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31. 发明授权

US08260849B2 Synchronous interface to asynchronous processes 有权
标题翻译：异步进程的同步接口
公开(公告)号：US08260849B2
公开(公告)日：2012-09-04
申请号：US12777164
申请日：2010-05-10
申请人： Taras Shkvarchuk , Alexander Lerner , Thomas Nabiel Boulos
发明人： Taras Shkvarchuk , Alexander Lerner , Thomas Nabiel Boulos
IPC分类号： G06F15/16
CPC分类号： H04L63/20 , H04L12/5601 , H04L63/10 , H04L67/02 , H04L67/28 , H04L67/2823 , H04L67/42 , H04L2012/5619 , H04L2012/5629
摘要： Methods and apparatus, including computer program products, implementing and using techniques for selectively accessing one or more web services from a client machine, the one or more web services and the client machine being accessible over a network. A request for information is received from a client machine with a conversion engine. The request is received over a synchronous interface. The request is processed in the conversion engine. The processed request is transmitted over an asynchronous interface from the conversion engine to at least one web service. Methods and apparatus, including computer program products, for converting a web service description language file for a synchronous web service into a web service description language file for an asynchronous client machine are also described.
摘要翻译：包括计算机程序产品，用于从客户机选择性地访问一个或多个web服务的实现和使用技术的方法和装置，所述一个或多个web服务和所述客户端机器可通过网络访问。从具有转换引擎的客户机接收到信息请求。通过同步接口接收请求。请求在转换引擎中处理。经处理的请求通过异步接口从转换引擎传输到至少一个Web服务。还描述了用于将用于同步web服务的web服务描述语言文件转换成用于异步客户机的web服务描述语言文件的方法和装置，包括计算机程序产品。

32. 发明申请

US20070295371A1 SINGLE WAFER DRYER AND DRYING METHODS 有权
标题翻译：单辊干燥机和干燥方法
公开(公告)号：US20070295371A1
公开(公告)日：2007-12-27
申请号：US11846400
申请日：2007-08-28
申请人： Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavleiv , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
发明人： Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavleiv , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
IPC分类号： B08B1/00
CPC分类号： H01L21/67034 , B08B3/10 , H01L21/67751 , H01L21/681 , H01L21/68764 , Y10S414/139
摘要： In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.
摘要翻译：在第一方面，提供一种适于处理晶片的模块。模块包括具有一个或多个特征的处理部分，例如（1）可旋转晶片支撑件，用于从第一取向旋转输入晶片，其中晶片与负载端口对准至第二取向，其中晶片与卸货港（2）捕捉器，其适于在从所述处理部分卸载时与晶片被动接触和行进; （3）适于产生从其一侧到另一侧的层流空气流的封闭输出部分; （4）具有多个晶片接收器的输出部分; （5）浸没式流体喷嘴; 和/或（6）干燥气体导流板等。其它方面包括晶片处理的方法。

33. 发明申请

US20060174921A1 Single wafer dryer and drying methods 审中-公开
公开(公告)号：US20060174921A1
公开(公告)日：2006-08-10
申请号：US11398058
申请日：2006-04-04
申请人： Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavleiv , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
发明人： Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavleiv , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
IPC分类号： B08B3/00
CPC分类号： H01L21/67034 , B08B3/10 , H01L21/67751 , H01L21/681 , H01L21/68764 , Y10S414/139
摘要： In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.

34. 发明申请

US20050229426A1 Single wafer dryer and drying methods 有权
标题翻译：单片干燥机和干燥方法
公开(公告)号：US20050229426A1
公开(公告)日：2005-10-20
申请号：US11054336
申请日：2005-02-09
申请人： Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavliev , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
发明人： Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavliev , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
IPC分类号： B05D3/02 , F26B3/00 , H01L21/00 , H01L21/306
CPC分类号： H01L21/02052 , H01L21/67034
摘要： In a first aspect, a first method of drying a substrate is provided. The first method includes the steps of (1) lifting a substrate through an air/fluid interface at a first rate; (2) directing a drying vapor at the air/fluid interface during lifting of the substrate; and (3) while a portion of the substrate remains in the air/fluid interface, reducing a rate at which a remainder of the substrate is lifted through the air/fluid interface to a second rate. The drying vapor may form an angle of about 23° with the air/fluid interface and/or the second rate may be about 2.5 mm/sec.
摘要翻译：在第一方面中，提供了干燥基板的第一种方法。第一种方法包括以下步骤：（1）以第一速率提升衬底通过空气/流体界面; （2）在提升衬底期间在空气/流体界面处引导干燥蒸汽; 和（3）当衬底的一部分保留在空气/流体界面中时，降低衬底的剩余部分通过空气/流体界面提升到第二速率的速率。干燥蒸气可以与空气/流体界面形成约23°的角度和/或第二速率可以为约2.5mm / sec。

35. 发明授权

US06460551B1 Megasonic resonator for disk cleaning and method for use thereof 失效
标题翻译：用于磁盘清洗的超声波谐振器及其使用方法
公开(公告)号：US06460551B1
公开(公告)日：2002-10-08
申请号：US09430345
申请日：1999-10-29
申请人： Boris Fishkin , Alexander Lerner , Jianshe Tang , Brian J. Brown
发明人： Boris Fishkin , Alexander Lerner , Jianshe Tang , Brian J. Brown
IPC分类号： B08B312
CPC分类号： H01L21/67057 , B08B3/12 , G10K11/28 , Y10S134/902
摘要： A Megasonic cleaning apparatus having at least one reflector (e.g., a parabolic or paraboloid reflector) positioned to collect otherwise wasted cleaning energy and redirect that energy to one or a plurality of positions on a wafer's edge is provided. A first embodiment comprises a complex parabolic reflector which has a width greater than that of the wafer and a preferred length approximately equal to the diameter of the wafer, and which is shaped to provide focal points which vary along the length of the parabolic reflector, such that energy striking the reflector at different points along the reflector's length is directed to a plurality of different points along the wafer's edge. A second embodiment comprises a simple parabolic reflector having a width greater than that of the wafer and a preferred length less than the diameter of the wafer, and which is provided to focus at a cord along the wafer's surface, effectively focusing cleaning energy on two points along the wafer's edge at any given time. Yet another embodiment of the invention comprises a paraboloid reflector having a width greater than that of the wafer and a preferred length which is substantially less than the diameter of the wafer and which is shaped to focus all collected energy to a single point on the wafer's edge. Multiple such reflectors may be positioned in the cleaning tank to optimize energy usage and wafer cleaning.
摘要翻译：提供了一种具有至少一个反射器（例如，抛物面或抛物面反射器）的超声波清洗装置，其被定位成收集另外浪费的清洁能量并将该能量重定向到晶片边缘上的一个或多个位置。第一实施例包括复杂的抛物面反射器，其宽度大于晶片的宽度，并且优选的长度近似等于晶片的直径，并且其被成形为提供沿着抛物面反射器的长度变化的焦点，沿着反射器长度的不同点撞击反射器的能量被引导到沿着晶片边缘的多个不同点。第二实施例包括具有大于晶片宽度的宽度的简单抛物面反射器，并且具有小于晶片直径的优选长度，并且其设置成沿着晶片表面聚焦在绳索处，有效地将清洁能量聚焦在两点上在任何给定的时间沿晶圆的边缘。本发明的另一个实施例包括具有大于晶片宽度的宽度的抛物面反射器，其优选长度基本上小于晶片的直径，并且其被成形为将所有收集的能量聚焦到晶片边缘上的单个点。可以将多个这样的反射器定位在清洁槽中以优化能量使用和晶片清洁。

36. 发明授权

US09212422B2 CVD reactor with gas flow virtual walls 有权
标题翻译：具有气流虚拟壁的CVD反应器
公开(公告)号：US09212422B2
公开(公告)日：2015-12-15
申请号：US13222840
申请日：2011-08-31
申请人： Gregg Higashi , Alexander Lerner , Khurshed Sorabji , Lori D. Washington
发明人： Gregg Higashi , Alexander Lerner , Khurshed Sorabji , Lori D. Washington
IPC分类号： C23C16/455
CPC分类号： C23C16/45565 , C23C16/45519
摘要： A chemical vapor deposition reactor has one or more deposition zones bounded by gas flow virtual walls, within a housing having closed walls. Each deposition zone supports chemical vapor deposition onto a substrate. Virtual walls formed of gas flows laterally surround the deposition zone, including a first gas flow of reactant gas from within the deposition zone and a second gas flow of non-reactant gas from a region laterally external to the deposition zone. The first and second gas flows are mutually pressure balanced to form the virtual walls. The virtual walls are formed by merging of gas flows at the boundary of each deposition zone. The housing has an exhaust valve to prevent pressure differences or pressure build up that would destabilize the virtual walls. Cross-contamination is reduced, between the deposition zones and the closed walls of the housing or an interior region of the housing outside the gas flow virtual walls.
摘要翻译：化学气相沉积反应器具有由气流虚拟壁限定的一个或多个沉积区，在具有封闭壁的壳体内。每个沉积区支持化学气相沉积到基底上。由气体流形成的虚拟壁横向包围沉积区，包括来自沉积区内的反应气体的第一气流和非反应气体从沉积区的横向外侧的区域的第二气流。第一和第二气体流量相互压力平衡以形成虚拟壁。虚拟壁通过在每个沉积区的边界处合并气流而形成。壳体具有排气阀，以防止压力差或压力增加，这将破坏虚拟墙体的稳定性。在沉积区域和壳体的封闭壁之间或在气流虚拟壁外部的壳体的内部区域之间的交叉污染减少。

37. 发明授权

US08478818B2 Synchronous interface to asynchronous processes 有权
标题翻译：异步进程的同步接口
公开(公告)号：US08478818B2
公开(公告)日：2013-07-02
申请号：US13563365
申请日：2012-07-31
申请人： Taras Shkvarchuk , Alexander Lerner , Thomas Nabiel Boulos
发明人： Taras Shkvarchuk , Alexander Lerner , Thomas Nabiel Boulos
IPC分类号： G06F15/16
CPC分类号： H04L63/20 , H04L12/5601 , H04L63/10 , H04L67/02 , H04L67/28 , H04L67/2823 , H04L67/42 , H04L2012/5619 , H04L2012/5629
摘要： Methods and apparatus, including computer program products, implementing and using techniques for selectively accessing one or more web services from a client machine, the one or more web services and the client machine being accessible over a network. A request for information is received from a client machine with a conversion engine. The request is received over a synchronous interface. The request is processed in the conversion engine. The processed request is transmitted over an asynchronous interface from the conversion engine to at least one web service. Methods and apparatus, including computer program products, for converting a web service description language file for a synchronous web service into a web service description language file for an asynchronous client machine are also described.
摘要翻译：包括计算机程序产品，用于从客户机选择性地访问一个或多个web服务的实现和使用技术的方法和装置，所述一个或多个web服务和所述客户端机器可通过网络访问。从具有转换引擎的客户机接收到信息请求。通过同步接口接收请求。请求在转换引擎中处理。经处理的请求通过异步接口从转换引擎传输到至少一个Web服务。还描述了用于将用于同步web服务的web服务描述语言文件转换成用于异步客户机的web服务描述语言文件的方法和装置，包括计算机程序产品。

38. 发明申请

US20130052346A1 CVD REACTOR WITH GAS FLOW VIRTUAL WALLS 有权
标题翻译：气体反应器与气体虚拟壁挂
公开(公告)号：US20130052346A1
公开(公告)日：2013-02-28
申请号：US13222840
申请日：2011-08-31
申请人： Gregg Higashi , Alexander Lerner , Khurshed Sorabji , Lori D. Washington
发明人： Gregg Higashi , Alexander Lerner , Khurshed Sorabji , Lori D. Washington
IPC分类号： C23C16/455
CPC分类号： C23C16/45565 , C23C16/45519
摘要： A chemical vapor deposition reactor has one or more deposition zones bounded by gas flow virtual walls, within a housing having closed walls. Each deposition zone supports chemical vapor deposition onto a substrate. Virtual walls formed of gas flows laterally surround the deposition zone, including a first gas flow of reactant gas from within the deposition zone and a second gas flow of non-reactant gas from a region laterally external to the deposition zone. The first and second gas flows are mutually pressure balanced to form the virtual walls. The virtual walls are formed by merging of gas flows at the boundary of each deposition zone. The housing has an exhaust valve to prevent pressure differences or pressure build up that would destabilize the virtual walls. Cross-contamination is reduced, between the deposition zones and the closed walls of the housing or an interior region of the housing outside the gas flow virtual walls.
摘要翻译：化学气相沉积反应器具有由气流虚拟壁限定的一个或多个沉积区，在具有封闭壁的壳体内。每个沉积区支持化学气相沉积到基底上。由气体流形成的虚拟壁横向包围沉积区，包括来自沉积区内的反应气体的第一气流和非反应气体从沉积区的横向外侧的区域的第二气流。第一和第二气体流量相互压力平衡以形成虚拟壁。虚拟壁通过在每个沉积区的边界处合并气流而形成。壳体具有排气阀，以防止压力差或压力增加，这将破坏虚拟墙体的稳定性。在沉积区域和壳体的封闭壁之间或在气流虚拟壁外部的壳体的内部区域之间的交叉污染减少。

39. 发明申请

US20100030219A1 ORTHOPEDIC NAVIGATION SYSTEM AND METHOD 审中-公开
标题翻译： ORTHOPEDIC导航系统和方法
公开(公告)号：US20100030219A1
公开(公告)日：2010-02-04
申请号：US12543103
申请日：2009-08-18
申请人： Alexander Lerner , Alexander Nassonov , Lev Diamant
发明人： Alexander Lerner , Alexander Nassonov , Lev Diamant
IPC分类号： A61B17/58 , G06K9/00
CPC分类号： A61B17/1725 , A61B17/1703 , A61B17/62 , A61B17/64 , A61B34/20 , A61B90/11 , A61B90/14 , A61B90/50 , A61B2017/3407 , A61B2090/373 , A61B2090/376 , A61B2090/3945
摘要： System and methods for establishing, in combination with an imaging device, a desired orientation of a navigated element having a longitudinal axis, with respect to a bone, the system comprising a jig configured for being directly or indirectly fixed relative to the bone; a positioning head supported by the jig and movable with respect thereto; an angle adjustment member mounted within the positioning head, comprising a passage having a guiding axis, the angle adjustment member being configured for receiving in the passage the navigated element so that the longitudinal axis of the navigated element is aligned with the guiding axis, the angle adjustment member being movable with respect to the positioning head; and an alignment pin having a pin proximal end, a pin distal end and a pin axis, and configured for being received in the passage so that the pin axis is aligned with the guiding axis and so that the pin distal end faces towards the bone, the pin further comprising a light source disposed at its proximal end for projecting an alignment beam along the pin axis in the direction away from the bone for the alignment of the imaging device relative to the guiding axis of the passage for use of the imaging device in establishing the orientation of the guiding axis corresponding to the desired orientation of navigated element.
摘要翻译：用于与成像装置组合建立相对于骨骼具有纵向轴线的导航元件的期望取向的系统和方法，所述系统包括构造成用于相对于骨直接或间接固定的夹具; 由夹具支撑并可相对于其移动的定位头; 安装在所述定位头内的角度调节构件包括具有引导轴线的通道，所述角度调节构件构造成用于在所述通道中容纳所述导航元件，使得所述导航元件的纵向轴线与所述引导轴线对准，调节构件可相对于定位头移动; 以及具有销近端，销远端和销轴线的对准销，并且构造成被容纳在通道中，使得销轴线与引导轴线对齐并且使得销的远端朝向骨头，所述销还包括设置在其近端处的光源，用于沿着所述销轴线沿远离所述骨的方向突出对准光束，用于使所述成像装置相对于所述通道的引导轴线对准所述成像装置，以用于所述成像装置建立对应于导航元件的期望取向的引导轴的取向。

40. 发明授权

US07256132B2 Substrate centering apparatus and method 失效
标题翻译：基板定心装置及方法
公开(公告)号：US07256132B2
公开(公告)日：2007-08-14
申请号：US10631650
申请日：2003-07-31
申请人： Alexander Lerner , Avi Tepman , Donald Olgato
发明人： Alexander Lerner , Avi Tepman , Donald Olgato
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L21/68
摘要： A semiconductor substrate centering mechanism includes a plurality of substrate support pins, each pin having a top surface. The top surfaces of the pins define a plane in which the substrate is supported. Each pin has a tab mounted eccentrically at the top surface of the pin. The tabs extend upwardly relative to the top surfaces of the pins. The centering mechanism further includes a pin rotation mechanism adapted to rotate each pin. The pin rotation mechanism rotates the pins between a first position in which the tabs define an envelope that is larger than a circumference of the substrate and a second position in which the tabs define a centered position for the substrate. A telescoping arrangement of nesting shield segments may also be provided for each pin to prevent processing fluid from reaching a shaft of the pin. In one aspect the centering mechanism is coupled to a substrate support of a substrate processing location, and thus allows a substrate to be centered as it is lowered to the processing location.
摘要翻译：半导体基板定心机构包括多个基板支撑销，每个销具有顶面。销的顶表面限定了其中衬底被支撑的平面。每个销具有偏心地安装在销的顶表面处的突片。凸片相对于销的顶部表面向上延伸。定心机构还包括适于旋转每个销的销旋转机构。销旋转机构使销在第一位置和第二位置之间旋转，在第一位置中，突片限定了大于衬底周长的外壳，其中突片限定了衬底的居中位置。也可以为每个销提供嵌套屏蔽段的伸缩布置，以防止处理流体到达销的轴。在一个方面，定心机构耦合到衬底处理位置的衬底支撑件，并且因此允许衬底在被降低到处理位置时居中。

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