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31. 发明授权

US08865258B2 Method of manufacturing thin film which suppresses unnecessary scattering and deposition of a source material 有权
标题翻译：制造薄膜的方法，其抑制源材料的不必要的散射和沉积
公开(公告)号：US08865258B2
公开(公告)日：2014-10-21
申请号：US13392433
申请日：2011-06-01
申请人： Kazuyoshi Honda , Kunihiko Bessho , Takashi Shimada
发明人： Kazuyoshi Honda , Kunihiko Bessho , Takashi Shimada
IPC分类号： C23C14/00 , C23C14/24 , C23C14/56 , C23C14/54
CPC分类号： C23C14/24 , C23C14/243 , C23C14/542 , C23C14/562 , H01M4/0423 , H01M4/1391 , H01M4/1395
摘要： The present invention provides a thin film manufacturing method which realizes stable, highly-efficient film formation using a nozzle-type evaporation source while avoiding unnecessary scattering and deposition of a film formation material after the termination of the film formation. Used is a film forming apparatus including: an evaporation chamber 16; a film forming chamber 17 in which a substrate 21 is provided; an evaporation source 19 holding a film formation material 15 and including an opening surface 14; a moving mechanism 35 configured to cause the evaporation source 19 to move; and a conductance variable structure 34. The film formation is performed in a state where the opening surface 14 of the evaporation source 19 holding the heated film formation material is located close to the substrate 21 while evacuating the evaporation chamber 16 and the film forming chamber 17 without shutting off communication between the evaporation chamber 16 and the film forming chamber 17 by the conductance variable structure 34. Next, the evaporation of the film formation material is suppressed by introducing a nonreactive gas to the evaporation chamber 16 and the film forming chamber 17 to adjust pressure in each chamber to predetermined pressure or more. Then, the evaporation source 19 is moved by the moving mechanism 35 such that the opening surface 14 is located away from the substrate 21. The conductance variable structure is activated to shut off the communication between these chambers, and the film formation material is cooled while continuously introducing the nonreactive gas to the evaporation chamber 16.
摘要翻译：本发明提供一种薄膜制造方法，其使用喷嘴型蒸发源实现稳定，高效的成膜，同时避免成膜材料终止后不必要的成膜材料的散射和沉积。使用的成膜装置包括：蒸发室16; 设置有基板21的成膜室17; 保持成膜材料15并包括开口表面14的蒸发源19; 构造成使蒸发源19移动的移动机构35; 和导电可变结构34.成膜是在保持加热成膜材料的蒸发源19的开口表面14位于靠近基板21的同时抽空蒸发室16和成膜室17的状态下进行的而不用电导可变结构34关闭蒸发室16和成膜室17之间的连通。接下来，通过向蒸发室16和成膜室17引入非反应性气体来抑制成膜材料的蒸发，将每个室中的压力调节至预定压力或更大。然后，蒸发源19被移动机构35移动，使得开口表面14远离基板21.导电可变结构被激活以切断这些室之间的连通，并且成膜材料被冷却，同时将非反应性气体连续引入蒸发室16。

32. 发明授权

US08455070B2 Hinged carriage case for electronical parts having antistatic properties 有权
标题翻译：具有抗静电性能的电子部件的铰链托架
公开(公告)号：US08455070B2
公开(公告)日：2013-06-04
申请号：US12451787
申请日：2008-05-30
申请人： Ken Nagai , Takashi Shimada , Yoshiyuki Nakajima
发明人： Ken Nagai , Takashi Shimada , Yoshiyuki Nakajima
IPC分类号： B65D85/30 , B65D85/86
CPC分类号： B65D43/164 , B65D43/022 , B65D2213/02 , B65D2543/00101 , B65D2543/00296 , B65D2543/00518 , B65D2543/00546 , B65D2585/86 , C08G65/336 , C08L83/04 , C09J171/02 , H05K9/0067 , Y10T428/13 , Y10T428/1352
摘要： A carriage case, in which electronical parts are received for transportation, is provided as being capable of securely holding such parts therein and preventing them from being damaged and hampering dust from attaching on them with the removal of electrostatic charge and reducing gas detrimental to such parts to the minimum. The carriage case comprises: a case body having a base member and a cover member; and a sheet member that is made from an adhesive material of curable composition essentially consisting of component (A): a polyoxyalkylene based polymer having more than one alkenyl groups in one molecule, component (B): a compound having at least two hydrosilyl groups in one molecule and component (C): a hydrosilylation catalyst. The sheet member is applied on an inner bottom side surface of the base member and on the sheet member. The parts are attached so as to be securely positioned in the case.
摘要翻译：提供电子部件用于运输的托架壳体，其能够可靠地将这些部件保持在其中并防止其被损坏并且阻止灰尘附着在它们上，同时除去静电荷并减少对这些部件有害的气体到最小。托架壳体包括：壳体，其具有基部构件和盖构件; 以及由基本上由组分（A）组成的可固化组合物的粘合剂材料制成的片材构件：在一个分子中具有多个烯基的聚氧化烯系聚合物，成分（B）：具有至少两个氢化甲硅烷基的化合物一种分子和组分（C）：氢化硅烷化催化剂。片状构件被施加在基底构件的内底侧表面上和片构件上。这些部件被安装成可靠地定位在壳体中。

33. 发明申请

US20120148746A1 METHOD OF MANUFACTURING THIN FILM 有权
标题翻译：制造薄膜的方法
公开(公告)号：US20120148746A1
公开(公告)日：2012-06-14
申请号：US13392433
申请日：2011-06-01
申请人： Kazuyoshi Honda , Kunihiko Bessho , Takashi Shimada
发明人： Kazuyoshi Honda , Kunihiko Bessho , Takashi Shimada
IPC分类号： C23C16/448 , C23C16/455
CPC分类号： C23C14/24 , C23C14/243 , C23C14/542 , C23C14/562 , H01M4/0423 , H01M4/1391 , H01M4/1395
摘要： The present invention provides a thin film manufacturing method which realizes stable, highly-efficient film formation using a nozzle-type evaporation source while avoiding unnecessary scattering and deposition of a film formation material after the termination of the film formation. Used is a film forming apparatus including: an evaporation chamber 16; a film forming chamber 17 in which a substrate 21 is provided; an evaporation source 19 holding a film formation material 15 and including an opening surface 14; a moving mechanism 35 configured to cause the evaporation source 19 to move; and a conductance variable structure 34. The film formation is performed in a state where the opening surface 14 of the evaporation source 19 holding the heated film formation material is located close to the substrate 21 while evacuating the evaporation chamber 16 and the film forming chamber 17 without shutting off communication between the evaporation chamber 16 and the film forming chamber 17 by the conductance variable structure 34. Next, the evaporation of the film formation material is suppressed by introducing a nonreactive gas to the evaporation chamber 16 and the film forming chamber 17 to adjust pressure in each chamber to predetermined pressure or more. Then, the evaporation source 19 is moved by the moving mechanism 35 such that the opening surface 14 is located away from the substrate 21. The conductance variable structure is activated to shut off the communication between these chambers, and the film formation material is cooled while continuously introducing the nonreactive gas to the evaporation chamber 16.
摘要翻译：本发明提供一种薄膜制造方法，其使用喷嘴型蒸发源实现稳定，高效的成膜，同时避免成膜材料终止后不必要的成膜材料的散射和沉积。使用的成膜装置包括：蒸发室16; 设置有基板21的成膜室17; 保持成膜材料15并包括开口表面14的蒸发源19; 构造成使蒸发源19移动的移动机构35; 和导电可变结构34.成膜是在保持加热成膜材料的蒸发源19的开口表面14位于靠近基板21的同时抽空蒸发室16和成膜室17的状态下进行的而不用电导可变结构34关闭蒸发室16和成膜室17之间的连通。接下来，通过向蒸发室16和成膜室17引入非反应性气体来抑制成膜材料的蒸发，将每个室中的压力调节至预定压力或更大。然后，蒸发源19被移动机构35移动，使得开口表面14远离基板21.导电可变结构被激活以切断这些室之间的连通，并且成膜材料被冷却，同时将非反应性气体连续引入蒸发室16。

34. 发明申请

US20120027506A1 WELD JOINT OF ALUMINUM ALLOY MEMBER 审中-公开
标题翻译：铝合金会员的焊接接头
公开(公告)号：US20120027506A1
公开(公告)日：2012-02-02
申请号：US13264617
申请日：2010-04-15
申请人： Takanori Yahaba , Hayato Takahashi , Daisuke Hirano , Takashi Shimada
发明人： Takanori Yahaba , Hayato Takahashi , Daisuke Hirano , Takashi Shimada
IPC分类号： F16B11/00
CPC分类号： B62D21/11 , B23K9/0282 , B23K9/173 , B23K9/23 , B23K31/02 , B23K33/006 , B23K33/008 , B23K2101/006 , B23K2103/10 , B23K2103/18 , Y10T403/477
摘要： Disclosed is a weld joint of an aluminum alloy member formed by joining one end of a wrought material (12) to one end of a cast member (11). The cast member has a chamfer (14), and an inserting portion (13) which extends from the lower end of the chamfer (14) toward the distal end of the case member along the lower surface of the wrought material. The distance (L) from the lower end of the chamfer to the end face (12a) at one end of the wrought material is set equal to 1.0-1.7 times of the thickness (T) of the wrought material, and the chamfer is inclined so that the angle of a groove between the chamfer and the end face (12a) at one end of the wrought material is 15-45°.
摘要翻译：公开了一种通过将锻造材料（12）的一端连接到铸件（11）的一端而形成的铝合金构件的焊接接头。铸造件具有倒角（14）和从倒角（14）的下端朝向锻造材料的下表面朝向壳体构件的远端延伸的插入部分（13）。在锻造材料的一端从倒角的下端到端面（12a）的距离（L）设定为锻造材料的厚度（T）的1.0-1.7倍，并且倒角倾斜使得倒角与锻造材料一端的端面（12a）之间的角度为15-45°。

35. 发明申请

US20120009349A1 THIN FILM FORMING DEVICE AND THIN FILM FORMING METHOD 审中-公开
标题翻译：薄膜形成装置和薄膜形成方法
公开(公告)号：US20120009349A1
公开(公告)日：2012-01-12
申请号：US13257514
申请日：2010-04-14
申请人： Yasuharu Shinokawa , Satoshi Shibutani , Kazuyoshi Honda , Takashi Shimada , Yuma Kamiyama , Masahiro Yamamoto
发明人： Yasuharu Shinokawa , Satoshi Shibutani , Kazuyoshi Honda , Takashi Shimada , Yuma Kamiyama , Masahiro Yamamoto
IPC分类号： B05D3/00 , B05D1/00 , C23C14/00
CPC分类号： C23C14/562 , C23C14/541
摘要： In a film forming method using gas cooling, a decrease in a film formation rate and an excessive load on a vacuum pump due to gas introduction are avoided while achieving an adequate cooling effect. A thin film forming device of the present invention includes: a cooling body 10 having a cooling surface 10S located near a rear surface of a substrate 7 in a thin film forming region 9; and a gas introducing unit configured to introduce a gas to between the cooling surface 10S and the rear surface of the substrate 7. In a width-direction cross section of the substrate, a center portion of the cooling surface is shaped to project toward the rear surface of the substrate 7 as compared to both end portions of the cooling surface. In the width-direction cross section of the substrate, the cooling surface preferably has a bilaterally-symmetric shape and more preferably has a shape represented by a catenary curve.
摘要翻译：在使用气体冷却的成膜方法中，避免了由于气体导入而导致的真空泵的成膜速度的降低和真空泵的过大的负荷，同时达到充分的冷却效果。本发明的薄膜形成装置包括：在薄膜形成区域9中具有位于基板7的后表面附近的冷却表面10S的冷却体10; 以及气体引入单元，其被配置为将气体引入到冷却表面10S和基板7的后表面之间。在基板的宽度方向横截面中，冷却表面的中心部分成形为向后突出与冷却表面的两个端部相比，衬底7的表面。在基板的宽度方向截面中，冷却面优选具有双向对称的形状，更优选具有由悬链曲线表示的形状。

36. 发明授权

US07883705B2 Anti FGF23 antibody and a pharmaceutical composition comprising the same 有权
标题翻译：抗FGF23抗体和包含其的药物组合物
公开(公告)号：US07883705B2
公开(公告)日：2011-02-08
申请号：US12030593
申请日：2008-02-13
申请人： Yuji Yamazaki , Itaru Urakawa , Hitoshi Yoshida , Yukiko Aono , Takeyoshi Yamashita , Takashi Shimada , Hisashi Hasegawa
发明人： Yuji Yamazaki , Itaru Urakawa , Hitoshi Yoshida , Yukiko Aono , Takeyoshi Yamashita , Takashi Shimada , Hisashi Hasegawa
IPC分类号： A61K39/395
CPC分类号： C07K16/22 , A61K2039/505 , C07K16/244 , C07K2317/24 , C07K2317/565 , C07K2317/76
摘要： To provide an antibody against FGF23 and a pharmaceutical composition such as a preventive or therapeutic agent which can prevent or treat by suppressing an action of FGF23 by using the antibody. An antibody or its functional fragment against human FGF23 produced by hybridoma C10 (Accession No. FERM BP-10772).
摘要翻译：提供针对FGF23的抗体和通过使用抗体抑制FGF23的作用可以预防或治疗的药物组合物，例如预防或治疗剂。由杂交瘤C10（登录号FERM BP-10772）产生的针对人FGF23的抗体或其功能片段。

37. 发明申请

US20090206146A1 Welding method, welding system, and welding jig for robotically welding a motorcycle fuel tank 审中-公开
标题翻译：焊接方法，焊接系统和用于机器人焊接摩托车燃料箱的焊接夹具
公开(公告)号：US20090206146A1
公开(公告)日：2009-08-20
申请号：US12386702
申请日：2009-04-22
申请人： Naoji Yamaoka , Yoshimasa Iwaguchi , Takashi Shimada , Setsuo Arai , Toshio Ishii
发明人： Naoji Yamaoka , Yoshimasa Iwaguchi , Takashi Shimada , Setsuo Arai , Toshio Ishii
IPC分类号： B23K37/04
CPC分类号： B23K9/0026 , B23K37/0435 , B23K37/0443 , B23K2101/006 , B62J35/00
摘要： A welding jig for holding a motorcycle fuel tank when the fuel tank is welded includes a plurality of attachments for holding said fuel tank through resilient bodies. The plurality of attachments have springs hold the outer plate of a fuel tank, and an inner jig positions an inner plate. The attachments are attached to clamp arms which are opened/closed by cylinders. When the overlap portion between the outer and inner plates is welded, the thermal deformation caused by welding is accommodated by the springs. The attachments are spaced from the fuel tank in the order in which the welding point is approached.
摘要翻译：当燃料箱被焊接时用于保持摩托车燃料箱的焊接夹具包括用于通过弹性体保持所述燃料箱的多个附件。多个附件具有弹簧保持燃料箱的外板，并且内夹具定位内板。附件连接到由气缸打开/关闭的夹臂上。当焊接外板和内板之间的重叠部分时，通过弹簧容纳焊接引起的热变形。附件按焊接点接近的顺序与燃料箱隔开。

38. 发明申请

US20070128172A1 Hair growth method 审中-公开
标题翻译：头发生长法
公开(公告)号：US20070128172A1
公开(公告)日：2007-06-07
申请号：US10581606
申请日：2004-12-03
申请人： Katsutoshi Yoshizato , Takashi Shimada , Koei Toyoshima , Mikaru Matsunaga
发明人： Katsutoshi Yoshizato , Takashi Shimada , Koei Toyoshima , Mikaru Matsunaga
IPC分类号： A01N63/00 , C12N5/00 , C12N5/08 , A01N65/00 , C12N5/02
CPC分类号： A61L27/3869 , A61F2/10 , A61K35/12 , A61L27/362 , A61L27/3666 , A61L27/3813 , A61L2430/18 , C12N5/0627 , C12N2501/115
摘要： A method of enabling effective hair growth and furthermore, inducing hair growth closely similar to the natural hair state in the case of transplanting dermal papillae or cultured dermal papilla cells into the skin to regenerate the hair, characterized by comprising transplanting a composition containing the following components into an epidermis defect site: (a) dermal papillae or dermal papilla cells, (b) an epidermal tissue or epidermal cells and/or (c) a tissue constituting hair follicles or cells thereof.
摘要翻译：此外，在将真皮乳头或培养的真皮乳头细胞移植到皮肤中以再生毛发的情况下，能够有效地进行毛发生长的方法，此外，诱导与天然毛发状态非常相似的毛发生长，其特征在于，包括移植含有以下成分的组合物进入表皮缺损部位：（a）真皮乳头或真皮乳头细胞，（b）表皮组织或表皮细胞和/或（c）构成毛囊或其细胞的组织。

39. 发明授权

US06632547B2 Substrate for magnetic recording medium, manufacturing method thereof, and magnetic recording medium 有权
标题翻译：磁记录介质用基板，其制造方法和磁记录介质
公开(公告)号：US06632547B2
公开(公告)日：2003-10-14
申请号：US09796105
申请日：2001-02-28
申请人： Takashi Shimada
发明人： Takashi Shimada
IPC分类号： G11B566
CPC分类号： G11B5/8404 , Y10S428/90
摘要： A slowly advancing tape-shaped matrix is pressed into contact with a surface of a rapidly rotating non-magnetic substrate for a magnetic recording medium. An abrasive slurry is added to the matrix. The area contact rate between the matrix and the surface, as well as the contact pressure per unit area between the matrix and the surface are regulated to both polish and slightly roughen the surface in a single process. In the case of a glass presubstrate, the glass is chemically strengthened before being surface-treated.
摘要翻译：缓慢前进的带状基体被压接成用于磁记录介质的快速旋转非磁性基板的表面。将磨料浆料加入到基质中。基体和表面之间的面积接触率以及基体和表面之间的每单位面积的接触压力被调节为在单个过程中抛光和稍微粗糙的表面。在玻璃预浸料的情况下，玻璃在进行表面处理之前被化学强化

40. 发明授权

US06591681B1 Nondestructive inspection apparatus for inspecting an internal defect in an object 失效
标题翻译：用于检查物体内部缺陷的非破坏性检查装置
公开(公告)号：US06591681B1
公开(公告)日：2003-07-15
申请号：US10111168
申请日：2002-04-22
申请人： Takashi Shimada , Shinichi Hattori , Takahiro Sakamoto , Syuichi Nakamura
发明人： Takashi Shimada , Shinichi Hattori , Takahiro Sakamoto , Syuichi Nakamura
IPC分类号： G01N2920
CPC分类号： G01N29/045 , G01N29/11 , G01N29/2412 , G01N29/4454 , G01N2291/014 , G01N2291/0232 , G01N2291/02827 , G01N2291/0427 , G01N2291/044 , G01N2291/102
摘要： A nondestructive inspection apparatus includes a vibrating section 11 which is adapted to be placed in pressure contact with a surface of a measuring object 16 for generating an acoustic elastic wave W, a receiving section 12 for receiving a reflected wave, a pushing mechanism 13 for pushing the vibrating section and the receiving section against the measuring object, a pushing force measurement section 14 for detecting pushing forces Fa, Fb during vibration, a vibration control section 10 for driving the vibrating section, and a reception signal processing section 15 for determining the internal defect based on a reception signal R. The reception signal processing section includes a reflection energy calculation section for calculating a reflection energy level due to elasticity vibration of the measuring object, a reflection energy correction section for normalizing the reflection energy level by the pushing force to calculate a correction value; and an internal defect determination section for detecting the internal defect based on the correction value. With this arrangement, the absolute reflection energy level of the reflected wave is determined through comparison, thereby making it possible to improve the evaluation accuracy of the internal defect to a substantial extent.
摘要翻译：非破坏性检查装置包括：振动部11，其适于与测量对象16的表面压力接触以产生声弹性波W;接收部12，用于接收反射波;推动机构13，用于推动振动部分和接收部分相对于测量对象，用于检测振动期间的推动力Fa，Fb的推力测量部分14，用于驱动振动部分的振动控制部分10以及用于确定内部振动的接收信号处理部分15 基于接收信号R的缺陷。接收信号处理部分包括：反射能量计算部分，用于计算由于测量对象的弹性振动引起的反射能量水平;反射能量校正部分，用于通过推力使反射能量级别归一化计算校正值; 以及内部缺陷确定部分，用于基于所述校正值来检测所述内部缺陷。通过这种布置，通过比较来确定反射波的绝对反射能级，从而可以在很大程度上提高内部缺陷的评估精度。

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