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31. 发明申请

US20100233637A1 DEVELOPING APPARATUS, DEVELOPING METHOD, AND STORAGE MEDIUM 有权
标题翻译：开发设备，开发方法和存储介质
公开(公告)号：US20100233637A1
公开(公告)日：2010-09-16
申请号：US12718104
申请日：2010-03-05
申请人： Hiroshi ARIMA , Yuichi Yoshida , Taro Yamamoto , Kousuke Yoshihara
发明人： Hiroshi ARIMA , Yuichi Yoshida , Taro Yamamoto , Kousuke Yoshihara
IPC分类号： G03F7/20 , G03B27/52 , G06F17/00
CPC分类号： G03F7/3021 , H01L21/6715
摘要： A developing apparatus including a substrate holder that holds a substrate horizontally; means for atomizing a surface treatment liquid used to improve wettability of the substrate with a developer; a first spray nozzle that sprays the atomized surface treatment liquid onto the substrate; and a developer supply nozzle that supplies a developer onto the substrate to which the substrate treatment liquid has been sprayed. The surface tension of the atomized surface treatment liquid with respect to the substrate is lower than the surface tension of the surface treatment liquid with respect to the substrate. The atomization suppresses the fact that the surface treatment liquid gathers on a certain portion of the surface of the substrate. The surface treatment liquid can be easily supplied onto the entire surface of the substrate, and improve wettability of the substrate with the developer.
摘要翻译：一种显影装置，包括：水平保持基板的基板支架; 用于使用显影剂使用于改善基材的润湿性的表面处理液体雾化的装置; 将雾化的表面处理液体喷射到基板上的第一喷嘴; 以及将显影剂供给到已经喷射了基板处理液的基板上的显影剂供给喷嘴。雾化表面处理液相对于基材的表面张力低于表面处理液相对于基材的表面张力。雾化抑制了表面处理液体聚集在基材表面的某一部分上的事实。可以容易地将表面处理液体提供到基板的整个表面上，并且改善基板与显影剂的润湿性。

32. 发明申请

US20100154834A1 CLEANING APPARATUS, COATING AND DEVELOPING APPARATUS, AND CLEANING METHOD 有权
标题翻译：清洁装置，涂装和开发设备和清洁方法
公开(公告)号：US20100154834A1
公开(公告)日：2010-06-24
申请号：US12716981
申请日：2010-03-03
申请人： Masahiro Fukuda , Taro Yamamoto
发明人： Masahiro Fukuda , Taro Yamamoto
IPC分类号： B08B3/00
CPC分类号： H01L21/67051 , H01L21/68742
摘要： A wafer W is held in a horizontal attitude within an airtight container 41 by a vacuum chuck 42 such that small gaps are formed between the wafer W and the inner surfaces of the airtight container 41. A cleaning liquid is supplied toward the center portion of a front surface of the wafer W through a fluid supply port 40 which is an end of a fluid supply path 5, and is discharged through a fluid discharge portion 44 arranged in the bottom portion of the airtight container 41 in a form of a groove running along a circle having its center located on the center axis of the wafer W. The cleaning liquid flows and spreads from the center portion of the wafer W toward the peripheral portion while removing particles adhered to the wafer W, and is discharged through the fluid discharge portion 44.This arrangement allows the particles to be uniformly and reliably removed without rotating the wafer W. The entire cleaning apparatus 4 has a small size.
摘要翻译：通过真空吸盘42在晶片W与密封容器41的内表面之间形成小间隙，将晶片W保持在气密容器41内的水平位置。向玻璃W的中心部分供给清洗液通过作为流体供给路径5的端部的流体供给口40将晶片W的前表面通过布置在气密容器41的底部的流体排出部44排出，形成为沿着其中心位于晶片W的中心轴线上。清洗液体从晶片W的中心部朝向周边部分流动，同时除去附着在晶片W上的微粒，并通过流体排出部这种布置允许在不旋转晶片W的情况下均匀且可靠地除去颗粒。整个清洁装置4具有小尺寸。

33. 发明授权

US07733472B2 Method and system for determining condition of process performed for coating film before immersion light exposure 有权
标题翻译：用于确定浸入式曝光前涂膜的处理条件的方法和系统
公开(公告)号：US07733472B2
公开(公告)日：2010-06-08
申请号：US11832188
申请日：2007-08-01
申请人： Taro Yamamoto , Hitoshi Kosugi
发明人： Taro Yamamoto , Hitoshi Kosugi
IPC分类号： G01N21/00
CPC分类号： G03F7/70341 , G03F7/16
摘要： A method is used for determining a condition of a predetermined process for preparing a process target, which includes a coating film formed on a substrate and including a resist film. This is to prevent film peeling from occurring in the coating film when performing immersion light exposure after the predetermined process. The method includes preparing test targets, each of which includes a sample film corresponding to the coating film and formed on a sample substrate corresponding to the substrate; performing a test process on each of the test targets in a testing unit, which imitates an immersion light exposure apparatus, under a condition corresponding to a designated immersion light exposure condition; and determining a condition of the predetermined process to be used for the coating film, based on a result of the test process.
摘要翻译：一种方法用于确定用于制备处理目标的预定方法的条件，其包括形成在基板上并包括抗蚀剂膜的涂膜。这是为了防止在预定处理之后进行浸没曝光时在涂膜中发生膜剥离。该方法包括制备测试对象，每个测试对象包括与涂膜相对应的样品膜，并形成在与该基板相对应的样品基板上; 在与指定的浸没式曝光条件相对应的条件下对模拟浸没式曝光装置的测试单元中的每个测试目标进行测试处理; 并基于测试过程的结果确定用于涂膜的预定处理的条件。

34. 发明申请

US20100050073A1 INFORMATION PROCESSING PROGRAM, INFORMATION PROCESSING METHOD, AND INFORMATION PROCESSING DEVICE 有权
标题翻译：信息处理程序，信息处理方法和信息处理装置
公开(公告)号：US20100050073A1
公开(公告)日：2010-02-25
申请号：US12543770
申请日：2009-08-19
申请人： Taro Yamamoto
发明人： Taro Yamamoto
IPC分类号： G06F17/20
CPC分类号： G06F17/211 , G06F17/24
摘要： The present invention is intended to improve operability in page-by-page editing operation of a document file having multiple pages using a computer. A display processor displays multiple pages of the document file in list form on a display unit, selects an item to be displayed from a plurality of items contained in attribute information allocated to each page, and displays the attribute information relating to the item that has been selected in association with each page. An editing processor receives page selection operation and editing operation, executes editing process on a selected page, and updates the attribute information by rewriting an item associated with the editing process of the attribute information allocated to the selected page. After the editing process by the editing processor, the display processor selects an item to be displayed from the plurality of items of the attribute information based on the substance of the editing process to update a display item list of the attribute information.
摘要翻译：本发明旨在通过使用计算机提高具有多个页面的文档文件的逐页编辑操作的可操作性。显示处理器以列表形式在显示单元上显示文档文件的多个页面，从分配给每个页面的属性信息中包含的多个项目中选择要显示的项目，并显示与已经被分配的项目相关的属性信息与每个页面相关联地选择。编辑处理器接收页面选择操作和编辑操作，对所选择的页面执行编辑处理，并通过重写与分配给所选页面的属性信息的编辑处理相关联的项目来更新属性信息。在通过编辑处理器的编辑处理之后，显示处理器基于编辑处理的实质从属性信息的多个项目中选择要显示的项目，以更新属性信息的显示项目列表。

35. 发明申请

US20090145489A1 TEMPERATURE REGULATION METHOD AND SYSTEM FOR LOW FLOW RATE LIQUID 有权
标题翻译：低流量液体的温度调节方法和系统
公开(公告)号：US20090145489A1
公开(公告)日：2009-06-11
申请号：US11719347
申请日：2005-11-07
申请人： Hiroyasu Goto , Masahiro Fukuda , Taro Yamamoto
发明人： Hiroyasu Goto , Masahiro Fukuda , Taro Yamamoto
IPC分类号： F16L53/00 , F17D1/14
CPC分类号： G05D23/1919 , Y10T137/6416
摘要： ABSTRACT A method and a system for controlling temperature of a liquid in small flow amount, for supplying a liquid whose temperature is highly accurately controlled, as a flow of a small flow amount or an intermittent flow. A liquid supplied from a supply path is pressurized and introduced into a circulation path, and is temperature-controlled by a temperature control device in the circulation path, while being circulated in the circulation path by a pump in the pressurized condition. The liquid is supplied to an exterior device through a discharge path caused to branch from the circulation path, as a consecutive flow in a small amount or an intermittent flow in a small amount in a flow amount less than at least ½ times the flow amount in the circulation path, by adjusting a discharge valve provided in the discharge path.
摘要翻译：摘要：一种用于控制小流量的液体的温度的方法和系统，用于将温度高度精确控制的液体作为小流量或间歇流量的流动。从供给路径供给的液体被加压并引入循环路径，并且通过循环路径中的温度控制装置进行温度控制，同时在加压状态下通过泵在循环路径中循环。液体通过从循环路径分支的排出路径供给到外部装置，作为少量的连续流量或少量的少量的间歇流量，流量少于流量的至少1/2的流量循环路径，通过调节设置在排出路径中的排出阀。

36. 发明申请

US20090033898A1 DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：开发设备，开发方法和存储介质
公开(公告)号：US20090033898A1
公开(公告)日：2009-02-05
申请号：US12173262
申请日：2008-07-15
申请人： Taro Yamamoto , Hirofumi Takeguchi , Shuichi Nagamine
发明人： Taro Yamamoto , Hirofumi Takeguchi , Shuichi Nagamine
IPC分类号： G03B27/42 , G03F7/22
CPC分类号： G03B27/42 , G03F7/3021 , H01L21/6715 , H01L21/67178
摘要： A developing apparatus includes, to process substrates each coated with a resist and processed by an exposure process by a developing process, includes: plural developing units each provided with a substrate holding device for stably pouring a developer onto the substrate, a first developer nozzle to be used in common by the plural developing units to pour the developer in a band-shaped flow onto the substrates held by each of the substrate holding devices, a nozzle driving mechanism for carrying the first developer nozzle from one to another of the developing units, and moving the first developer nozzle with one end of a band-shaped area into which the developer is to be poured through the first developer nozzle directed toward the center of the substrate in each of the developing units such that a part in a surface of the substrate onto which the developer is poured moves from a central part toward a peripheral part or from a peripheral part toward a central part in the surface of the substrate to coat the surface of the substrate entirely with a developer film, and second developer nozzles for pouring the developer into a circular area or a band-shaped area of a short length shorter than that of the band-shaped area into which the first developer nozzle pours the developer in a central part of the substrate on which the developer film has been formed by the first developer nozzle. The nozzles are used selectively for developing steps.
摘要翻译：显影装置包括：处理各自涂覆有抗蚀剂并通过显影处理曝光处理的基板的显影装置包括：多个显影单元，每个显影单元设置有用于将显影剂稳定地浇注到基板上的基板保持装置，第一显影剂喷嘴通过多个显影单元共同使用将显影剂倾倒在由每个基板保持装置保持的基板上的带状流中，用于将第一显影剂喷嘴从另一个承载到显影单元的喷嘴驱动机构，并且移动第一显影剂喷嘴，其中一个带状区域的一端，显影剂将通过第一显影剂喷嘴注入到每个显影单元中的基板的中心，使得其中的部分在显影剂注入的基板从中心部分向周边部分移动，或从周边部分朝向表面的中心部分移动 e基板，其全部用显影剂膜涂覆基板的表面;以及第二显影剂喷嘴，用于将显影剂倾倒成比带状区域的短的短的短的长度的圆形区域或带状区域，第一显影剂喷嘴将显影剂倾倒在其上已由第一显影剂喷嘴形成有显影剂膜的基板的中心部分。喷嘴被选择性地用于显影步骤。

37. 发明申请

US20080142043A1 COATING FILM PROCESSING METHOD AND APPARATUS 有权
标题翻译：涂膜处理方法和装置
公开(公告)号：US20080142043A1
公开(公告)日：2008-06-19
申请号：US11950122
申请日：2007-12-04
申请人： Taro YAMAMOTO , Kousuke Yoshihara
发明人： Taro YAMAMOTO , Kousuke Yoshihara
IPC分类号： B08B7/04
CPC分类号： H01L21/6715 , G03F7/70341 , H01L21/67051
摘要： A coating film processing method is used for processing a coating film formed on a surface of a substrate to prepare for an immersion light exposure process arranged to perform light exposure through a liquid. The method includes supplying a solvent-containing liquid comprising a combination of a solvent and a solvent-ability decreasing agent for decreasing solvent ability, or a diluted solvent, onto an edge portion of the coating film, thereby performing edge portion cutting; and supplying a cleaning liquid onto the edge portion of the coating film, thereby performing edge portion cleaning, subsequently to the edge portion cutting.
摘要翻译：使用涂膜处理方法来处理形成在基板的表面上的涂膜，以准备用于通过液体进行曝光的浸没曝光处理。该方法包括将包含溶剂和溶剂能力降低剂的组合的含溶剂的液体或稀释溶剂供给到涂膜的边缘部分上，从而进行边缘部分切割; 并将清洗液供给到涂膜的边缘部分上，从而进行边缘部分的清洁。

38. 发明申请

US20070215178A1 PROTECTIVE FILM REMOVING DEVICE, MIXED CHEMICAL SOLUTION RECOVERING METHOD AND PROGRAM STORAGE MEDIUM 有权
标题翻译：保护膜去除装置，混合化学溶液回收方法和程序存储介质
公开(公告)号：US20070215178A1
公开(公告)日：2007-09-20
申请号：US11681977
申请日：2007-03-05
申请人： Taro Yamamoto , Kousuke Yoshihara
发明人： Taro Yamamoto , Kousuke Yoshihara
IPC分类号： B08B7/04 , B08B3/04 , B08B3/00
CPC分类号： H01L21/6715 , H01L21/6708
摘要： The present invention improves recover percentage at which a mixed chemical solution discharged from a protective film removing device.The protective film removing device includes: a recovery line communicating with an atmosphere surrounding a substrate to recover a mixed chemical solution, an intermediate tank connected to the outlet end of the recovery line, a volatilization preventing liquid supply means for supplying a volatilization preventing liquid having a specific gravity smaller than that of the mixed chemical solution into the intermediate tank in advance, a transfer line having an inlet end connected to the intermediate tank and provided with a valve, a recovery tank connected to an outlet end of the transfer line, a liquid quantity monitoring means for monitoring a quantity of a liquid contained in the intermediate tank, and a control means for opening the valve of the transfer line to transfer the liquid contained in the intermediate tank to the recovery tank when it is decided that the quantity of the liquid contained in the intermediate tank reached a predetermined quantity on the basis of a signal provided by the liquid quantity monitoring means.
摘要翻译：本发明提高从保护膜去除装置排出的混合化学溶液的回收率。保护膜去除装置包括：与基板周围的气氛连通以回收混合化学溶液的回收管线，连接到回收管线出口端的中间罐，用于供应防挥发液体的挥发防止液体供应装置，预先将比重小于混合化学溶液的比重，具有连接到中间罐并具有阀的入口端的输送管线，连接到输送管线的出口端的回收罐，液体监测装置，用于监测包含在中间罐中的液体的量;以及控制装置，用于打开输送管线的阀门，以将包含在中间罐中的液体转移到回收罐中，当确定量包含在中间罐中的液体基于信号产生器达到预定量由液量监控装置维持。

39. 发明申请

US20070122551A1 Coater/developer and coating/developing method 失效
标题翻译：涂料/显影剂和涂料/显影方法
公开(公告)号：US20070122551A1
公开(公告)日：2007-05-31
申请号：US10581713
申请日：2004-12-03
申请人： Taro Yamamoto , Osamu Hirakawa
发明人： Taro Yamamoto , Osamu Hirakawa
IPC分类号： B05D3/12
CPC分类号： H01L21/67271 , G03F7/3021 , G03F7/70341 , H01L21/67034 , H01L21/6708 , H01L21/67253
摘要： A coating and developing system prevents wetting its component units with water when the coating and developing system forms a resist film on a substrate and processes the substrate processed by immersion exposure by a developing process. A substrate having a surface coated with a resist film and processed by immersion exposure is placed on a substrate support device and a liquid detector detects at least the liquid formed a liquid film for immersion exposure and remaining on the surface of the substrate. A decision is made as to whether or not the substrate needs to be dried on the basis of the result of detection made by the liquid detector. If it is decided that the substrate needs to be dried, the substrate is dried by a drying means. Thus wetting the interior of the coating and developing system with water can be prevented. Since only substrates that need to be dried are subjected to a drying process, the coating and developing system is able to operate at a high throughput.
摘要翻译：当涂层和显影系统在基底上形成抗蚀剂膜时，涂层和显影系统防止用水润湿其组分单元，并通过显影过程对通过浸渍曝光处理的基底进行处理。具有涂覆有抗蚀剂膜并通过浸渍曝光处理的表面的基板被放置在基板支撑装置上，并且液体检测器至少检测形成用于浸没曝光的液体膜并保留在基板的表面上的液体。基于由液体检测器进行的检测结果确定基板是否需要被干燥。如果确定衬底需要干燥，则通过干燥装置干燥衬底。因此可以防止涂层和显影系统内部的水分润湿。由于仅需要干燥的基材经受干燥处理，所以涂层和显影系统能够以高产量进行操作。

40. 发明申请

US20070119479A1 Rinse method and developing apparatus 有权
标题翻译：冲洗方法和显影装置
公开(公告)号：US20070119479A1
公开(公告)日：2007-05-31
申请号：US11602390
申请日：2006-11-21
申请人： Kousuke Yoshihara , Junji Nakamura , Hirofumi Takeguchi , Taro Yamamoto
发明人： Kousuke Yoshihara , Junji Nakamura , Hirofumi Takeguchi , Taro Yamamoto
IPC分类号： B08B7/04 , B08B3/00
CPC分类号： H01L21/67051 , H01L21/67253
摘要： A rinse method for rinsing a substrate having an exposure pattern thereon developed includes presetting conditions for a rinse process according to surface states of the substrate, measuring a surface state of the substrate, selecting a corresponding condition for the rinse process based on the measured surface state of the substrate, and performing the rinse process under the selected condition.
摘要翻译：用于漂洗其上具有曝光图案的基板的冲洗方法包括根据基板的表面状态的冲洗过程的预设条件，测量基板的表面状态，基于测量的表面状态选择冲洗过程的相应条件并在所选择的条件下进行冲洗过程。

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