会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 32. 发明申请
    • VENTILATION LOAD-REDUCING APPARATUS AND VEHICLE AIR CONDITIONER USING THE SAME
    • 使用通风负荷减轻装置和车辆空调器
    • US20110143642A1
    • 2011-06-16
    • US13003807
    • 2009-07-06
    • Kazuo NakajoHiroki YoshiokaTakashi Fujita
    • Kazuo NakajoHiroki YoshiokaTakashi Fujita
    • B60H1/26
    • B60H1/00564B60H1/03B60H1/039B60H1/246B60H1/248
    • A ventilation load-reducing apparatus, which has a simple structure and is capable of further improving the efficiency of the heat recovery, and a vehicle air conditioner using the same are proposed. The ventilation load-reducing apparatus includes an inside air lead-out path 4 for ventilation which leads air of a vehicle-interior out of a vehicle from a rear side of the vehicle-interior, an outside air lead-in path 5 which leads outside air into a front side of the vehicle-interior, a ventilation heat recovery device 6 which recovers heat from the air led out through the inside air lead-out path 4, a recovered heat radiator 7 which releases the heat on the air led in through the outside air lead-in path 5, and a heat transmitter 8 which transmits the heat between the ventilation heat recovery device 6 and the recovered heat radiator 7. The ventilation load-reducing apparatus is independent of a refrigerant circulating system 9 of a vehicle air conditioner 2.
    • 提出了具有简单的结构并且能够进一步提高热回收效率的通风减压装置,以及使用其的车辆空调。 通风减压装置包括用于通风的内部空气引出路径4,其将车辆内部的空气从车辆内部的后侧引出车辆外部空气引入路径5,其引导到外部 空气进入车辆内部的前侧;通风热回收装置6,其从通过内部空气引出路径4引出的空气回收热量;回收的散热器7,其释放通过的空气的热量; 外部空气引入路径5,以及在通风热量回收装置6和回收的散热器7之间传递热的热量传递器8.通风负荷减少装置与车辆空气的制冷剂循环系统9无关 护发素2。
    • 33. 发明授权
    • Film thickness measuring apparatus and film thickness measuring method
    • 膜厚测定装置及膜厚测定方法
    • US07830141B2
    • 2010-11-09
    • US12319403
    • 2009-01-07
    • Takashi FujitaToshiyuki YokoyamaKeita Kitade
    • Takashi FujitaToshiyuki YokoyamaKeita Kitade
    • G01B7/06G01R33/12
    • G01B7/105
    • Coil is made to be disposed with gap opposed to the surface of wafer, and wafer stage is made to move in X and Y direction and R and θ direction. When supplying an alternating current to coil with the frequency swept by impedance analyzer, the magnetic field made to be induced in coil will operate on the conductive film of wafer. By changing a parameter (a frequency or an angle) influencing the skin effect of the conductive film and giving the parameter to coil, the state where a magnetic field is not made to penetrate relatively the film of wafer and the state where the magnetic field is made to penetrate relatively the film can be formed. From the variation of various values corresponding to the eddy current induced based on the change of state influenced by the skin effect of the conductive film, the film thickness of wafer can be measured with sufficient accuracy.
    • 将线圈设置成与晶片表面相对的间隙,并且使晶片台在X和Y方向上移动,并且R和& 方向。 当用阻抗分析仪扫描的频率向线圈提供交流电时,在线圈中感应的磁场将在晶片的导电膜上工作。 通过改变影响导电膜的皮肤效应并给出线圈参数的参数(频率或角度),没有使磁场相对于晶片的膜渗透的状态和磁场为 可以形成相对渗透的薄膜。 根据由导电膜的皮肤效应影响的状态变化引起的涡电流对应的各种值的变化,可以以足够的精度测量晶片的膜厚度。
    • 34. 发明授权
    • Method and device for forecasting/detecting polishing end point and method and device for monitoring real-time film thickness
    • 用于预测/检测抛光终点的方法和装置以及用于监控实时胶片厚度的方法和装置
    • US07821257B2
    • 2010-10-26
    • US12228945
    • 2008-08-18
    • Takashi FujitaToshiyuki YokoyamaKeita Kitade
    • Takashi FujitaToshiyuki YokoyamaKeita Kitade
    • G01B7/06B24B49/04G01R33/12B24B49/10
    • B24B37/013
    • A method and device for forecasting/detecting a polishing end point and for monitoring a real-time film thickness to suppress Joule heat loss due to the eddy current to the minimum, to precisely forecast/detect a polishing end point, to precisely calculate the remaining film thickness to be removed, and polishing rate. An inductor 36 in a sensor is arranged adjacent to a predetermined conductive film 28, and a magnetic flux change induced in the conductive film 28 by a magnetic flux formed by the inductor 36 is monitored, and by use of a magnetic flux change when a film thickness becomes corresponding to skin depth in which a film thickness in polishing is determined by the material of the predetermined conductive film 28 as a factor, a magnetic flux change part to forecast a polishing end point in the magnetic flux change process is detected, and a polishing end point is forecasted from the magnetic flux change part, and a polishing rate and a remaining film thickness amount to be removed are calculated on the spot.
    • 一种用于预测/检测抛光终点并用于监测实时膜厚度以将由于涡流引起的焦耳热损失抑制到最小以精确地预测/检测抛光终点的方法和装置,以精确地计算剩余的 要去除的膜厚度和抛光速率。 传感器中的电感器36布置成与预定的导电膜28相邻,并且通过由电感器36形成的磁通量在导电膜28中感应的磁通量变化被监测,并且通过使用磁通量改变膜 厚度对应于其中通过预定导电膜28的材料确定抛光中的膜厚度的皮肤深度,检测用于预测磁通量变化过程中的抛光终点的磁通量变化部分,并且 从磁通量变化部分预测抛光终点,并且现场计算抛光速率和待除去的剩余膜厚度量。
    • 35. 发明授权
    • Method and device for forecasting polishing end point
    • 抛光终点预测方法和装置
    • US07795866B2
    • 2010-09-14
    • US12218600
    • 2008-07-16
    • Takashi Fujita
    • Takashi Fujita
    • G01B7/06B24B49/04B24B49/10G01R33/12
    • G01B7/06B24B37/013B24B49/105
    • A method for forecasting a polishing end time or point, wherein an inductor 36 in a sensor is placed adjacent to the conductive film 28. The magnetic flux formed by the inductor 36 is monitored, and a change of magnetic flux induced in the conductive film 28 is detected. Based on the skin effect of the material of the conductive film 28 as a factor, a process is used in which an eddy current formed with the decrease of the film thickness by polishing increases and a process in which the eddy current formed with the decrease of the film thickness substantially decreases when the polishing is progressed. Based on the characteristic change of the magnetic flux induced in the conductive film 28, the polishing end point is forecasted, and at the same time, the magnetic flux induced in the conductive film 28 is alleviated or turned off.
    • 一种用于预测抛光结束时间或点的方法,其中传感器中的电感器36放置在与导电膜28相邻的位置。由电感器36形成的磁通量被监测,并且在导电膜28中感应的磁通量的变化 被检测到。 基于导电膜28的材料的皮肤效应作为因素,使用其中通过抛光增加膜厚减小而形成的涡流增加的过程和其中形成的涡流减小的过程 当抛光进行时,膜厚度显着降低。 基于在导电膜28中感应的磁通的特性变化,预测抛光终点,同时,导电膜28中感应的磁通减轻或关闭。
    • 36. 发明授权
    • Pad conditioner, pad conditioning method, and polishing apparatus
    • 垫调节剂,垫调理方法和抛光装置
    • US07731569B2
    • 2010-06-08
    • US11948612
    • 2007-11-30
    • Takashi Fujita
    • Takashi Fujita
    • B24B1/00
    • B24B53/017B24B29/005
    • A pad conditioning apparatus and method for conditioning a surface of a polishing pad which is used in a polishing apparatus for polishing works, having a bending or deflecting or elastic member and a supporting section to support a base end of the bending or deflecting or elastic member, wherein the bending or deflecting or elastic member elastically deforms upon contact of a vicinity of a tip end of the bending or deflecting or elastic member with the polishing pad, so that a pressure necessary to condition the pad is generated. A pad preparation apparatus using the pad conditioner; and a pad preparation method using the same, enable even conditioning of a polishing pad of an elastic body by following a surface of the polishing pad.
    • 一种用于调整用于抛光工件的抛光装置中的具有弯曲或偏转或弹性构件的抛光垫的表面的衬垫调节装置和方法以及用于支撑弯曲或偏转或弹性构件的基端的支撑部分 其中,所述弯曲或偏转或弹性构件在弯曲或偏转或弹性构件的末端附近与抛光垫接触时弹性变形,从而产生调节垫所需的压力。 一种衬垫调节装置, 以及使用其的垫制备方法,通过跟随抛光垫的表面,能够均匀地调理弹性体的抛光垫。
    • 37. 发明授权
    • Relative position measurement method and relative position measurement system using satellites
    • 相对位置测量方法和使用卫星的相对位置测量系统
    • US07616152B2
    • 2009-11-10
    • US11666254
    • 2004-10-29
    • Yukihiro TeradaKeiji ItoTakenori AbeTakashi Fujita
    • Yukihiro TeradaKeiji ItoTakenori AbeTakashi Fujita
    • G01S5/14G01C21/30
    • G01S19/51G01S19/04G01S19/14G01S19/35G01S19/43
    • A positioning system wherein radio waves from a GPS satellite (4) are received by a reference station (1), the absolute position of which is already known, and a plurality of mobile stations (3) to perform relative positioning among particular stations, thereby determining the positions of the mobile stations (3). At least one of the mobile stations (3) is disposed such that a baseline limit length allowing relative positioning relative to the reference station (1) is exceeded, and the intervals between particular mobile stations (3) are shorter than the baseline limit length allowing relative positioning. Each of the stations (1, 3) is equipped with a GPS receiver (11, 21) that receives the radio waves from the GPS satellite (4), and further equipped with a wireless communication apparatus (12, 22) that transmits/receives data to/from a particular station. There are provided a relative position calculation part (32) for calculating the relative position between the particular stations; and an absolute position calculation part (33) for determining, based on an absolute position of one station that performs a relative positioning, an absolute position of the other station.
    • 一种定位系统,其中来自GPS卫星(4)的无线电波被其绝对位置已知的参考站(1)接收,并且多个移动站(3)在特定站点之间执行相对定位,从而 确定移动台(3)的位置。 移动站(3)中的至少一个被布置成使得允许允许相对于参考站(1)的相对定位的基线限制长度,并且特定移动站(3)之间的间隔比基线限制长度短,允许 相对定位 每个站(1,3)配备有从GPS卫星(4)接收无线电波的GPS接收机(11,21),并且还配备有发送/接收的无线通信装置(12,22) 来往/来自特定车站的数据。 提供了用于计算特定站之间的相对位置的相对位置计算部分(32) 以及用于基于执行相对定位的一个站的绝对位置确定另一个站的绝对位置的绝对位置计算部分(33)。