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41. 发明授权

US4610525A Electronic flash device 失效
标题翻译：电子闪光装置
公开(公告)号：US4610525A
公开(公告)日：1986-09-09
申请号：US758842
申请日：1985-07-25
申请人： Masaaki Yoshida , Hiroyuki Kataoka
发明人： Masaaki Yoshida , Hiroyuki Kataoka
IPC分类号： G03B15/05 , G03B7/097
CPC分类号： G03B15/05 , G03B2215/055
摘要： In a flash device arranged to determine the aperture value of a photo-taking lens according to the measured level of a reflection light obtained by preliminary flashing and to control main flashing according to a light control level corresponding to the aperture value, when a light diffusing panel is arranged in front of a main flashing part for a wider flash illuminating angle, another light diffusing panel which gives an equal light reducing effect is also arranged for a preliminary flashing part. The light quantity of preliminary flashing is thus reduced in proportion to the degree of reduction in the light quantity of main flashing, so that the aperture value set by preliminary flashing and the light controllable range of main flashing for photographing can be made to be always in agreement with each other.
摘要翻译：在闪光灯装置中，其被配置为根据通过预备闪光获得的反射光的测量水平来确定摄影镜头的光圈值，并且根据与光圈值对应的光控制水平来控制主闪光，当光扩散面板布置在主闪光部分的前面，用于更宽的闪光照明角度，还为初步闪光部分布置另外具有相同减光效果的光漫射板。预先闪光的光量与主闪光量的减少程度成比例地减小，从而可以使通过初步闪光设定的光圈值和用于拍摄的主闪光的光可控范围始终保持在相互约定

42. 发明授权

US4208252A Apparatus for treatment of rubber and plastic wastes 失效
标题翻译：用于处理橡胶和塑料废物的设备
公开(公告)号：US4208252A
公开(公告)日：1980-06-17
申请号：US683153
申请日：1976-05-04
申请人： Masaaki Yoshida , Masao Watanabe , Kimio Tohma , Mitsuhiko Noda
发明人： Masaaki Yoshida , Masao Watanabe , Kimio Tohma , Mitsuhiko Noda
IPC分类号： C10B47/44 , C10B53/00 , C10B53/07 , C10B1/06 , C10B1/08 , C10B27/00
CPC分类号： C10B47/44 , C10B53/07 , Y02P20/143
摘要： An apparatus for treatment of rubber and plastic wastes, comprising in series an extruder for heating and melting rubber and plastic wastes to extrude the molten wastes, a decomposing section for heating the molten wastes to prepare decomposed products while optionally separating residues therefrom, a dry-distilling section for gasifying the decomposed products by dry-distillation, and a cooling section for cooling the dry-distilled products to separate gaseous materials from liquid materials.
摘要翻译：一种用于处理橡胶和塑料废物的设备，包括用于加热和熔化橡胶和塑料废料以挤出熔融废物的挤出机，用于加热熔融废物以制备分解产物同时任选分离残余物的分解部分，用于通过干馏气化分解产物的蒸馏部分，以及用于冷却干蒸馏产物以将液体材料与液体材料分离的冷却部分。

43. 发明授权

US11035901B2 State output apparatus, state output method, and recording medium 有权
公开(公告)号：US11035901B2
公开(公告)日：2021-06-15
申请号：US15581311
申请日：2017-04-28
申请人： Masaaki Yoshida
发明人： Masaaki Yoshida
IPC分类号： G01R31/364 , G01R31/36 , G01R31/392
摘要： A state output apparatus includes a power storage device information acquirer configured to acquire power storage device information including a voltage and a current of a power storage device; an integrated current amount calculator configured to calculate an integrated current amount supplied to the power storage device during a period in which the voltage changes from a first voltage to a second voltage between a discharge end voltage and a charge end voltage by charging the power storage device; an integrated current amount comparer configured to compare the calculated integrated current amount with a reference integrated current amount stored in a storage device; and a state outputter configured to output a result of the comparison as information indicating a state of the power storage device.

44. 发明授权

US08716501B2 Method for producing oxygen-containing compound 失效
标题翻译：含氧化合物的制造方法
公开(公告)号：US08716501B2
公开(公告)日：2014-05-06
申请号：US13201918
申请日：2010-02-17
申请人： Masaaki Yoshida
发明人： Masaaki Yoshida
IPC分类号： C07D301/08
CPC分类号： C07D493/08 , B01J19/002 , B01J19/242 , B01J2219/00263 , C01B13/10 , C07C45/40 , C07C51/34 , C07C49/04 , C07C49/433 , C07C47/02 , C07C47/12 , C07C49/786 , C07C55/14 , C07C59/147 , C07C59/225 , C07C59/185 , C07C53/126 , C07C55/18
摘要： [Problem] There is provided a method for producing an oxygen-containing compound safely and with improved reaction efficiency, in which an undesired peroxide is unlikely to be produced, and efficient heat exchange of the ozonization can be achieved.[Mean for solving the Problem] The method comprises an ozonization reaction step of continuously supplying, together with an organic compound, ozone having an oxygen content of less than 10% in a dissolved state in high-pressure carbon dioxide to an ozonization reaction section having a thin tubular shape, and reacting the ozone and the organic compound under conditions that suppress generation of oxygen due to thermal decomposition of the ozone, thereby continuously producing an ozonide; and a decomposition reaction step of continuously supplying the ozonide produced in the ozonization reaction step to a decomposition reaction section having a thin tubular shape, thereby continuously producing an oxygen-containing compound, the decomposition reaction step being provided in a manner continuous with the ozonization reaction step.
摘要翻译： [问题]提供了一种安全地生产含氧化合物的方法，并且具有改善的反应效率，其中不太可能产生不期望的过氧化物，并且可以实现臭氧化的有效的热交换。 [解决问题的意思]该方法包括臭氧化反应步骤，与臭氧化反应步骤一起，在有机化合物中将氧含量低于10％的臭氧在高压二氧化碳中的溶解状态提供给具有细管状，并且在抑制臭氧热分解产生氧的条件下使臭氧和有机化合物反应，从而连续生产臭氧化物; 以及分解反应步骤，将在臭氧化反应步骤中生产的臭氧化物连续供给到具有薄管状分解反应段，从而连续生产含氧化合物，分解反应步骤以与臭氧化反应连续的方式提供步。

45. 发明授权

US07846637B2 Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film 有权
标题翻译：用于形成用于液浸光刻工艺的抗蚀保护膜的材料和使用该保护膜形成抗蚀剂图案的方法
公开(公告)号：US07846637B2
公开(公告)日：2010-12-07
申请号：US11587509
申请日：2005-04-25
申请人： Keita Ishizuka , Kazumasa Wakiya , Kotaro Endo , Masaaki Yoshida
发明人： Keita Ishizuka , Kazumasa Wakiya , Kotaro Endo , Masaaki Yoshida
IPC分类号： G03F7/09 , C08F12/20
CPC分类号： G03F7/11 , C08F220/18 , C08F220/28 , C08F232/08 , G03F7/2041
摘要： The liquid immersion lithography process is configured so that the resist pattern resolution is improved by exposing a resist film to the lithographic exposure light under the conditions in which the predetermined thickness of the liquid for liquid immersion lithography, of which the refractive index is higher than that of air and smaller than that of the resist film is intervened at least on the resist film in a path of the lithography exposure light reaching the resist film, a protective film is formed on the surface of the resist film to be used. Therefore, when various immersion liquid, water being the representative example is used in the liquid immersion lithography process can be formed, the deterioration of the resist film and the immersion liquid to be used are simultaneously prevented, and the number of the process steps are not increased, and then the resist pattern having higher resolving ability.
摘要翻译：液浸光刻工艺被配置为通过在其中折射率高于液浸光刻液的液体光刻液体的预定厚度的条件下将抗蚀剂膜暴露于平版曝光光下来改善抗蚀剂图案分辨率的空气并且小于抗蚀剂膜的空气至少在到达抗蚀剂膜的光刻曝光光的路径中的抗蚀剂膜上被干涉，在要使用的抗蚀剂膜的表面上形成保护膜。因此，在液浸光刻工序中，可以形成各种浸渍液，作为代表例的水，同时防止使用的抗蚀剂膜和浸渍液的劣化，处理工序的数量不是增加，然后抗蚀剂图案具有较高的分辨能力。

46. 发明申请

US20100151383A1 POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN 有权
标题翻译：聚合物化合物，包含这种聚合物化合物的光电组合物和形成耐蚀图案的方法
公开(公告)号：US20100151383A1
公开(公告)日：2010-06-17
申请号：US12707462
申请日：2010-02-17
申请人： Toshiyuki Ogata , Syogo Matsumaru , Hideo Hada , Masaaki Yoshida
发明人： Toshiyuki Ogata , Syogo Matsumaru , Hideo Hada , Masaaki Yoshida
IPC分类号： G03F7/20 , G03F7/004 , C08F224/00
CPC分类号： C08F220/28 , C07C69/54 , C07C2601/14 , C08F222/1006 , C08F232/08 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： A polymer compound that, within a chemically amplified positive resist system, exhibits a significant change in alkali solubility from a state prior to exposure to that following exposure, as well as a photoresist composition that includes such a polymer compound and a method for forming a resist pattern, which are capable of forming fine patterns with a high level of resolution. The polymer compound includes, as an alkali-soluble group (i), a substituent group in which a group selected from amongst alcoholic hydroxyl groups, carboxyl groups, and phenolic hydroxyl groups is protected with an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1) shown below: [Formula 1] —CH2—O-AO—CH2—]n (1) (wherein, A represents an organic group of 1 to 20 carbon atoms with a valency of at least n+1, and n represents an integer from 1 to 4).
摘要翻译：化学放大型正性抗蚀剂体系内的曝光后的状态下的碱溶解度显着变化的高分子化合物以及包含这种高分子化合物的光致抗蚀剂组合物和形成抗蚀剂的方法图案，能够以高分辨率形成精细图案。高分子化合物作为碱溶性基团（i）包括其中选自醇羟基，羧基和酚羟基的基团用酸解离的溶解抑制基团（ii）保护的取代基，通式（1）表示的化合物：[式1] -CH 2 OAOO-CH 2 - ] n（1）（其中，A表示1〜20个碳原子的有机基团， 1，n表示1〜4的整数）。

47. 发明申请

US20090122370A1 Image reading apparatus 有权
标题翻译：图像读取装置
公开(公告)号：US20090122370A1
公开(公告)日：2009-05-14
申请号：US12291093
申请日：2008-11-06
申请人： Masaaki Yoshida
发明人： Masaaki Yoshida
IPC分类号： H04N1/46
CPC分类号： H04N1/1912 , H04N1/1917 , H04N1/484
摘要： In a color reading apparatus for successively reading respective red, green, and blue colors in each line while a document is continuously conveyed to a plurality of line sensor units arranged in a zigzag manner, the line sensor units are arranged with a distance equal to or shorter than a unit of line to prevent a color shift. When read data of the plurality of line sensor units in a conveying direction are to be combined, image data shifted by the number of lines corresponding to distances between the line sensor units in the conveying direction are set as first combination candidates. A color code and a line code are added to each of the data. Image data having the same color code and the same line code are combined. According to the image reading apparatus structured as described above, it is possible to obtain data capable of reproducing read data for each color on the same line without errors.
摘要翻译：在将文件连续传送到以Z字形排列的多个线传感器单元的情况下，连续读取各行的红色，绿色，蓝色的彩色读取装置中，线传感器单元的距离等于或等于短于单位线以防止颜色偏移。当组合传送方向上的多个行传感器单元的读取数据时，将与传送方向上的行传感器单元之间的距离相对应的行数移位的图像数据设置为第一组合候选。每个数据都添加一个颜色代码和一行代码。具有相同颜色代码和相同行代码的图像数据被组合。根据如上所述构造的图像读取装置，可以获得能够在同一行上再现用于每个颜色的读取数据的数据而无误差的数据。

48. 发明申请

US20080311523A1 Material for Formation of Resist Protection Film and Method of Forming Resist Pattern Therewith 失效
标题翻译：抗蚀剂保护膜形成材料及其形成方法
公开(公告)号：US20080311523A1
公开(公告)日：2008-12-18
申请号：US11658900
申请日：2005-07-29
申请人： Kotaro Endo , Masaaki Yoshida , Keita Ishizuka
发明人： Kotaro Endo , Masaaki Yoshida , Keita Ishizuka
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/2041 , G03F7/11
摘要： In the liquid immersion lithography process, by simultaneously preventing deterioration of a resist film and deterioration of an immersion liquid employed during liquid immersion lithography which uses various immersion liquids, including water, resistance to post exposure delay of the resist film can be improved without increasing the number of processes, thereby making it possible to form a high resolution resist pattern using liquid immersion lithography. Furthermore, it is possible to apply a high refractive index liquid immersion medium, used in combination with the high refractive index liquid immersion medium, thus making it possible to further improve pattern accuracy. Using a composition comprising an acrylic resin component having characteristics which have substantially no compatibility with a liquid in which a resist film is immersed, particularly water, and are also soluble in alkaline, a protective film is formed on the surface of a resist film used.
摘要翻译：在液浸光刻工艺中，通过同时防止抗蚀剂膜的劣化以及使用包括水在内的各种浸渍液体的液浸光刻中所使用的浸渍液的劣化，可以提高抗蚀剂膜的后曝光延迟性，而不会增加处理次数，从而可以使用液浸光刻法形成高分辨率抗蚀剂图案。此外，可以应用与高折射率浸液介质组合使用的高折射率液浸介质，从而可以进一步提高图案精度。使用包含与浸渍有抗蚀剂膜的液体基本上不相容的特性的丙烯酸树脂组分的组合物，特别是水，并且也可溶于碱性，在所用的抗蚀剂膜的表面上形成保护膜。

49. 发明申请

US20080032202A1 Material for Forming Resist Protective Film for Use in Liquid Immersion Lithography Process and Method for Forming Resist Pattern Using the Protective Film 有权
标题翻译：用于液浸式平版印刷工艺中形成抗蚀保护膜的材料及使用保护膜形成抗蚀剂图案的方法
公开(公告)号：US20080032202A1
公开(公告)日：2008-02-07
申请号：US11587509
申请日：2005-04-25
申请人： Keita Ishizuka , Kazumasa Wakiya , Kotaro Endo , Masaaki Yoshida
发明人： Keita Ishizuka , Kazumasa Wakiya , Kotaro Endo , Masaaki Yoshida
IPC分类号： C08F20/10 , C08F22/00 , C08F36/16 , G03F7/11 , H01L21/027
CPC分类号： G03F7/11 , C08F220/18 , C08F220/28 , C08F232/08 , G03F7/2041
摘要： The liquid immersion lithography process is configured so that the resist pattern resolution is improved by exposing a resist film to the lithographic exposure light under the conditions in which the predetermined thickness of the liquid for liquid immersion lithography, of which the refractive index is higher than that of air and smaller than that of the resist film is intervened at least on the resist film in a path of the lithography exposure light reaching the resist film, a protective film is formed on the surface of the resist film to be used. Therefore, when various immersion liquid, water being the representative example is used in the liquid immersion lithography process can be formed, the deterioration of the resist film and the immersion liquid to be used are simultaneously prevented, and the number of the process steps are not increased, and then the resist pattern having higher resolving ability.
摘要翻译：液浸光刻工艺被配置为通过在其中折射率高于液浸光刻液的液体光刻液体的预定厚度的条件下将抗蚀剂膜暴露于平版曝光光下来改善抗蚀剂图案分辨率的空气并且小于抗蚀剂膜的空气至少在到达抗蚀剂膜的光刻曝光光的路径中的抗蚀剂膜上被干涉，在要使用的抗蚀剂膜的表面上形成保护膜。因此，在液浸光刻工序中，可以形成各种浸渍液，作为代表例的水，同时防止使用的抗蚀剂膜和浸渍液的劣化，处理工序的数量不是增加，然后抗蚀剂图案具有较高的分辨能力。

50. 发明授权

US07217384B2 Device and method for runner-less molding of thermosetting resin and rubber 有权
标题翻译：热固性树脂和橡胶的无浇道成型的装置和方法
公开(公告)号：US07217384B2
公开(公告)日：2007-05-15
申请号：US10490650
申请日：2002-10-01
申请人： Yoshiaki Tanaka , Masaaki Yoshida
发明人： Yoshiaki Tanaka , Masaaki Yoshida
IPC分类号： B29C45/72
CPC分类号： B29C45/2756 , B29C2045/2796 , B29K2021/006 , B29K2101/10
摘要： A runner-less molding device for thermosetting resins and rubbers, characterized by a movable runner bush (15), through which an uncured or unvulcanized fluid material kept at a low temperature supplied from a pouring nozzle (31) can flow, is slidably arranged in a temperature controlling bush (13) communicating with a gate (4) of a cavity (1); an insulation space (A) is formed by moving the movable runner bush (15) apart from the gate (4) during heating; a valve pin (18) is movably inserted into said movable runner bush (15); and the valve pin (18) is arranged so as to open and close the gate (4) in accordance with a pouring operation of the fluid material. A runner part of the movable runner bush containing molding material is constituted so as to move forward/backward relative to the cavity for preventing heat from conducting from the cavity, which is kept at a molding temperature, to the runner positioned apart from the gate for a long time, so that material loss generated in a sprue runner is reduced to almost null in order to reduce fabricating costs after molding and amount of wastes generated during after treatments. Thus, the improved molding device for the thermosetting resin and the rubber is obtained, and burdens on the global environment are alleviated.
摘要翻译：一种用于热固性树脂和橡胶的无浇道模制装置，其特征在于可移动的浇道衬套（15），由倾倒喷嘴（31）供应的保持在低温下的未硫化或未硫化的流体材料可流动通过该浇道衬套与腔（1）的门（4）连通的温度控制衬套（13）; 通过在加热期间将可动浇道衬套（15）与浇口（4）分开移动而形成绝缘空间（A）一个阀销（18）可移动地插入到所述活动滚道衬套（15）中; 并且阀销（18）被布置成根据流体材料的倾倒操作来打开和关闭闸门（4）。包含成型材料的活动浇道衬套的流道部分被构造成相对于腔体向前/向后移动，以防止热量从保持在模制温度的腔体传导到远离浇口的流道长时间，使得在浇道流道中产生的材料损失减少到几乎为零，以便降低成型后的制造成本和处理后产生的废物量。因此，获得了用于热固性树脂和橡胶的改进的模制装置，并且减轻了对全球环境的负担。

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