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41. 发明专利

JPH1153716A MAGNETO-RESISTANCE EFFECT TYPE HEAD, ITS MANUFACTURE AND MAGNETIC RECORDING AND REPRODUCING DEVICE USING THE SAME 失效
公开(公告)号：JPH1153716A
公开(公告)日：1999-02-26
申请号：JP20784797
申请日：1997-08-01
申请人： HITACHI LTD
发明人： YOSHIDA NOBUO , FUKUI HIROSHI , OKADA TOSHIHIRO , FUYAMA MORIAKI , NAKAMOTO KAZUHIRO
IPC分类号： G11B5/39
摘要： PROBLEM TO BE SOLVED: To form electrodes with high accuracy even in forming a narrower track in accordance with such high recording density and also to obtain good characteristics. SOLUTION: In the magneto-resistance effect type head having a magneto- resistance effect film 3 for converting a magnetic signal into an electric signal, a magnetic domain control film 6 for impressing a magnetic field upon the magneto-resistance effect film and the electrodes for making a signal detecting current flow into the magneto-resistance effect film, the electrodes consists of the 1st electrodes 7 on the magnetic domain control film and the 2nd electrodes 10 with smaller interelectrode space than the 1st electrodes on the 1st electrodes. These electrodes are formed by RIE(reactive ion etching).

42. 发明专利

JPH10241125A THIN FILM MAGNETIC HEAD AND RECORDING/REPRODUCING SEPARATION TYPE MAGNETIC HEAD AND MAGNETIC RECORDING/ REPRODUCING APPARATUS USING THE SAME 失效
公开(公告)号：JPH10241125A
公开(公告)日：1998-09-11
申请号：JP34252197
申请日：1997-12-12
申请人： HITACHI LTD
发明人： KOMURO MATAHIRO , HOSHINO KATSUMI , YOSHIDA NOBUO , NAKAMURA ATSUSHI , SHIMIZU NOBORU , HARA YOSHINORI , KAWABE TAKASHI , OKADA TOSHIHIRO , SANO MASAAKI , MARUYAMA YOJI , FUYAMA MORIAKI , FUKUI HIROSHI
IPC分类号： G11B5/31 , G11B5/39
摘要： PROBLEM TO BE SOLVED: To prevent deterioration of recording performance in high frequency recording by forming a magnetic cap with a magnetic film of two or more layers and by setting a specific resistance of a magnetic film of at least single layer of magnetic film to the value higher than that of the other magnetic film. SOLUTION: Under the lower magnetic film 5 working as an upper shielding film, MR and GMR film are provided as a reproducing head. At a part 11 of this lower magnetic film, a non-magnetic film having a high specific resistance (80μΩcm or higher) is formed by the sputtering method, etc., as a gap film 4. As a magnetic film satisfying this characteristic, a film having a high specific resistance can be obtained by simultaneously adding oxygen, nitrogen and an element having intensive affinity thereto, for example, Fe, CoFe alloy, etc. On this film having high specific resistance, a lower layer film 3 is formed, a resist frame 2 is formed thereon to form an upper magnetic film 1 by the plating method. Here, drop of recording performance can be controlled in the high frequency range by setting the thickness of high specific resistance film to 0.5 to 3 times the thickness of the gap film.

43. 发明专利

JPH103612A THIN-FILM MAGNETIC HEAD AND ITS PRODUCTION 失效
公开(公告)号：JPH103612A
公开(公告)日：1998-01-06
申请号：JP15370696
申请日：1996-06-14
申请人： HITACHI LTD
发明人： KUDO KAZUE , OKADA TOSHIHIRO
IPC分类号： G11B5/31
摘要： PROBLEM TO BE SOLVED: To make it possible to form a frame delineating a track width with high accuracy by forming this frame after flattening the stepped part of the insulating layer on a conductor coil and forming the resist used for flattening as part of the frame. SOLUTION: The resist 6 of the film thickness enough to flatten the stepping of the conductor coil 3 and the insulating layer on the coil is applied over the entire surface. This resist is exposed and developed via a photomask, by which the resist 6 in the upper part of the stepping is removed. The resist 6 in the lower part of the stepping is then made to reflow and is thereby flattened. The resist 6 for forming the frame 5 is then applied over the entire surface and is exposed and developed via a photomask, by which part of the frame is formed. Further, the frame is irradiated with UV rays, for UV rays, electron beams, etc. An ion milling method is, for example, used for patterning of the resist 6 previously used for flattening. As a result, the frame delineating the track width is formed with the high accuracy.

44. 发明专利

JPH08201849A LIQUID CRYSTAL DISPLAY DEVICE AND ITS MANUFACTURING METHOD 失效
公开(公告)号：JPH08201849A
公开(公告)日：1996-08-09
申请号：JP1229895
申请日：1995-01-30
申请人： HITACHI LTD
发明人： WAKAGI MASATOSHI , KIZAWA KENICHI , ANDO MASAHIKO , KANEKO TOSHITERU , MINEMURA TETSUO , OKADA TOSHIHIRO
IPC分类号： G02F1/136 , G02F1/1345 , G02F1/1362 , G02F1/1368 , H01L29/786
摘要： PURPOSE: To provide a highly reliable terminal connection by constructing a drain made of a metal film and the end portion of gate wiring using transparent electrically conductive films. CONSTITUTION: A metal film is formed on a transparent insulated substrate and machined on drain wiring 2, a source electrode 3 and an added capacity electrode 4. Then, a semiconductor layer 6, a gate insulated layer 7 and a electrically conductive metal film are formed and gate wiring 8 is made. A protective insulated layer is formed and etched, exposing the end portions of the gate wiring and the drain wiring and a pixel electrode section. By forming a transparent electrically conductive film and eliminating the unnecessary portion of the transparent electrically conductive film by using a lift off method for erasing resist, a drain wiring end portion ITO 14 and a gate wiring end portion ITO 15 are formed. Thus, since the same ITO is used for the drain wiring, the source electrode and the pixel electrode, the drain wiring, the source electrode and the pixel electrode are manufactured by performing film formation and a photolithographic process once.

45. 发明专利

JPH08194922A MAGNETORESISTIVE HEAD 失效
公开(公告)号：JPH08194922A
公开(公告)日：1996-07-30
申请号：JP658195
申请日：1995-01-19
申请人： HITACHI LTD
发明人： KUDO KAZUE , OKADA TOSHIHIRO , WATANABE KATSURO , AONO HIDEKI
IPC分类号： G11B5/11 , G11B5/31 , G11B5/39
摘要： PURPOSE: To maintain the insulation between a magnetoresistive film and a shielding film. CONSTITUTION: An oxide film 14 is formed between a lower shielding film 12 and a lower magnetic gap film 16. Or, an oxide film 28 is formed between an upper magnetic gap film 26 and an upper shielding film 30. With this constitution, even if pin-holes are produced in the gap films 16 and 26, the satisfactory insulation between a magnetoresistive film 36 and the shielding films 12 and 30 can be maintained. Therefore, even if pin-holes are produced in the gap films, the satisfactory insulation between the magnetoresistive film and the shielding films can be maintained and the dielectric strength can be improved.

46. 发明专利

JPH06267843A PATTERN FORMING METHOD 失效
公开(公告)号：JPH06267843A
公开(公告)日：1994-09-22
申请号：JP4900493
申请日：1993-03-10
申请人： HITACHI LTD
发明人： OKADA TOSHIHIRO , KAWABE TAKASHI , KONUMA AKIRA , FUYAMA MORIAKI , MORIJIRI MAKOTO
IPC分类号： G03F7/26 , H01L21/027
摘要： PURPOSE:To form a pattern by a lift-off method using a sputtering method, after a mask member having an undercut is formed on a two-layered film using photoresist on the upper layer part and polydimethyl glutaric imide on the lower layer part, by combining irradiation of ultraviolet rays and far ultraviolet rays with a plurality of times development. CONSTITUTION:After photoresist 3 of the upper layer part and polydimethyl glutaric imide 2 of the lower layer part are developed, the resist 3 of the upper layer is cured and the polydimetnyl glutaric imide 2 is exposed to light by the irradiation of far ultraviolet rays 6. By the second development, only the lower layer part is subjected to selective side etching, and a mask member having an undercut is formed. A thin film is deposited on the mask member by a sputtering method, and a pattern is formed by a lift-off method using organic solvent.

47. 发明专利

JPH06103535A THIN-FILM MAGNETIC HEAD AND ITS PRODUCTION 失效
公开(公告)号：JPH06103535A
公开(公告)日：1994-04-15
申请号：JP24757192
申请日：1992-09-17
申请人： HITACHI LTD
发明人： KAWABE TAKASHI , OKADA TOSHIHIRO , IMAGAWA TAKAO , ASHIDA EIJI , FUYAMA MORIAKI
IPC分类号： G11B5/39
摘要： PURPOSE:To obtain reliability and high pattern accuracy by constituting the electrode film with a material which can be patterned and produced by reactive etching using plasma contg. fluorine radical or fluorine ions. CONSTITUTION:Total four-layered films consisting of an NiFe film 106 as a magneto-resistance effect film, an FeNiCr film 108 as a shunt bias film and a Cr film 201 as an etching stopper film are formed on a ground surface film 102 and after sensor patterns are formed, three-layered films 202 consisting of Nb (20nm thickness)/W(0.3mum)/Nb(20nm) are formed as the electrode films. In succession, positive type photoresist patterns 203 (1mum) are produced. The electrode films 202 are etched by a reactive ion etching method using a gaseous mixture composed of CF4+5%O2. The etching conditions are specified to 6Pa gaseous pressure and 100W electric power to be applied. Since the Cr film 201 as the etching stopper exists under the electrode films 202 at this time, the sensor part does not receive the damage by the etching and the excellent reproduction characteristic is maintained.

48. 发明专利

JP2002092821A SINGLE MAGNETIC POLE TYPE MAGNETIC HEAD AND MAGNETIC DISK DEVICE MOUNTED WITH THE SAME 失效
公开(公告)号：JP2002092821A
公开(公告)日：2002-03-29
申请号：JP2000286842
申请日：2000-09-18
申请人： HITACHI LTD
发明人： OKADA TOSHIHIRO , KAWATO YOSHIAKI , NISHIDA YASUTAKA , WAKAGI YASUO
IPC分类号： G11B5/31
摘要： PROBLEM TO BE SOLVED: To manufacture a magnetic head for perpendicular recording without writing from a principal magnetic pole side surface and without erasing of an adjacent track and to provide a magnetic disk device using it. SOLUTION: The side surface of the principal magnetic pole of the magnetic head for perpendicular recording is formed in an inverse taper shape. The inverse taper shape is obtained by previously forming a groove to be a track part in an inorganic insulating film, then forming a magnetic film and flattening the upper surface thereof.

49. 发明专利

JP2002008211A METHOD FOR MANUFACTURING THIN FILM MAGNETIC HEAD AND MAGNETIC DISK DEVICE 失效
公开(公告)号：JP2002008211A
公开(公告)日：2002-01-11
申请号：JP2000189725
申请日：2000-06-20
申请人： HITACHI LTD
发明人： OKADA TOSHIHIRO , ETO KIMITOSHI , YOSHIDA NOBUO , TANAKA ATSUKO , SHIRAKI KIYONORI
IPC分类号： G11B5/39
摘要： PROBLEM TO BE SOLVED: To manufacture a magnetic head having =20 Gbit/in2 surface recording density. SOLUTION: A phase shift mask in which a phase of a transmitted light through one electrode pattern is inverted to a phase of a transmitted light through the other electrode pattern is used as a reticle for forming the reproducing track width of the magnetic head of the magnetic disk device to form

50. 发明专利

JP2001110663A TEST PIECE PROCESSING METHOD, APPARATUS THEREFOR, AND METHOD FOR MANUFACTURE OF MAGNETIC HEAD 失效
公开(公告)号：JP2001110663A
公开(公告)日：2001-04-20
申请号：JP28865899
申请日：1999-10-08
申请人： HITACHI LTD , HITACHI METALS LTD
发明人： YOSHIOKA TAKESHI , TORII ZENZO , FUYAMA MORIAKI , OKADA TOSHIHIRO , KANAI SABURO , USUI TAKETO , HARADA HITOSHI
IPC分类号： H01L21/306 , C23F4/00 , G11B5/127 , G11B5/31 , G11B5/40 , H01F41/14
摘要： PROBLEM TO BE SOLVED: To provide a test piece processing method, apparatus and manufacturing method for magnetic head without such a post processing as removal of corrosion products only by corrosion treatment residual chroline component by plasma process. SOLUTION: Laminated layers are formed by a seed layer of NiFe alloy, an upper magnetic pole of NiFe alloy connected with the seed layer, a gap layer of an oxide layer adhered to the seed layer, and a seed layer of NiFe alloy adhered to the gap layer. The seed layer is etched by means of plasma process using gas including chroline with the upper magnetic pole as a mask. Residual chlorine component is removed by plasma tail-end process using plasma including H2O or methanol.

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