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1. 发明申请

US20090057556A1 METHOD AND APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON BEAM 失效
标题翻译：使用电子束检测系统的方法和装置
公开(公告)号：US20090057556A1
公开(公告)日：2009-03-05
申请号：US12211343
申请日：2008-09-16
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译：通过提供新颖的检查方法和采用这种新方法的检测装置，本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置，该方法能够提高扫描样本的速度作为半导体晶片。本发明提供的检验新颖方法包括以下步骤：产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子，并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。

2. 发明授权

US06987265B2 Method and an apparatus of an inspection system using an electron beam 失效
公开(公告)号：US06987265B2
公开(公告)日：2006-01-17
申请号：US10083481
申请日：2002-02-27
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.

3. 发明授权

US06512227B2 Method and apparatus for inspecting patterns of a semiconductor device with an electron beam 有权
公开(公告)号：US06512227B2
公开(公告)日：2003-01-28
申请号：US09982965
申请日：2001-10-22
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Atsuko Takafuji , Hiroshi Toyama , Katsuya Sugiyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Atsuko Takafuji , Hiroshi Toyama , Katsuya Sugiyama
IPC分类号： G01N2300
CPC分类号： H01J37/28 , G01N23/04 , H01J2237/2817
摘要： An object of the present invention is to provide an inspection method using an electron beam and an inspection apparatus therefor, which are capable of enhancing the resolution, improving the inspection speed and reliability, and realizing miniaturization the apparatus. To achieve the above object, according to the present invention, there is provided an inspection method using an electron beam, including the steps of; applying a voltage on a sample via a sample stage; converging an electron beam on the sample; scanning the sample with the converged electron beam and simultaneously, continuously moving the sample stage; detecting charged particles generated from the sample; and detecting a defect on the sample on the basis of the detected charged particles; wherein a distance between the sample and the shield frame is determined on the basis of a critical discharge between the sample stage and the shield frame; coils of at least hexapoles for correcting the shape of an electron beam are provided; the electron beam is deflected for blanking during movement of the sample with the crossover of the electron beam taken as a fulcrum of blanking; or the magnitude of the voltage applied to the sample may be determined depending on the kind of sample.

4. 发明授权

US07232996B2 Method and an apparatus of an inspection system using an electron beam 失效
标题翻译：使用电子束的检查系统的方法和装置
公开(公告)号：US07232996B2
公开(公告)日：2007-06-19
申请号：US11319279
申请日：2005-12-29
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译：通过提供新颖的检查方法和采用这种新方法的检测装置，本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置，该方法能够提高扫描样本的速度作为半导体晶片。本发明提供的检验新颖方法包括以下步骤：产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子，并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。

5. 发明授权

US4687931A Scanning electron microscope 失效
标题翻译：扫描电子显微镜
公开(公告)号：US4687931A
公开(公告)日：1987-08-18
申请号：US857234
申请日：1986-04-29
申请人： Satoru Fukuhara , Hideo Todokoro
发明人： Satoru Fukuhara , Hideo Todokoro
IPC分类号： H01J37/20 , H01J37/28
CPC分类号： H01J37/20 , H01J37/28
摘要： Herein disclosed is a scanning electron microscope in which an electron beam is finely focused into a small beam diameter and irradiated on a specimen so that the focused electron beam may scan two-dimensionally to obtain an image with signals of secondary electrons generated from the specimen. The scanning electron microscope is equipped with means for making the moving speed of a specimen stage, which is movable two-dimensionally in response to electric control signals, automatically variable in association with the magnification of the image.
摘要翻译：这里公开的是扫描电子显微镜，其中电子束被精细地聚焦成小的光束直径并照射在样本上，使得聚焦的电子束可以二维地扫描以获得具有从样本产生的二次电子的信号的图像。扫描电子显微镜配备有用于使得能够根据电气控制信号二维移动的样本台的移动速度的装置，与图像的放大倍数相关联地可自动变化。

6. 发明授权

US4355232A Apparatus for measuring specimen potential in electron microscope 失效
标题翻译：用电子显微镜测量样品电位的仪器
公开(公告)号：US4355232A
公开(公告)日：1982-10-19
申请号：US152843
申请日：1980-05-23
申请人： Hideo Todokoro , Satoru Fukuhara , Yoshio Sakitani
发明人： Hideo Todokoro , Satoru Fukuhara , Yoshio Sakitani
IPC分类号： G01R19/00 , G01N23/225 , G01R31/302 , G01R31/305 , H01J37/22 , H01J37/244 , H01J37/28 , H01J49/06 , G01N23/00 , H01J37/00
CPC分类号： H01J37/244 , G01R31/305 , H01J2237/2443 , H01J2237/2448 , H01J2237/2449 , H01J2237/24507
摘要： An apparatus for measuring the specimen potential in an electron microscope includes a first grid arranged to enclose a specimen which is to be irradiated with a primary charged particle beam emitted from the electron source of the electron microscope and to which is supplied a voltage sufficient to attract the secondary electrons emitted from the specimen. A second grid supplied with a voltage sufficient to analyze the energy of the secondary electrons which have passed through the first grid is disposed outside the first grid, and a secondary electron detecting arrangement for detecting the secondary electrons which have passed through the second grid is disposed adjacent the second grid. A current detecting arrangement partly for impressing the voltage upon the first grid and partly for detecting the current flowing through the first grid is provided along with a dividing and amplifying arrangement for dividing the output of the secondary electron detecting arrangement by the output of the current detecting arrangement, whereby the potential at said specimen of the electron microscope is measured with increased sensitivity.
摘要翻译：用于在电子显微镜中测量样本电位的装置包括：第一栅格，其布置成围绕从电子显微镜的电子源发射的被照射的初级带电粒子束的样本，并且被提供足以吸引的电压从样品发射的二次电子。提供有足以分析已经通过第一栅极的二次电子的能量的电压的第二栅极设置在第一栅极的外部，并且设置用于检测已经通过第二栅极的二次电子的二次电子检测装置毗邻第二格。电流检测装置部分地用于将电压施加在第一栅极上并且部分地用于检测流过第一栅极的电流，以及用于将二次电子检测装置的输出除以电流检测的输出的分频和放大装置排列，由此以增加的灵敏度测量电子显微镜的所述样本的电位。

7. 发明申请

US20120132801A1 METHOD AND AN APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON BEAM 有权
标题翻译：使用电子束检测系统的方法和装置
公开(公告)号：US20120132801A1
公开(公告)日：2012-05-31
申请号：US13366874
申请日：2012-02-06
申请人： Yuko IWABUCHI , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko IWABUCHI , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译：通过提供新颖的检查方法和采用这种新方法的检测装置，本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置，该方法能够提高扫描样本的速度作为半导体晶片。本发明提供的检验新颖方法包括以下步骤：产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子，并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用所存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。

8. 发明授权

US07439506B2 Method and an apparatus of an inspection system using an electron beam 失效
标题翻译：使用电子束的检查系统的方法和装置
公开(公告)号：US07439506B2
公开(公告)日：2008-10-21
申请号：US11798239
申请日：2007-05-11
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： H01J37/256 , H01J37/244
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译：通过提供新颖的检查方法和采用这种新方法的检测装置，本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置，该方法能够提高扫描样本的速度作为半导体晶片。本发明提供的检验新颖方法包括以下步骤：产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子，并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用所存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。

9. 发明授权

US5093616A Voltage measurement method using electron beam 失效
标题翻译：使用电子束的电压测量方法
公开(公告)号：US5093616A
公开(公告)日：1992-03-03
申请号：US580532
申请日：1990-09-11
申请人： Shigemitsu Seitoh , Hideo Todokoro , Satoru Fukuhara , Hiroyuki Shinada
发明人： Shigemitsu Seitoh , Hideo Todokoro , Satoru Fukuhara , Hiroyuki Shinada
IPC分类号： H01J37/28 , G01R31/305
CPC分类号： G01R31/305
摘要： An electron beam is irradiated on a sample to generate secondary electrons from the sample, the secondary electrons are detected by a secondary electron detector through a retarding grid to provide a secondary electron detector output signal, the relation is acquired in advance between a known sample voltage and a value (normalized secondary electron signal for the known sample voltage) resulting from dividing a differential value of the secondary electron detector output signal at a retarding grid voltage by the secondary electron detector output signal, and this relation is retrieved with a normalized secondary electron signal obtained with an unknown sample voltage to determine an absolute value of the unknown sample voltage.
摘要翻译：电子束被照射在样品上以从样品产生二次电子，二次电子通过延迟栅格由二次电子检测器检测，以提供二次电子检测器输出信号，该关系在已知的采样电压以及通过二次电子检测器输出信号将延迟电网电压的二次电子检测器输出信号的微分值除以由二次电子检测器输出信号分离得到的值（已知样品电压的归一化二次电子信号），并且用归一化二次电子用未知样品电压获得的信号，以确定未知样品电压的绝对值。

10. 发明授权

US4581534A Image display system for a stroboscopic scanning electron microscope 失效
标题翻译：用于频闪扫描电子显微镜的图像显示系统
公开(公告)号：US4581534A
公开(公告)日：1986-04-08
申请号：US517818
申请日：1983-07-27
申请人： Hideo Todokoro , Satoru Fukuhara
发明人： Hideo Todokoro , Satoru Fukuhara
IPC分类号： H01J37/22 , G01R31/302 , H01J37/24 , H01J37/26 , H01J37/28 , H01L21/66 , G01N23/225
CPC分类号： H01J37/24 , H01J37/268
摘要： This invention relates to an image display system for a stroboscopic scanning electron microscope. In a stroboscopic scanning electron microscope having a pulse gate mechanism for chopping an electron beam and a mechanism for arbitrarily changing the phase relation between a voltage applied to a sample and the chopping, the phase change of chopping is carried out periodically and continuously and a gate circuit provided between a detector for detecting scondary electrons or deflected electrons and an image display for displaying a video signal of the secondary electron or the reflected electron to be in synchronism with the phase change allows the video signal to pass therethrough only during a certain period of phase change and to be displayed.
摘要翻译：本发明涉及一种用于频闪扫描电子显微镜的图像显示系统。在具有用于斩波电子束的脉冲门机构的频闪扫描电子显微镜和用于随意改变施加到样本的电压与斩波之间的相位关系的机构中，切断相位周期性且连续地进行，在用于检测硬质电子或偏转电子的检测器之间提供的电路以及用于显示与相变同步的二次电子或反射电子的视频信号的图像显示器允许视频信号仅在一定时间段内通过相变并显示。

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