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31. 发明申请

US20120329969A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：US20120329969A1
公开(公告)日：2012-12-27
申请号：US13539558
申请日：2012-07-02
申请人： Tasuku MATSUMIYA , Daiju Shiono , Tomoyuki Hirano , Takahiro Dazai , Kotaro Endo
发明人： Tasuku MATSUMIYA , Daiju Shiono , Tomoyuki Hirano , Takahiro Dazai , Kotaro Endo
IPC分类号： C08F228/06
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/111
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1), a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, and a structural unit (a3) derived from an acrylate ester containing a hydroxy group-containing aliphatic hydrocarbon group represented by general formula (a3-1), and the amount of the structural unit (a3) based on the combined total of all structural units constituting the polymeric compound (A1) being in the range of 1 to 30 mol %.
摘要翻译：一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1），由通式（a0-1）表示的结构单元（a0），由含有酸解离性，溶解抑制基团的丙烯酸酯衍生的结构单元（a1）和来自丙烯酸酯的结构单元（a3）含有由通式（a3-1）表示的含羟基的脂族烃基的酯和基于构成聚合化合物（A1）的所有结构单元的总和的结构单元（a3）的量在该范围内为1〜30摩尔％。

32. 发明授权

US08329378B2 Positive resist composition, method of forming resist pattern, and polymeric compound 有权
标题翻译：正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物
公开(公告)号：US08329378B2
公开(公告)日：2012-12-11
申请号：US12721240
申请日：2010-03-10
申请人： Tomoyuki Hirano , Tasuku Matsumiya , Daiju Shiono , Takahiro Dazai
发明人： Tomoyuki Hirano , Tasuku Matsumiya , Daiju Shiono , Takahiro Dazai
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/2041 , C08F212/08 , C08F212/14 , C08F212/32 , C08F220/24 , C08F220/28 , C08F220/30 , C08F2220/1891 , C08F2220/382 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid, and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) having an aromatic group, a structural unit (a5) represented by general formula (a5-1) shown below, and a structural unit (a1) containing an acid-dissociable, dissolution-inhibiting group. In the formula (a5-1), R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof.
摘要翻译：一种正极抗蚀剂组合物，其包含在酸性作用下在碱显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸发生剂组分（B），所述碱成分（A）包含聚合物含有具有芳香族基团的结构单元（a0）的化合物（A1），下述通式（a5-1）所示的结构单元（a5）和含有酸解离性，溶解抑制性的结构单元（a1）组。式（a5-1）中，R 1表示氢原子，碳原子数1〜5的烷基或碳原子数1〜5的卤代烷基，R 2表示二价连接基，R 3表示含有 -SO2-在其环骨架内。

33. 发明授权

US08232041B2 Positive resist composition, method of forming resist pattern, and polymeric compound 有权
标题翻译：正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物
公开(公告)号：US08232041B2
公开(公告)日：2012-07-31
申请号：US12694037
申请日：2010-01-26
申请人： Takahiro Dazai , Tomoyuki Hirano , Tasuku Matsumiya , Daiju Shiono
发明人： Takahiro Dazai , Tomoyuki Hirano , Tasuku Matsumiya , Daiju Shiono
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , C08F28/06
CPC分类号： C08F220/10 , C08F28/06 , G03F7/0397 , Y10S430/111
摘要： A polymeric compound (A1) includes a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) represented by general formula (a0-2), and a structural unit (a1-0-1) represented by general formula (a1-0-1), wherein relative to the combined total of all the structural units, the proportion of the structural unit (a0-1) is from 10 to 40 mol %, the proportion of the structural unit (a0-2) is from 5 to 20 mol %, and the proportion of the structural unit (a1-0-1) is from 10 to 55 mol %. [In the formulas, each of R1 and R independently represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms, or a halogenated alkyl group of 1 to 5 carbon atoms, R2, A and B each represents a divalent linking group, R3 represents a cyclic group containing —SO2— within the ring skeleton thereof, and R4 and X1 each represents an acid-dissociable, dissolution-inhibiting group.]
摘要翻译：高分子化合物（A1）包括由通式（a0-1）表示的结构单元（a0-1），由通式（a0-2）表示的结构单元（a0-2）和结构单元（a1- 0-1），其中相对于所有结构单元的组合总和，结构单元（a0-1）的比例为10〜40摩尔％，比例为结构单元（a0-2）为5〜20摩尔％，结构单元（a1-0-1）的比例为10〜55摩尔％。 [式中，R 1，R 2各自独立地表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基，R2，A，B各自表示二价连接基团， R3表示在其环骨架中含有-SO2-的环状基团，R4和X1各自表示酸解离的溶解抑制基团。

34. 发明授权

US08221956B2 Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound 有权
标题翻译：用于浸渍曝光的抗蚀剂组合物，形成抗蚀剂图案的方法和含有氟化物的聚合物
公开(公告)号：US08221956B2
公开(公告)日：2012-07-17
申请号：US12457705
申请日：2009-06-18
申请人： Daiju Shiono , Tomoyuki Hirano , Sanae Furuya , Takahiro Dazai , Hiroaki Shimizu , Tsuyoshi Kurosawa , Hideto Nito , Tsuyoshi Nakamura
发明人： Daiju Shiono , Tomoyuki Hirano , Sanae Furuya , Takahiro Dazai , Hiroaki Shimizu , Tsuyoshi Kurosawa , Hideto Nito , Tsuyoshi Nakamura
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , C08F14/18
CPC分类号： C08F214/18 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.
摘要翻译：一种浸渍曝光用抗蚀剂组合物，包括：含有具有碱解离基团的结构单元（f1）和由通式（f2-1）表示的结构单元（f2）的含氟聚合物（F）（其中R表示氢原子，低级烷基或卤代低级烷基; W为通式（w-1）〜（w-4）中任一个表示的基团）; 在酸性作用下在碱性显影液中表现出改变的溶解性的碱成分（A）和在曝光时产生酸的酸发生剂组分（B）。

35. 发明申请

US20120077125A1 RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND 有权
标题翻译：用于浸渍曝光的耐腐蚀组合物，使用其的形成耐蚀图案的方法和含氟化合物
公开(公告)号：US20120077125A1
公开(公告)日：2012-03-29
申请号：US13310625
申请日：2011-12-02
申请人： Daiju Shiono , Takahiro Dazai , Sanae Furuya , Tomoyuki Hirano , Takayoshi Mori
发明人： Daiju Shiono , Takahiro Dazai , Sanae Furuya , Tomoyuki Hirano , Takayoshi Mori
IPC分类号： G03F7/20 , G03F7/004 , G03F7/027
CPC分类号： G03F7/0046 , C07C69/653 , C07C69/67 , C07C69/712 , C07C69/757 , C07C2603/00 , C07C2603/84 , C07C2603/86 , C08F12/20 , C08F12/22 , C08F12/32 , C08F220/22 , C08F220/24 , C08F220/26 , C08F220/28 , C09D125/14 , C09D125/18 , G03F7/0048 , G03F7/0382 , G03F7/0397 , G03F7/2041 , C08F212/14 , C08F2220/1833 , C08F212/32 , C08F2220/185 , C08F2220/283 , C08F220/06
摘要： A resist composition for immersion exposure, including a base component that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component that generates acid upon exposure, and a fluorine-containing compound represented by a general formula (c-1) that is decomposable in an alkali developing solution: wherein R1 represents an organic group which may contain a polymerizable group, with the proviso that said polymerizable group has a carbon-carbon multiple bond, and the carbon atoms forming the multiple bond are not directly bonded to the carbon atom within the —C(═O)— group in general formula (c-1); and R2 represents an organic group having a fluorine atom.
摘要翻译：一种用于浸渍曝光的抗蚀剂组合物，包括在酸作用下在碱性显影液中表现出改变的溶解度的基础组分，暴露时产生酸的酸产生剂组分和由通式（c-1）表示的含氟化合物），其可以在碱性显影液中分解：其中R1表示可以含有可聚合基团的有机基团，条件是所述可聚合基团具有碳 - 碳多重键，并且形成多重键的碳原子不直接键合通式（c-1）中的-C（= O） - 基团中的碳原子; R2表示具有氟原子的有机基团。

36. 发明授权

US08088553B2 Positive resist composition, method of forming resist pattern, and polymeric compound 有权
标题翻译：正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物
公开(公告)号：US08088553B2
公开(公告)日：2012-01-03
申请号：US12425706
申请日：2009-04-17
申请人： Hiroaki Shimizu , Tsuyoshi Nakamura , Takayoshi Mori , Sanae Furuya , Daiju Shiono , Tomoyuki Hirano , Takahiro Dazai
发明人： Hiroaki Shimizu , Tsuyoshi Nakamura , Takayoshi Mori , Sanae Furuya , Daiju Shiono , Tomoyuki Hirano , Takahiro Dazai
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , C08F220/28
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/2041 , Y10S430/111
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) having a structural unit (a0-1) represented by general formula (a0-1) (wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; R8 represents a divalent linking group; and R7 represents an acid dissociable, dissolution inhibiting group) and a structural unit (a0-2) represented by general formula (a0-2) (wherein R3 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; R4 represents a branched alkyl group of 3 or more carbon atoms; and each of R5 and R6 independently represents an alkyl group, wherein R5 and R6 are mutually bonded to form a ring).
摘要翻译：一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1）具有由通式（a0-1）表示的结构单元（a0-1）（其中R1表示氢原子，低级烷基或卤代低级烷基; R8表示二价连接基团，R7表示酸解离，溶解抑制基）和由通式（a0-2）表示的结构单元（a0-2）（其中R3表示氢原子，低级烷基或卤代低级烷基; R4表示支链烷基 3个以上的碳原子，R5和R6各自独立地表示烷基，其中R5和R6相互键合形成环）。

37. 发明授权

US08021823B2 Positive resist composition, method of forming resist pattern, and polymeric compound 有权
标题翻译：正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物
公开(公告)号：US08021823B2
公开(公告)日：2011-09-20
申请号：US12372964
申请日：2009-02-18
申请人： Hiroaki Shimizu , Tsuyoshi Nakamura , Takahiro Dazai , Daiju Shiono , Tomoyuki Hirano
发明人： Hiroaki Shimizu , Tsuyoshi Nakamura , Takahiro Dazai , Daiju Shiono , Tomoyuki Hirano
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/111 , Y10S430/122 , Y10S430/123 , Y10S430/124 , Y10S430/125 , Y10S430/126
摘要： There is provided a positive resist composition, including a base component (A) which exhibits increased solubility in an alkali developing solution under action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) containing a structural unit (a0) represented by the general formula (a0-1) shown below: (wherein, R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a bivalent linking group; B represents a bivalent linking group; and R2 represents an acid dissociable, dissolution inhibiting group).
摘要翻译：提供了一种正性抗蚀剂组合物，其包含在酸性作用下在碱性显影液中表现出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂成分（B），其中， A）包括含有下述通式（a0-1）表示的结构单元（a0）的高分子化合物（A1）：（其中，R1表示氢原子，低级烷基或卤代低级烷基; A 表示二价连接基团; B表示二价连接基团; R2表示酸解离，溶解抑制基团）。

38. 发明申请

US20100196821A1 POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND POLYMERIC COMPOUND 有权
标题翻译：正极性组合物，使用其的耐热图案的形成方法和聚合物
公开(公告)号：US20100196821A1
公开(公告)日：2010-08-05
申请号：US12687430
申请日：2010-01-14
申请人： Takahiro Dazai , Daiju Shiono , Tomoyuki Hirano , Tasuku Matsumiya , Masaru Takeshita
发明人： Takahiro Dazai , Daiju Shiono , Tomoyuki Hirano , Tasuku Matsumiya , Masaru Takeshita
IPC分类号： G03F7/20 , G03F7/004 , C08F220/26 , C08F228/06
CPC分类号： C08F220/26 , C08F228/06 , G03F7/0045 , G03F7/0397
摘要： A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure dissolved in an organic solvent (S), the base component (A) containing a polymeric compound (A1) including a structural unit (a0) derived from an acrylate ester having a cyclic group containing a sulfonyl group on the side chain thereof, a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group and a structural unit (a5) represented by general formula (a5-1) (Y1 represents an aliphatic hydrocarbon group; Z represents a monovalent organic group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, provided that a+b=1 to 3).
摘要翻译：一种正性抗蚀剂组合物，其包含在碱的作用下在碱性显影液中的溶解度变化的碱成分（A）和暴露于有机溶剂（S）时产生酸的酸产生剂成分（B），所述碱含有由侧链上具有含有磺酰基的环状基团的丙烯酸酯衍生的结构单元（a0）的高分子化合物（A1）的组分（A），来源于丙烯酸酯的结构单元（a1）酸解离，溶解抑制基团和由通式（a5-1）表示的结构单元（a5）（Y1表示脂族烃基; Z表示一价有机基团; a表示1〜3的整数，b表示 0〜2的整数，条件是a + b = 1〜3）。

39. 发明申请

US20100183981A1 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US20100183981A1
公开(公告)日：2010-07-22
申请号：US12591819
申请日：2009-12-02
申请人： Tasuku Matsumiya , Daiju Shiono , Tomoyuki Hirano , Takahiro Dazai , Kotaro Endo
发明人： Tasuku Matsumiya , Daiju Shiono , Tomoyuki Hirano , Takahiro Dazai , Kotaro Endo
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/111
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1), a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, and a structural unit (a3) derived from an acrylate ester containing a hydroxy group-containing aliphatic hydrocarbon group represented by general formula (a3-1), and the amount of the structural unit (a3) based on the combined total of all structural units constituting the polymeric compound (A1) being in the range of 1 to 30 mol %.
摘要翻译：一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1），由通式（a0-1）表示的结构单元（a0），由含有酸解离性，溶解抑制基团的丙烯酸酯衍生的结构单元（a1）和来自丙烯酸酯的结构单元（a3）含有由通式（a3-1）表示的含羟基的脂族烃基的酯和基于构成聚合化合物（A1）的所有结构单元的总和的结构单元（a3）的量在该范围内为1〜30摩尔％。

40. 发明申请

US20090269694A1 POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND 有权
标题翻译：正极性组合物，形成耐火模式的方法和聚合物
公开(公告)号：US20090269694A1
公开(公告)日：2009-10-29
申请号：US12425706
申请日：2009-04-17
申请人： Hiroaki Shimizu , Tsuyoshi Nakamura , Takayoshi Mori , Sanae Furuya , Daiju Shiono , Tomoyuki Hirano , Takahiro Dazai
发明人： Hiroaki Shimizu , Tsuyoshi Nakamura , Takayoshi Mori , Sanae Furuya , Daiju Shiono , Tomoyuki Hirano , Takahiro Dazai
IPC分类号： G03F7/20 , G03F7/004 , C08F222/10 , C08F224/00
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/2041 , Y10S430/111
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) having a structural unit (a0-1) represented by general formula (a0-1) (wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; R8 represents a divalent linking group; and R7 represents an acid dissociable, dissolution inhibiting group) and a structural unit (a0-2) represented by general formula (a0-2) (wherein R3 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; R4 represents a branched alkyl group of 3 or more carbon atoms; and each of R5 and R6 independently represents an alkyl group, wherein R5 and R6 are mutually bonded to form a ring).
摘要翻译：一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1）具有由通式（a0-1）表示的结构单元（a0-1）（其中R1表示氢原子，低级烷基或卤代低级烷基; R8表示二价连接基团，R7表示酸解离，溶解抑制基）和由通式（a0-2）表示的结构单元（a0-2）（其中R3表示氢原子，低级烷基或卤代低级烷基; R4表示支链烷基 3个以上的碳原子，R5和R6各自独立地表示烷基，其中R5和R6相互键合形成环）。

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