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1. 发明申请

US20090274975A1 POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH 审中-公开
标题翻译：正性感光组合物及其形成方法
公开(公告)号：US20090274975A1
公开(公告)日：2009-11-05
申请号：US12413314
申请日：2009-03-27
申请人： Yuko Tada , Akinori Shibuya
发明人： Yuko Tada , Akinori Shibuya
IPC分类号： G03F7/039 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0395 , G03F7/0758
摘要： A positive photosensitive composition includes (A) a resin having a repeating unit with a lactone structure of 5.0 or below an Onishi parameter and having any of repeating units of Formula (I) that when acted on by an acid, generates a carboxylic acid, and (B) a compound that when exposed to actinic rays or radiation, generates an acid, wherein each of R1, R2 and R3 independently represents a substituted or unsubstituted alkyl group or a substituted or unsubstituted cycloalkyl group, provided that R2 and R3 may be bonded with each other to thereby form a ring structure, and Ra represents a hydrogen atom, an alkyl group or a group of the formula —CH2—O—Ra2 in which Ra2 represents a hydrogen atom, an alkyl group or an acyl group, the structure of Formula (I) having a van der Waals volume of 306×10−30 m3 or less.
摘要翻译：正型感光性组合物包含（A）具有内酯结构为5.0以下的Onishi参数的重复单元的树脂，并且具有任何式（I）的重复单元，当被酸作用时，产生羧酸，并且（B）当暴露于光化射线或辐射时产生酸的化合物，其中R 1，R 2和R 3各自独立地表示取代或未取代的烷基或取代或未取代的环烷基，条件是R 2和R 3可以键合由此形成环结构，R a表示氢原子，烷基或式-CH 2 -O-Ra 2的基团，其中Ra 2表示氢原子，烷基或酰基，结构（I）的范德华体积为306×10-30m 3或更小。

2. 发明授权

US09023579B2 Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition 有权
标题翻译：光化学射线或辐射敏感性树脂组合物，使用该组合物形成图案的化合物和方法
公开(公告)号：US09023579B2
公开(公告)日：2015-05-05
申请号：US13485793
申请日：2012-05-31
申请人： Shuhei Yamaguchi , Akinori Shibuya
发明人： Shuhei Yamaguchi , Akinori Shibuya
IPC分类号： G03F7/004 , G03F7/00 , C07C311/00 , C07C309/39 , C07C309/06 , C07C309/17 , C07C311/48 , C07C381/12 , C07D215/58 , C07D217/08 , C07D307/33 , C07D307/93 , C07D333/16 , C07D333/46 , C07D335/02 , C07D409/02 , C07D409/14 , C07D417/02 , G03F7/039 , G03F7/20 , G03F7/11
CPC分类号： C07C309/06 , C07C309/17 , C07C311/48 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D215/58 , C07D217/08 , C07D307/33 , C07D307/93 , C07D333/16 , C07D333/46 , C07D335/02 , C07D409/02 , C07D409/14 , C07D417/02 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds (A) of general formula (I) below that when exposed to actinic rays or radiation, generates an acid and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid. (The characters used in general formula (I) have the meanings mentioned in the description.)
摘要翻译：根据一个实施方案，光化射线或辐射敏感性树脂组合物包含以下通式（I）的化合物（A）中的任一种，当暴露于光化射线或辐射时，产生酸和树脂（B），其中通过酸的作用，溶解到碱性显影剂中的速率增加。（通式（I）中使用的字符具有说明书中提及的含义。）

3. 发明申请

US20130095429A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME 审中-公开
标题翻译：丙酰胺或辐射敏感性树脂组合物及其形成图案的方法
公开(公告)号：US20130095429A1
公开(公告)日：2013-04-18
申请号：US13807508
申请日：2011-07-07
申请人： Yusuke Iizuka , Akinori Shibuya , Hidenori Takahashi , Toshiaki Fukuhara , Kousuke Koshijima
发明人： Yusuke Iizuka , Akinori Shibuya , Hidenori Takahashi , Toshiaki Fukuhara , Kousuke Koshijima
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/004 , C08F12/20 , C08F12/22 , C08F12/32 , C08F212/14 , C08F212/32 , G03F7/0046 , G03F7/0397 , G03F7/0758 , G03F7/20 , G03F7/2041
摘要： Provided is an actinic-ray- or radiation-sensitive resin composition that simultaneously achieves excellent developability and excellent immersion-liquid tracking properties, and a method of forming a pattern using the same. The composition contains a resin (B) containing at least either a fluorine atom or a silicon atom, the resin (B) containing any of repeating units of general formula (I) below.
摘要翻译：本发明提供一种同时具有优异的显影性和优良的浸液追踪性的光化射线或辐射敏感性树脂组合物，以及使用其形成图案的方法。该组合物含有至少含有氟原子或硅原子的树脂（B），该树脂（B）含有下述通式（I）的重复单元。

4. 发明申请

US20110014571A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权
标题翻译：正极性组合物和使用其的图案形成方法
公开(公告)号：US20110014571A1
公开(公告)日：2011-01-20
申请号：US12922041
申请日：2009-03-26
申请人： Kei Yamamoto , Akinori Shibuya
发明人： Kei Yamamoto , Akinori Shibuya
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0007 , G03F7/0046 , G03F7/0758 , G03F7/2041 , Y10S430/111
摘要： A positive resist composition and a pattern forming method using the resist composition are provided, the resist composition including: (A) a resin containing a repeating structural unit represented by formula (I) as defined in the specification and being capable of decomposing by an action of an acid to increase the solubility in an alkali developer; (B) an acid generator; and (C) a mixed solvent containing at least one solvent selected from the group consisting of the following Group (a) and at least one solvent selected from the group consisting of the following Groups (b) to (d): Group (a): an alkylene glycol monoalkyl ether, Group (b): an alkylene glycol monoalkyl ether carboxylate, Group (c): a linear ketone, a branched chain ketone, a cyclic ketone, a lactone and an alkylene carbonate, and Group (d): a lactic acid ester, an acetic acid ester and an alkoxypropionic acid ester.
摘要翻译：提供了一种使用该抗蚀剂组合物的正性抗蚀剂组合物和图案形成方法，该抗蚀剂组合物包括：（A）含有本说明书中定义的式（I）表示的重复结构单元并且能够通过动作分解的树脂的酸以增加在碱性显影剂中的溶解度; （B）酸发生剂; 和（C）含有选自下列组（a）和至少一种选自下列组（b）至（d）的组的溶剂中的至少一种溶剂的混合溶剂：组（a）亚烷基二醇单烷基醚，（b）：亚烷基二醇单烷基醚羧酸酯，（c）组：直链酮，支链酮，环酮，内酯和碳酸亚烷基酯，和（d）：乳酸酯，乙酸酯和烷氧基丙酸酯。

5. 发明授权

US07449282B2 Lithographic printing plate precursor 有权
标题翻译：平版印刷版前体
公开(公告)号：US07449282B2
公开(公告)日：2008-11-11
申请号：US11116399
申请日：2005-04-28
申请人： Akinori Shibuya
发明人： Akinori Shibuya
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/00 , G03F7/031 , G03F7/035 , Y10S430/134
摘要： A lithographic printing plate precursor comprising a photosensitive layer comprising: (A) a fluorescent brightening agent; (B) an activator compound being capable of inducing a chemical change by an interaction with light absorption of the fluorescent brightening agent to produce at least one of a radical, an acid and a base; (C) a compound being capable of undergoing a reaction by an effect of at least one of a radical, an acid and a base to irreversibly change in its physical or chemical properties; and (D) a polyurethane resin binder, wherein the polyurethane resin binder is synthesized from at least following compounds (i), (ii), (iii) and (iv): (i) a diisocyanate compound; (ii) a diol compound having at least one carboxyl group; (iii) a diol compound having a logP value of less than 0; and (iv) a diol compound having a logP value of 0 or more, with the proviso that each of the diol compound (iii) and the diol compound (iv) does not have a carboxyl group.
摘要翻译：包括感光层的平版印刷版原版包括：（A）荧光增白剂; （B）能够通过与荧光增白剂的光吸收相互作用而引起化学变化以产生基团，酸和碱中的至少一种的活化剂化合物; （C）能够通过自由基，酸和碱中的至少一种的作用进行反应的化合物，以不可逆地改变其物理或化学性质; 和（D）聚氨酯树脂粘合剂，其中所述聚氨酯树脂粘合剂由至少以下化合物（i），（ii），（iii）和（iv）合成：（i）二异氰酸酯化合物; （ii）具有至少一个羧基的二醇化合物; （iii）logP值小于0的二醇化合物; 和（iv）logP值为0以上的二醇化合物，条件是二醇化合物（iii）和二醇化合物（iv）中的每一个不具有羧基。

6. 发明申请

US20060204889A1 Photosensitive composition 审中-公开
标题翻译：感光组合物
公开(公告)号：US20060204889A1
公开(公告)日：2006-09-14
申请号：US11370036
申请日：2006-03-08
申请人： Akinori Shibuya , Youhei Ishiji
发明人： Akinori Shibuya , Youhei Ishiji
IPC分类号： G03C1/76
CPC分类号： G03F7/029 , G03F7/031
摘要： A photosensitive composition comprising (A) a sensitizing dye having a specific structure, (B) a initiating compound capable of generating a radical, an acid or a base, and (C) a polymerizable compound capable of reaction by at least one of a radical, an acid and a base.
摘要翻译：一种光敏组合物，其包含（A）具有特定结构的敏化染料，（B）能够产生自由基，酸或碱的引发化合物，和（C）能够通过至少一个基团，酸和碱。

7. 发明授权

US09316911B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition 有权
标题翻译：光化学射线或辐射敏感性树脂组合物，其中的光化射线或辐射敏感膜，以及使用组合物形成图案的方法
公开(公告)号：US09316911B2
公开(公告)日：2016-04-19
申请号：US13538246
申请日：2012-06-29
申请人： Tomoki Matsuda , Yoko Tokugawa , Akinori Shibuya
发明人： Tomoki Matsuda , Yoko Tokugawa , Akinori Shibuya
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/2041 , Y10T428/24802
摘要： An actinic-ray- or radiation-sensitive resin composition according to the present invention includes (A) a resin to be decomposed to increase its solubility in an alkali developer when acted on by an acid, and (B) a compound represented by the general formula (1-1) below.
摘要翻译：根据本发明的光化射线或辐射敏感性树脂组合物包括（A）待酸分解时增加其在碱显影剂中的溶解度的树脂，和（B）由通式公式（1-1）。

8. 发明授权

US09081277B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition 有权
标题翻译：光化学射线或辐射敏感性树脂组合物，其中的光化射线或辐射敏感膜，以及使用组合物形成图案的方法
公开(公告)号：US09081277B2
公开(公告)日：2015-07-14
申请号：US13520106
申请日：2011-12-22
申请人： Tomoki Matsuda , Akinori Shibuya , Yoko Tokugawa , Shuhei Yamaguchi , Mitsuhiro Fujita
发明人： Tomoki Matsuda , Akinori Shibuya , Yoko Tokugawa , Shuhei Yamaguchi , Mitsuhiro Fujita
IPC分类号： G03F7/004 , C07C381/12 , G03F7/039 , G03F7/20 , G03F7/11
CPC分类号： G03F7/0045 , C07C381/12 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： Provided are an actinic-ray- or radiation-sensitive resin composition that excels in the sensitivity, roughness characteristics and exposure latitude, and a method of forming a pattern using the same. The composition includes (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and (B) a compound that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, the compound being any of compounds of general formula (1-1) below.
摘要翻译：提供了在灵敏度，粗糙度特性和曝光宽容度方面优异的光化射线或辐射敏感性树脂组合物，以及使用其形成图案的方法。组合物包括（A）当被酸作用时分解的树脂，从而增加其在碱性显影剂中的溶解度，和（B）当暴露于光化射线或辐射时被分解从而产生酸的化合物该化合物是下述通式（1-1）的化合物中的任何一种。

9. 发明申请

US20120273924A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION 有权
标题翻译：抗紫外线或辐射敏感性树脂组合物，其抗紫外线或辐射敏感性膜及其使用组合物形成图案的方法
公开(公告)号：US20120273924A1
公开(公告)日：2012-11-01
申请号：US13520106
申请日：2011-12-22
申请人： Tomoki Matsuda , Akinori Shibuya , Yoko Tokugawa , Shuhei Yamaguchi , Mitsuhiro Fujita
发明人： Tomoki Matsuda , Akinori Shibuya , Yoko Tokugawa , Shuhei Yamaguchi , Mitsuhiro Fujita
IPC分类号： G03F7/027 , H01L21/311 , H01L29/02 , G03F7/20
CPC分类号： G03F7/0045 , C07C381/12 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： Provided are an actinic-ray- or radiation-sensitive resin composition that excels in the sensitivity, roughness characteristics and exposure latitude, and a method of forming a pattern using the same. The composition includes (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and (B) a compound that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, the compound being any of compounds of general formula (1-1) below.
摘要翻译：提供了在灵敏度，粗糙度特性和曝光宽容度方面优异的光化射线或辐射敏感性树脂组合物，以及使用其形成图案的方法。组合物包括（A）当被酸作用时分解的树脂，从而增加其在碱性显影剂中的溶解度，和（B）当暴露于光化射线或辐射时被分解从而产生酸的化合物该化合物是下述通式（1-1）的化合物中的任何一种。

10. 发明申请

US20110027716A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND METHOD OF FORMING PATTERN USING THE COMPOSITION 审中-公开
标题翻译：化合物或辐射敏感性树脂组合物，使用组合物形成图案的化合物和方法
公开(公告)号：US20110027716A1
公开(公告)日：2011-02-03
申请号：US12833668
申请日：2010-07-09
申请人： Shuhei YAMAGUCHI , Akinori Shibuya
发明人： Shuhei YAMAGUCHI , Akinori Shibuya
IPC分类号： G03F7/004 , C07D409/02 , G03F7/20 , C07D417/02 , C07D335/02 , C07D215/58 , C07C311/09 , C07C309/04 , C07D409/14 , C07D333/16
CPC分类号： C07D215/58 , C07C309/06 , C07C309/17 , C07C311/48 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D217/08 , C07D307/33 , C07D307/93 , C07D333/16 , C07D333/46 , C07D335/02 , C07D409/02 , C07D409/14 , C07D417/02 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds (A) of general formula (I) below that when exposed to actinic rays or radiation, generates an acid and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid. (The characters used in general formula (I) have the meanings mentioned in the description.)
摘要翻译：根据一个实施方案，光化射线或辐射敏感性树脂组合物包含以下通式（I）的化合物（A）中的任一种，当暴露于光化射线或辐射时，产生酸和树脂（B），其中通过酸的作用，溶解到碱性显影剂中的速率增加。（通式（I）中使用的字符具有说明书中提及的含义。）

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