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1. 发明申请

US20110014571A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权
标题翻译：正极性组合物和使用其的图案形成方法
公开(公告)号：US20110014571A1
公开(公告)日：2011-01-20
申请号：US12922041
申请日：2009-03-26
申请人： Kei Yamamoto , Akinori Shibuya
发明人： Kei Yamamoto , Akinori Shibuya
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0007 , G03F7/0046 , G03F7/0758 , G03F7/2041 , Y10S430/111
摘要： A positive resist composition and a pattern forming method using the resist composition are provided, the resist composition including: (A) a resin containing a repeating structural unit represented by formula (I) as defined in the specification and being capable of decomposing by an action of an acid to increase the solubility in an alkali developer; (B) an acid generator; and (C) a mixed solvent containing at least one solvent selected from the group consisting of the following Group (a) and at least one solvent selected from the group consisting of the following Groups (b) to (d): Group (a): an alkylene glycol monoalkyl ether, Group (b): an alkylene glycol monoalkyl ether carboxylate, Group (c): a linear ketone, a branched chain ketone, a cyclic ketone, a lactone and an alkylene carbonate, and Group (d): a lactic acid ester, an acetic acid ester and an alkoxypropionic acid ester.
摘要翻译：提供了一种使用该抗蚀剂组合物的正性抗蚀剂组合物和图案形成方法，该抗蚀剂组合物包括：（A）含有本说明书中定义的式（I）表示的重复结构单元并且能够通过动作分解的树脂的酸以增加在碱性显影剂中的溶解度; （B）酸发生剂; 和（C）含有选自下列组（a）和至少一种选自下列组（b）至（d）的组的溶剂中的至少一种溶剂的混合溶剂：组（a）亚烷基二醇单烷基醚，（b）：亚烷基二醇单烷基醚羧酸酯，（c）组：直链酮，支链酮，环酮，内酯和碳酸亚烷基酯，和（d）：乳酸酯，乙酸酯和烷氧基丙酸酯。

2. 发明授权

US09012123B2 Positive resist composition and pattern forming method using the same 有权
标题翻译：正型抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US09012123B2
公开(公告)日：2015-04-21
申请号：US12922041
申请日：2009-03-26
申请人： Kei Yamamoto , Akinori Shibuya
发明人： Kei Yamamoto , Akinori Shibuya
IPC分类号： G03F7/004 , G03F7/039 , G03F7/26 , G03F7/00 , G03F7/075 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0007 , G03F7/0046 , G03F7/0758 , G03F7/2041 , Y10S430/111
摘要： A positive resist composition and a pattern forming method using the resist composition are provided, the resist composition including: (A) a resin containing a repeating structural unit represented by formula (I) as defined in the specification and being capable of decomposing by an action of an acid to increase the solubility in an alkali developer; (B) an acid generator; and (C) a mixed solvent containing at least one solvent selected from the group consisting of the following Group (a) and at least one solvent selected from the group consisting of the following Groups (b) to (d): Group (a): an alkylene glycol monoalkyl ether, Group (b): an alkylene glycol monoalkyl ether carboxylate, Group (c): a linear ketone, a branched chain ketone, a cyclic ketone, a lactone and an alkylene carbonate, and Group (d): a lactic acid ester, an acetic acid ester and an alkoxypropionic acid ester.
摘要翻译：提供了一种使用该抗蚀剂组合物的正性抗蚀剂组合物和图案形成方法，该抗蚀剂组合物包括：（A）含有本说明书中定义的式（I）表示的重复结构单元并且能够通过动作分解的树脂的酸以增加在碱性显影剂中的溶解度; （B）酸发生剂; 和（C）含有选自下列组（a）和至少一种选自下列组（b）至（d）的组的溶剂中的至少一种溶剂的混合溶剂：组（a）亚烷基二醇单烷基醚，（b）：亚烷基二醇单烷基醚羧酸酯，（c）组：直链酮，支链酮，环酮，内酯和碳酸亚烷基酯，和（d）：乳酸酯，乙酸酯和烷氧基丙酸酯。

3. 外观设计

USD835554S1 Interior door panel for an automobile 有权
公开(公告)号：USD835554S1
公开(公告)日：2018-12-11
申请号：US29587301
申请日：2016-12-12
申请人： Kei Yamamoto , Keitarou Hinoue
设计人： Kei Yamamoto , Keitarou Hinoue

4. 外观设计

USD783481S1 Interior door panel for an automobile 有权
公开(公告)号：USD783481S1
公开(公告)日：2017-04-11
申请号：US29537642
申请日：2015-08-27
申请人： Kei Yamamoto
设计人： Kei Yamamoto

5. 外观设计

USD705142S1 Instrument panel for an automobile 有权
公开(公告)号：USD705142S1
公开(公告)日：2014-05-20
申请号：US29400088
申请日：2011-08-23
申请人： Kei Yamamoto , Yoshiko Hayashi
设计人： Kei Yamamoto , Yoshiko Hayashi

6. 发明授权

US08007897B2 Insulating sheet and method for producing it, and power module comprising the insulating sheet 有权
标题翻译：绝缘片及其制造方法以及包含该绝缘片的功率模块
公开(公告)号：US08007897B2
公开(公告)日：2011-08-30
申请号：US12834073
申请日：2010-07-12
申请人： Hiromi Ito , Naoshi Yamada , Kei Yamamoto , Hirofumi Fujioka , Takumi Kikuchi , Osamu Yashiro
发明人： Hiromi Ito , Naoshi Yamada , Kei Yamamoto , Hirofumi Fujioka , Takumi Kikuchi , Osamu Yashiro
IPC分类号： B32B5/16 , H05K7/20
CPC分类号： H01L23/3737 , H01L24/29 , H01L2224/29011 , H01L2224/29076 , H01L2224/291 , H01L2224/2929 , H01L2224/29386 , H01L2224/29499 , H01L2224/32245 , H01L2224/48091 , H01L2224/48137 , H01L2224/48247 , H01L2224/48257 , H01L2224/48464 , H01L2224/49109 , H01L2924/15747 , H01L2924/181 , H01L2924/19107 , Y10T156/10 , Y10T428/24372 , Y10T428/249924 , Y10T428/24994 , Y10T428/28 , H01L2924/00014 , H01L2924/05432 , H01L2924/049 , H01L2924/045 , H01L2924/00 , H01L2924/00012
摘要： An insulating sheet includes an adhesive component of a thermosetting resin and containing a filler member. Heat conductivity of an adhesive face region of the insulating sheet is smaller than heat conductivity of an inner region of the insulating sheet.
摘要翻译：绝缘片包括热固性树脂的粘合剂组分并且包含填充构件。绝缘片的粘合面区域的导热率小于绝缘片的内部区域的导热率。

7. 外观设计

USD642103S1 Instrument panel for an automobile 有权
公开(公告)号：USD642103S1
公开(公告)日：2011-07-26
申请号：US29368646
申请日：2010-08-26
申请人： Kei Yamamoto , Yoshinori Sakakibara , Kaori Suzuki
设计人： Kei Yamamoto , Yoshinori Sakakibara , Kaori Suzuki

8. 发明申请

US20110143280A1 POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORMING METHOD 有权
标题翻译：用于浸没曝光和图案形成方法的积极抵抗组合物
公开(公告)号：US20110143280A1
公开(公告)日：2011-06-16
申请号：US13057287
申请日：2009-09-25
申请人： Kei Yamamoto , Hiroshi Saegusa
发明人： Kei Yamamoto , Hiroshi Saegusa
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/039 , C09D133/16 , C09D133/26 , C09D143/04 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/0397 , G03F7/0758 , G03F7/2041 , Y10S430/122 , Y10S430/126
摘要： A positive resist composition for immersion exposure includes the following (A) to (D): (A) a resin capable of decomposing by an action of an acid to increase a solubility of the resin in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a resin having at least either one of a fluorine atom and a silicon atom; and (D) a mixed solvent containing at least one kind of a solvent selected from the group consisting of solvents represented by any one of the following formulae (S1) to (S3) as defined in the specification, in which a total amount of the at least one kind of the solvent is from 3 to 20 mass % based on all solvents of the mixed solvent (D).
摘要翻译：用于浸渍曝光的正型抗蚀剂组合物包括以下（A）至（D）：（A）能够通过酸的作用分解以增加树脂在碱性显影剂中的溶解度的树脂; （B）能够在用光化射线或辐射照射时能产生酸的化合物; （C）具有氟原子和硅原子中的至少一个的树脂; 和（D）含有至少一种选自由说明书中定义的下式（S1）至（S3）中任一项所示的溶剂的溶剂的溶剂的混合溶剂，其中，相对于混合溶剂（D）的所有溶剂，至少一种溶剂为3〜20质量％。

9. 发明授权

US06885085B2 Semiconductor laser device 失效
标题翻译：半导体激光器件
公开(公告)号：US06885085B2
公开(公告)日：2005-04-26
申请号：US10351609
申请日：2003-01-27
申请人： Hidenori Kawanishi , Kei Yamamoto , Fumihiro Konushi , Yoshie Fujishiro , Toshihiko Yoshida
发明人： Hidenori Kawanishi , Kei Yamamoto , Fumihiro Konushi , Yoshie Fujishiro , Toshihiko Yoshida
IPC分类号： H01S5/22 , H01S5/227 , H01S5/34 , H01S5/343 , H01L23/552
CPC分类号： B82Y20/00 , H01S5/2206 , H01S5/3403 , H01S5/3434 , H01S5/34373 , H01S5/34386
摘要： A semiconductor laser device has an n-type AlGaAs first cladding layer 2, a multiple quantum well active layer 3, and a p-type AlGaAs second cladding layer 4 formed in this order and supported by an n-type GaAs substrate 1. The multiple quantum well active layer 3 has two quantum well layers 3a and barrier layers 3b provided on both sides of each quantum well layer 3a. The quantum well layers 3a are each made of In1-v1Gav1As1-w1Pw1, while the barrier layers 3b are each made of In1-v2Gav2As1-w2Pw2. Here, v1 and v2 satisfy v1
摘要翻译：半导体激光器件具有依次形成并由n型GaAs衬底1支撑的n型AlGaAs第一覆层2，多量子阱有源层3和p型AlGaAs第二覆层4。量子阱活性层3具有设置在每个量子阱层3a两侧的两个量子阱层3a和势垒层3b。量子阱层3a分别由In 1-v1＆lt; 1＆lt; 1＆lt; 1＆lt; 1＆lt; 1＆gt; ，而阻挡层3b分别由In 1-v2＆lt; 2＆gt;＆lt; 1＆gt; 1-w2＆lt; W 2＆lt; >。这里，v 1和v 2满足v 1

10. 发明授权

US06584580B1 Processor and multiprocessor system 失效
标题翻译：处理器和多处理器系统
公开(公告)号：US06584580B1
公开(公告)日：2003-06-24
申请号：US09460519
申请日：1999-12-14
申请人： Akihiro Yamato , Kei Yamamoto
发明人： Akihiro Yamato , Kei Yamamoto
IPC分类号： G06F1100
CPC分类号： G06F11/0793 , G06F11/008 , G06F11/0724 , G06F11/073 , G06F12/0831 , G06F2212/1032
摘要： For use in a multiprocessor system in which a plurality of processors share a main memory via a processor bus, an error processing unit (EU) that determines an error level is provided in each processor. When an L2 cache control unit (SU) that controls an L2 cache in the write-back mode, a bus interface unit (PU), and so on, are normal and snoop processing may be continued, the snoop processing is continued in the processor, in which an error occurred, regardless of whether or not the processor is reset. This prevents the system from going down even when data coherence among L2 caches is lost due to an error that occurs in one of processors.
摘要翻译：为了在多处理器系统中使用多处理器系统，其中多个处理器经由处理器总线共享主存储器，在每个处理器中提供了确定错误级别的错误处理单元（EU）。当在回写模式下控制L2高速缓存的L2高速缓存控制单元（SU），总线接口单元（PU）等是正常的并且可以继续进行侦听处理时，在处理器中继续进行窥探处理，其中发生错误，而不管处理器是否被复位。即使在L2缓存之间的数据一致性由于在一个处理器中发生的错误而丢失，也可以防止系统下降。

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