衍射光明显不同。衍射光栅各自具有不同的预定区域; 然而，当输入均匀的光时，每个晶格将相同的总光量衍射到其相应的检测器。

44. 发明授权

US4486096A Device for measuring incident light 失效
标题翻译：用于测量入射光的装置
公开(公告)号：US4486096A
公开(公告)日：1984-12-04
申请号：US285404
申请日：1981-07-20
申请人： Kiyonobu Endo , Noriyuki Nose
发明人： Kiyonobu Endo , Noriyuki Nose
IPC分类号： G01J1/04 , G01J1/42 , G02B27/00 , G02B27/10 , G03B7/099 , G03B13/28
CPC分类号： G02B27/108 , G01J1/04 , G01J1/0407 , G01J1/0477 , G01J1/4214 , G02B27/0018 , G02B27/1086 , G03B13/28 , G03B7/09976
摘要： A system for measuring incident light includes: an optical system defining an optical path; a photodetector; and a plurality of beam splitters, with each beamsplitter having a different, predetermined area and adapted to be disposed in the optical path with, at any one time, only one beam splitter in the optical path; and means for measuring the light received by the photodetector.
摘要翻译：用于测量入射光的系统包括：限定光路的光学系统; 光检测器; 以及多个分束器，其中每个分束器具有不同的预定面积，并且适于在任何一个时间仅在光路中的一个分束器设置在光路中; 以及用于测量由光电检测器接收的光的装置。

45. 发明授权

US5767962A Inspection system and device manufacturing method using the same 失效
标题翻译：检验系统和装置制造方法采用该方法
公开(公告)号：US5767962A
公开(公告)日：1998-06-16
申请号：US755352
申请日：1996-11-25
申请人： Masayuki Suzuki , Noriyuki Nose , Minoru Yoshii , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
发明人： Masayuki Suzuki , Noriyuki Nose , Minoru Yoshii , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
IPC分类号： G01N21/88 , G01B11/30 , G01N21/94 , G01N21/956 , G03F1/84 , H01L21/66 , G01N21/00
CPC分类号： G01N21/94
摘要： An inspection system includes a light source, a scanning device for scanning a surface to be inspected, with light from the light source, wherein the scanning device includes an optical member disposed with inclination with respect to a primary scan direction, the optical member being adapted to provide a convergent light being converged to form a spot at a distance changeable with the position of a scan, and a light receiving device for receiving scattered light from the surface.
摘要翻译：检查系统包括光源，用于扫描来自光源的光的扫描装置，其中所述扫描装置包括相对于主扫描方向倾斜设置的光学构件，所述光学构件适于以提供会聚的光会聚在一起形成与扫描位置可变的距离的光点，以及用于接收来自表面的散射光的光接收装置。

46. 发明授权

US5751426A Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object 失效
$Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object$
标题翻译：位置偏差测量装置和测量形成在同一物体上的多个衍射光栅之间的位置偏差的方法
公开(公告)号：US5751426A
公开(公告)日：1998-05-12
申请号：US460708
申请日：1995-06-02
申请人： Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Hiroshi Osawa , Koichi Sentoku , Toshihiko Tsuji , Takahiro Matsumoto
发明人： Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Hiroshi Osawa , Koichi Sentoku , Toshihiko Tsuji , Takahiro Matsumoto
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object include an illumination optical system for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system for forming at least one interference light beam from the plurality of diffracted light beams, a detector for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.
摘要翻译：用于测量形成在同一物体上的多个衍射光栅之间的位置偏差的装置和方法包括用光束照射多个衍射光栅的照明光学系统，光学系统的照明产生多个衍射光束来自多个衍射光栅的干涉光学系统，用于形成来自多个衍射光束的至少一个干涉光束，用于检测至少一个干涉光束的检测器，检测结果作为测量的基础多个衍射光栅之间的位置偏差，以及用于测量照明光学系统和多个衍射光栅之间的相对位置关系的测量部分。

47. 发明授权

US5610718A Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes 失效
$Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes$
标题翻译：用于检测彼此靠近布置的第一和第二衍射光栅之间的相对位移的装置和方法，其中所述光栅具有不同的间距尺寸
公开(公告)号：US5610718A
公开(公告)日：1997-03-11
申请号：US297511
申请日：1994-08-29
申请人： Koichi Sentoku , Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh
发明人： Koichi Sentoku , Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh
IPC分类号： G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A method and device for measuring the relative displacement between first and second diffraction gratings includes an interference optical system forming first and second interference rays of light from light diffracted from the first and second diffraction gratings and separating the first and second interference rays of light on the basis of the difference in their direction of polarization, a first detector for detecting the first interference ray of light to generate a first detection signal, a second detector for detecting the second interference ray of light to generate a second detection signal, and signal processing section for detecting the phase difference between the first and second detection signals and for determining the relative displacement between the first and second diffraction gratings on the basis of the phase difference.
摘要翻译：用于测量第一和第二衍射光栅之间的相对位移的方法和装置包括干涉光学系统，其形成从第一和第二衍射光栅衍射的光的第一和第二干涉光线，并且将第一和第二干涉光线分离在其偏振方向的差异的基础，用于检测第一干涉光线以产生第一检测信号的第一检测器，用于检测第二干涉光线以产生第二检测信号的第二检测器，以及信号处理部分用于检测第一和第二检测信号之间的相位差，并且用于基于相位差确定第一和第二衍射光栅之间的相对位移。

48. 发明授权

US5557411A Position detection method 失效
标题翻译：位置检测方法
公开(公告)号：US5557411A
公开(公告)日：1996-09-17
申请号：US577704
申请日：1995-12-22
申请人： Sakae Houryu , Noriyuki Nose
发明人： Sakae Houryu , Noriyuki Nose
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F9/70
摘要： An interval detection method for detecting the interval between two marks provided on the surface of a wafer with high accuracy using other two marks provided on the wafer, and a method for detecting the relative positions of a wafer and a mask with high accuracy are provided. The method for detecting the interval includes the steps of projecting a first light beam passing through a first mark on the mask and a fifth mark on the wafer onto a predetermined detection surface, projecting a second light beam passing through a second mark on the mask and a sixth mark on the wafer onto the predetermined detection surface, projecting a third light beam passing through a third mark on the mask and the fifth mark onto the predetermined detection surface, projecting a fourth light beam passing through a fourth mark on the mask and the sixth mark onto the predetermined detection surface, and determining the interval between the first mark and the second mark based on information relating to the incident positions of the first, second, third and fourth light beams on the predetermined detection surface, and the interval between the third mark and the fourth mark.
摘要翻译：提供了一种使用设置在晶片上的其他两个标记来高精度地检测设置在晶片表面上的两个标记之间的间隔的间隔检测方法，以及用于高精度地检测晶片和掩模的相对位置的方法。用于检测间隔的方法包括以下步骤：将通过掩模上的第一标记的第一光束和晶片上的第五标记投影到预定检测表面上，将通过第二标记的第二光束投射到掩模上; 在晶片上的第六标记到预定检测表面上，将通过掩模上的第三标记的第三光束和第五标记投影到预定检测表面上，将通过第四标记的第四光束投射在掩模上，第六标记到预定检测表面上，以及基于与预定检测表面上的第一，第二，第三和第四光束的入射位置相关的信息，确定第一标记和第二标记之间的间隔，第三标记和第四标记。

49. 发明授权

US5440394A Length-measuring device and exposure apparatus 失效
标题翻译：长度测量装置和曝光装置
公开(公告)号：US5440394A
公开(公告)日：1995-08-08
申请号：US193880
申请日：1994-02-09
申请人： Noriyuki Nose , Kenji Saito , Mitsuaki Amemiya
发明人： Noriyuki Nose , Kenji Saito , Mitsuaki Amemiya
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , G01B11/02 , G01B11/26
CPC分类号： G03F7/70616 , G03F7/70633 , G03F9/7023 , G03F9/7049
摘要： A length measuring device for performing length measurement and an exposure apparatus for performing an exposure operation on a first object having a plurality of alignment patterns thereon, includes an alignment detector for detecting the relative positional relation between the first object and a second object having a plurality of reference alignment patterns used for aligning the first object therewith, and for detecting an alignment condition between the alignment patterns of the first and second objects, a movement device for moving the first and second objects relative to each other, a measurement device for measuring the amount of movement of the movement device, and a length measurement device for performing measurement of the space between the plurality of alignment patterns formed on the first object. The length measurement device performs length measurement on the basis of successive alignment conditions detected by successive alignment condition detection operations of the alignment detector between the plurality of reference alignment patterns on the second object and the plurality of alignment patterns on the first object, as well as the amount of movement of the movement device measured by the measurement device during the successive alignment condition detection operations of the alignment detector.
摘要翻译：用于进行长度测量的长度测量装置和用于对其上具有多个对准图案的第一物体进行曝光操作的曝光装置包括：对准检测器，用于检测第一物体与具有多个对准图案的第二物体之间的相对位置关系; 用于对准第一物体的参考对准图案，并且用于检测第一和第二物体的对准图案之间的对准状态，用于使第一和第二物体相对于彼此移动的移动装置，用于测量第一物体的测量装置移动装置的移动量，以及用于进行形成在第一物体上的多个排列图案之间的间隔的测量的长度测量装置。长度测量装置基于通过对准检测器在第二物体上的多个参考对准图案与第一物体上的多个对准图案之间的对准检测器的连续对准条件检测操作检测到的连续对准条件进行长度测量，以及在对准检测器的连续对准状态检测操作期间由测量装置测量的移动装置的移动量。

50. 发明授权

US5369486A Position detector for detecting the position of an object using a diffraction grating positioned at an angle 失效
$Position detector for detecting the position of an object using a diffraction grating positioned at an angle$
标题翻译：位置检测器，用于使用位于一定角度的衍射光栅来检测物体的位置
公开(公告)号：US5369486A
公开(公告)日：1994-11-29
申请号：US947383
申请日：1992-09-21
申请人： Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Masanobu Hasegawa , Koichi Sentoku
发明人： Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Masanobu Hasegawa , Koichi Sentoku
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A position detector includes a diffraction grating provided on the surface of an object, an illumination system for illuminating the diffraction grating, a detection system for detecting diffracted light diffracted from the diffraction grating, and a processing system for detecting positional information relating to the object. The illumination system emits a first pair of beams which are diffracted by the diffraction grating and interfere with each other, and emits a second pair of beams which are diffracted by the diffraction grating and also interfere with each other. The first pair of beams are incident upon the diffraction grating along a plane extending in a first direction in which the diffraction grating extends. The second pair of beams are incident upon the diffraction grating along a plane extending in a second direction in which the diffraction grating extends. The first and second directions are different from a grating line direction. The detection system detects the interfering light and generates first and second beat signals therefrom. The processing system detects positional information with respect to the first direction from the phase state of the first beat signal and with respect to the second direction from the phase state of the second beat signal.
摘要翻译：位置检测器包括设置在物体表面上的衍射光栅，用于照射衍射光栅的照明系统，用于检测衍射光栅衍射的衍射光的检测系统，以及用于检测与物体有关的位置信息的处理系统。照明系统发射由衍射光栅衍射并彼此干涉的第一对光束，并且发射由衍射光栅衍射并且彼此干涉的第二对光束。第一对光束沿着沿衍射光栅延伸的第一方向延伸的平面入射在衍射光栅上。第二对光束沿着沿衍射光栅延伸的第二方向延伸的平面入射在衍射光栅上。第一和第二方向与光栅线方向不同。检测系统检测干扰光并从其产生第一和第二拍拍信号。处理系统从第一拍子信号的相位状态和相对于第二拍摄信号的相位状态相对于第二方向检测关于第一方向的位置信息。

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