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41. 发明授权

US08586893B2 Rapid detection of imminent failure in optical thermal processing of a substrate 失效
标题翻译：快速检测基板光热处理中即将发生的故障
公开(公告)号：US08586893B2
公开(公告)日：2013-11-19
申请号：US12075798
申请日：2008-03-12
申请人： Bruce E. Adams , Dean Jennings , Aaron Muir Hunter , Abhilash J. Mayur , Vijay Parihar
发明人： Bruce E. Adams , Dean Jennings , Aaron Muir Hunter , Abhilash J. Mayur , Vijay Parihar
IPC分类号： B23K26/04 , B23K26/03 , B23K26/42
CPC分类号： B23K26/032 , B23K26/03 , B23K26/0604 , B23K26/0676 , B23K26/0738 , B23K26/702 , B23K2101/40
摘要： A system for thermal processing of a substrate includes a source of radiation, optics disposed between the source and the substrate to receive light from the source of radiation at the optics proximate end, and a housing holding the optics and having a void inside the housing isolated from light emitted from the source. A light detector is disposed within the void in the housing to detect light from the optics emitted into the housing and send a deterioration signal. The system further includes a power supply for the source of radiation, and a controller to control the power supply based on the deterioration signal from the light detector.
摘要翻译：用于衬底的热处理的系统包括辐射源，设置在光源和衬底之间的光学器件，以在光学器件的近端处接收来自辐射源的光，以及保持光学元件并且在壳体内部具有空隙的壳体从光源发出的光。光检测器设置在外壳中的空隙内，以检测发射到壳体中的光学器件的光并发出劣化信号。该系统还包括用于辐射源的电源，以及控制器，用于基于来自光检测器的劣化信号来控制电源。

42. 发明申请

US20080217306A1 Rapid detection of imminent failure in optical thermal processing of a substrate 失效
标题翻译：快速检测基板光热处理中即将发生的故障
公开(公告)号：US20080217306A1
公开(公告)日：2008-09-11
申请号：US12075798
申请日：2008-03-12
申请人： Bruce E. Adams , Dean Jennings , Aaron Muir Hunter , Abhilash J. Mayur , Vijay Parihar
发明人： Bruce E. Adams , Dean Jennings , Aaron Muir Hunter , Abhilash J. Mayur , Vijay Parihar
IPC分类号： B23K26/04
CPC分类号： B23K26/032 , B23K26/03 , B23K26/0604 , B23K26/0676 , B23K26/0738 , B23K26/702 , B23K2101/40
摘要： A system for thermal processing of a substrate includes a source of radiation, optics disposed between the source and the substrate to receive light from the source of radiation at the optics proximate end, and a housing holding the optics and having a void inside the housing isolated from light emitted from the source. A light detector is disposed within the void in the housing to detect light from the optics emitted into the housing and send a deterioration signal. The system further includes a power supply for the source of radiation, and a controller to control the power supply based on the deterioration signal from the light detector.
摘要翻译：用于衬底的热处理的系统包括辐射源，设置在光源和衬底之间的光学器件，以在光学器件的近端处接收来自辐射源的光，以及保持光学元件并且在壳体内部具有空隙的壳体从光源发出的光。光检测器设置在外壳中的空隙内，以检测发射到壳体中的光学器件的光并发出劣化信号。该系统还包括用于辐射源的电源，以及控制器，用于基于来自光检测器的劣化信号来控制电源。

43. 发明授权

US07422988B2 Rapid detection of imminent failure in laser thermal processing of a substrate 失效
标题翻译：快速检测基板激光热处理中即将发生的故障
公开(公告)号：US07422988B2
公开(公告)日：2008-09-09
申请号：US11185454
申请日：2005-07-20
申请人： Bruce E. Adams , Dean Jennings , Aaron M. Hunter , Abhilash J. Mayur , Vijay Parihar
发明人： Bruce E. Adams , Dean Jennings , Aaron M. Hunter , Abhilash J. Mayur , Vijay Parihar
IPC分类号： H01L21/00 , B23K26/04
CPC分类号： B23K26/032 , B23K26/03 , B23K26/0604 , B23K26/0676 , B23K26/0738 , B23K26/702 , B23K2101/40
摘要： A thermal processing system includes a source of laser radiation having an array of lasers emitting light at a laser wavelength, a substrate support, optics disposed between said source and said substrate support for forming a line beam in a substrate plane of the substrate support from the light emitted by the source of laser radiation, and scanning apparatus for effecting movement of said line beam relative to said substrate support in a direction transverse to the longitudinal axis of said line beam. The system further includes a housing encompassing said optics, a light detector disposed inside said housing for sensing an ambient light level, a power supply coupled to the source of laser radiation, and a controller governing said power supply and responsive to said light detector for interrupting said power supply upon an increase in the output of said light detector above a threshold ambient level.
摘要翻译：热处理系统包括激光辐射源，其具有发射激光波长的光的激光阵列，衬底支撑件，设置在所述源极和所述衬底支撑件之间的光学器件，用于在衬底支撑件的衬底平面中形成线束由激光辐射源发射的光以及用于在垂直于所述线束的纵向轴线的方向上相对于所述衬底支撑件实现所述线束的运动的扫描装置。该系统还包括包围所述光学元件的壳体，设置在所述壳体内用于感测环境光级别的光检测器，耦合到激光辐射源的电源，以及控制所述电源并响应于所述光检测器中断的控制器所述电源在所述光检测器的输出增加超过阈值环境水平时。

44. 发明授权

US08541680B2 Photovoltaic cells including peaks and methods of manufacture 失效
标题翻译：光伏电池包括峰值和制造方法
公开(公告)号：US08541680B2
公开(公告)日：2013-09-24
申请号：US12792707
申请日：2010-06-02
申请人： Chris Eberspacher , Bruce E. Adams
发明人： Chris Eberspacher , Bruce E. Adams
IPC分类号： H01L31/00
CPC分类号： H01L31/022425 , H01L31/03921 , H01L31/0465 , Y02E10/50
摘要： Photovoltaic module and methods for the manufacture of photovoltaic modules are described. Operative layers of the photovoltaic cell are deposited onto a superstrate having one or more of at least one peak allowing for electrical isolation of a portion of a photovoltaic module and at least one ramp creating a series connection between individual photovoltaic cells with minimal loss of the efficiency due to dead space between the cells.
摘要翻译：描述了用于制造光伏组件的光伏组件和方法。将光伏电池的操作层沉积到具有一个或多个至少一个峰的上覆层上，所述至少一个峰允许电光隔离一部分光伏模块和至少一个斜坡，从而在单个光伏电池之间产生串联连接，同时以最小的效率损失由于细胞之间的死空间。

45. 发明授权

US08367983B2 Apparatus including heating source reflective filter for pyrometry 有权
标题翻译：装置包括用于高温计的加热源反射滤光片
公开(公告)号：US08367983B2
公开(公告)日：2013-02-05
申请号：US12483770
申请日：2009-06-12
申请人： Joseph M. Ranish , Aaron M. Hunter , Blake R. Koelmel , Bruce E. Adams
发明人： Joseph M. Ranish , Aaron M. Hunter , Blake R. Koelmel , Bruce E. Adams
IPC分类号： H05B3/68 , F27B5/14 , F26B19/00 , C23C16/00
CPC分类号： H01L21/67115
摘要： Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer.
摘要翻译：公开了用于处理衬底和使用辐射测温法测量温度的方法和装置。反射层设置在处理室的窗口上。提供在第一波长范围内的辐射的辐射源加热衬底，所述衬底对于处于预定温度范围的第一波长范围内的第二波长范围内的辐射是透明的。在第二波长范围内的辐射被反射层反射。

46. 发明申请

US20110023957A1 PHOTOVOLTAIC CELLS INCLUDING PEAKS AND METHODS OF MANUFACTURE 失效
标题翻译：光伏电池包括峰值和制造方法
公开(公告)号：US20110023957A1
公开(公告)日：2011-02-03
申请号：US12792707
申请日：2010-06-02
申请人： Chris Eberspacher , Bruce E. Adams
发明人： Chris Eberspacher , Bruce E. Adams
IPC分类号： H01L31/0236 , H01L31/0232
CPC分类号： H01L31/022425 , H01L31/03921 , H01L31/0465 , Y02E10/50
摘要： Photovoltaic module and methods for the manufacture of photovoltaic modules are described. Operative layers of the photovoltaic cell are deposited onto a superstrate having one or more of at least one peak allowing for electrical isolation of a portion of a photovoltaic module and at least one ramp creating a series connection between individual photovoltaic cells with minimal loss of the efficiency due to dead space between the cells.
摘要翻译：描述了用于制造光伏组件的光伏组件和方法。将光伏电池的操作层沉积到具有一个或多个至少一个峰的上覆层上，所述至少一个峰允许电光隔离光伏模块的一部分和至少一个斜坡，从而在单个光伏电池之间产生串联连接，同时以最小的效率损失由于细胞之间的死空间。

47. 发明授权

US07867868B2 Absorber layer candidates and techniques for application 有权
标题翻译：吸收层候选和应用技术
公开(公告)号：US07867868B2
公开(公告)日：2011-01-11
申请号：US11681343
申请日：2007-03-02
申请人： Joseph M. Ranish , Bruce E. Adams
发明人： Joseph M. Ranish , Bruce E. Adams
IPC分类号： H01L21/336
CPC分类号： H01L21/67115 , H01L21/26513 , H01L21/268 , H01L21/2686 , H01L21/324 , H01L21/6715 , H01L29/66575
摘要： The present invention generally provides an absorber layer using carbon based materials with increased and stabled thermal absorption coefficient and economical methods to produce such an absorber layer. One embodiment of the present invention provides a method for processing a substrate comprising depositing an absorber layer on a top surface of the substrate, wherein the substrate is maintained under a first temperature, annealing the substrate in a thermal processing chamber, wherein the substrate is heated to a second temperature, and the second temperature is higher than the first temperature, and removing the absorber layer from the substrate.
摘要翻译：本发明通常提供一种使用具有增加和稳定的热吸收系数的碳基材料和生产这种吸收层的经济方法的吸收层。本发明的一个实施方案提供了一种处理衬底的方法，包括在衬底的顶表面上沉积吸收层，其中将衬底保持在第一温度下，在热处理室中退火衬底，其中衬底被加热到第二温度，第二温度高于第一温度，并且从基板除去吸收体层。

48. 发明申请

US20090289053A1 Apparatus Including Heating Source Reflective Filter for Pyrometry 有权
标题翻译：包括热源反射滤光片的设备
公开(公告)号：US20090289053A1
公开(公告)日：2009-11-26
申请号：US12483770
申请日：2009-06-12
申请人： Joseph M. Ranish , Aaron M. Hunter , Blake R. Koelmel , Bruce E. Adams
发明人： Joseph M. Ranish , Aaron M. Hunter , Blake R. Koelmel , Bruce E. Adams
IPC分类号： H05B1/00 , A21B2/00 , H05B6/00 , G21G5/00
CPC分类号： H01L21/67115
摘要： Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer.
摘要翻译：公开了用于处理衬底和使用辐射测温法测量温度的方法和装置。反射层设置在处理室的窗口上。提供在第一波长范围内的辐射的辐射源加热衬底，所述衬底对于处于预定温度范围的第一波长范围内的第二波长范围内的辐射是透明的。在第二波长范围内的辐射被反射层反射。

49. 发明申请

US20080214014A1 ABSORBER LAYER CANDIDATES AND TECHNIQUES FOR APPLICATION 有权
标题翻译：吸收层应用的候选和技术
公开(公告)号：US20080214014A1
公开(公告)日：2008-09-04
申请号：US11681343
申请日：2007-03-02
申请人： JOSEPH M. RANISH , Bruce E. Adams
发明人： JOSEPH M. RANISH , Bruce E. Adams
IPC分类号： H01L21/31 , H01L51/40 , H01L21/469 , B05D3/02
CPC分类号： H01L21/67115 , H01L21/26513 , H01L21/268 , H01L21/2686 , H01L21/324 , H01L21/6715 , H01L29/66575
摘要： The present invention generally provides an absorber layer using carbon based materials with increased and stabled thermal absorption coefficient and economical methods to produce such an absorber layer. One embodiment of the present invention provides a method for processing a substrate comprising depositing an absorber layer on a top surface of the substrate, wherein the substrate is maintained under a first temperature, annealing the substrate in a thermal processing chamber, wherein the substrate is heated to a second temperature, and the second temperature is higher than the first temperature, and removing the absorber layer from the substrate.
摘要翻译：本发明通常提供一种使用具有增加和稳定的热吸收系数的碳基材料和生产这种吸收层的经济方法的吸收层。本发明的一个实施方案提供了一种处理衬底的方法，包括在衬底的顶表面上沉积吸收层，其中将衬底保持在第一温度下，在热处理室中退火衬底，其中衬底被加热到第二温度，第二温度高于第一温度，并且从基板除去吸收体层。

50. 发明申请

US20080118641A1 COMPENSATION TECHNIQUES FOR SUBSTRATE HEATING PROCESSES 失效
标题翻译：基板加热工艺补偿技术
公开(公告)号：US20080118641A1
公开(公告)日：2008-05-22
申请号：US11561851
申请日：2006-11-20
申请人： Joseph M. Ranish , Bruce E. Adams
发明人： Joseph M. Ranish , Bruce E. Adams
IPC分类号： C23C16/46 , C21D1/34
CPC分类号： C23C16/46 , C21D1/34
摘要： Methods for compensating for a thermal profile in a substrate heating process are provided herein. In one embodiment, a method of processing a substrate includes determining an initial thermal profile of a substrate resulting from a process; imposing a compensatory thermal profile on the substrate based on the initial thermal profile; and performing the process to create a desired thermal profile on the substrate. In other embodiments of the invention, the initial substrate thermal profile is compensated for by adjusting a local mass heated per unit area, a local heat capacity per unit area, or an absorptivity or reflectivity of a component proximate the substrate prior to performing the process. In another embodiment, the heat provided by an edge ring to the substrate may be controlled either prior to or during the substrate heating process.
摘要翻译：本文提供了补偿基板加热过程中的热分布的方法。在一个实施例中，处理衬底的方法包括确定由工艺产生的衬底的初始热分布; 基于初始热分布在衬底上施加补偿热分布; 并执行该过程以在衬底上产生期望的热分布。在本发明的其它实施例中，通过在执行该过程之前通过调整每单位面积加热的局部质量，每单位面积的局部热容量或靠近该衬底的组分的吸收率或反射率来补偿初始衬底热分布。在另一个实施例中，由边缘环向衬底提供的热量可以在衬底加热过程之前或期间被控制。

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