专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08445189B2 Developing device and developing method 有权
标题翻译：开发设备和开发方法
公开(公告)号：US08445189B2
公开(公告)日：2013-05-21
申请号：US13024939
申请日：2011-02-10
申请人： Taro Yamamoto , Kousuke Yoshihara , Hideharu Kyouda , Hirofumi Takeguchi , Atsushi Ookouchi
发明人： Taro Yamamoto , Kousuke Yoshihara , Hideharu Kyouda , Hirofumi Takeguchi , Atsushi Ookouchi
IPC分类号： G03C5/18 , G03C5/26 , B05B7/06 , B05B3/00
CPC分类号： G03F7/3028 , G03F7/3021
摘要： The temperature of a developing solution is varied depending on the type of resist or the resist pattern. The developing solution is applied while scanning a developer nozzle having a slit-shaped ejection port that has a length matching the width of the effective area of the substrate. After leaving the substrate with the developing solution being coated thereon for a predetermined period of time, a diluent is supplied while scanning a diluent nozzle, thereby substantially stopping the development reaction and causing the dissolved resist components to diffuse. A desired amount of resist can be quickly dissolved through the control of the developing solution temperature, while the development can be stopped before the dissolved resist components exhibit adverse effect through the supply of the diluent a predetermined timing, whereby achieving a pattern having a uniform line width and improved throughput.
摘要翻译：显影液的温度根据抗蚀剂的种类或抗蚀剂图案而变化。当扫描具有与衬底的有效面积的宽度匹配的长度的狭缝形喷射口的显影剂喷嘴时，施加显影溶液。在将其上涂覆有显影液的基板离开预定时间后，在扫描稀释剂喷嘴的同时供给稀释剂，从而基本上停止显影反应并使溶解的抗蚀剂组分扩散。可以通过控制显影液温度来快速溶解所需量的抗蚀剂，同时可以通过在预定时间内提供稀释剂而使溶解的抗蚀剂组分显示出不利影响之前，可以停止显影，从而获得具有均匀线的图案宽度和提高吞吐量。

2. 发明申请

US20110200321A1 COATING AND DEVELOPING APPARATUS, DEVELOPING METHOD AND NON-TRANSITORY MEDIUM 有权
标题翻译：涂料和开发设备，开发方法和非交联介质
公开(公告)号：US20110200321A1
公开(公告)日：2011-08-18
申请号：US13025300
申请日：2011-02-11
申请人： Yasushi Takiguchi , Taro Yamamoto , Hiroshi Arima , Kousuke Yoshihara , Yuichi Yoshida
发明人： Yasushi Takiguchi , Taro Yamamoto , Hiroshi Arima , Kousuke Yoshihara , Yuichi Yoshida
IPC分类号： G03B13/00
CPC分类号： G03B27/52 , G03F7/3021 , H01L21/6715 , H01L21/67178 , H01L21/6719 , H01L21/67745 , H01L21/67748 , H01L21/68742 , H01L21/68785
摘要： There is provided a coating and developing apparatus that develops a substrate of which surface is coated with resist and exposed to lights. The coating and developing apparatus includes a developing module; a cleaning module; and a transfer mechanism configured to transfer a substrate developed by the developing module to the cleaning module. The developing module includes an airtightly sealed processing vessel configured to form a processing atmosphere; a temperature control plate provided in the processing vessel and mounts thereon the substrate and cools the substrate; and an atmosphere gas supply unit configured to supply an atmosphere gas including mist of a developing solution to a surface of the substrate within the processing vessel. The cleaning module includes a mounting table configured to mount thereon the substrate; and a cleaning solution supply unit configured to supply a cleaning solution to the substrate mounted on the mounting table.
摘要翻译：提供了一种涂覆和显影装置，其显影其表面被抗蚀剂涂覆并暴露于光的基底。涂料和显影装置包括显影模块; 清洁模块; 以及传送机构，其构造成将由显影模块显影的基板传送到清洁模块。显影模块包括构造成形成处理气氛的气密密封处理容器; 设置在处理容器中并安装在其上的温度控制板并冷却基板; 以及气氛气体供给单元，被构造成将处理容器内的显影液的气雾气体气体供给至基板的表面。清洁模块包括：安装台，其安装在其上; 以及清洗液供给单元，其构造成将清洗液供给到安装在所述安装台上的基板。

3. 发明授权

US07918182B2 Developing device and developing method 有权
标题翻译：开发设备和开发方法
公开(公告)号：US07918182B2
公开(公告)日：2011-04-05
申请号：US10584265
申请日：2004-12-24
申请人： Taro Yamamoto , Kousuke Yoshihara , Hideharu Kyouda , Hirofumi Takeguchi , Atsushi Ookouchi
发明人： Taro Yamamoto , Kousuke Yoshihara , Hideharu Kyouda , Hirofumi Takeguchi , Atsushi Ookouchi
IPC分类号： B05C11/10
CPC分类号： G03F7/3028 , G03F7/3021
摘要： The temperature of a developing solution is varied depending on the type of resist or the resist pattern. The developing solution is applied while scanning a developer nozzle having a slit-shaped ejection port that has a length matching the width of the effective area of the substrate. After leaving the substrate with the developing solution being coated thereon for a predetermined period of time, a diluent is supplied while scanning a diluent nozzle, thereby substantially stopping the development reaction and causing the dissolved resist components to diffuse. A desired amount of resist can be quickly dissolved through the control of the developing solution temperature, while the development can be stopped before the dissolved resist components exhibit adverse effect through the supply of the diluent a predetermined timing, whereby achieving a pattern having a uniform line width and improved throughput.
摘要翻译：显影液的温度根据抗蚀剂的种类或抗蚀剂图案而变化。当扫描具有与衬底的有效面积的宽度匹配的长度的狭缝形喷射口的显影剂喷嘴时，施加显影溶液。在将其上涂覆有显影液的基板离开预定时间后，在扫描稀释剂喷嘴的同时供给稀释剂，从而基本上停止显影反应并使溶解的抗蚀剂组分扩散。可以通过控制显影液温度来快速溶解所需量的抗蚀剂，同时可以通过在预定时间内提供稀释剂而使溶解的抗蚀剂组分显示出不利影响之前，可以停止显影，从而实现具有均匀线的图案宽度和提高吞吐量。

4. 发明授权

US07742146B2 Coating and developing method, coating and developing system and storage medium 有权
标题翻译：涂层和显影方法，涂层和显影系统和储存介质
公开(公告)号：US07742146B2
公开(公告)日：2010-06-22
申请号：US11623481
申请日：2007-01-16
申请人： Hideharu Kyouda , Kousuke Yoshihara , Taro Yamamoto
发明人： Hideharu Kyouda , Kousuke Yoshihara , Taro Yamamoto
IPC分类号： G03B27/52 , G03D5/00 , H01L21/00
CPC分类号： G03F7/2041 , G03F7/11 , G03F7/38
摘要： A resist film formed on a substrate is coated with a water-repellent protective film and the substrate is subjected to a developing process after the substrate has been processed by an immersion exposure process. The protective film is removed from the substrate after the resist film has been processed by the immersion exposure process, the substrate is processed by a heating process, and then the substrate is subjected to a developing process. The surface of the substrate is cleaned with a cleaning liquid before the protective film is removed and after the substrate has been processed by the immersion exposure process or the surface of the substrate is cleaned with a cleaning liquid after removing the protective film and before the substrate is subjected to the heating process.
摘要翻译：在基板上形成的抗蚀剂膜涂覆有防水保护膜，并且在通过浸没曝光工艺处理基板之后对基板进行显影处理。在通过浸渍曝光工艺处理了抗蚀剂膜之后，从基板上除去保护膜，通过加热工艺处理基板，然后对基板进行显影处理。在除去保护膜之前，用浸渍曝光工序处理基板后，用清洗液清洗基板的表面，在除去保护膜之后和基板之前用清洗液清洗基板的表面进行加热处理。

5. 发明申请

US20070184178A1 Developing device and developing method 有权
标题翻译：开发设备和开发方法
公开(公告)号：US20070184178A1
公开(公告)日：2007-08-09
申请号：US10584265
申请日：2004-12-24
申请人： Taro Yamamoto , Kousuke Yoshihara , Hideharu Kyouda , Hirofumi Takeguchi , Atsushi Ookouchi
发明人： Taro Yamamoto , Kousuke Yoshihara , Hideharu Kyouda , Hirofumi Takeguchi , Atsushi Ookouchi
IPC分类号： B05C11/00 , B05B7/06 , B05D1/02 , B05B3/00
CPC分类号： G03F7/3028 , G03F7/3021
摘要： The temperature of a developing solution is varied depending on the type of resist or the resist pattern. The developing solution is applied while scanning a developer nozzle having a slit-shaped ejection port that has a length matching the width of the effective area of the substrate. After leaving the substrate with the developing solution being coated thereon for a predetermined period of time, a diluent is supplied while scanning a diluent nozzle, thereby substantially stopping the development reaction and causing the dissolved resist components to diffuse. A desired amount of resist can be quickly dissolved through the control of the developing solution temperature, while the development can be stopped before the dissolved resist components exhibit adverse effect through the supply of the diluent a predetermined timing, whereby achieving a pattern having a uniform line width and improved throughput.
摘要翻译：显影液的温度根据抗蚀剂的种类或抗蚀剂图案而变化。当扫描具有与衬底的有效面积的宽度匹配的长度的狭缝形喷射口的显影剂喷嘴时，施加显影溶液。在将其上涂覆有显影液的基板离开预定时间后，在扫描稀释剂喷嘴的同时供给稀释剂，从而基本上停止显影反应并使溶解的抗蚀剂组分扩散。可以通过控制显影液温度来快速溶解所需量的抗蚀剂，同时可以通过在预定时间内提供稀释剂而使溶解的抗蚀剂组分显示出不利影响之前，可以停止显影，从而获得具有均匀线的图案宽度和提高吞吐量。

6. 发明授权

US08398319B2 Developing apparatus, developing method, and storage medium 有权
标题翻译：显影装置，显影方法和存储介质
公开(公告)号：US08398319B2
公开(公告)日：2013-03-19
申请号：US12718104
申请日：2010-03-05
申请人： Hiroshi Arima , Yuichi Yoshida , Taro Yamamoto , Kousuke Yoshihara
发明人： Hiroshi Arima , Yuichi Yoshida , Taro Yamamoto , Kousuke Yoshihara
IPC分类号： G03D5/00
CPC分类号： G03F7/3021 , H01L21/6715
摘要： A developing apparatus including a substrate holder that holds a substrate horizontally; means for atomizing a surface treatment liquid used to improve wettability of the substrate with a developer; a first spray nozzle that sprays the atomized surface treatment liquid onto the substrate; and a developer supply nozzle that supplies a developer onto the substrate to which the substrate treatment liquid has been sprayed. The surface tension of the atomized surface treatment liquid with respect to the substrate is lower than the surface tension of the surface treatment liquid with respect to the substrate. The atomization suppresses the fact that the surface treatment liquid gathers on a certain portion of the surface of the substrate. The surface treatment liquid can be easily supplied onto the entire surface of the substrate, and improve wettability of the substrate with the developer.
摘要翻译：一种显影装置，包括：水平保持基板的基板支架; 用于使用显影剂使用于改善基材的润湿性的表面处理液体雾化的装置; 将雾化的表面处理液体喷射到基板上的第一喷嘴; 以及将显影剂供给到已经喷射了基板处理液的基板上的显影剂供给喷嘴。雾化表面处理液相对于基材的表面张力低于表面处理液相对于基材的表面张力。雾化抑制了表面处理液体聚集在基材表面的某一部分上的事实。可以容易地将表面处理液体提供到基板的整个表面上，并且改善基板与显影剂的润湿性。

7. 发明授权

US08216389B2 Substrate cleaning method and substrate cleaning apparatus 有权
标题翻译：基板清洗方法和基板清洗装置
公开(公告)号：US08216389B2
公开(公告)日：2012-07-10
申请号：US12400419
申请日：2009-03-09
申请人： Kousuke Yoshihara , Yuichi Yoshida , Taro Yamamoto
发明人： Kousuke Yoshihara , Yuichi Yoshida , Taro Yamamoto
IPC分类号： B08B7/00 , B08B3/02
CPC分类号： G03F7/168 , B08B3/024 , G03F7/3021 , H01L21/67051
摘要： A substrate cleaning method that includes: a step in which, while a substrate holder is being continuously rotated, a to-be-discharged position of the cleaning liquid on the substrate is changed to an eccentric position deviated from the central part of the substrate, and a gas is discharged from a gas nozzle to the central part of the substrate so as to form a dried area of the cleaning liquid under a condition in which a shortest distance between an edge of a cleaning liquid flow output from the cleaning-liquid nozzle and an edge of a gas flow output from the gas nozzle is set between 9 mm and 15 mm.
摘要翻译：一种基板清洗方法，其特征在于，包括：在基板保持件持续旋转的同时，将基板上的清洗液的排出位置变更为偏离基板的中心部的偏心位置，气体从气体喷嘴排出到基板的中心部分，以便在从清洗液喷嘴输出的清洗液流的边缘之间的最短距离的条件下形成清洁液体的干燥区域并且从气体喷嘴输出的气流的边缘被设定在9mm和15mm之间。

8. 发明授权

US08026048B2 Developing apparatus and developing method 有权
标题翻译：开发设备和开发方法
公开(公告)号：US08026048B2
公开(公告)日：2011-09-27
申请号：US12877612
申请日：2010-09-08
申请人： Atsushi Ookouchi , Taro Yamamoto , Hirofumi Takeguchi , Hideharu Kyouda , Kousuke Yoshihara
发明人： Atsushi Ookouchi , Taro Yamamoto , Hirofumi Takeguchi , Hideharu Kyouda , Kousuke Yoshihara
IPC分类号： G03F7/00 , G03F7/26 , G03F7/30 , B05C5/02
CPC分类号： H01L21/67051 , G03F7/3021 , H01L21/6708 , H01L21/6715 , H01L21/6719 , Y10S134/902
摘要： A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is supplied to the surface of the wafer, the developer nozzle having a slit-like ejection port whose longitudinal direction is oriented to the direction perpendicular to the radial direction of the wafer. The movement speed of the nozzle is higher than a case where a nozzle with a small-diameter circular nozzle is used, and this enables a development time to be reduced. Further, the thickness of a developing solution on a substrate can be reduced, so that the developing solution can be saved.
摘要翻译：显影剂喷嘴从晶片的周边朝向中心部分移动，同时保持在旋转卡盘处的暴露的基板围绕垂直轴线旋转并且显影液从显影剂喷嘴排出，并且以这种方式，显影液被提供到晶片的表面，显影剂喷嘴具有狭缝状喷射口，其纵向方向定向为垂直于晶片的径向的方向。喷嘴的移动速度高于使用具有小直径圆形喷嘴的喷嘴的情况，这使得能够减少显影时间。此外，可以减少基板上的显影液的厚度，从而可以节省显影液。

9. 发明授权

US07896562B2 Developing method, developing apparatus and storage medium 有权
标题翻译：显影方法，显影装置和存储介质
公开(公告)号：US07896562B2
公开(公告)日：2011-03-01
申请号：US12173285
申请日：2008-07-15
申请人： Taro Yamamoto , Hirofumi Takeguchi , Atsushi Ookouchi , Kousuke Yoshihara
发明人： Taro Yamamoto , Hirofumi Takeguchi , Atsushi Ookouchi , Kousuke Yoshihara
IPC分类号： G03D5/00 , G03B27/32 , B05C11/02
CPC分类号： H01L21/6715 , G03F7/3021
摘要： A method of supplying a developing solution is provided. The method includes supplying a developing solution onto a substrate from a first developing solution nozzle, so as to form a ribbon-like region on the surface of the substrate, while rotating the substrate about a vertical axis via a substrate holding part. The method further includes shifting a position of the ribbon-like region in which the developing solution is supplied. Developing solution is supplied from a second developing solution nozzle, so as to form a circular region on the central portion of the substrate or form a ribbon-like region shorter in length than the ribbon-like region of the developing solution supplied from the first developing nozzle. Simultaneously, the substrate is rotated about the vertical axis via the substrate holding part, thereby spreading the developing solution toward a peripheral portion of the substrate by centrifugal force.
摘要翻译：提供了提供显影液的方法。该方法包括从第一显影液喷嘴将显影液供给到基板上，以便在基板表面上形成带状区域，同时通过基板保持部件绕垂直轴线旋转基板。该方法还包括移动其中供应显影液的带状区域的位置。显影溶液由第二显影剂溶液喷嘴提供，以在基材的中心部分上形成圆形区域，或形成比从第一显影剂供应的显影溶液的带状区域的长度短的带状区域喷嘴。同时，基板经由基板保持部围绕垂直轴线旋转，从而通过离心力将显影液向基板的周边部分扩散。

10. 发明授权

US08333522B2 Developing apparatus, developing method and storage medium 有权
标题翻译：显影装置，显影方法和存储介质
公开(公告)号：US08333522B2
公开(公告)日：2012-12-18
申请号：US13025490
申请日：2011-02-11
申请人： Hiroshi Arima , Kousuke Yoshihara , Yuichi Yoshida , Yasushi Takiguchi , Taro Yamamoto
发明人： Hiroshi Arima , Kousuke Yoshihara , Yuichi Yoshida , Yasushi Takiguchi , Taro Yamamoto
IPC分类号： G03D5/00
CPC分类号： G03F7/3021
摘要： There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form a liquid film of the developing solution on a surface of a substrate loaded into the processing vessel; and a drying unit that dries the substrate in order to stop a developing process by the liquid film. A reaction between a resist and the developing solution can be stopped. Therefore, a developing process can be performed in parallel with a cleaning process performed by a cleaning module and high throughput is achieved.
摘要翻译：提供了能够实现高产量的显影装置。显影装置包括在其中形成处理气氛的气密密封处理容器; 气氛气体供给单元，其将含有显影液雾的气氛气体供给到处理容器中，以在装载到处理容器中的基板的表面上形成显影液的液膜; 以及干燥单元，其干燥基板以便通过液膜来停止显影处理。可以停止抗蚀剂与显影液的反应。因此，可以与由清洁模块执行的清洁处理并行执行显影处理，并且实现高生产率。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式