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31. 发明申请

WO2006071544A2 METHODS FOR SILICON ELECTRODE ASSEMBLY ETCH RATE AND ETCH UNIFORMITY RECOVERY 审中-公开
标题翻译：用于硅电极组装电压和电流均匀性恢复的方法
公开(公告)号：WO2006071544A2
公开(公告)日：2006-07-06
申请号：PCT/US2005/045361
申请日：2005-12-15
申请人： LAM RESEARCH CORPORATION , HUANG, Tuochuan , REN, Daxing , SHIH, Hong , ZHOU, Catherine , YAN, Chun , MAGNI, Enrico , YEN, Bi, Ming , HUBACEK, Jerome , LIM, Dae, J. , SUNG, Dougyong
发明人： HUANG, Tuochuan , REN, Daxing , SHIH, Hong , ZHOU, Catherine , YAN, Chun , MAGNI, Enrico , YEN, Bi, Ming , HUBACEK, Jerome , LIM, Dae, J. , SUNG, Dougyong
IPC分类号： B44C1/22 , C23F1/00
CPC分类号： H01L21/67069 , B08B3/10 , B08B3/12 , B24C1/003 , H01J37/32605
摘要： Methods for cleaning an electrode assembly, which can be used for etching a dielectric material in a plasma etching chamber after the cleaning, comprise polishing a silicon surface of the electrode assembly, preferably to remove black silicon contamination therefrom.
摘要翻译：用于清洁电极组件的方法，其可以用于在清洁之后蚀刻等离子体蚀刻室中的电介质材料，包括抛光电极组件的硅表面，优选从其中去除黑色硅污染物。

32. 发明申请

WO2006071535A2 SILICON ELECTRODE ASSEMBLY SURFACE DECONTAMINATION BY ACIDIC SOLUTION 审中-公开
标题翻译：硅电极组件表面去酸化酸性溶液
公开(公告)号：WO2006071535A2
公开(公告)日：2006-07-06
申请号：PCT/US2005/045273
申请日：2005-12-14
申请人： LAM RESEARCH CORPORATION , SHIH, Hong , HUANG, Tuochuan , ZHOU, Chunhong
发明人： SHIH, Hong , HUANG, Tuochuan , ZHOU, Chunhong
IPC分类号： H01L21/302
CPC分类号： C11D11/0047 , C11D7/08 , Y10T137/0329
摘要： Methods for cleaning silicon surfaces of electrode assemblies by efficiently removing contaminants from the silicon surfaces without discoloring the silicon surfaces using an acidic solution comprising hydrofluoric acid, nitric acid, acetic acid, and balance deionized water.
摘要翻译：通过使用包含氢氟酸，硝酸，乙酸和余量的去离子水的酸性溶液有效地从硅表面除去污染物而不使硅表面变色来清洁电极组件的硅表面的方法。

33. 发明申请

WO2012061362A2 ELECTRODE SECURING PLATENS AND ELECTRODE POLISHING ASSEMBLIES INCORPORATING THE SAME 审中-公开
标题翻译：电极安装板和电极抛光组件
公开(公告)号：WO2012061362A2
公开(公告)日：2012-05-10
申请号：PCT/US2011/058745
申请日：2011-11-01
申请人： LAM RESEARCH CORPORATION , LA CROIX, Cliff , AVOYAN, Armen , OUTKA, Duane , ZHOU, Catherine , SHIH, Hong
发明人： LA CROIX, Cliff , AVOYAN, Armen , OUTKA, Duane , ZHOU, Catherine , SHIH, Hong
IPC分类号： H01L21/304
CPC分类号： B24B37/30 , B24B41/061
摘要： In one embodiment, an electrode polishing assembly may include an electrode securing platen, a plurality of electrode locating fasteners, and an electrode. Each of the electrode locating fasteners may include an electrode spacing shoulder, a variance cancelling shoulder extending from the electrode spacing shoulder, a threaded platen clamping portion extending from the variance cancelling shoulder, and a threaded nut that engages the threaded platen clamping portion. The electrode locating fasteners clamp the electrode securing platen between the threaded nut and the electrode spacing shoulder. The variance cancelling shoulder is at least partially within one of a plurality of variance cancelling passages of the electrode securing platen. A minimum position stack-up is equal to a minimum passage size minus a maximum shoulder size. A maximum position stack-up is equal to a maximum passage size minus a minimum shoulder size. The maximum position stack-up is greater than the minimum position stack-up.
摘要翻译：在一个实施例中，电极抛光组件可以包括电极固定压板，多个电极定位紧固件和电极。每个电极定位紧固件可以包括电极间隔肩部，从电极间隔肩部延伸的方差消除肩部，从变形消除肩部延伸的螺纹压板夹持部分和与螺纹压板夹持部分接合的螺纹螺母。电极定位紧固件将电极固定压板夹在螺母和电极间隔肩之间。方差消除肩部至少部分地在电极固定台板的多个方差消除通路之一内。最小位置叠加等于最小通道尺寸减去最大肩部尺寸。最大位置叠加等于最大通道尺寸减去最小肩部尺寸。最大位置叠加大于最小位置叠加。

34. 发明申请

WO2010068753A2 IMMERSIVE OXIDATION AND ETCHING PROCESS FOR CLEANING SILICON ELECTRODES 审中-公开
标题翻译：用于清洁硅电极的强力氧化和蚀刻工艺
公开(公告)号：WO2010068753A2
公开(公告)日：2010-06-17
申请号：PCT/US2009067495
申请日：2009-12-10
申请人： LAM RES CORP , ZHOU CATHERINE , OUTKA DUANE , AVOYAN ARMEN , SHIH HONG
发明人： ZHOU CATHERINE , OUTKA DUANE , AVOYAN ARMEN , SHIH HONG
IPC分类号： H05H1/34 , H05H1/42
CPC分类号： B24B41/06 , B08B3/08 , B08B3/12 , C11D7/08 , C11D7/261 , C11D7/265 , C11D11/0047
摘要： A process for cleaning a silicon electrode is provided where the silicon electrode is soaked in an agitated aqueous detergent solution and rinsed with water following removal from the aqueous detergent solution. The rinsed silicon electrode is then soaked in an agitated isopropyl alcohol (IPA) solution and rinsed. The silicon electrode is then subjected to an ultrasonic cleaning operation in water following removal from the IPA solution. Contaminants are then removed from the silicon electrode by soaking the silicon electrode in an agitated mixed acid solution comprising hydrofluoric acid, nitric acid, acetic acid, and water. The silicon electrode is subjected to an additional ultrasonic cleaning operation following removal from the mixed acid solution and is subsequently rinsed and dried. In other embodiments of the present disclosure, it is contemplated that the silicon electrode can be soaked in either the agitated aqueous detergent solution, the agitated isopropyl alcohol (IPA) solution, or both. Additional embodiments are contemplated, disclosed, and claimed.
摘要翻译：提供一种清洁硅电极的方法，其中硅电极浸泡在搅拌的含水洗涤剂溶液中，并且在从洗涤剂水溶液中除去之后用水漂洗。然后将冲洗的硅电极浸泡在搅拌的异丙醇（IPA）溶液中并漂洗。然后在从IPA溶液中除去之后，将硅电极进行超声波清洗操作。然后通过将硅电极浸入包含氢氟酸，硝酸，乙酸和水的搅拌的混合酸溶液中从硅电极中除去污染物。在从混合酸溶液中除去之后，对硅电极进行附加的超声波清洗操作，随后漂洗并干燥。在本公开的其它实施例中，预期硅电极可以浸泡在搅拌的含水洗涤剂溶液，搅拌的异丙醇（IPA）溶液中或两者中。额外的实施例被设想，公开和要求保护。

35. 发明申请

WO2010002631A3 PROCESSES FOR RECONDITIONING MULTI-COMPONENT ELECTRODES 审中-公开
公开(公告)号：WO2010002631A3
公开(公告)日：2010-01-07
申请号：PCT/US2009/048244
申请日：2009-06-23
申请人： LAM RESEARCH CORPORATION , AVOYAN, Armen , FANG, Yan , OUTKA, Duane , SHIH, Hong , WHITTEN, Stephen
发明人： AVOYAN, Armen , FANG, Yan , OUTKA, Duane , SHIH, Hong , WHITTEN, Stephen
IPC分类号： H05H1/34
摘要： A process for reconditioning a multi-component electrode comprising a silicon electrode bonded to an electrically conductive backing plate is provided. The process comprises: (i) removing metal ions from the multi-component electrode by soaking the multi-component electrode in a substantially alcohol-free DSP solution comprising sulfuric acid, hydrogen peroxide, and water and rinsing the multi-component electrode with de-ionized water; (ii) polishing one or more surfaces of the multi-component electrode following removal of metal ions there from; and (iii) removing contaminants from silicon surfaces of the multi-component electrode by treating the polished multi-component electrode with a mixed acid solution comprising hydrofluoric acid, nitric acid, acetic acid, and water and by rinsing the treated multi-component electrode with de-ionized water. Additional embodiments of broader and narrower scope are contemplated.

36. 发明申请

WO2010002631A2 PROCESSES FOR RECONDITIONING MULTI-COMPONENT ELECTRODES 审中-公开
标题翻译：用于重新组装多组分电极的方法
公开(公告)号：WO2010002631A2
公开(公告)日：2010-01-07
申请号：PCT/US2009048244
申请日：2009-06-23
申请人： LAM RES CORP , AVOYAN ARMEN , FANG YAN , OUTKA DUANE , SHIH HONG , WHITTEN STEPHEN
发明人： AVOYAN ARMEN , FANG YAN , OUTKA DUANE , SHIH HONG , WHITTEN STEPHEN
IPC分类号： H05H1/34
CPC分类号： H01J37/32862 , H01J37/32559
摘要： A process for reconditioning a multi-component electrode comprising a silicon electrode bonded to an electrically conductive backing plate is provided. The process comprises: (i) removing metal ions from the multi-component electrode by soaking the multi-component electrode in a substantially alcohol-free DSP solution comprising sulfuric acid, hydrogen peroxide, and water and rinsing the multi-component electrode with de-ionized water; (ii) polishing one or more surfaces of the multi-component electrode following removal of metal ions there from; and (iii) removing contaminants from silicon surfaces of the multi-component electrode by treating the polished multi-component electrode with a mixed acid solution comprising hydrofluoric acid, nitric acid, acetic acid, and water and by rinsing the treated multi-component electrode with de-ionized water. Additional embodiments of broader and narrower scope are contemplated.
摘要翻译：提供了一种用于再生多组分电极的方法，其包括结合到导电背板的硅电极。该方法包括：（i）通过将多组分电极浸入含有硫酸，过氧化氢和水的基本上不含醇的DSP溶液中并从而从多组分电极中除去金属离子，并用去离子水冲洗多组分电极，电离水; （ii）在从其去除金属离子之后抛光多组分电极的一个或多个表面; 和（iii）通过用包含氢氟酸，硝酸，乙酸和水的混合酸溶液处理抛光的多组分电极，并通过用处理过的多组分电极进行漂洗来处理多组分电极的硅表面的污染物去离子水。考虑到更广泛和更窄范围的另外的实施例。

37. 发明申请

WO2009110980A3 METHOD FOR INSPECTING ELECTROSTATIC CHUCKS WITH KELVIN PROBE ANALYSIS 审中-公开
标题翻译：用Kelvin探针分析检查静电卡箍的方法
公开(公告)号：WO2009110980A3
公开(公告)日：2009-12-03
申请号：PCT/US2009001224
申请日：2009-02-26
申请人： LAM RES CORP , AVOYAN ARMEN , SHIH HONG , DAUGHERTY JOHN
发明人： AVOYAN ARMEN , SHIH HONG , DAUGHERTY JOHN
IPC分类号： H01L21/66 , H01L21/683 , H01L21/687
CPC分类号： H01L21/6833 , H01L21/67069 , H01L21/67253
摘要： ABSTRACT A method of inspecting an electrostatic chuck (ESC) is provided. The ESC has a dielectric support surface for a semiconductor wafer. The dielectric support surface is scanned with a Kelvin probe to obtain a surface potential map. The surface potential map is compared with a reference Kelvin probe surface potential map to determine if the ESC passes inspection.
摘要翻译：摘要提供了一种检查静电吸盘（ESC）的方法。 ESC具有用于半导体晶片的电介质支撑表面。用Kelvin探针扫描介电支撑表面以获得表面电位图。将表面电位图与参考开尔文探针表面电位图进行比较以确定ESC是否通过检查。

38. 发明申请

WO2009110980A2 METHOD FOR INSPECTING ELECTROSTATIC CHUCKS WITH KELVIN PROBE ANALYSIS 审中-公开
标题翻译：用KELVIN探针分析检查静电切片的方法
公开(公告)号：WO2009110980A2
公开(公告)日：2009-09-11
申请号：PCT/US2009/001224
申请日：2009-02-26
申请人： LAM RESEARCH CORPORATION , AVOYAN, Armen , SHIH, Hong , DAUGHERTY, John
发明人： AVOYAN, Armen , SHIH, Hong , DAUGHERTY, John
IPC分类号： H01L21/66
CPC分类号： H01L21/6833 , H01L21/67069 , H01L21/67253
摘要： ABSTRACT A method of inspecting an electrostatic chuck (ESC) is provided. The ESC has a dielectric support surface for a semiconductor wafer. The dielectric support surface is scanned with a Kelvin probe to obtain a surface potential map. The surface potential map is compared with a reference Kelvin probe surface potential map to determine if the ESC passes inspection.
摘要翻译：摘要提供了一种检查静电卡盘（ESC）的方法。 ESC具有用于半导体晶片的电介质支撑表面。用开尔文探针扫描电介质支撑表面以获得表面电位图。将表面电位图与参考开尔文探针表面电位图进行比较，以确定ESC是否通过检查。

39. 发明申请

WO2008121287A1 METHODOLOGY FOR CLEANING OF SURFACE METAL CONTAMINATION FROM ELECTRODE ASSEMBLIES 审中-公开
标题翻译：从电极组件清洗表面金属污染的方法
公开(公告)号：WO2008121287A1
公开(公告)日：2008-10-09
申请号：PCT/US2008/003969
申请日：2008-03-27
申请人： LAM RESEARCH CORPORATION , SHIH, Hong , YIN, Yaobo , WU, Shun, Jackson , AVOYAN, Armen , DAUGHERTY, John, E. , JIANG, Linda
发明人： SHIH, Hong , YIN, Yaobo , WU, Shun, Jackson , AVOYAN, Armen , DAUGHERTY, John, E. , JIANG, Linda
IPC分类号： H01L21/3065
CPC分类号： B08B3/08 , B08B3/12 , H01J37/32862 , H01L21/67051 , H01L21/67069
摘要： Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications and manufacturing yields are enhanced. Pre-cleaning of tools used in the cleaning process helps prevent contamination of the electrode being cleaned.
摘要翻译：系统和有效的清洁电容耦合等离子体反应堆电极的方法，并降低表面粗糙度，从而提高清洁电极满足表面污染规格和制造产量。对清洁过程中使用的工具进行预清洁有助于防止被清洁电极的污染。

40. 发明申请

WO2008048443A1 METHODS AND APPARATUS FOR WET CLEANING ELECTRODE ASSEMBLIES FOR PLASMA PROCESSING APPARATUSES 审中-公开
标题翻译：用于等离子体处理装置的清洁电极组件的方法和装置
公开(公告)号：WO2008048443A1
公开(公告)日：2008-04-24
申请号：PCT/US2007/021628
申请日：2007-10-10
申请人： LAM RESEARCH CORPORATION , SHIH, Hong , YIN, Yaobo , AUGUSTINO, Jason , ZHOU, Catherine , AVOYAN, Armen
发明人： SHIH, Hong , YIN, Yaobo , AUGUSTINO, Jason , ZHOU, Catherine , AVOYAN, Armen
IPC分类号： H01L21/306 , H01L21/3065
CPC分类号： C23C16/4407 , B08B1/00 , B08B3/02 , B08B3/12
摘要： Methods of cleaning backing plates of electrode assemblies, or electrode assemblies including a backing plate and an electrode plate are provided. The methods can be used to clean backing plates and electrode plates made of various materials, such as silicon electrode plates and graphite and aluminum backing plates. The backing plates and electrode assemblies can be new, used or refurbished. A flushing fixture that can be used in the cleaning methods is also provided.
摘要翻译：提供了清洁电极组件的背板或包括背板和电极板的电极组件的方法。该方法可用于清洁由各种材料制成的背板和电极板，例如硅电极板和石墨和铝背板。背板和电极组件可以是新的，使用的或翻新的。还提供了可用于清洁方法的冲洗夹具。

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