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    • 7. 发明申请
    • Method of making a circuitized substrate having at least one capacitor therein
    • 制造其中具有至少一个电容器的电路化基板的方法
    • US20080248596A1
    • 2008-10-09
    • US11878673
    • 2007-07-26
    • Rabindra N. DasFrank D. EgittoHow T. LinJohn M. LaufferVoya R. Markovich
    • Rabindra N. DasFrank D. EgittoHow T. LinJohn M. LaufferVoya R. Markovich
    • H01L21/77
    • H01G4/206H01G4/232H01G4/33H05K1/162H05K3/0032H05K3/107H05K2201/0209H05K2201/0257H05K2201/09236H05K2201/09309H05K2201/09881H05K2203/0108H05K2203/066
    • A method of making a circuitized substrate which includes at least one and possibly several capacitors as part thereof. In one embodiment, the substrate is produced by forming a layer of capacitive dielectric material on a dielectric layer and thereafter forming channels with the capacitive material, e.g., using a laser. The channels are then filled with conductive material, e.g., copper, using selected deposition techniques, e.g., sputtering, electro-less plating and electroplating. A second dielectric layer is then formed atop the capacitor and a capacitor “core” results. This “core” may then be combined with other dielectric and conductive layers to form a larger, multilayered PCB or chip carrier. In an alternative approach, the capacitive dielectric material may be photo-imageable, with the channels being formed using conventional exposure and development processing known in the art. In still another embodiment, at least two spaced-apart conductors may be formed within a metal layer deposited on a dielectric layer, these conductors defining a channel there-between. The capacitive dielectric material may then be deposited (e.g., using lamination) within the channels.
    • 一种制造电路化衬底的方法,其包括至少一个可能的几个电容器作为其一部分。 在一个实施例中,通过在电介质层上形成电容电介质材料层,然后用电容材料形成通道,例如使用激光来制造衬底。 然后使用所选择的沉积技术,例如溅射,无电镀和电镀,用导电材料(例如铜)填充通道。 然后在电容器顶部形成第二电介质层,并产生电容器“芯”。 然后,该“芯”可以与其它电介质层和导电层组合以形成较大的多层PCB或芯片载体。 在替代方法中,电容介电材料可以是可光成像的,其中通道是使用本领域已知的常规曝光和显影处理形成的。 在另一个实施例中,可以在沉积在电介质层上的金属层内形成至少两个间隔开的导体,这些导体在其间限定通道。 然后可以在通道内沉积(例如,使用层压)的电容电介质材料。