会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 36. 发明授权
    • Apparatus for vacuum deposition
    • 真空沉积设备
    • US4121537A
    • 1978-10-24
    • US779795
    • 1977-03-21
    • Eiichi MaruyamaTadaaki HiraiSachio IshiokaHideaki YamamotoKiyohisa Inao
    • Eiichi MaruyamaTadaaki HiraiSachio IshiokaHideaki YamamotoKiyohisa Inao
    • C23C14/54B05C11/00C23C13/08
    • C23C14/546
    • An apparatus for vacuum deposition comprising a turn-table for holding substrates for deposition, and a plurality of evaporation boats arranged in opposition to a circumferential part of the turn-table, the turn-table being rotated at deposition whereby vapors from the respective boats can be cyclically accumulated and stuck onto the substrates, further comprises at least one film-thickness monitor which is fixed to the turn-table and which detects the quantity of a deposited substance of one layer stuck every time the substrates pass over each boat, and means to receive a signal from the film-thickness monitor and divide the signal time sequentially, thereby detecting at least one of the deposition rate and the total amount of the vapor from each boat, and to control the quantity of the vapor arriving to the substrates for deposition from each boat while comparing the detected value with a predetermined value.
    • 一种用于真空沉积的装置,包括用于保持用于沉积的基板的转台以及与转台的圆周部分相对布置的多个蒸发舟,所述转台在沉积下旋转,从而来自各个船的蒸气可以 进一步包括至少一个薄膜厚度监测器,该膜厚监测器固定在转台上,每隔一个基板通过每个船只就检测一层沉积物质的量;以及装置 接收来自薄膜厚度监视器的信号并依次划分信号时间,从而检测来自每个船的蒸气的沉积速率和总量中的至少一个,并且控制到达基板的蒸气的量 在将检测值与预定值进行比较时,从每个船的沉积。