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31. 发明授权

US09316911B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition 有权
标题翻译：光化学射线或辐射敏感性树脂组合物，其中的光化射线或辐射敏感膜，以及使用组合物形成图案的方法
公开(公告)号：US09316911B2
公开(公告)日：2016-04-19
申请号：US13538246
申请日：2012-06-29
申请人： Tomoki Matsuda , Yoko Tokugawa , Akinori Shibuya
发明人： Tomoki Matsuda , Yoko Tokugawa , Akinori Shibuya
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/2041 , Y10T428/24802
摘要： An actinic-ray- or radiation-sensitive resin composition according to the present invention includes (A) a resin to be decomposed to increase its solubility in an alkali developer when acted on by an acid, and (B) a compound represented by the general formula (1-1) below.
摘要翻译：根据本发明的光化射线或辐射敏感性树脂组合物包括（A）待酸分解时增加其在碱显影剂中的溶解度的树脂，和（B）由通式公式（1-1）。

32. 发明授权

US07794916B2 Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition 失效
标题翻译：正性感光性组合物，用于阳性感光性组合物的高分子化合物，高分子化合物的制造方法，以及使用正型感光性组合物的图案形成方法
公开(公告)号：US07794916B2
公开(公告)日：2010-09-14
申请号：US11943908
申请日：2007-11-21
申请人： Akinori Shibuya
发明人： Akinori Shibuya
IPC分类号： G03F7/004 , G03F7/30 , C08F2/38 , C08F28/04
CPC分类号： G03F7/0397 , C08F2/38 , C08F2/50 , C08F220/28 , C08F220/38 , C08F220/42 , G03F7/11 , G03F7/2041 , Y10S430/111
摘要： A polymer compound having a structure represented by the formula (1) as defined herein at a main chain terminal, and a positive photosensitive composition containing a polymer compound having a structure represented by the following formula (1) as defined herein at a main chain terminal and a photoacid generator capable of generating an acid upon irradiation with actinic rays or radiation.
摘要翻译：在主链末端具有由式（1）表示的结构的聚合物化合物和在主链末端含有具有如下定义的下式（1）所示结构的高分子化合物的正性光敏组合物以及能够在用光化射线或辐射照射时产生酸的光酸产生剂。

33. 发明申请

US20090274975A1 POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH 审中-公开
标题翻译：正性感光组合物及其形成方法
公开(公告)号：US20090274975A1
公开(公告)日：2009-11-05
申请号：US12413314
申请日：2009-03-27
申请人： Yuko Tada , Akinori Shibuya
发明人： Yuko Tada , Akinori Shibuya
IPC分类号： G03F7/039 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0395 , G03F7/0758
摘要： A positive photosensitive composition includes (A) a resin having a repeating unit with a lactone structure of 5.0 or below an Onishi parameter and having any of repeating units of Formula (I) that when acted on by an acid, generates a carboxylic acid, and (B) a compound that when exposed to actinic rays or radiation, generates an acid, wherein each of R1, R2 and R3 independently represents a substituted or unsubstituted alkyl group or a substituted or unsubstituted cycloalkyl group, provided that R2 and R3 may be bonded with each other to thereby form a ring structure, and Ra represents a hydrogen atom, an alkyl group or a group of the formula —CH2—O—Ra2 in which Ra2 represents a hydrogen atom, an alkyl group or an acyl group, the structure of Formula (I) having a van der Waals volume of 306×10−30 m3 or less.
摘要翻译：正型感光性组合物包含（A）具有内酯结构为5.0以下的Onishi参数的重复单元的树脂，并且具有任何式（I）的重复单元，当被酸作用时，产生羧酸，并且（B）当暴露于光化射线或辐射时产生酸的化合物，其中R 1，R 2和R 3各自独立地表示取代或未取代的烷基或取代或未取代的环烷基，条件是R 2和R 3可以键合由此形成环结构，R a表示氢原子，烷基或式-CH 2 -O-Ra 2的基团，其中Ra 2表示氢原子，烷基或酰基，结构（I）的范德华体积为306×10-30m 3或更小。

34. 发明授权

US07435529B2 Photosensitive composition and image recording method using the same 失效
标题翻译：光敏组合物和使用其的图像记录方法
公开(公告)号：US07435529B2
公开(公告)日：2008-10-14
申请号：US11171208
申请日：2005-07-01
申请人： Yohei Ishiji , Akinori Shibuya
发明人： Yohei Ishiji , Akinori Shibuya
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/031 , G03F7/029 , Y10S430/106 , Y10S430/114 , Y10S430/146
摘要： A photosensitive composition comprising: a sensitizing dye represented by the formula (I) defined herein, in which Z represents a substituted divalent linking group forming a 5-membered or 6-membered ring, provided that a total volume of substituents arranged on the 5-membered or 6-membered ring formed by Z is 200 Å3 or more; R1 represents a hydrogen atom or a monovalent non-metal atomic group; A represents a substituted or unsubstituted aromatic ring or hetero ring; and R1 and A may be taken together to form an aliphatic or aromatic ring; an activator compound being capable of causing a chemical change due to a mutual action with an electron excited state to be generated by light absorption of the sensitizing dye, thereby generating a radical or an acid; and a polymerizable compound being capable of reacting with at least one of a radical and an acid.
摘要翻译：一种光敏组合物，其包含：由本文定义的式（I）表示的增感染料，其中Z表示形成5元或6元环的取代的二价连接基团，条件是布置在5- 由Z形成的6-元或6-元环是200〜3个以上; R 1表示氢原子或一价非金属原子团; A表示取代或未取代的芳环或杂环; 并且R 1和A可以一起形成脂族或芳族环; 活化剂化合物能够由于通过敏化染料的光吸收而产生的与电子激发态相互作用的化学变化，从而产生自由基或酸; 以及能够与自由基和酸中的至少一种反应的可聚合化合物。

35. 发明授权

US07267925B2 Photosensitive composition and novel compound used therefor 有权
标题翻译：光敏组合物和用于其的新型化合物
公开(公告)号：US07267925B2
公开(公告)日：2007-09-11
申请号：US10813136
申请日：2004-03-31
申请人： Akinori Shibuya
发明人： Akinori Shibuya
IPC分类号： G03F7/031 , G03F7/032
CPC分类号： G03F7/031 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , Y10S430/106 , Y10S430/114 , Y10S430/127
摘要： A photosensitive composition containing: a sensitizing dye represented by the formula (1) as defined herein; an initiator compound capable of generating a radical, an acid, or a base; and a compound whose physical or chemical characteristic irreversibly changes by at least one of a radical, an acid, and a base.
摘要翻译：一种光敏组合物，其含有如本文所定义的由式（1）表示的增感染料; 能够产生自由基，酸或碱的引发剂化合物; 以及其物理或化学特性由基团，酸和碱中的至少一种不可逆地改变的化合物。

36. 发明申请

US20060210920A1 Photosensitive composition and lithographic printing plate precursor 审中-公开
标题翻译：光敏组合物和平版印刷版前体
公开(公告)号：US20060210920A1
公开(公告)日：2006-09-21
申请号：US11373299
申请日：2006-03-13
申请人： Akinori Shibuya
发明人： Akinori Shibuya
IPC分类号： G03C1/76
CPC分类号： G03F7/033
摘要： A photosensitive composition comprising: a polymer obtained by polymerization of a monomer having a structure represented by the formula (I) as defined herein; a polymerizable compound having an unsaturated double bond; and a radical polymerization initiator selected from a hexaarylbiimidazole compound and a metallocene compound.
摘要翻译：一种光敏组合物，其包含：通过聚合具有如本文所定义的式（I）所示结构的单体获得的聚合物; 具有不饱和双键的聚合性化合物; 和选自六芳基联咪唑化合物和茂金属化合物的自由基聚合引发剂。

37. 发明授权

US09012123B2 Positive resist composition and pattern forming method using the same 有权
标题翻译：正型抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US09012123B2
公开(公告)日：2015-04-21
申请号：US12922041
申请日：2009-03-26
申请人： Kei Yamamoto , Akinori Shibuya
发明人： Kei Yamamoto , Akinori Shibuya
IPC分类号： G03F7/004 , G03F7/039 , G03F7/26 , G03F7/00 , G03F7/075 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0007 , G03F7/0046 , G03F7/0758 , G03F7/2041 , Y10S430/111
摘要： A positive resist composition and a pattern forming method using the resist composition are provided, the resist composition including: (A) a resin containing a repeating structural unit represented by formula (I) as defined in the specification and being capable of decomposing by an action of an acid to increase the solubility in an alkali developer; (B) an acid generator; and (C) a mixed solvent containing at least one solvent selected from the group consisting of the following Group (a) and at least one solvent selected from the group consisting of the following Groups (b) to (d): Group (a): an alkylene glycol monoalkyl ether, Group (b): an alkylene glycol monoalkyl ether carboxylate, Group (c): a linear ketone, a branched chain ketone, a cyclic ketone, a lactone and an alkylene carbonate, and Group (d): a lactic acid ester, an acetic acid ester and an alkoxypropionic acid ester.
摘要翻译：提供了一种使用该抗蚀剂组合物的正性抗蚀剂组合物和图案形成方法，该抗蚀剂组合物包括：（A）含有本说明书中定义的式（I）表示的重复结构单元并且能够通过动作分解的树脂的酸以增加在碱性显影剂中的溶解度; （B）酸发生剂; 和（C）含有选自下列组（a）和至少一种选自下列组（b）至（d）的组的溶剂中的至少一种溶剂的混合溶剂：组（a）亚烷基二醇单烷基醚，（b）：亚烷基二醇单烷基醚羧酸酯，（c）组：直链酮，支链酮，环酮，内酯和碳酸亚烷基酯，和（d）：乳酸酯，乙酸酯和烷氧基丙酸酯。

38. 发明申请

US20130130178A1 ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH 审中-公开
标题翻译：抗紫外线或辐射敏感性树脂组合物及其形成方法
公开(公告)号：US20130130178A1
公开(公告)日：2013-05-23
申请号：US13807623
申请日：2011-08-26
申请人： Yusuke Iizuka , Akinori Shibuya
发明人： Yusuke Iizuka , Akinori Shibuya
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/004 , C08F12/20 , C08F12/22 , C08L25/18 , C09D133/062 , C09D133/16 , C09D143/04 , G03F7/0046 , G03F7/0397 , G03F7/0758 , G03F7/20 , G03F7/2041
摘要： Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (B) containing at least either a fluorine atom or a silicon atom, the resin (B) containing any of repeating units of general formulae (I-1) and (I-2) below: Wherein each of R1s independently represents a hydrogen atom, an alkyl group or a halogen atom, X1 represents a bivalent organic group, X2 represents a single bond or a bivalent organic group, each of Ar1s independently represents a monovalent aromatic ring group, Ar2 represents a bivalent aromatic ring group, and each of L's independently represents a single bond or a bivalent organic group.
摘要翻译：本发明提供包含含有至少含有氟原子或硅原子的树脂（B）的光化射线或辐射敏感性树脂组合物，所述树脂（B）含有通式（I-1）和（I-2）：其中R1各自独立地表示氢原子，烷基或卤素原子，X1表示二价有机基团，X2表示单键或二价有机基团，Ar1各自独立地表示一价芳环基团，Ar 2表示二价芳环基团，L 1各自独立地表示单键或二价有机基团。

39. 发明申请

US20120282548A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM 有权
标题翻译：图案形成方法，丙烯酸敏感或辐射敏感性树脂组合物和耐腐蚀膜
公开(公告)号：US20120282548A1
公开(公告)日：2012-11-08
申请号：US13521164
申请日：2011-01-07
申请人： Yuichiro Enomoto , Shinji Tarutani , Sou Kamimura , Kaoru Iwato , Keita Kato , Akinori Shibuya
发明人： Yuichiro Enomoto , Shinji Tarutani , Sou Kamimura , Kaoru Iwato , Keita Kato , Akinori Shibuya
IPC分类号： G03F7/20 , G03F7/075 , C07D211/46 , C08F226/02 , C07C271/14 , G03F7/027 , G03F7/004
CPC分类号： G03F7/325 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/0758 , G03F7/2041
摘要： Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.
摘要翻译：提供了一种图案形成方法，其包括（i）从光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤，（ii）曝光所述膜的步骤，和（iii）使所述曝光膜显影的步骤通过使用含有机溶剂的显影剂，其中所述光化学射线敏感性或辐射敏感性树脂组合物包含（A）能够通过酸的作用降低对含有机溶剂的显影剂的溶解度的树脂，（B）能够在用光化学射线或辐射照射时产生酸的化合物，（D）溶剂，和（G）具有氟原子和硅原子中的至少一个并具有碱性或能够增加碱度的化合物通过酸的作用。

40. 发明申请

US20110136062A1 POSITIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权
标题翻译：正极光敏组合物和使用其的图案形成方法
公开(公告)号：US20110136062A1
公开(公告)日：2011-06-09
申请号：US13059441
申请日：2009-09-29
申请人： Toshiaki Fukuhara , Akinori Shibuya , Takayuki Kato
发明人： Toshiaki Fukuhara , Akinori Shibuya , Takayuki Kato
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： C08F20/28 , C08F20/26 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/111
摘要： A positive photosensitive composition, includes: (A) a resin having a repeating unit represented by formula (1) as defined in the specification and a repeating unit represented by formula (2) as defined in the specification and being capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; and a solvent, and a pattern forming method uses the positive photosensitive composition.
摘要翻译：正型感光性组合物包括：（A）具有本说明书中定义的式（1）表示的重复单元的树脂和由说明书中定义的式（2）表示的重复单元，并且能够提高通过酸的作用在碱性显影剂中的树脂（A）; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; 和溶剂，并且图案形成方法使用正性感光性组合物。

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