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31. 发明申请

US20120305809A1 APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT 审中-公开
标题翻译：用于产生极度超紫外线灯的装置和方法
公开(公告)号：US20120305809A1
公开(公告)日：2012-12-06
申请号：US13482857
申请日：2012-05-29
申请人： Masato MORIYA , Osamu Wakabayashi
发明人： Masato MORIYA , Osamu Wakabayashi
IPC分类号： G21K5/04
CPC分类号： H05G2/008 , H05G2/003
摘要： An apparatus for generating extreme ultraviolet light is used with a first laser device for outputting a first laser beam. The apparatus includes a second laser device for outputting a second laser beam, a beam adjusting unit for causing beam axes of the first and second laser beams to substantially coincide with each other, a chamber, a target supply unit for supplying target materials into the chamber, a laser beam focusing optical system for focusing the first laser beam on the target material for plasma generation, an optical detection system for detecting the second laser beam and light from plasma, a focus position correction mechanism for correcting a first laser beam focusing position, and a target supply position correction mechanism for correcting a target material supplying position, and a controller for the focus position correction mechanism and the target supply position correction mechanism based on the optical detection system's detection.
摘要翻译：用于产生极紫外光的装置与用于输出第一激光束的第一激光装置一起使用。该装置包括用于输出第二激光束的第二激光装置，用于使第一和第二激光束的光束轴线彼此基本一致的光束调节单元，用于将目标材料供应到腔室中的目标供应单元用于将第一激光束聚焦在等离子体产生用靶材料上的激光束聚焦光学系统，用于检测第二激光束的光检测系统和来自等离子体的光，用于校正第一激光束聚焦位置的聚焦位置校正机构，以及用于校正目标材料供给位置的目标供给位置校正机构，以及基于光学检测系统的检测的聚焦位置校正机构和目标供给位置校正机构的控制器。

32. 发明授权

US08311066B2 Laser apparatus and extreme ultraviolet light source apparatus 有权
标题翻译：激光设备和极紫外光源设备
公开(公告)号：US08311066B2
公开(公告)日：2012-11-13
申请号：US12713874
申请日：2010-02-26
申请人： Nowak Krzysztof , Takeshi Ohta , Osamu Wakabayashi
发明人： Nowak Krzysztof , Takeshi Ohta , Osamu Wakabayashi
IPC分类号： H01S3/098
CPC分类号： H01S3/235 , G03F7/70033 , H01S3/005 , H01S3/08031 , H01S3/1307 , H01S3/2232 , H01S3/2375 , H01S3/2383 , H01S5/0654 , H01S5/0687 , H01S5/141 , H01S5/4012 , H01S5/4025
摘要： A laser apparatus comprises an amplifier including at least one of a MOPA and a MOPO each of which amplifies a single-longitudinal or multiple-longitudinal mode laser light, an amplifiable agent of the amplifier being a molecular gas, a master oscillator constructed from a semiconductor laser being able to oscillate a single-longitudinal or multiple-longitudinal mode laser light of which wavelength is within one or more amplification lines of the amplifier; and a controller executing a wave shape control adjusting a pulse shape and/or a pulse output timing of a single-longitudinal or multiple-longitudinal mode laser light outputted from the master oscillator.
摘要翻译：激光装置包括放大器，该放大器包括MOPA和MOPO中的至少一个，每个MOPA和MOPO均放大单纵向或多纵模激光，放大器的可分解剂是分子气体，由半导体构成的主振荡器激光器能够振荡波长在放大器的一个或多个放大线内的单纵向或多纵模激光; 以及执行调整从主振荡器输出的单纵向或多纵模激光的脉冲形状和/或脉冲输出定时的波形控制的控制器。

33. 发明申请

US20120223257A1 EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 有权
标题翻译：极光紫外线发光装置
公开(公告)号：US20120223257A1
公开(公告)日：2012-09-06
申请号：US13474100
申请日：2012-05-17
申请人： Shinji NAGAI , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
发明人： Shinji NAGAI , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
IPC分类号： G21K5/04
CPC分类号： H05G2/008 , B23K10/00 , B23K26/12 , B23K26/36 , G03B27/32 , G03F7/70025 , G03F7/70033 , G21K1/067 , G21K5/00 , G21K5/02 , G21K2201/064 , H05G2/005
摘要： An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
摘要翻译：一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

34. 发明授权

US08242474B2 Extreme ultraviolet light generation apparatus 有权
标题翻译：极紫外光发生装置
公开(公告)号：US08242474B2
公开(公告)日：2012-08-14
申请号：US13032172
申请日：2011-02-22
申请人： Shinji Nagai , Tamotsu Abe , Takanobu Ishihara , Osamu Wakabayashi
发明人： Shinji Nagai , Tamotsu Abe , Takanobu Ishihara , Osamu Wakabayashi
IPC分类号： G01N21/33 , H01J1/50 , G21K5/08
CPC分类号： H05G2/003 , G01J3/10 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.
摘要翻译：一种与激光系统组合使用的极紫外光发生装置，该装置可以包括：设置有至少一个入口的腔室，用于将从激光系统输出的激光束引入腔室; 目标供给单元，其设置在所述室中，用于将所述目标材料供给到所述室内的预定区域，所述目标材料用所述激光束照射; 设置在所述室内的至少一个光学元件; 用于产生围绕预定区域的磁场的磁场产生单元; 离子收集单元，设置在所述磁场的磁力线的方向上，用于收集当所述靶材料被所述激光束照射并沿着所述磁力线流动时产生的离子; 以及用于将蚀刻气体引入到室中的气体引入单元。

35. 发明授权

US08242472B2 Extreme ultraviolet light source device and control method for extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置及极紫外光源装置的控制方法
公开(公告)号：US08242472B2
公开(公告)日：2012-08-14
申请号：US12612861
申请日：2009-11-05
申请人： Masato Moriya , Osamu Wakabayashi
发明人： Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B5/00
CPC分类号： H05G2/008 , H01S3/0007 , H01S3/005 , H01S3/0064 , H01S3/08095 , H01S3/1305 , H01S3/1307 , H01S3/2232 , H01S3/2308 , H01S3/2316 , H05G2/003
摘要： [Problem]An extreme ultraviolet light source device in accordance with the present invention corrects an optical performance of a laser beam in an appropriate manner.[Means for Resolution]A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system 30 that amplifies a laser beam that is output from a driver laser oscillator 20. The guide laser beam is output from a laser device 50 as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror 52. A sensor 44 detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller 60 outputs a signal to a wave front correction part 34 based on a measured result of a sensor 36. The wave front correction part 34 corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller 60.
摘要翻译： [问题]根据本发明的极紫外光源装置以适当的方式校正激光束的光学性能。 [分辨装置]具有光轴和与激光脉冲激光束的光束直径基本相等的光束直径的引导激光束被引入到放大从驱动激光振荡器20输出的激光束的放大系统30中。引导激光束作为连续光从激光装置50输出，并且通过引导激光束引入反射镜52被引入到驱动脉冲激光束的光路中。传感器44检测激光束的角度（方向）激光束和波前曲率的变化。波前校正控制器60基于传感器36的测量结果将信号输出到波前校正部34。波前校正部34根据指令将激光束的波前校正为预定波阵面来自波前校正控制器60。

36. 发明申请

US20120161040A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT 有权
标题翻译：极光紫外线光源装置及其产生极光紫外线灯的方法
公开(公告)号：US20120161040A1
公开(公告)日：2012-06-28
申请号：US13416884
申请日：2012-03-09
申请人： Akira Endo , Yoshifumi Ueno , Youichi Sasaki , Osamu Wakabayashi
发明人： Akira Endo , Yoshifumi Ueno , Youichi Sasaki , Osamu Wakabayashi
IPC分类号： G21K5/00
CPC分类号： G21K5/00 , G03F7/70033 , H05G2/00 , H05G2/003 , H05G2/008
摘要： An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.
摘要翻译：一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶，在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。

37. 发明申请

US20120119118A1 EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM 审中-公开
标题翻译：极致超紫外光源系统
公开(公告)号：US20120119118A1
公开(公告)日：2012-05-17
申请号：US13359315
申请日：2012-01-26
申请人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
发明人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
IPC分类号： G21K5/00
CPC分类号： G03F7/70975 , G03F7/70033
摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.
摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。

38. 发明申请

US20110309260A1 CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：室外设备和极光紫外线发光系统
公开(公告)号：US20110309260A1
公开(公告)日：2011-12-22
申请号：US13122354
申请日：2011-03-11
申请人： Toshihiro Nishisaka , Yukio Watanabe , Tamotsu Abe , Osamu Wakabayashi
发明人： Toshihiro Nishisaka , Yukio Watanabe , Tamotsu Abe , Osamu Wakabayashi
IPC分类号： G21K5/00 , G01J1/42
CPC分类号： H05G2/008 , G03B27/54 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/003
摘要： A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.
摘要翻译：与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生极紫外光的室; 设置在室中的用于收集极紫外光的收集器反射镜; 用于将收集器镜固定到腔室的支撑件; 以及设置到室的输出端口，用于允许由集光镜收集的极紫外光通过其引入外部设备。

39. 发明申请

US20110297852A1 MIRROR AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 审中-公开
标题翻译：镜子和极光超紫外光发生系统
公开(公告)号：US20110297852A1
公开(公告)日：2011-12-08
申请号：US13124063
申请日：2011-03-22
申请人： Hidenobu Kameda , Osamu Wakabayashi , Masato Moriya
发明人： Hidenobu Kameda , Osamu Wakabayashi , Masato Moriya
IPC分类号： G21K5/00 , G02B7/192
CPC分类号： G21K1/062 , B82Y10/00 , G02B5/0891 , G03F7/70891 , G03F7/70983 , G21K2201/067
摘要： A mirror is provided which may include: a substrate; a thermal diffusion layer provided on a principal surface of the substrate, the thermal diffusion layer having a higher thermal conductivity than the substrate; and a reflective layer provided on the thermal diffusion layer, the reflective layer having a lower thermal conductivity than the thermal diffusion layer.
摘要翻译：提供了一种可以包括：基底的反射镜; 设置在所述基板的主表面上的热扩散层，所述热扩散层具有比所述基板更高的热导率; 以及设置在所述热扩散层上的反射层，所述反射层具有比所述热扩散层低的热导率。

40. 发明授权

US07965756B2 Optical element for gas laser and gas laser apparatus using the same 有权
标题翻译：用于气体激光的光学元件和使用其的气体激光装置
公开(公告)号：US07965756B2
公开(公告)日：2011-06-21
申请号：US12545495
申请日：2009-08-21
申请人： Osamu Wakabayashi , Shinji Nagai , Kouji Kakizaki , Satoshi Tanaka
发明人： Osamu Wakabayashi , Shinji Nagai , Kouji Kakizaki , Satoshi Tanaka
IPC分类号： H01S3/22
CPC分类号： H01S3/005 , G02B1/02 , H01S3/0057 , H01S3/08009 , H01S3/08054 , H01S3/10061 , H01S3/2251
摘要： At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.
摘要翻译：进入平面或出射平面的光中的至少任一个平行于CaF 2晶体的（111）晶面，并且从入射平面入射的激光束穿过位于[111]轴和第一方位角 [001]轴围绕[111]轴的旋转轨迹的轴线，包括[111]轴和第一方位轴，位于旋转轨迹中的[111]轴和第二方位角轴之间的平面围绕[111]轴的[010]轴线，并且包括[111]轴和第二方位角轴或位于[111]轴和第三方位角之间的平面围绕[111]轴并且包括[111]轴和第三方位角轴并从出射平面离开。

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