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1. 发明申请

US20080204675A1 COATING/DEVELOPING APPARATUS AND PATTERN FORMING METHOD 有权
标题翻译：涂料/开发设备和图案形成方法
公开(公告)号：US20080204675A1
公开(公告)日：2008-08-28
申请号：US11958798
申请日：2007-12-18
申请人： Hisashi Kawano , Junichi Kitano , Hitoshi Kosugi , Koichi Hontake , Masashi Enomoto
发明人： Hisashi Kawano , Junichi Kitano , Hitoshi Kosugi , Koichi Hontake , Masashi Enomoto
IPC分类号： G03B27/52 , G03F7/26
CPC分类号： G03F7/162 , G03F7/168 , G03F7/3021
摘要： A coating/developing apparatus includes a process section including processing units to perform a series of processes for resist coating and development; an interface section disposed between the process section and immersion light exposure apparatus; and a drying section disposed in the interface section to dry the substrate immediately after the immersion light exposure process. The drying section includes a process container configured to accommodate the substrate, a substrate support member configured to place the substrate thereon, a temperature-adjusted gas supply mechanism configured to supply a temperature-adjusted gas into the process container, and an exhaust mechanism configured to exhaust the process container. The drying section is arranged to dry the substrate by supplying the temperature-adjusted gas into the process container with the substrate placed on the substrate support member, while exhausting the process container.
摘要翻译：一种涂布/显影装置，包括：处理部，包括进行抗蚀剂涂布和显影的一系列处理的处理单元; 布置在处理部分和浸没曝光装置之间的界面部分; 以及设置在界面部分中的干燥部分，以在浸没曝光处理之后立即干燥基板。所述干燥部包括被配置为容纳所述基板的处理容器，被配置为将所述基板放置在其上的基板支撑部件，被配置为将经温度调节的气体供应到所述处理容器中的温度调节气体供给机构，以及配置为排出过程容器。干燥部被布置成通过将衬底放置在基板支撑构件上的温度调节气体供给到处理容器中，同时排出处理容器来干燥基板。

2. 发明授权

US07924396B2 Coating/developing apparatus and pattern forming method 有权
标题翻译：涂布/显影装置和图案形成方法
公开(公告)号：US07924396B2
公开(公告)日：2011-04-12
申请号：US11958798
申请日：2007-12-18
申请人： Hisashi Kawano , Junichi Kitano , Hitoshi Kosugi , Koichi Hontake , Masashi Enomoto
发明人： Hisashi Kawano , Junichi Kitano , Hitoshi Kosugi , Koichi Hontake , Masashi Enomoto
IPC分类号： G03B27/32 , G03B5/00
CPC分类号： G03F7/162 , G03F7/168 , G03F7/3021
摘要： A coating/developing apparatus includes a process section including processing units to perform a series of processes for resist coating and development; an interface section disposed between the process section and immersion light exposure apparatus; and a drying section disposed in the interface section to dry the substrate immediately after the immersion light exposure process. The drying section includes a process container configured to accommodate the substrate, a substrate support member configured to place the substrate thereon, a temperature-adjusted gas supply mechanism configured to supply a temperature-adjusted gas into the process container, and an exhaust mechanism configured to exhaust the process container. The drying section is arranged to dry the substrate by supplying the temperature-adjusted gas into the process container with the substrate placed on the substrate support member, while exhausting the process container.
摘要翻译：一种涂布/显影装置，包括：处理部，包括进行抗蚀剂涂布和显影的一系列处理的处理单元; 布置在处理部分和浸没曝光装置之间的界面部分; 以及设置在界面部分中的干燥部分，以在浸没曝光处理之后立即干燥基板。所述干燥部包括被配置为容纳所述基板的处理容器，被配置为将所述基板放置在其上的基板支撑部件，配置成将经温度调节的气体供给到所述处理容器中的温度调节气体供给机构，以及配置为排出过程容器。干燥部被布置成通过将衬底放置在基板支撑构件上的温度调节气体供给到处理容器中，同时排出处理容器来干燥基板。

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