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    • 45. 发明授权
    • Multi-voltage plane, multi-signal plane circuit card with photoimageable dielectric
    • 多电平面,多信号平面电路卡,带有可光成像电介质
    • US06201194B1
    • 2001-03-13
    • US09203978
    • 1998-12-02
    • John M. LaufferRoy H. MagnusonVoya R. MarkovichJohn A. Welsh
    • John M. LaufferRoy H. MagnusonVoya R. MarkovichJohn A. Welsh
    • H01R909
    • H05K3/429H01R12/523H05K3/0023H05K3/4602H05K3/4608H05K3/4641H05K2201/0355H05K2201/09309H05K2201/09536H05K2201/096H05K2203/0554Y10T29/49165
    • A technique for forming an organic chip carrier or circuit board, having two voltage planes and at least two signal planes is provided which includes bonding a first layer of photolithographic dielectric material to a first metal layer and exposing the first layer of dielectric material to a pattern of radiation to provide at least one opening through the first layer of the dielectric material. A second metal layer is bonded to the first layer of photoimageable material on the opposite side from the first metal layer. Holes are etched in the first and second metal layers which correspond to and are larger than each of the patterns on said openings in the first layer of dielectric material. The exposed pattern on the first layer of dielectric material is then developed, with the openings in the first and second metal layers being larger than the corresponding developed opening in the first dielectric material. Second and third layers of photoimageable dielectric material are applied on the first and second metal layers, respectively and are photopatterned and developed to provide openings in each of the second and third layers of dielectric material some of which correspond to each of the holes in the first layer of dielectric material and the holes in the first and second metal layers, some of which terminate at the underlying metal layer. The exposed surfaces of both the second and third dielectric material, are circuitized and the holes plated or filled with metal.
    • 提供了一种用于形成具有两个电压平面和至少两个信号面的有机芯片载体或电路板的技术,其包括将第一层光刻电介质材料结合到第一金属层并将第一介电材料层暴露于图案 的辐射以提供通过电介质材料的第一层的至少一个开口。 第二金属层在与第一金属层相对的一侧上结合到可光成像材料的第一层。 在第一和第二金属层中蚀刻孔,其对应于并且大于第一介电材料层中的所述开口上的每个图案。 然后显影第一层介电材料上的暴露图案,其中第一和第二金属层中的开口大于第一介电材料中对应的显影开口。 将第二和第三层可光成像介电材料分别施加在第一和第二金属层上,并对其进行光刻图案化和显影以在第二和第三层介电材料中的每一个中提供开口,其中的第一和第三层对应于第一和第二金属层中的每个孔 介电材料层和第一和第二金属层中的孔,其中一些终止于下面的金属层。 第二和第三介电材料的暴露表面被电路化,并且孔被镀金或填充金属。