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    • 32. 发明授权
    • Multi-beam semiconductor laser device
    • 多光束半导体激光器件
    • US07149235B2
    • 2006-12-12
    • US11132981
    • 2005-05-19
    • Tsuyoshi TojoTomonori HinoOsamu GotoYoshifumi YabukiShinichi AnsaiShiro UchidaMasao Ikeda
    • Tsuyoshi TojoTomonori HinoOsamu GotoYoshifumi YabukiShinichi AnsaiShiro UchidaMasao Ikeda
    • H01S5/00
    • H01S5/4031H01S5/0425H01S5/32341H01S5/4087
    • A multi-beam semiconductor laser device capable of emitting respective laser beams with uniform optical output levels and enabling easy alignment is provided. This multi-beam semiconductor laser device (40) is a GaN base multi-beam semiconductor laser device provided with four laser stripes (42A, 42B, 42C and 42D) which are capable of emitting laser beams with the same wavelength. The respective laser oscillating regions (42A to 42D) are provided with a p-type common electrode (48) on a mesa structure (46) which is formed on a sapphire substrate (44), and have active regions (50A, 50B, 50C and 50D) respectively. Two n-type electrodes (52A and 52B) are provided on an n-type GaN contact layer (54) and located as common electrodes opposite to the p-type common electrode (48) on both sides of the mesa structure (46). The distance A between the laser stripe (42A) and the laser stripe (42D) is no larger than 100 μm. The distance B1 between the laser stripe (42A) and the n-type electrode (52B) is no larger than 150 μm while the distance B2 between the laser stripe (42D) and the n-type electrode (52A) is no larger than 150 μm.
    • 提供能够发射具有均匀光输出水平的各激光束并且能够容易对准的多光束半导体激光器装置。 该多光束半导体激光器件(40)是具有能够发射具有相同波长的激光束的四个激光条纹(42A,42B,42C和42D)的GaN基多光束半导体激光器件。 相应的激光振荡区域(42A至42D)在形成在蓝宝石衬底(44)上的台面结构(46)上设置有p型公共电极(48),并具有活性区域(50A, 50B,50C和50D)。 在n型GaN接触层(54)上设置两个n型电极(52A和52B),并且位于与台面结构(46)的两侧的p型公共电极(48)相对的公共电极 )。 激光条纹(42A)与激光条纹(42D)之间的距离A不大于100μm。 激光条纹(42A)和n型电极(52B)之间的距离B 1 <1>不大于150μm,而激光之间的距离B 2 <2> 条纹(42D)和n型电极(52A)不大于150μm。
    • 33. 发明授权
    • Method of manufacturing semiconductor device
    • 制造半导体器件的方法
    • US06991952B2
    • 2006-01-31
    • US10613624
    • 2003-07-03
    • Takashi MizunoMotonobu TakeyaTakeharu AsanoMasao Ikeda
    • Takashi MizunoMotonobu TakeyaTakeharu AsanoMasao Ikeda
    • H01L21/00
    • H01S5/0224H01S5/0021H01S5/02212H01S5/02224H01S5/02272H01S5/32341
    • Provided is a method of manufacturing a semiconductor device, which is adapted to prevent the deposition of a material on a laser light emitting edge, thereby enabling an improvement in longevity characteristics of a laser. A base having a laser chip mounted thereon is irradiated with an energy beam having a shorter wavelength than an oscillation wavelength of the laser chip. Photolysis and oxidation caused by the energy beam cause the removal of an adherent from the overall base or the deterioration thereof, and incidentally, the adherent is derived from an adhesive sheet used to attach the laser chip to the base, or the like. Preferably, laser light or ultraviolet light, for example, is used as the energy beam. Alternatively, the base having the laser chip mounted thereon may be irradiated with plasma so as to remove the adherent utilizing an ion cleaning effect of the plasma. After irradiation, a top is mounted to the base so as to shut off the laser chip from the outside.
    • 提供一种制造半导体器件的方法,其适于防止材料沉积在激光发射边缘上,从而能够提高激光器的寿命特性。 用具有比激光芯片的振荡波长短的波长的能量束照射安装有激光芯片的基座。 由能量束引起的光解和氧化导致从整个基底中去除附着物或其劣化,附带地,粘合剂衍生自用于将激光芯片附着到基底的粘合片等。 优选地,例如使用激光或紫外线作为能量束。 或者,可以用等离子体照射安装有激光芯片的基座,以便利用等离子体的离子清洁效果去除粘附剂。 照射后,将顶部安装在基座上,以从外部切断激光芯片。
    • 34. 发明申请
    • Multi-beam semiconductor laser device
    • 多光束半导体激光器件
    • US20050218422A1
    • 2005-10-06
    • US11132981
    • 2005-05-19
    • Tsuyoshi TojoTomonori HinoOsamu GotoYoshifumi YabukiShinichi AnsaiShiro UchidaMasao Ikeda
    • Tsuyoshi TojoTomonori HinoOsamu GotoYoshifumi YabukiShinichi AnsaiShiro UchidaMasao Ikeda
    • H01L21/205H01S5/042H01S5/22H01S5/323H01S5/40H01L29/24
    • H01S5/4031H01S5/0425H01S5/32341H01S5/4087
    • A multi-beam semiconductor laser device capable of emitting respective laser beams with uniform optical output levels and enabling easy alignment is provided. This multi-beam semiconductor laser device (40) is a GaN base multi-beam semiconductor laser device provided with four laser stripes (42A, 42B, 42C and 42D) which are capable of emitting laser beams with the same wavelength. The respective laser oscillating regions (42A to 42D) are provided with a p-type common electrode (48) on a mesa structure (46) which is formed on a sapphire substrate (44), and have active regions (50A, 50B, 50C and 50D) respectively. Two n-type electrodes (52A and 52B) are provided on an n-type GaN contact layer (54) and located as common electrodes opposite to the p-type common electrode (48) on both sides of the mesa structure (46). The distance A between the laser stripe (42A) and the laser stripe (42D) is no larger than 100 μm. The distance B1 between the laser stripe (42A) and the n-type electrode (52B) is no larger than 150 μM while the distance B2 between the laser stripe (42D) and the n-type electrode (52A) is no larger than 150 μm.
    • 提供能够发射具有均匀光输出水平的各激光束并且能够容易对准的多光束半导体激光器装置。 该多光束半导体激光器件(40)是具有能够发射具有相同波长的激光束的四个激光条纹(42A,42B,42C和42D)的GaN基多光束半导体激光器件。 相应的激光振荡区域(42A至42D)在形成在蓝宝石衬底(44)上的台面结构(46)上设置有p型公共电极(48),并具有活性区域(50A, 50B,50C和50D)。 在n型GaN接触层(54)上设置两个n型电极(52A和52B),并且位于与台面结构(46)的两侧的p型公共电极(48)相对的公共电极 )。 激光条纹(42A)与激光条纹(42D)之间的距离A不大于100μm。 激光条纹(42A)和n型电极(52B)之间的距离B 1 <1>不大于150μm,而激光器之间的距离B <2 <2> 条纹(42D)和n型电极(52A)不大于150μm。
    • 36. 发明授权
    • Semiconductor device as well as light emitting semiconductor device
    • 半导体器件以及发光半导体器件
    • US6111277A
    • 2000-08-29
    • US176270
    • 1998-10-21
    • Masao Ikeda
    • Masao Ikeda
    • H01L21/205H01L33/00H01L33/02H01L33/12H01L33/32H01S5/00H01S5/20H01S5/323H01S5/343
    • H01L33/025H01L33/007H01L33/0075H01S5/2077
    • A semiconductor device such as a light emitting semiconductor device comprising a mask layer having opening areas and a selective growing layer comprising a semiconductor grown selectively by way of the mask layer, with each of the mask layer and the selective growing layer being disposed by two or more layers alternately. The semiconductor device is manufactured by a step of laminating on a substrate a mask layer having opening areas and a selective growing layer comprising a semiconductor grown selectively way of a mask layer, each by two or more layers alternately and a subsequent step of laminating semiconductor layers thereon. Threading dislocations in the underlying layer are interrupted by the first mask layer and the second mask layer and do not propagate to the semiconductor layer. The density of the threading dislocations is lowered over the entire surface and the layer thickness can be reduced.
    • 一种半导体器件,例如包括具有开口区域的掩模层和包括通过掩模层选择性地生长的半导体的选择性生长层的发光半导体器件,其中掩模层和选择性生长层中的每一个被设置为两个或 更多层交替。 半导体器件通过在衬底上层叠具有开口面积的掩模层和选择性生长层的步骤来制造,所述选择性生长层包括选择性地形成掩模层的半导体生长层,每个通过两层或更多层交替层叠,并且随后的步骤层叠半导体层 上。 下层中的穿透位错被第一掩模层和第二掩模层中断,并且不传播到半导体层。 穿透位错的密度在整个表面上降低,并且可以减小层的厚度。
    • 39. 发明授权
    • 4-Benzazonine derivatives and process for preparation thereof
    • 4-苯并氮杂衍生物及其制备方法
    • US4008219A
    • 1977-02-15
    • US467520
    • 1974-05-06
    • Masao IkedaShigeo MiyamotoThutomu NozawaAkira KurobeOsamu Futsukaichi
    • Masao IkedaShigeo MiyamotoThutomu NozawaAkira KurobeOsamu Futsukaichi
    • C07D223/14C07D225/06
    • C07D223/14C07D225/06
    • Novel 4-Benzazonine derivatives and their salts, and processes for the preparation thereof are disclosed. These 4-benzazonine derivatives are represented by the following general formula: ##STR1## wherein R stands for --H, --OH or a lower alkoxy group such as --OCH.sub.3, R.sub.1 designates --H or a lower alkyl group such as --CH.sub.3 and --CH.sub.2 CH.sub.3, R.sub.2 indicates --H or a lower alkyl group such as --CH.sub.3, R.sub.3 stands for --H, a linear or branched, saturated or unsaturated alkyl group having 1 to 4 carbon atoms, a mono- or di-hydroxy lower alkyl group such as --CH.sub.2 OH and ##STR2## a saturated cyclic hydrocarbon group having 3 to 6 carbon atoms or a substituted or unsubstituted aromatic hydrocarbon group having 6 to 8 carbon atoms, and R.sub.4 designates --H, --OH or = O. These compounds have medicinal effects, especially therapeutic activities on the central nervous system, such as analgesic, antitussive and sedative activities.
    • 公开了新的4-苯并氮杂衍生物及其盐,以及其制备方法。 这些4-苯并氮杂衍生物由以下通式表示:其中R代表-H,-OH或低级烷氧基,例如-OCH 3,R 1表示-H或低级烷基如-CH 3和 - CH 2 CH 3,R 2表示-H或低级烷基如-CH 3,R 3表示-H,直链或支链,饱和或不饱和的具有1至4个碳原子的烷基,一或二羟基低级烷基如 作为-CH 2 OH和具有3〜6个碳原子的饱和环状烃基或具有6〜8个碳原子的取代或未取代的芳香族烃基,R4表示-H,-OH或= O.这些化合物具有药效 特别是中枢神经系统的治疗活动,如止痛,镇咳和镇静活动。