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41. 发明申请

US20110226745A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：极致超紫外光发生系统
公开(公告)号：US20110226745A1
公开(公告)日：2011-09-22
申请号：US13048454
申请日：2011-03-15
申请人： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
发明人： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
IPC分类号： B23K26/04
CPC分类号： G03F7/70033 , G03F7/70891 , G03F7/70916 , G03F7/70925 , G21K1/06 , G21K2201/064 , G21K2201/067 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
摘要翻译：极紫外光发生系统是与激光装置一起使用并与外部装置连接以向其提供极紫外光的极紫外光发生系统，并且极紫外线发生系统可以包括：室入射至少一个激光束的入口; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，其被设置到蚀刻气体通过的室，所述蚀刻气体被引入以蚀刻所述目标材料的碎屑，所述目标材料在所述靶材料被所述室内的所述激光束照射时发射，并且粘附至所述至少一个光学元件以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

42. 发明授权

US08558202B2 Extreme ultraviolet light source apparatus 有权
公开(公告)号：US08558202B2
公开(公告)日：2013-10-15
申请号：US13336749
申请日：2011-12-23
申请人： Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
发明人： Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.

43. 发明申请

US20110057126A1 EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光紫外线光源设备
公开(公告)号：US20110057126A1
公开(公告)日：2011-03-10
申请号：US12943090
申请日：2010-11-10
申请人： HIDEO HOSHINO , Tamotsu Abe , Akira Endo
发明人： HIDEO HOSHINO , Tamotsu Abe , Akira Endo
IPC分类号： H01J27/24
CPC分类号： H01S3/2383 , G03F7/70033 , H01S3/0057 , H01S3/2308 , H01S5/4012
摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
摘要翻译：可以有效地获得EUV光的极端紫外光源装置使用驱动激光，其能够以基本均匀的强度实现期望的脉冲宽度。该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。

44. 发明申请

US20100181503A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20100181503A1
公开(公告)日：2010-07-22
申请号：US12638571
申请日：2009-12-15
申请人： Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
发明人： Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
IPC分类号： G21K5/02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
摘要翻译：在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

45. 发明授权

US08436328B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08436328B2
公开(公告)日：2013-05-07
申请号：US12638571
申请日：2009-12-15
申请人： Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
发明人： Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
摘要翻译：在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

46. 发明申请

US20080197299A1 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US20080197299A1
公开(公告)日：2008-08-21
申请号：US12071352
申请日：2008-02-20
申请人： Hideo Hoshino , Tamotsu Abe , Akira Endo
发明人： Hideo Hoshino , Tamotsu Abe , Akira Endo
IPC分类号： G21K5/00
CPC分类号： H01S3/2383 , G03F7/70033 , H01S3/0057 , H01S3/2308 , H01S5/4012
摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained by using a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
摘要翻译：通过使用能够以基本均匀的强度实现期望的脉冲宽度的驱动激光可以有效地获得EUV光的极端紫外光源装置。该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。

47. 发明授权

US08324601B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08324601B2
公开(公告)日：2012-12-04
申请号：US12943090
申请日：2010-11-10
申请人： Hideo Hoshino , Tamotsu Abe , Akira Endo
发明人： Hideo Hoshino , Tamotsu Abe , Akira Endo
IPC分类号： H05H1/00 , G01J3/10
CPC分类号： H01S3/2383 , G03F7/70033 , H01S3/0057 , H01S3/2308 , H01S5/4012
摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
摘要翻译：可以有效地获得EUV光的极端紫外光源装置使用驱动激光，其能够以基本均匀的强度实现期望的脉冲宽度。该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。

48. 发明申请

US20120091893A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20120091893A1
公开(公告)日：2012-04-19
申请号：US13336749
申请日：2011-12-23
申请人： Tatsuya YANAGIDA , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
发明人： Tatsuya YANAGIDA , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
IPC分类号： H05H1/46
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
摘要翻译：在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

49. 发明授权

US07842937B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07842937B2
公开(公告)日：2010-11-30
申请号：US12071352
申请日：2008-02-20
申请人： Hideo Hoshino , Tamotsu Abe , Akira Endo
发明人： Hideo Hoshino , Tamotsu Abe , Akira Endo
IPC分类号： H01J27/24 , A61N5/06
CPC分类号： H01S3/2383 , G03F7/70033 , H01S3/0057 , H01S3/2308 , H01S5/4012
摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
摘要翻译：可以有效地获得EUV光的极端紫外光源装置使用驱动激光，其能够以基本均匀的强度实现期望的脉冲宽度。该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。

50. 发明申请

US20100140513A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20100140513A1
公开(公告)日：2010-06-10
申请号：US12605113
申请日：2009-10-23
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
IPC分类号： G21K5/02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.
摘要翻译：极紫外光源装置具有磁场发生器，该磁场发生器在通过等离子体产生等离子体区域的磁场方向周围产生磁场区域，并将包含从等离子体区域射出的离子的带电粒子向着磁场方向，安装在磁场区域的磁场轴的两侧的第一带电粒子收集器（接收器），以收集（接收）由磁场收敛的带电粒子;目标供给单元从位于极紫外光发生室内的磁场区域内的会聚区域的会聚区域的喷嘴和位于与喷嘴相对的位置的目标集合体供给目标，目标取出部检索对等离子体的产生无贡献的残留目标。

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