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31. 发明申请

US20100315609A1 Maintenance method, maintenance device, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US20100315609A1
公开(公告)日：2010-12-16
申请号：US12805715
申请日：2010-08-16
申请人： Tomoharu Fujiwara , Yasufumi Nishii , Kenichi Shiraishi
发明人： Tomoharu Fujiwara , Yasufumi Nishii , Kenichi Shiraishi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70925 , G03F7/70975
摘要： An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is cleaned.

32. 发明授权

US07804576B2 Maintenance method, maintenance device, exposure apparatus, and device manufacturing method 有权
标题翻译：维护方法，维护装置，曝光装置和装置制造方法
公开(公告)号：US07804576B2
公开(公告)日：2010-09-28
申请号：US11662452
申请日：2005-12-05
申请人： Tomoharu Fujiwara , Yasufumi Nishii , Kenichi Shiraishi
发明人： Tomoharu Fujiwara , Yasufumi Nishii , Kenichi Shiraishi
IPC分类号： G03B27/52 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70925 , G03F7/70975
摘要： An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is cleaned.
摘要翻译：曝光装置设置有喷嘴构件，喷嘴构件具有供应液体的供给出口和回收液体的收集口中的至少一个。通过将喷嘴部件浸渍在容纳在容器内的清洗液LK中，对喷嘴部件进行清洗。

33. 发明授权

US07557900B2 Exposure apparatus, device manufacturing method, maintenance method, and exposure method 有权
标题翻译：曝光装置，装置制造方法，维护方法和曝光方法
公开(公告)号：US07557900B2
公开(公告)日：2009-07-07
申请号：US10588146
申请日：2005-02-08
申请人： Kenichi Shiraishi
发明人： Kenichi Shiraishi
IPC分类号： G03B27/42 , G03B27/52 , G03B27/32
CPC分类号： G03F7/70341
摘要： An exposure apparatus can prevent disadvantages of supplying liquid of reduced cleanliness and formation of watermarks. The exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (LQ), and includes a liquid supply mechanism (10) for supplying the liquid (LQ), and a measuring device (60) which measures a time during which the supply of the liquid from the liquid supply mechanism is stopped (10).
摘要翻译：曝光装置可以防止提供降低清洁度和形成水印的液体的缺点。曝光装置（EX）通过投影光学系统（PL）和液体（LQ）将曝光光（EL）照射到基板（P）上而曝光基板（P），并且包括液体供给机构供给液体（LQ）和测量装置（60），其测量从液体供给机构供给的液体停止的时间（10）。

34. 发明申请

US20090115977A1 Exposure Apparatus, Exposure Method, and Device Manufacturing Method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20090115977A1
公开(公告)日：2009-05-07
申请号：US11887584
申请日：2006-04-17
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70858 , G03F7/70891
摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.
摘要翻译：曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

35. 发明申请

US20080215295A1 Method Of Analysis, Exposure Apparatus, And Exposure Apparatus System 审中-公开
标题翻译：分析方法，曝光装置和曝光装置系统
公开(公告)号：US20080215295A1
公开(公告)日：2008-09-04
申请号：US11587824
申请日：2005-04-25
申请人： Kenichi Shiraishi
发明人： Kenichi Shiraishi
IPC分类号： G06F17/40
CPC分类号： G03F9/7003 , G03F7/70525 , G03F7/70533 , G03F7/70625 , G03F7/70633
摘要： The present invention provides a method of analysis enabling easy and suitable analysis of measurement data relating to the production of devices and dependent on the recipe or combination of processing units. According to the method, for example the line width precision, overlay precision, and other characteristics of the results of exposure are detected from the results of exposure for different lots and those characteristics are classified linked with for example the recipes at the time of the exposure processing exhibiting those characteristics and the processing units or combinations thereof in the exposure apparatus or track. Further, based on the classified results, whether the characteristics of the results of exposure are dependent on the specific recipe or processing units is judged. When there is dependency, when a lot using that recipe or processing unit is subsequently loaded, a warning is issued or automatic correction is performed to prevent processing with poor precision.
摘要翻译：本发明提供了一种分析方法，其能够容易且适当地分析与生产装置有关的测量数据，并且取决于配方或处理单元的组合。根据该方法，例如根据不同批次的曝光结果检测曝光结果的线宽精度，叠加精度和其他特性，并且将这些特征与例如曝光时的配方相关联在曝光装置或轨道中展现这些特征的处理和处理单元或其组合。此外，基于分类结果，判断曝光结果的特性是否取决于特定配方或处理单元。当有依赖性时，当随后加载大量使用该配方或处理单元时，发出警告或执行自动校正以防止精度差的处理。

36. 发明申请

US20070247600A1 EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20070247600A1
公开(公告)日：2007-10-25
申请号：US11767425
申请日：2007-06-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译：提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板投影光学系统的像平面附近。

37. 发明申请

US20070064210A1 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20070064210A1
公开(公告)日：2007-03-22
申请号：US11603078
申请日：2006-11-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译：提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板投影光学系统的像平面附近。

38. 发明申请

US20060139614A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US20060139614A1
公开(公告)日：2006-06-29
申请号：US11297324
申请日：2005-12-09
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.

39. 发明授权

US07043026B1 Method for removing AM neighboring interference and a circuit for the same 有权
标题翻译：用于去除AM相邻干扰的方法和用于其的电路
公开(公告)号：US07043026B1
公开(公告)日：2006-05-09
申请号：US09247826
申请日：1999-02-11
申请人： Kenichi Shiraishi , Atsushi Shinoda
发明人： Kenichi Shiraishi , Atsushi Shinoda
IPC分类号： H04H5/00 , H04B1/10
CPC分类号： H04H40/36 , H04B1/1018
摘要： An AM neighboring interference removing method and circuit is provided which can select only a desired AM modulation wave even if an interference AM modulation wave is partially superposed upon the desired AM modulation wave. An AM modulation wave desired to be received is multiplied at multipliers by local oscillation signals having frequencies 3fc/2 and fc/2 where fc is the carrier frequency of a neighboring interference AM modulation wave. High frequency components contained in the outputs of the multipliers are removed by low-pass filters. Of the outputs of the low-pass filters, the carrier frequency of the neighboring interference wave is fc/2 and the AM carrier frequencies of the AM stereo modulation wave are (fc/2+fα) and (fc/2−fα), where fα is a difference frequency between the AM carrier frequency of the AM stereo modulation wave and the carrier frequency of the neighboring interference wave. A subtractor subtracts the output of one of the low-pass filter from the output of the other to thereby cancel out the neighboring interference wave. This subtraction signal is passed through a low-pass filter having a cut-off frequency of fc/2 to derive only the AM stereo modulation wave.
摘要翻译：提供了一种AM相邻干扰去除方法和电路，其即使干扰AM调制波部分地叠加在期望的AM调制波上也可以仅选择期望的AM调制波。需要接收的AM调制波通过具有频率3fc / 2和fc / 2的本地振荡信号乘以乘法器，其中fc是相邻干扰AM调制波的载波频率。通过低通滤波器去除乘法器的输出中包含的高频分量。在低通滤波器的输出中，相邻干扰波的载波频率为fc / 2，AM立体声调制波的AM载波频率为（fc / 2 + falpha）和（fc / 2-falpha），其中falpha是AM立体声调制波的AM载波频率与相邻干扰波的载波频率之间的差分频率。减法器从另一个的输出中减去一个低通滤波器的输出，从而抵消相邻的干扰波。该减法信号通过具有截止频率fc / 2的低通滤波器，仅导出AM立体声调制波。

40. 发明授权

US06772378B1 Dummy error addition circuit 失效
标题翻译：虚假误差加法电路
公开(公告)号：US06772378B1
公开(公告)日：2004-08-03
申请号：US09807029
申请日：2001-04-09
申请人： Kenichi Ishihara , Kenichi Shiraishi , Soichi Shinjo , Akihiro Horii
发明人： Kenichi Ishihara , Kenichi Shiraishi , Soichi Shinjo , Akihiro Horii
IPC分类号： G06F1100
CPC分类号： H04L1/00 , H04L1/0003 , H04L1/241
摘要： A dummy error addition circuit for adding a dummy error to an orthogonal modulation symbol data, wherein a value based on a specified bit error rate is loaded to count clock signals at a counter (11), a carrier of the counter (11) stores outputs from a PN data generator (21) in a shift register (22), outputs from a PN comparison circuit (3) when stored data agree with count values of the counter (11) are recognized as error pulses, a bit selector (40) randomly selects, on receiving error pulses and based on outputs from a PN data generator (41), bits to which to add errors in an orthogonal modulation data, e.g. a PSK modulation symbol data, at interval based on a bit error rate, and bits selected from the orthogonal modulation data are inverted in a bit inversion circuit (5) for outputting to thereby add errors.
摘要翻译：一种用于向正交调制符号数据添加虚拟错误的虚拟错误添加电路，其中基于指定的误码率的值被加载以对计数器（11）计数时钟信号，计数器（11）的载波存储输出当存储与计数器（11）的计数值一致的数据被识别为误差脉冲时，从PN比较电路（3）输出来自移位寄存器（22）中的PN数据发生器（21）的位选择器（40）在接收到错误脉冲并基于PN数据生成器（41）的输出时，随机地选择在正交调制数据中添加错误的位，例如基于比特误码率的间隔的PSK调制符号数据和从正交调制数据中选择的比特在比特反相电路（5）中反转，从而输出错误。

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