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    • 46. 发明授权
    • Substrate container and method of dehumidifying substrate container
    • 底物容器及基体容器除湿方法
    • US06547953B2
    • 2003-04-15
    • US09769308
    • 2001-01-26
    • Yoko SuzukiAkira TanakaKazuo Okubo
    • Yoko SuzukiAkira TanakaKazuo Okubo
    • B01D5326
    • H01L21/67772H01L21/67366H01L21/67393
    • A substrate container includes a container housing having an opening for storing a substrate therethrough and a cover sealingly covering the opening, a fan motor mounted in the container housing for producing a circulating path of air in contact with the substrate in the container housing, and a particle removing filter and a gaseous impurity trapping filter which are disposed in the a portion of the circulating path which extends toward the substrate. A dehumidifying unit for dehumidifying a space in the container housing comprises a solid polymer electrolyte film disposed in the circulating path and voltage applying means for applying a voltage to the solid polymer electrolyte film to decompose water in air flowing in the circulating path thereby to dehumidify a space in the container housing.
    • 基板容器包括容器壳体,其具有用于存储基板的开口和密封地覆盖开口的盖,安装在容器壳体中的风扇马达,用于产生与容器壳体中的基板接触的空气的循环路径,以及 颗粒去除过滤器和气态杂质捕集过滤器,其设置在朝向衬底延伸的循环路径的一部分中。 用于除湿容器壳体中的空间的除湿单元包括设置在循环路径中的固体聚合物电解质膜和用于向固体聚合物电解质膜施加电压以分解在循环路径中流动的空气中的水的电压施加装置,从而除湿 容器外壳空间。
    • 48. 发明授权
    • Photosensitive polyimide resin composition
    • 感光聚酰亚胺树脂组合物
    • US6160081A
    • 2000-12-12
    • US183124
    • 1998-10-30
    • Akira TanakaKei SakamotoKenichi ItoYasuhiro YonedaKishio YokouchiYasuo Naganuma
    • Akira TanakaKei SakamotoKenichi ItoYasuhiro YonedaKishio YokouchiYasuo Naganuma
    • C08G73/10G03F7/037H05K1/00H05K1/03C08G69/26
    • G03F7/037C08G73/1025H05K1/0346H05K3/4676
    • The invention relates to a photosensitive polyimide resin composition comprising (A) a polyamic acid having, in its main chain, repeating units formed from a polycondensation product of at least one tetracarboxylic acid or tetracarboxylic anhydride thereof with at least one diamine compound, and having actinic ray-sensitive functional groups at both terminals thereof; (B) a photosensitive auxiliary having a photopolymerizable functional group; (C) a photopolymerization initiator; and (D) a solvent, wherein 1 the polyamic acid is such that when the repeating unit represented by the formula (1) is defined as a unit molecular weight, a unit molecular weight per carboxyl group (unit molecular weight/COOH) falls within a range of from 200 to 300, and 2 the photosensitive resin composition permits the formation of a polyimide film having a residual stress of 40 MPa or lower and a coefficient of thermal expansion of 30 ppm/.degree. C. or lower on a substrate, and to said polyamic acid, a polyimide film having excellent film properties, and a pattern forming process using the photosensitive polyimide resin composition.
    • 本发明涉及一种感光性聚酰亚胺树脂组合物,其包含(A)在其主链中具有由至少一种四羧酸或其四羧酸酐与至少一种二胺化合物的缩聚产物形成的并具有光化性的重复单元的聚酰胺酸 两端的光敏功能基团; (B)具有可光聚合官能团的光敏助剂; (C)光聚合引发剂; 和(D)溶剂,其中+ E,crc 1 + EE聚酰胺酸使得当由式(1)表示的重复单元定义为单位分子量时,每个羧基的单位分子量(单位分子量 重量/ COOH)在200〜300的范围内,并且+ E,crc 2 + EE,感光性树脂组合物能够形成残留应力为40MPa以下,聚酰亚胺膜的热膨胀系数为30 ppm /℃以下,以及所述聚酰胺酸,具有优异膜特性的聚酰亚胺膜和使用感光性聚酰亚胺树脂组合物的图案形成方法。