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41. 发明授权

US07218392B2 Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination 有权
标题翻译：使用多角度和多波长照明的晶圆检查系统的系统和方法
公开(公告)号：US07218392B2
公开(公告)日：2007-05-15
申请号：US11227555
申请日：2005-09-14
申请人： Steve Biellak , Stanley E. Stokowski , Mehdi Vaez-Iravani
发明人： Steve Biellak , Stanley E. Stokowski , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： G01N21/47 , G01N21/474 , G01N21/8806 , G01N21/9501 , G01N2021/8825 , H01L22/12
摘要： A method for detecting an anomaly on a top surface of a substrate comprises directing a first radiation beam having a first wavelength at the top surface of the substrate at a first angle measured from normal, and directing a second radiation beam having a second wavelength at the top surface of the substrate at a second angle measured from normal, wherein the second wavelength is not equal to the first wavelength. The method then comprises detecting scattered radiation from the first radiation beam and the second radiation beam to detect the presence of particles or COPs, and to differentiate between the two. Differences in the scattered radiation detected from the first radiation beam and from the second radiation beam provide the data needed to differentiate between particles and COPs.
摘要翻译：用于检测衬底的顶表面上的异常的方法包括以从正常测量的第一角度引导具有第一波长的第一辐射束在衬底的顶表面处，并且将具有第二波长的第二辐射束引导到从正常测量的第二角度的衬底的顶表面，其中第二波长不等于第一波长。该方法然后包括检测来自第一辐射束和第二辐射束的散射辐射，以检测颗粒或COP的存在，并区分两者。从第一辐射束和第二辐射束检测的散射辐射的差异提供了区分颗粒和COP之间所需的数据。

42. 发明申请

US20060256327A1 System for Detecting Anomalies and/or Features of a Surface 审中-公开
标题翻译：用于检测表面异常和/或特征的系统
公开(公告)号：US20060256327A1
公开(公告)日：2006-11-16
申请号：US11459586
申请日：2006-07-24
申请人： Mehdi Vaez-Iravani , Guoheng Zhao , Stanley Stokowski
发明人： Mehdi Vaez-Iravani , Guoheng Zhao , Stanley Stokowski
IPC分类号： G01N21/88
CPC分类号： G01N21/95623 , G01N21/47 , G01N21/94 , G01N2201/1045
摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam. For inspecting surface with a pattern thereon, the light from the surface is first passed through a spatial filter before it is imaged onto the charge-coupled devices. The spatial filter includes stripes of scattering regions that shift in synchronism with relative motion between the beam and the surface to block Fourier components from the pattern. The spatial filter may be replaced by reflective strips that selectively reflects scattered radiation to the detector, where the reflective strips also shifts in synchronism with the relative motion.
摘要翻译：使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。为了在其上检查具有图案的表面，来自表面的光首先在其被成像到电荷耦合器件之前通过空间滤光器。空间滤波器包括散射区域的条带，其与波束和表面之间的相对运动同步地移动，以阻止来自图案的傅立叶分量。空间滤波器可以被选择性地将散射的辐射反射到检测器的反射条替代，其中反射条也与相对运动同步地移动。

43. 发明授权

US07068363B2 Systems for inspection of patterned or unpatterned wafers and other specimen 有权
标题翻译：用于检查图案或未图案化晶片和其他样品的系统
公开(公告)号：US07068363B2
公开(公告)日：2006-06-27
申请号：US10456203
申请日：2003-06-06
申请人： Christopher F. Bevis , Mike Kirk , Mehdi Vaez-Iravani
发明人： Christopher F. Bevis , Mike Kirk , Mehdi Vaez-Iravani
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/474 , G01N21/94 , G01N21/9501
摘要： Systems for inspection of patterned and unpatterned wafers are provided. One system includes an illumination system configured to illuminate the specimen. The system also includes a collector configured to collect light scattered from the specimen. In addition, the system includes a segmented detector configured to separately detect different portions of the light such that azimuthal and polar angular information about the different portions of light is preserved. The detector may also be configured to produce signals representative of the different portions of the light. The system may also include a processor configured to detect defects on the specimen from the signals. In another embodiment, the system may include a stage that is configured to rotate and translate the specimen. In one such embodiment, the system may also include an illumination system configured to scan the specimen in a wide scan path during rotation and translation of the specimen.
摘要翻译：提供了用于图案化和未图案化晶片检查的系统。一个系统包括被配置为照亮样本的照明系统。该系统还包括收集器，用于收集从样品散射的光。此外，该系统包括分段检测器，其被配置为分别检测光的不同部分，使得保持关于光的不同部分的方位角和极坐标信息。检测器还可以被配置为产生表示光的不同部分的信号。该系统还可以包括处理器，其配置成从信号中检测样本上的缺陷。在另一个实施例中，系统可以包括被配置为旋转和平移样本的台。在一个这样的实施例中，系统还可以包括被配置为在样本的旋转和平移期间以宽扫描路径扫描样本的照明系统。

44. 发明申请

US20050174568A1 Sample inspection system 失效
公开(公告)号：US20050174568A1
公开(公告)日：2005-08-11
申请号：US10627402
申请日：2003-07-24
申请人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
发明人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
IPC分类号： G01N21/956 , G01J3/44 , G01N21/00 , G01N21/21 , G01N21/47 , G01N21/88 , G01N21/94 , G01N21/95 , H01L21/66
CPC分类号： G01J3/44 , G01J3/0216 , G01J3/0229 , G01N21/21 , G01N21/47 , G01N21/474 , G01N21/8806 , G01N21/94 , G01N21/9501 , G01N2021/8825 , G01N2021/8845 , G01N2021/8848 , G01N2201/065
摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.

45. 发明授权

US06724473B2 Method and system using exposure control to inspect a surface 有权
标题翻译：使用曝光控制来检查表面的方法和系统
公开(公告)号：US06724473B2
公开(公告)日：2004-04-20
申请号：US10113145
申请日：2002-03-27
申请人： Jenn-Kuen Leong , Guoheng Zhao , Mehdi Vaez-Iravani
发明人： Jenn-Kuen Leong , Guoheng Zhao , Mehdi Vaez-Iravani
IPC分类号： G01N2100
CPC分类号： G01N21/47 , G01N21/9501 , G01N2021/8896 , G01N2021/9513
摘要： A method and system of using exposure control to inspect a surface, such as a wafer. One inspection system comprises charge coupled devices (CCDs) as detectors. The exposure control function of each CCD is used to adjust integration times on individual taps of the CCD such that light scattered from the surface, which may contain multiple scattering regions, is within a dynamic range of the CCD during inspection.
摘要翻译：使用曝光控制来检查诸如晶片的表面的方法和系统。一个检测系统包括作为检测器的电荷耦合器件（CCD）。每个CCD的曝光控制功能用于调节CCD各个抽头上的积分时间，使得从表面散射的光可能包含多个散射区域，在检测期间处于CCD的动态范围内。

46. 发明授权

US06578961B2 Massively parallel inspection and imaging system 有权
标题翻译：大规模并行检测和成像系统
公开(公告)号：US06578961B2
公开(公告)日：2003-06-17
申请号：US09819347
申请日：2001-03-27
申请人： Mehdi Vaez-Iravani
发明人： Mehdi Vaez-Iravani
IPC分类号： G01N2188
CPC分类号： G01N21/956 , G01N21/8806 , G01N21/9501 , G01N2021/8905
摘要： A massively parallel inspection and imaging system is provided which employs multiple focused beams to illuminate a specimen. Laser light energy passes through a relatively low resolution diffraction grating or digital optical element, which is either one or two dimensional, and concentrates the transmitted energy into multiple discrete directions or orders. The beams split by the diffraction grating pass through a beam expander or telescope and are recombined onto an optical element and diverted toward the specimen. On reflection toward the specimen, the beams diverge again toward a focusing objective. The resultant light thus comprises multiple focused beams, and a relatively large area of the specimen is illuminated simultaneously by these beams. Upon reflection of the light from the sample, light passes back through the focusing objective in multiple beams, and the beams converge toward the optical element and diverge outward in collimated beams. The collimated beams pass through a focusing lens, which brings all beams onto foci on a detector array. Scanning of patterned wafers by the system may occur using coordinated motion of both the scanning beam and the wafer. To achieve proper orientation and observation, the stage speed in the cross direction is set at the ratio of the distance between the first and last lines divided by the period of the scanner.
摘要翻译：提供了大量平行的检查和成像系统，其采用多个聚焦光束照射样本。激光能量通过相对低分辨率的衍射光栅或数字光学元件，其为一维或二维，并将透射的能量集中到多个离散的方向或次序。由衍射光栅分裂的光束通过光束扩展器或望远镜，并重新组合到光学元件上并朝向样本转移。在对样本的反射时，光束再次朝向聚焦目标发散。所得到的光由此包括多个聚焦光束，并且通过这些光束同时照射样本的相对较大的面积。当来自样品的光反射时，光以多个光束返回穿过聚焦物镜，并且光束朝向光学元件会聚，并在准直光束中向外发散。准直光束通过聚焦透镜，其将所有光束带到检测器阵列上的焦点上。通过系统扫描图案化晶片可以使用扫描光束和晶片两者的协调运动来进行。为了实现适当的取向和观察，将横向的台阶速度设定为第一行和最后一行之间的距离除以扫描仪的周期之间的比率。

47. 发明授权

US06538730B2 Defect detection system 有权
公开(公告)号：US06538730B2
公开(公告)日：2003-03-25
申请号：US09828269
申请日：2001-04-06
申请人： Mehdi Vaez-Iravani , Jeffrey Alan Rzepiela , Carl Treadwell , Andrew Zeng , Robert Fiordalice
发明人： Mehdi Vaez-Iravani , Jeffrey Alan Rzepiela , Carl Treadwell , Andrew Zeng , Robert Fiordalice
IPC分类号： G01N2100
CPC分类号： G01N21/956 , G01N21/21 , G01N21/9501
摘要： Scattered radiation from a sample surface is collected by means of a collector that collects radiation substantially symmetrically about a line normal to the surface. The collected radiation is directed to channels at different azimuthal angles so that information related to relative azimuthal positions of the collected scattered radiation about the line is preserved. The collected radiation is converted into respective signals representative of radiation scattered at different azimuthal angles about the line. The presence and/or characteristics of anomalies are determined from the signals. Alternatively, the radiation collected by the collector may be filtered by means of a spatial filter having an annular gap of an angle related to the angular separation of expected pattern scattering. Signals obtained from the narrow and wide collection channels may be compared to distinguish between micro-scratches and particles. Forward scattered radiation may be collected from other radiation and compared to distinguish between micro-scratches and particles. Intensity of scattering is measured when the surface is illuminated sequentially by S- and P-polarized radiation and compared to distinguish between micro-scratches and particles. Representative films may be measured using profilometers or scanning probe microscopes to determine their roughness and by the above-described instruments to determine haze in order to build a database. Surface roughness of unknown films may then be determined by measuring haze values and from the database.

48. 发明授权

US4929836A Focusing in instruments, such as SEMs and CRTs 失效
标题翻译：专注于仪器仪表，如SEM和CRT
公开(公告)号：US4929836A
公开(公告)日：1990-05-29
申请号：US333059
申请日：1989-04-03
申请人： Albert Sicignano , Mehdi Vaez-Iravani
发明人： Albert Sicignano , Mehdi Vaez-Iravani
IPC分类号： G01Q30/02 , H01J37/28
CPC分类号： H01J37/28
摘要： A significantly improved focusing technique is set forth for use with electron beams, particularly in scanning electron microscopes and/or CRTs. This technique utilizes an in-situ differential signal measurement of an object surface to form a signal which is particularly sensitive to edges in the sample at a superimposed frequency. Perfect focus is obtained when the signal strength at the superimposed frequency is a maximum thereby resulting in a minimum spot size.
摘要翻译：阐述了与电子束一起使用的显着改进的聚焦技术，特别是在扫描电子显微镜和/或CRT中。该技术利用物体表面的原位差分信号测量来形成对叠加频率对样本中边缘特别敏感的信号。当叠加频率处的信号强度最大时，可获得完美的聚焦，从而导致最小光斑尺寸。

49. 发明授权

US4845362A In situ differential imaging and method utilizing a scanning electron microscope 失效
标题翻译：利用扫描电子显微镜进行原位差分成像和方法
公开(公告)号：US4845362A
公开(公告)日：1989-07-04
申请号：US151367
申请日：1988-02-02
申请人： Albert Sicignano , Mehdi Vaez-Iravani
发明人： Albert Sicignano , Mehdi Vaez-Iravani
IPC分类号： G01N23/22 , G21K5/04 , H01J37/147 , H01J37/22 , H01J37/244 , H01J37/28
CPC分类号： H01J37/28
摘要： The operating characteristics of an SEM apparatus are enhanced by carrying out in situ deflection during electron beam scanning of an object to be examined. Differential signals derived from the in situ deflection are a direct measure of the spatial derivative of any geometric or material variations on the surface of the scanned object.

50. 发明授权

US08891079B2 Wafer inspection 有权
标题翻译：晶圆检查
公开(公告)号：US08891079B2
公开(公告)日：2014-11-18
申请号：US13822281
申请日：2011-12-07
申请人： Guoheng Zhao , Jenn-Kuen Leong , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Jenn-Kuen Leong , Mehdi Vaez-Iravani
IPC分类号： G01N21/00 , G01J4/00 , G01N21/88 , G01N21/95 , H01L21/66
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/8806 , G01N2201/06113 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Systems and methods for inspecting a wafer are provided. One system includes an illumination subsystem configured to illuminate the wafer; a collection subsystem configured to collect light scattered from the wafer and to preserve the polarization of the scattered light; an optical element configured to separate the scattered light collected in different segments of the collection numerical aperture of the collection subsystem, where the optical element is positioned at a Fourier plane or a conjugate of the Fourier plane of the collection subsystem; a polarizing element configured to separate the scattered light in one of the different segments into different portions of the scattered light based on polarization; and a detector configured to detect one of the different portions of the scattered light and to generate output responsive to the detected light, which is used to detect defects on the wafer.
摘要翻译：提供了用于检查晶片的系统和方法。一个系统包括配置成照亮晶片的照明子系统; 收集子系统，被配置为收集从晶片散射的光并保持散射光的偏振; 光学元件，被配置为将收集在收集子系统的收集数值孔径的不同段中的散射光分离，其中所述光学元件位于所述收集子系统的傅立叶平面或所述傅立叶平面的共轭处; 偏振元件，被配置为基于极化将所述不同段中的一个中的散射光分离成所述散射光的不同部分; 以及检测器，被配置为检测散射光的不同部分中的一个，并且响应于检测到的光而产生输出，所述检测光用于检测晶片上的缺陷。

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