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    • 32. 发明授权
    • Cleaning apparatus and method for immersion light exposure
    • 浸没式曝光清洗装置及方法
    • US08010221B2
    • 2011-08-30
    • US11949287
    • 2007-12-03
    • Kouichi HontakeMasashi EnomotoHideharu Kyouda
    • Kouichi HontakeMasashi EnomotoHideharu Kyouda
    • G06F19/00H01L21/00
    • H01L21/67051H01L21/67225
    • A cleaning apparatus for immersion light exposure includes a cleaning apparatus main body including a mechanism configured to perform a cleaning process on the substrate, and a control section configured to control respective components of the cleaning apparatus main body. The control section is arranged to fabricate a new process recipe in response to input of a surface state of a film formed on a substrate, such that the new process recipe contains hardware conditions and/or process conditions corresponding to the surface state, with reference to relationships stored therein between parameter values representing a surface state of a film formed on a substrate and hardware conditions and/or process conditions for performing suitable cleaning for the parameter values; and to control the cleaning apparatus main body to perform a cleaning process in accordance with the new process recipe.
    • 用于浸没式曝光的清洁装置包括:清洁装置主体,包括构造成对基板执行清洁处理的机构;以及控制部,其被配置为控制清洁装置主体的各个部件。 控制部分被布置成响应于在基板上形成的膜的表面状态的输入而制造新的工艺配方,使得新工艺配方包含与表面状态相对应的硬件条件和/或工艺条件,参考 存储在其中的表示在基板上形成的膜的表面状态的参数值与用于对参数值执行适当清洁的硬件条件和/或处理条件之间的关系; 并且控制清洁装置主体以根据新的处理配方执行清洁处理。
    • 36. 发明申请
    • COATING/DEVELOPING APPARATUS AND PATTERN FORMING METHOD
    • 涂料/开发设备和图案形成方法
    • US20080204675A1
    • 2008-08-28
    • US11958798
    • 2007-12-18
    • Hisashi KawanoJunichi KitanoHitoshi KosugiKoichi HontakeMasashi Enomoto
    • Hisashi KawanoJunichi KitanoHitoshi KosugiKoichi HontakeMasashi Enomoto
    • G03B27/52G03F7/26
    • G03F7/162G03F7/168G03F7/3021
    • A coating/developing apparatus includes a process section including processing units to perform a series of processes for resist coating and development; an interface section disposed between the process section and immersion light exposure apparatus; and a drying section disposed in the interface section to dry the substrate immediately after the immersion light exposure process. The drying section includes a process container configured to accommodate the substrate, a substrate support member configured to place the substrate thereon, a temperature-adjusted gas supply mechanism configured to supply a temperature-adjusted gas into the process container, and an exhaust mechanism configured to exhaust the process container. The drying section is arranged to dry the substrate by supplying the temperature-adjusted gas into the process container with the substrate placed on the substrate support member, while exhausting the process container.
    • 一种涂布/显影装置,包括:处理部,包括进行抗蚀剂涂布和显影的一系列处理的处理单元; 布置在处理部分和浸没曝光装置之间的界面部分; 以及设置在界面部分中的干燥部分,以在浸没曝光处理之后立即干燥基板。 所述干燥部包括被配置为容纳所述基板的处理容器,被配置为将所述基板放置在其上的基板支撑部件,被配置为将经温度调节的气体供应到所述处理容器中的温度调节气体供给机构,以及配置为 排出过程容器。 干燥部被布置成通过将衬底放置在基板支撑构件上的温度调节气体供给到处理容器中,同时排出处理容器来干燥基板。
    • 37. 发明授权
    • Water-soluble acrylic resin, resin composition containing the same for
use in water-based coating composition, water-based coating composition
and coating method by use of the same
    • 水溶性丙烯酸树脂,含有它们的用于水性涂料组合物的树脂组合物,水性涂料组合物和使用它们的涂布方法
    • US6025449A
    • 2000-02-15
    • US31659
    • 1998-02-27
    • Masashi EnomotoNobushige NumaTomokuni IharaHirofumi FukuyamaHajime SukejimaHiroto Takeuchi
    • Masashi EnomotoNobushige NumaTomokuni IharaHirofumi FukuyamaHajime SukejimaHiroto Takeuchi
    • C08F220/18C08F220/28C09D4/00C09D7/45C08F18/00
    • C09D7/02C08F220/18C08F220/28C09D4/00
    • A water-soluble acrylic resin which is prepared by neutralizing with a neutralizing agent an acrylic copolymer formed by copolymerizing (a) an alkylene oxide group-containing (meth)acrylate, (b) a cyclic saturated hydrocarbon group-containing (meth)acrylate, (c) a hydroxyl group-containing unsaturated monomer other than the monomer (a), and (d) other unsaturated monomer; a resin composition used for a water-based coating composition and containing, as a vehicle component, the above water-soluble acrylic resin; a water-based coating composition containing, as major components, (A) at Least one resin selected from the group consisting of a water-soluble resin and a water-dispersible resin and (B) a pigment, said pigment (B) being subjected to dispersion treatment; with a water-soluble acrylic resin (C), which is prepared by neutralizing with a neutralizing agent an acrylic copolymer formed by copolymerizing (a) an alkylene oxide group-containing (meth)acrylate, (b) a cyclic saturated hydrocarbon group-containing (meth)acrylate, and (e) other unsaturated monomer, followed by being mixed with the resin (A) to form a water-based coating composition; a coating method comprising coating a base coat coating composition onto a substrate followed by coating a top clear coating composition, the above water-based coating composition being used as the base coat coating composition.
    • (a)含环氧烷基的(甲基)丙烯酸酯,(b)含环状饱和烃基的(甲基)丙烯酸酯,(甲基)丙烯酸酯,(甲基)丙烯酸酯, (c)除单体(a)以外的含羟基的不饱和单体,和(d)其它不饱和单体; 用于水性涂料组合物并含有上述水溶性丙烯酸树脂作为载体组分的树脂组合物; 一种水性涂料组合物,其含有(A)至少一种选自水溶性树脂和水分散性树脂的树脂作为主要成分,(B)颜料,所述颜料(B)经受 分散处理; 与(a)含烯氧化物基团的(甲基)丙烯酸酯共聚形成的丙烯酸共聚物,(b)含有环状饱和烃基的(甲基)丙烯酸酯, (甲基)丙烯酸酯和(e)其它不饱和单体,然后与树脂(A)混合形成水性涂料组合物; 一种涂覆方法,包括将底涂层涂料组合物涂布在基材上,然后涂覆顶部透明涂料组合物,上述水基涂料组合物用作底涂涂料组合物。
    • 39. 发明申请
    • OPTICAL DEVICE AND ILLUMINATING DEVICE
    • 光学装置和照明装置
    • US20130033873A1
    • 2013-02-07
    • US13639444
    • 2011-04-06
    • Masaki SuzukiHirofumi TsuikiHayato HasegawaMasashi Enomoto
    • Masaki SuzukiHirofumi TsuikiHayato HasegawaMasashi Enomoto
    • F21V7/04
    • G02B17/006F21S11/00
    • To provide an optical device which is capable of improving a light-introduction efficiency, and which may be made thinner. The optical device according to an embodiment of the present invention includes a structural layer including a plurality of reflection surfaces, which reflect light entering the light-incident surface toward the light-output surface. The above-mentioned reflection surface has a first length (h) in the X-axis direction. The reflection surfaces are arrayed in the Z-axis direction orthogonal to the X-axis direction at pitches (p). The reflection surfaces satisfy a relation of h=(2n−1)·p/tan θ, where θ is indicative of an incident angle of light with respect to the X-axis direction, the light being light travelling on an XZ plane out of light entering the reflection surface, and n is indicative of the number of reflection of incident light by the reflection surface, the angle θ being any angle satisfying the range of 6.5°≦θ≦87.5°.
    • 提供能够提高导光效率并且可以变薄的光学装置。 根据本发明的实施例的光学装置包括结构层,其包括多个反射表面,其将进入光入射表面的光朝向光输出表面反射。 上述反射面在X轴方向上具有第一长度(h)。 反射面以与间隔(p)的X轴方向正交的Z轴方向排列。 反射面满足h =(2n-1)·p /tanθ的关系,其中, 表示相对于X轴方向的入射角的光,该光是在XZ平面上从进入反射面的光中行进的光,n表示反射面的入射光的反射次数 角度和角度 满足6.5°&nlE的范围的任何角度;& nlE; 87.5°。