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31. 发明授权

US4827127A Apparatus using charged particle beam 失效
标题翻译：使用带电粒子束的装置
公开(公告)号：US4827127A
公开(公告)日：1989-05-02
申请号：US922715
申请日：1986-10-24
申请人： Hideo Todokoro
发明人： Hideo Todokoro
IPC分类号： H01J37/10 , H01J37/04 , H01J37/147 , H01J37/15 , H01J37/26 , H01J37/28
CPC分类号： H01J37/268 , H01J37/04 , H01J37/15 , G01R31/307
摘要： An apparatus using a charged particle beam is disclosed which includes means for generating charged particles, means for accelerating the charged particles so that the charged particles have desired kinetic energy, lens means including at least one objective lens for focusing a charged particle beam formed of the accelerated, charged particles, on the surface of a specimen, scanning means for scanning the surface of the specimen two-dimensionally with the focused beam, detection means for detecting secondary electrons, reflected electrons, X-rays and light, all of which emerge from the surface of the specimen, objective lens moving means for moving an objective lens nearest to the specimen, and deflection means linked with the objective lens moving means for deflecting the charged particle beam so that the charged particle beam carries out parallel displacement at the objective lens by an amount corresponding to the moving distance of the objective lens.
摘要翻译：公开了一种使用带电粒子束的装置，其包括用于产生带电粒子的装置，用于加速带电粒子以使带电粒子具有期望动能的装置，透镜装置包括至少一个物镜，用于聚焦由在样品表面上加速带电的颗粒，用聚焦光束二维扫描样品的扫描装置的扫描装置，用于检测二次电子，反射电子，X射线和光的检测装置，所有这些都从样本表面，用于移动最接近样本的物镜的物镜移动装置以及与物镜移动装置连接的偏转装置，用于偏转带电粒子束，使得带电粒子束在物镜处执行平行位移相当于物镜的移动距离的量。

32. 发明授权

US4629889A Potential analyzer 失效
标题翻译：电位分析仪
公开(公告)号：US4629889A
公开(公告)日：1986-12-16
申请号：US623083
申请日：1984-06-21
申请人： Hideo Todokoro , Satoru Fukuhara
发明人： Hideo Todokoro , Satoru Fukuhara
IPC分类号： G01N23/225 , G01R19/00 , G01R31/302 , G01R31/305 , H01J37/244 , H01J37/26 , H01J37/28 , H01L21/66 , G01N23/00
CPC分类号： G01R31/305 , H01J37/268
摘要： A potential analyzer for analyzing a potential at a specimen such as an LSI device or the like. This analyzer comprises: a detector to detect secondary electrons to be emitted from a specimen by radiating a primary electron beam thereto; a retarding grid, provided between the specimen and the detector, for controlling a detection amount of the secondary electrons; a circuit for applying a voltage to the retarding grid to keep the output of the secondary electron detector at a constant value; and a setting circuit for automatically setting the gain of the detector so as to allow an operating range of the voltage to the retarding grid to be within a specified value.
摘要翻译：用于分析诸如LSI器件等的样本的电位的电位分析器。该分析器包括：检测器，用于通过向其发射一次电子束来检测从样品发射的二次电子; 设置在样本和检测器之间的延迟栅格，用于控制二次电子的检测量; 用于向延迟栅格施加电压以将二次电子检测器的输出保持在恒定值的电路; 以及设定电路，用于自动设定检测器的增益，以使得延迟电网电压的工作范围在规定值内。

33. 发明授权

US4382182A Method of displaying an image of phase contrast in a scanning transmission electron microscope 失效
标题翻译：在扫描透射电子显微镜中显示相位差图像的方法
公开(公告)号：US4382182A
公开(公告)日：1983-05-03
申请号：US266290
申请日：1981-05-22
申请人： Takashi Matsuzaka , Hideo Todokoro
发明人： Takashi Matsuzaka , Hideo Todokoro
IPC分类号： H01J37/22 , H01J37/244 , H01J37/26 , H01J37/28
CPC分类号： H01J37/28
摘要： A method of and apparatus for displaying an image of phase contrast in a scanning transmission electron microscope, in which an electron beam flux transmitted through a specimen is deflected with a high frequency and repeatedly moved on an aperture provided in a region where a transmitted electron beam and a scattered electron beam interfere, and among signal components detected by a detector through the aperture, only a signal synchronous with the high frequency is sampled and detection-rectified, whereby the difference of the intensities of the region where both the electron beams interfere is detected so as to display the image of phase contrast of the specimen.
摘要翻译：一种用于在扫描透射电子显微镜中显示相位对比度的图像的方法和装置，其中透射通过样本的电子束通量以高频率偏转并在设置在透射电子束的区域中的孔上重复移动并且散射电子束干扰，并且在通过孔径由检测器检测的信号分量中，仅对与高频同步的信号进行采样和检测整流，由此两个电子束干涉的区域的强度差为以便显示样本的相位对比度的图像。

34. 发明授权

US4274035A Field emission electron gun 失效
标题翻译：场发射电子枪
公开(公告)号：US4274035A
公开(公告)日：1981-06-16
申请号：US056527
申请日：1979-07-11
申请人： Satoru Fukuhara , Hideo Todokoro , Yoshio Sakitani
发明人： Satoru Fukuhara , Hideo Todokoro , Yoshio Sakitani
IPC分类号： G01Q90/00 , H01J37/073 , G21K7/00
CPC分类号： H01J37/073
摘要： A field emission electron gun including a cathode, a control electrode which is disposed in the vicinity of the cathode, an anode which is disposed for accelerating electrons emitted from the cathode, and a source of a D.C. voltage to be applied between the cathode and the anode. Also, there is provided a switching arrangement capable of changing-over a potential of the control electrode between ground potential and a potential of the cathode, and an arrangement capable of varying relative positions of the cathode and the control electrode.
摘要翻译：一种场发射电子枪，包括阴极，设置在阴极附近的控制电极，设置用于加速从阴极发射的电子的阳极和施加在阴极和阴极之间的直流电压源阳极。此外，提供了一种切换装置，其能够切换控制电极的接地电位和阴极的电位之间的电位，以及能够改变阴极和控制电极的相对位置的装置。

35. 发明授权

US07982188B2 Apparatus and method for wafer pattern inspection 有权
标题翻译：晶圆图案检查的装置和方法
公开(公告)号：US07982188B2
公开(公告)日：2011-07-19
申请号：US11336895
申请日：2006-01-23
申请人： Hiroyuki Shinada , Hisaya Murakoshi , Hideo Todokoro , Hiroshi Makino , Yoshihiro Anan
发明人： Hiroyuki Shinada , Hisaya Murakoshi , Hideo Todokoro , Hiroshi Makino , Yoshihiro Anan
IPC分类号： G21K7/00
CPC分类号： H01J37/29 , H01J2237/2817
摘要： An electric field for decelerating an electron beam is formed on a surface of a sample semiconductor to be inspected, an electron beam having a specific area (a sheet electron beam) and containing a component having such an energy as not to reach the surface of the sample semiconductor is reflected in the very vicinity of the surface of the sample semiconductor by action of the electric field for deceleration and then forms an image through an imaging lens. Thus images of plural fields on the surface of the sample semiconductor are obtained and are stored in image memory units. By comparing the stored images of the plural fields with one another, the presence and position of a defect in the fields are determined.
摘要翻译：在要检查的样品半导体的表面上形成用于减小电子束的电场，具有特定面积的电子束（片状电子束）并且包含具有不能到达表面的能量的成分通过用于减速的电场的作用，样品半导体在样品半导体的表面的非常附近被反射，然后通过成像透镜形成图像。因此，获得样品半导体表面上的多个场的图像并将其存储在图像存储单元中。通过将存储的多个场的图像相互比较，确定场中的缺陷的存在和位置。

36. 发明授权

US07642514B2 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US07642514B2
公开(公告)日：2010-01-05
申请号：US12005387
申请日：2007-12-27
申请人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
发明人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
IPC分类号： H01J37/21
CPC分类号： G06T5/002 , G06T5/003 , G06T5/20 , G06T5/50 , G06T7/13 , G06T7/62 , G06T2207/10061 , G06T2207/30148 , H01J37/21 , H01J37/222 , H01J37/28 , H01J2237/21 , H01J2237/216 , H01J2237/221 , H01J2237/226 , H01J2237/281 , H01J2237/2815 , H01J2237/2817
摘要： It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the sample based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.
摘要翻译：本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的聚焦条件的装置，用于检测从所述样品的表面部分照射的带电粒子的带电粒子检测器，发射的带电粒子束，以及用于基于所述带电粒子束聚焦的信号来组合样品的表面部分的二维图像的装置，所述信号在从带电粒子检测器输出的信号中。

37. 发明申请

US20090057556A1 METHOD AND APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON BEAM 失效
标题翻译：使用电子束检测系统的方法和装置
公开(公告)号：US20090057556A1
公开(公告)日：2009-03-05
申请号：US12211343
申请日：2008-09-16
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译：通过提供新颖的检查方法和采用这种新方法的检测装置，本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置，该方法能够提高扫描样本的速度作为半导体晶片。本发明提供的检验新颖方法包括以下步骤：产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子，并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。

38. 发明申请

US20080302962A1 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US20080302962A1
公开(公告)日：2008-12-11
申请号：US12155038
申请日：2008-05-29
申请人： Noritsugu Takahashi , Muneyuki Fukuda , Hideo Todokoro , Mitsugu Sato
发明人： Noritsugu Takahashi , Muneyuki Fukuda , Hideo Todokoro , Mitsugu Sato
IPC分类号： G01N23/225
CPC分类号： G01N23/225 , H01J37/265 , H01J37/28 , H01J2237/221
摘要： The invention provides a charged particle beam apparatus capable of preventing image errors in a display image and capturing a clear display image. A display image displayed on a display unit has a rectangular shape having sides that are substantially parallel to coordinate axes of a rectangular coordinate system determined by wafer alignment. A charged particle beam is radiated onto an area including a display image in a direction that is not parallel to the coordinate axes of the reference rectangular coordinate system to scan the area. Then, among image information obtained by scanning, only information of a position within the display image is displayed on the image display unit. In this way, a clear display image without brightness variation is obtained.
摘要翻译：本发明提供一种能够防止显示图像中的图像错误并捕获清晰显示图像的带电粒子束装置。在显示单元上显示的显示图像具有与由晶片对准确定的直角坐标系的坐标轴基本平行的侧面的矩形。带电粒子束在与平行于参考直角坐标系的坐标轴不平行的方向上辐射到包括显示图像的区域上以扫描该区域。然后，在通过扫描获得的图像信息中，只有显示图像中的位置的信息被显示在图像显示单元上。以这种方式，可以获得没有亮度变化的清晰显示图像。

39. 发明授权

US07408172B2 Charged particle beam apparatus and charged particle beam irradiation method 有权
标题翻译：带电粒子束装置和带电粒子束照射法
公开(公告)号：US07408172B2
公开(公告)日：2008-08-05
申请号：US11841411
申请日：2007-08-20
申请人： Mitsugu Sato , Hideo Todokoro , Yoichi Ose , Makoto Ezumi , Noriaki Arai , Takashi Doi
发明人： Mitsugu Sato , Hideo Todokoro , Yoichi Ose , Makoto Ezumi , Noriaki Arai , Takashi Doi
IPC分类号： H01J37/317
CPC分类号： H01J37/153 , H01J2237/1506 , H01J2237/1534 , H01J2237/28
摘要： A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such than an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.
摘要翻译：当束相对于样品倾斜时，带电粒子束装置的分辨率几乎不降低。主光束4的轨迹被偏转器偏转或者被可动孔径改变，使得光束入射到多个透镜6和7的轴线上。提供了一种用于控制光束的离轴轨迹的装置，例如当光束倾斜时由物镜7产生的像差可以被另一透镜6产生的像差消除。

40. 发明授权

US07372028B2 Sample electrification measurement method and charged particle beam apparatus 有权
公开(公告)号：US07372028B2
公开(公告)日：2008-05-13
申请号：US11429237
申请日：2006-05-08
申请人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
发明人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices.To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.

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