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    • 42. 发明申请
    • RECESSED GATE FOR AN IMAGE SENSOR
    • 图像传感器的门
    • US20060124976A1
    • 2006-06-15
    • US10905097
    • 2004-12-15
    • James AdkissonJohn Ellis-MonaghanMark JaffeJerome Lasky
    • James AdkissonJohn Ellis-MonaghanMark JaffeJerome Lasky
    • H01L31/113H01L29/76H01L29/94
    • H01L27/14603H01L27/14601H01L27/14689H01L29/66621
    • A novel image sensor cell structure and method of manufacture. The imaging sensor comprises a substrate, a gate comprising a dielectric layer and gate conductor formed on the dielectric layer, a collection well layer of a first conductivity type formed below a surface of the substrate adjacent a first side of the gate conductor, a pinning layer of a second conductivity type formed atop the collection well at the substrate surface, and a diffusion region of a first conductivity type formed adjacent a second side of the gate conductor, the gate conductor forming a channel region between the collection well layer and the diffusion region. Part of the gate conductor bottom is recessed below the surface of the substrate. Preferably, a portion of the gate conductor is recessed at or below a bottom surface of the pinning layer to a depth such that the collection well intersects the channel region.
    • 一种新颖的图像传感器单元结构及其制造方法。 成像传感器包括基板,包括电介质层和形成在电介质层上的栅极导体的栅极,形成在与栅极导体的第一侧相邻的基板的表面下面的第一导电类型的收集阱层,钉扎层 在基板表面上形成在集合阱顶部的第二导电类型的第一导电类型的扩散区和在栅极导体的第二侧附近形成的第一导电类型的扩散区,栅极导体在集电阱层和扩散区之间形成沟道区 。 栅极导体底部的一部分凹陷在基板的表面下方。 优选地,栅极导体的一部分在钉扎层的底表面处或下方凹陷到使得收集阱与沟道区相交的深度。