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31. 发明授权

US08227702B2 Multilayer ceramic substrate, electronic component, and method of manufacturing multilayer ceramic substrate 有权
标题翻译：多层陶瓷基板，电子部件以及多层陶瓷基板的制造方法
公开(公告)号：US08227702B2
公开(公告)日：2012-07-24
申请号：US12385134
申请日：2009-03-31
申请人： Hatsuo Ikeda , Koji Ichikawa
发明人： Hatsuo Ikeda , Koji Ichikawa
IPC分类号： H05K1/09
CPC分类号： H05K1/113 , H01L2224/05568 , H01L2224/05573 , H01L2224/16225 , H01L2924/00014 , H01L2924/15192 , H01L2924/19105 , H05K1/0306 , H05K3/246 , H05K3/4061 , H05K3/4611 , H05K3/4629 , H05K2201/0347 , H05K2201/09745 , H01L2224/05599
摘要： A multilayer ceramic substrate in which an active element and a passive element are surface-equipped over the outermost surface on one side is provided. The multilayer ceramic substrate comprises a plurality of laminated ceramic substrate layers, a surface layer terminal electrode provided in a via hole of an outermost ceramic substrate layer on at least one side and having a surface layer via electrode and a metal plating layer deposited over an end surface of the surface layer via electrode, and a via conductor which connects the surface layer terminal electrode and circuit patterns over the ceramic substrate layer at the inside, wherein a via hole size of a surface layer terminal electrode for connection of the active element is smaller than a via hole size of a surface layer terminal electrode for connection of the passive element.
摘要翻译：提供一种多层陶瓷基板，其中在一侧的最外表面上表面配置有源元件和无源元件。多层陶瓷基板包括多个层叠陶瓷基板层，表面层端子电极，设置在至少一侧的最外侧陶瓷基板层的通路孔中，具有表面层通孔电极和沉积在端部的金属镀层表面层通孔电极的表面，以及将内表面层端子电极和电路图案连接在陶瓷基板层上的通孔导体，其中用于连接有源元件的表面层端子电极的通孔尺寸较小比用于连接无源元件的表面层端子电极的通孔尺寸。

32. 发明申请

US20120178021A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME 有权
标题翻译：树脂和光学组合物包括它们
公开(公告)号：US20120178021A1
公开(公告)日：2012-07-12
申请号：US13345941
申请日：2012-01-09
申请人： Hyungjoo KIM , Akira KAMABUCHI , Koji ICHIKAWA
发明人： Hyungjoo KIM , Akira KAMABUCHI , Koji ICHIKAWA
IPC分类号： G03F7/20 , G03F7/004 , C07D327/04 , C08F228/06
CPC分类号： C08F20/38 , C07D327/04 , C08F228/06 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom, T1 represents a C4-C34 sultone ring group optionally having one or more substituents, Z1 represents a C1-C6 alkanediyl group optionally having one or more substituents, or a group represented by the formula (a-1): -A10X10-A11sX11-A12- (a-1) wherein X10 and X11 each independently represents —O—, —NH—, —CO—, —CO—O—, —O—CO—, —CO—NH— or —NH—CO—, A10, A11 and A12 each independently represent a C1-C5 divalent aliphatic hydrocarbon group optionally having one or more substituents, and s represents 0 or 1, and Z2 represents a single bond or —CO—.
摘要翻译：本发明提供一种树脂，其包含由式（aa）表示的结构单元：其中R 1表示任选具有一个或多个卤素原子，氢原子或卤素原子的C 1 -C 6烷基，T 1表示C 4 -C 34磺内酯具有一个或多个取代基的环基，Z1表示任选具有一个或多个取代基的C1-C6烷二基，或由式（a-1）表示的基团：-A10XX-X-A11-X11-A12-（a -1）其中X10和X11各自独立地表示-O - ， - NH - ， - CO - ， - CO-O-，-O-CO-，-CO-NH-或-NH-CO-，A10，A11和 A 12各自独立地表示任选具有一个或多个取代基的C 1 -C 5二价脂族烃基，s表示0或1，Z 2表示单键或-CO-。

33. 发明申请

US20120122034A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME 有权
标题翻译：树脂和光学组合物包括它们
公开(公告)号：US20120122034A1
公开(公告)日：2012-05-17
申请号：US13290618
申请日：2011-11-07
申请人： Koji ICHIKAWA , Masahiko SHIMADA , Takashi NISHIMURA , Akira KAMABUCHI , Hyungjoo KIM , Mitsuyoshi OCHIAI
发明人： Koji ICHIKAWA , Masahiko SHIMADA , Takashi NISHIMURA , Akira KAMABUCHI , Hyungjoo KIM , Mitsuyoshi OCHIAI
IPC分类号： G03F7/20 , G03F7/004 , C07D327/04 , C08F28/06
CPC分类号： G03F7/0397 , C07D327/04 , C08F20/58 , C08F28/06 , G03F7/2041
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—, *—X1—X4—CO—X3—, *—X1—CO—X4—X3—, *—X1—X4—CO—X3—CO— or *—X1—CO—X4—X3—CO—, X1 and X3 independently each represent a C1-C6 divalent aliphatic hydrocarbon group, X4 represents —O— or —N(Rc)—, * represents a binding position to X2, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.
摘要翻译：本发明提供一种树脂，其包含由式（aa）表示的结构单元：其中T1表示任选具有一个或多个取代基的C 4 -C 34磺内酯环基团，X 2表示-O-或-N（R c） - ，R c表示氢原子或C1-C6烷基，当X2为-O-时，Z1为* -X1-，* -X3-CO-O-X1-，* -X3-CO-N（Rc）-X1-， * -X3-O-CO-X1-或* -X3-N（Rc）-CO-X1-，当X2为-N（Rc）时，Z1表示* -X1-，* -X1-O-X3- ，* -X1-CO-，* -X1-X4-CO-X3-，* -X1-CO-X4-X3-，* -X1-X4-CO-X3-CO-或* -X1-CO-X4 -X3-CO-，X1和X3各自独立地表示C1-C6二价脂族烃基，X4表示-O-或-N（Rc） - ，*表示与X2的结合位置，R1表示C1-C6烷基具有一个或多个卤素原子的基团，氢原子或卤素原子。

34. 发明申请

US20120100483A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120100483A1
公开(公告)日：2012-04-26
申请号：US13281145
申请日：2011-10-25
申请人： Tatsuro MASUYAMA , Satoshi YAMAMOTO , Koji ICHIKAWA
发明人： Tatsuro MASUYAMA , Satoshi YAMAMOTO , Koji ICHIKAWA
IPC分类号： G03F7/20 , G03F7/027 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
摘要翻译：抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

35. 发明申请

US20120015198A1 DIELECTRIC CERAMIC COMPOSITION, MULTILAYER DIELECTRIC SUBSTRATE, ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING DIELECTRIC CERAMIC COMPOSITION 有权
标题翻译：电介质陶瓷组合物，多层电介质基板，电子元件和制造电介质陶瓷组合物的方法
公开(公告)号：US20120015198A1
公开(公告)日：2012-01-19
申请号：US13260060
申请日：2010-03-19
申请人： Junichi Masukawa , Koji Ichikawa
发明人： Junichi Masukawa , Koji Ichikawa
IPC分类号： B32B18/00 , C04B35/47 , C04B35/64 , C04B35/465
CPC分类号： C04B35/47 , B32B18/00 , C04B35/18 , C04B35/195 , C04B35/462 , C04B35/465 , C04B35/62685 , C04B2235/3201 , C04B2235/3206 , C04B2235/3208 , C04B2235/3213 , C04B2235/3217 , C04B2235/3224 , C04B2235/3227 , C04B2235/3234 , C04B2235/3236 , C04B2235/3262 , C04B2235/3263 , C04B2235/3275 , C04B2235/3281 , C04B2235/3284 , C04B2235/3298 , C04B2235/3409 , C04B2235/3463 , C04B2235/3481 , C04B2235/408 , C04B2235/6025 , C04B2235/604 , C04B2235/656 , C04B2235/80 , C04B2235/9607 , C04B2235/9615 , C04B2237/341 , C04B2237/346 , C04B2237/582 , H01B3/12 , H05K1/0306 , Y10T428/24926
摘要： Disclosed is a dielectric ceramic composition which has high dielectric constant and suppressed low thermal expansion coefficient. Also disclosed are a multilayer dielectric substrate using the dielectric ceramic composition, and an electronic component. Specifically disclosed is a dielectric ceramic composition which contains an ATiO3 (wherein A represents either Ca and/or Sr) phase and an AAl2Si2O8 phase, said dielectric ceramic composition being characterized in that the dielectric constant is not less than 10 at 3 GHz and the average thermal expansion coefficient over the temperature range of 40-600° C. is less than 7 ppm/° C.
摘要翻译：公开了具有高介电常数和低热膨胀系数的介电陶瓷组合物。还公开了使用电介质陶瓷组合物和电子部件的多层电介质基板。具体公开了包含ATiO 3（其中A表示Ca和/或Sr）相和AA 12 Si 2 O 8相的电介质陶瓷组合物，所述介电陶瓷组合物的特征在于，在3GHz下介电常数不小于10，平均在40-600℃的温度范围内的热膨胀系数小于7ppm /℃

36. 发明申请

US20110123926A1 PHOTORESIST COMPOSITION 有权
标题翻译：光电组合物
公开(公告)号：US20110123926A1
公开(公告)日：2011-05-26
申请号：US12953606
申请日：2010-11-24
申请人： Koji ICHIKAWA , Takayuki MIYAGAWA , Mitsuhiro HATA
发明人： Koji ICHIKAWA , Takayuki MIYAGAWA , Mitsuhiro HATA
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rc1 represents an aromatic group which can have one or more substituents, Rc2 and Rc3 independently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, Rc4 and RC6 independently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc4 and Rc6 are bonded each other to form an alkanediyl group, Rc5 represents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, Rc7 represents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc5 and Rc7 are bonded each other to form an alkanediyl group.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，酸产生剂和由式（C1）表示的化合物：其中Rc1表示可以具有一个或多个取代基的芳基，Rc2和Rc3各自独立地表示氢原子，可具有一个或多个取代基的脂族烃基或可具有一个或多个取代基的芳族基团，R c4和RC 6各自独立地表示氢原子或可具有一个或多个取代基的脂族烃基，或R c4和R c6键合彼此形成烷二基，Rc5表示可具有一个或多个取代基的脂族烃基或可具有一个或两个取代基的氨基，R c7表示氢原子或可具有一个或多个取代基的脂族烃基，或Rc5和Rc7彼此键合形成烷二基。

37. 发明申请

US20110053086A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 失效
标题翻译：化合物，树脂，耐蚀组合物和用于生产耐腐蚀图案的方法
公开(公告)号：US20110053086A1
公开(公告)日：2011-03-03
申请号：US12873919
申请日：2010-09-01
申请人： Kazuhiko Hashimoto , Koji Ichikawa
发明人： Kazuhiko Hashimoto , Koji Ichikawa
IPC分类号： G03F7/004 , C07C69/88 , C07C69/96 , C07C69/017 , C08F20/10 , G03F7/20
CPC分类号： C07C69/84 , C07C69/54 , C07C69/96 , C07C2603/74 , C08F20/30 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A compound of the present invention is represented by the formula (A); wherein R1 represents a hydrogen atom or a C1 to C6 alkyl group; Z1 represents a single bond, —CO—O—* or —CO—O—(CH2)k—CO—O—*; Z2 represents a single bond, *—O—CO—, *—CO—O—, *—O—(CH2)k—CO—, *—CO—(CH2)k—O—, *—O—(CH2)k—CO—O—, *—O—CO—(CH2)k—O— or *—O—CO—(CH2)k—O—CO—; k represents an integer of 1 to 6; * represents a binding position to W; W represents a C4 to C36 (n+1) valent alicyclic hydrocarbon group or a C6 to C18 (n+1) valent aromatic hydrocarbon group, one or more hydrogen atoms contained in the alicyclic hydrocarbon group and the aromatic hydrocarbon group may be replaced by a halogen atom, a C1 to C12 alkyl group, a C1 to C12 alkoxy group, a C2 to C4 acyl group or —OR10; R10 represents a hydrogen atom or a group represented by the formula (R2-2); R2 represents a hydrogen atom, a group represented by the formula (R2-1) or (R2-2); n represents an integer of 1 to 3; R4, R5 and R6 independently represent a C1 to C12 hydrocarbon group; R7 and R8 independently represent a hydrogen atom or a C1 to C12 hydrocarbon group; R9 represents a C1 to C14 hydrocarbon group.
摘要翻译：本发明的化合物由式（A）表示; 其中R1表示氢原子或C1-C6烷基; Z1表示单键，-CO-O- *或-CO-O-（CH2）k-CO-O- *; Z2表示单键，* -O-CO-，* -CO-O-，* -O-（CH2）k-CO-，* -CO-（CH2）k-O-，* -O- ）k-CO-O-，* -O-CO-（CH2）k-O-或* -O-CO-（CH2）k-O-CO-; k表示1〜6的整数， *表示与W的绑定位置; W表示C 4〜C 36（n + 1）价的脂环式烃基或C 6〜C 18（n + 1）价芳香族烃基，脂环式烃基和芳香族烃基所含有的1个以上氢原子可以被卤素原子，C1〜C12烷基，C1〜C12烷氧基，C2〜C4酰基或-OR10; R 10表示氢原子或式（R2-2）表示的基团。 R2表示氢原子，式（R2-1）或（R2-2）表示的基团; n表示1〜3的整数， R4，R5和R6独立地表示C1〜C12烃基; R7和R8独立地表示氢原子或C1〜C12烃基; R9表示C1〜C14烃基。

38. 发明申请

US20110053082A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：树脂，耐蚀组合物和生产耐火图案的方法
公开(公告)号：US20110053082A1
公开(公告)日：2011-03-03
申请号：US12872817
申请日：2010-08-31
申请人： Koji Ichikawa , Akira Kamabuchi , Yuichi Mukai
发明人： Koji Ichikawa , Akira Kamabuchi , Yuichi Mukai
IPC分类号： G03F7/004 , G03F7/20 , C08F26/06 , C08F20/28 , C08F28/06 , C08F24/00
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F220/60 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/20 , G03F7/2041
摘要： A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; X1 represents a C2 to C36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C1 to C24 hydrocarbon group, a C1 to C12 alkoxyl group, a C2 to C4 acyl group, or a C2 to C4 acyloxy group, and one or more —CH2— contained in the heterocyclic group may be replaced by —CO— or —O—.
摘要翻译：树脂包含衍生自由式（I）表示的化合物的结构单元; 其中R1表示任选具有一个或多个卤素原子的氢原子，卤素原子或C1-C6烷基; X1表示C2〜C36杂环基，杂环基中含有的一个或多个氢原子可以被卤素原子，羟基，C1〜C24烃基，C1〜C12烷氧基，C2〜C4酰基基团或C2〜C4酰氧基，杂环基中所含的一个或多个-CH 2可以被-CO-或-O-代替。

39. 发明申请

US20110020749A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND SALT EMPLOYED THEREIN 有权
标题翻译：化学稳定组合物和盐使用的盐
公开(公告)号：US20110020749A1
公开(公告)日：2011-01-27
申请号：US12844557
申请日：2010-07-27
申请人： Koji Ichikawa , Isao Yoshida , Satoshi Yamaguchi
发明人： Koji Ichikawa , Isao Yoshida , Satoshi Yamaguchi
IPC分类号： G03F7/004 , C07C69/757 , C07D307/77 , C07C69/78 , C07C69/65 , C07D333/46
CPC分类号： C07C381/12 , C07C309/17 , C07C2601/14 , C07C2603/74 , C07D307/77 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor.By employing the salt represented by the formulae (A1) as an acid generator of a resist composition, the above mentioned object is achieved. wherein Z+ represents an organic cation, Q1 and Q2 each independently represent a fluorine atom or a perfluoroalkyl group, Ra2 represents a divalent alicyclic hydrocarbon group pr the like, Ra2 represents an elimination group represented by the formulae (II-1) or (II-2). In the formulae (II-1) or (II-2), Ra3 and Ra4 each independently represent a hydrogen atom or an aliphatic hydrocarbon group, Ra5 represents an aliphatic hydrocarbon group, Ra6 represents a divalent aliphatic hydrocarbon group, and Ra7 represents an aliphatic hydrocarbon group.
摘要翻译：本发明的目的是提供一种分辨率和掩模误差增强因子优异的化学放大抗蚀剂组合物。通过使用由式（A1）表示的盐作为抗蚀剂组合物的酸产生剂，实现了上述目的。其中Z +表示有机阳离子，Q1和Q2各自独立地表示氟原子或全氟烷基，Ra2表示二价脂环族烃基，Ra2表示由式（II-1）或（II- 2）。在式（II-1）或（II-2）中，Ra 3和Ra 4各自独立地表示氢原子或脂肪族烃基，Ra 5表示脂肪族烃基，Ra 6表示二价脂肪族烃基，Ra 7表示脂肪族烃基。

40. 发明申请

US20110014567A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
标题翻译：含有它的盐和光催化剂组合物
公开(公告)号：US20110014567A1
公开(公告)日：2011-01-20
申请号：US12833712
申请日：2010-07-09
申请人： Koji Ichikawa , Masako Sugihara , Yuko Yamashita
发明人： Koji Ichikawa , Masako Sugihara , Yuko Yamashita
IPC分类号： G03F7/20 , C07C69/76 , C07D333/76 , C08F28/06 , C08F28/02 , G03F7/004
CPC分类号： G03F7/066 , C07C62/22 , C07C63/08 , C07C69/63 , C07C69/712 , C07C69/753 , C07C69/757 , C07C205/57 , C07C309/17 , C07C381/12 , C07C2603/74 , C07D333/76 , C08F8/12 , C08F12/24 , C08F20/38 , C08F28/02 , C08F28/06 , C08F212/14 , C08F220/18 , C09D125/18 , G03F7/0045 , G03F7/038 , G03F7/0397 , G03F7/38 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123 , C08F12/22 , C08F2220/1883 , C08F2220/1891 , C08F220/20 , C08F2220/283 , C08F220/38
摘要： A salt represented by the formula (I—Pb): wherein Xpb represents a single bond or —O—, Rpb represents a single bond etc., Ypb represents a polymerizable group, Zpb represents an organic group, Xpc represents a single bond or a C1-C4 alkylene group, and Rpc represents a C1-C10 aliphatic hydrocarbon group which can have one or more substituents etc.
摘要翻译：由式（I-Pb）表示的盐：其中Xpb表示单键或-O-，Rpb表示单键等，Ypb表示可聚合基团，Zpb表示有机基团，Xpc表示单键或 C1-C4亚烷基，Rpc表示可以具有一个以上取代基等的C1-C10脂肪族烃基

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