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1. 发明申请

US20110053082A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：树脂，耐蚀组合物和生产耐火图案的方法
公开(公告)号：US20110053082A1
公开(公告)日：2011-03-03
申请号：US12872817
申请日：2010-08-31
申请人： Koji Ichikawa , Akira Kamabuchi , Yuichi Mukai
发明人： Koji Ichikawa , Akira Kamabuchi , Yuichi Mukai
IPC分类号： G03F7/004 , G03F7/20 , C08F26/06 , C08F20/28 , C08F28/06 , C08F24/00
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F220/60 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/20 , G03F7/2041
摘要： A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; X1 represents a C2 to C36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C1 to C24 hydrocarbon group, a C1 to C12 alkoxyl group, a C2 to C4 acyl group, or a C2 to C4 acyloxy group, and one or more —CH2— contained in the heterocyclic group may be replaced by —CO— or —O—.
摘要翻译：树脂包含衍生自由式（I）表示的化合物的结构单元; 其中R1表示任选具有一个或多个卤素原子的氢原子，卤素原子或C1-C6烷基; X1表示C2〜C36杂环基，杂环基中含有的一个或多个氢原子可以被卤素原子，羟基，C1〜C24烃基，C1〜C12烷氧基，C2〜C4酰基基团或C2〜C4酰氧基，杂环基中所含的一个或多个-CH 2可以被-CO-或-O-代替。

2. 发明授权

US08592129B2 Resin, resist composition and method for producing resist pattern 有权
标题翻译：树脂，抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08592129B2
公开(公告)日：2013-11-26
申请号：US12872817
申请日：2010-08-31
申请人： Koji Ichikawa , Akira Kamabuchi , Yuichi Mukai
发明人： Koji Ichikawa , Akira Kamabuchi , Yuichi Mukai
IPC分类号： G03F7/004 , C08F26/06
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F220/60 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/20 , G03F7/2041
摘要： A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; X1 represents a C2 to C36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C1 to C24 hydrocarbon group, a C1 to C12 alkoxyl group, a C2 to C4 acyl group, or a C2 to C4 acyloxy group, and one or more —CH2— contained in the heterocyclic group may be replaced by —CO— or —O—.
摘要翻译：树脂包含衍生自由式（I）表示的化合物的结构单元; 其中R1表示任选具有一个或多个卤素原子的氢原子，卤素原子或C1-C6烷基; X1表示C2〜C36杂环基，杂环基中含有的一个或多个氢原子可以被卤素原子，羟基，C1〜C24烃基，C1〜C12烷氧基，C2〜C4酰基基团或C2〜C4酰氧基，杂环基中所含的一个或多个-CH 2可以被-CO-或-O-代替。

3. 发明授权

US08697882B2 Compound, resin and photoresist composition 有权
标题翻译：化合物，树脂和光致抗蚀剂组合物
公开(公告)号：US08697882B2
公开(公告)日：2014-04-15
申请号：US13175072
申请日：2011-07-01
申请人： Hyungjoo Kim , Akira Kamabuchi , Yuichi Mukai
发明人： Hyungjoo Kim , Akira Kamabuchi , Yuichi Mukai
IPC分类号： C07D291/00 , C07D275/02 , C07D275/04 , C07D275/06 , C07C317/30 , C07D291/02
CPC分类号： C07D291/02 , C07C317/30 , C07D275/02 , C07D275/04 , C07D275/06 , C08F220/38 , G03F7/0045 , G03F7/0397
摘要： The present invention provides a compound represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group which may have one or more halogen atoms, A1 represents a divalent connecting group, X1 represents a C2-C36 heterocyclic group and one or more —CH2— in the C2-C36 heterocyclic group can be replaced by —CO— or —O—, R2 is independently in each occurrence a halogen atom, a hydroxyl group, a C1-C24 hydrocarbon group, a C1-C12 alkoxy group, a C2-C4 acyl group or a C2-C4 acyloxy group, and m represents an integer of 0 to 10.
摘要翻译：本发明提供由式（I）表示的化合物：其中R1表示氢原子，卤素原子或可具有一个或多个卤素原子的C1-C6烷基，A1表示二价连接基团，X1表示 C2-C36杂环基和C2-C36杂环基中的一个或多个-CH2-可以被-CO-或-O-替代，R2在每次出现时独立地为卤素原子，羟基，C1-C24烃基团，C 1 -C 12烷氧基，C 2 -C 4酰基或C 2 -C 4酰氧基，m表示0〜10的整数。

4. 发明授权

US09791776B2 Resist composition and method for producing resist pattern 有权
公开(公告)号：US09791776B2
公开(公告)日：2017-10-17
申请号：US13441032
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Yuichi Mukai
发明人： Koji Ichikawa , Takahiro Yasue , Yuichi Mukai
IPC分类号： G03F7/039 , G03F7/004 , G03F7/09 , G03F7/029 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/029 , G03F7/0392 , G03F7/0397 , G03F7/092 , G03F7/2041
摘要： A resist composition contains (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1 and R2, m and n, R3 and R4, X1, R5 and Z1+ are defined in the specification.

5. 发明授权

US08835095B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08835095B2
公开(公告)日：2014-09-16
申请号：US13405068
申请日：2012-02-24
申请人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
发明人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
IPC分类号： G03F7/004 , G03F7/039 , G03F7/11 , G03F7/027 , G03F7/20
CPC分类号： G03F7/027 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/20 , G03F7/2041 , Y10S430/121
摘要： A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) at least one compound selected from the group consisting of a compound represented by the formula (II1) and a compound represented by the formula (II2), wherein R1, A1, R2, R6, X1, X2, R3, R4 and R5 are defined in the specification.
摘要翻译：抗蚀剂组合物含有（A1）具有由式（I）表示的结构单元的树脂，（A2）不溶于碱性水溶液或难溶于碱性水溶液的树脂，但通过酸的作用变得可溶于碱性水溶液，（B）酸产生剂，和（D）选自由式（II1）表示的化合物和式（II2）表示的化合物中的至少一种化合物，其中R1，A1，R2，R6 X1，X2，R3，R4和R5在本说明书中定义。

6. 发明授权

US08778594B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08778594B2
公开(公告)日：2014-07-15
申请号：US13551980
申请日：2012-07-18
申请人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
发明人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II), wherein R1, A1, A13, A14, X12, R23, R24, R25, R26, X21 and X22 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和由式（II）表示的化合物，其中R1，A1，A13，A14，X12，R23，R24，R25，R26，X21和X22在本说明书中定义。

7. 发明授权

US08940473B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08940473B2
公开(公告)日：2015-01-27
申请号：US13404226
申请日：2012-02-24
申请人： Koji Ichikawa , Yuichi Mukai , Satoshi Yamamoto
发明人： Koji Ichikawa , Yuichi Mukai , Satoshi Yamamoto
IPC分类号： G03F7/20 , G03F7/039 , G03F7/004 , G03F7/11
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/115 , Y10S430/122 , Y10S430/124 , Y10S430/126
摘要： A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, and (B) an acid generator represented by the formula (II). wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom; R3 and R4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; X1 represents an C1 to C17 divalent saturated hydrocarbon group; R5 represents a group having cyclic ether structure; and Z1+ represents an organic cation.
摘要翻译：抗蚀剂组合物含有（A1）具有由式（I）表示的结构单元的树脂，（A2）不溶于碱性水溶液或难溶于碱性水溶液的树脂，但通过酸的作用变得可溶于碱性水溶液，（B）由式（II）表示的酸发生剂。其中R1表示氢原子或甲基; A1表示C1〜C6烷二基; R2表示具有氟原子的C1〜C10烃基; R3和R4独立地表示氟原子或C1〜C6全氟烷基; X1表示C1〜C17二价饱和烃基; R5表示具有环醚结构的基团; Z1 +表示有机阳离子。

8. 发明授权

US08802352B2 Salt, photoresist composition and method for producing photoresist pattern 有权
标题翻译：盐，光致抗蚀剂组合物和制造光致抗蚀剂图案的方法
公开(公告)号：US08802352B2
公开(公告)日：2014-08-12
申请号：US13567892
申请日：2012-08-06
申请人： Koji Ichikawa , Yuichi Mukai , Isao Yoshida
发明人： Koji Ichikawa , Yuichi Mukai , Isao Yoshida
IPC分类号： G03F7/004 , G03F7/26 , G03F7/027 , C07C69/753
CPC分类号： C07C309/17 , C07C381/12 , C07C2603/74
摘要： A salt represented by formula (I): wherein Q1, Q2, L1, W, and Z+are defined in the specification.
摘要翻译：由式（I）表示的盐：其中Q1，Q2，L1，W和Z +在说明书中定义。

9. 发明授权

US08685619B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08685619B2
公开(公告)日：2014-04-01
申请号：US13552273
申请日：2012-07-18
申请人： Koji Ichikawa , Yuichi Mukai , Satoshi Yamamoto
发明人： Koji Ichikawa , Yuichi Mukai , Satoshi Yamamoto
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, R23, R24, R25, X21 and Z1+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸衍生物和由式（II）表示的酸产生剂，其中R1，A1，A13，A14，X12，R23，R24，R25，X21和Z1 +在说明书中定义。

10. 发明授权

US08753796B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08753796B2
公开(公告)日：2014-06-17
申请号：US13443155
申请日：2012-04-10
申请人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
发明人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
IPC分类号： G03F7/039 , G03F7/38
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a salt represented by the formula (I): wherein R1 and R2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group, etc., s1 represents 1 or 2, and t1 represents 0 or 1, with proviso that sum of s1 and t1 is 1 or 2, R3 represents a C1-C12 saturated hydrocarbon group, etc., u1 represents an integer of 0 to 8, and (Z1)+ represents an organic cation,a salt represented by the formula (II-0): wherein R4 represents a C1-C24 hydrocarbon group etc., X2 represents a C1-C6 alkanediyl group etc., and (Z2)+ represents an organic cation, anda resin being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：本发明提供了包含式（I）表示的盐的光致抗蚀剂组合物：其中R1和R2各自独立地表示氟原子或C1-C6全氟烷基，X1表示C1-C17二价饱和烃基等， s1表示1或2，t1表示0或1，条件是s1和t1之和为1或2，R3表示C1-C12饱和烃基等，u1表示0〜8的整数，（ Z1）+表示有机阳离子，式（II-0）表示的盐：其中，R4表示C1-C24烃基等，X2表示C1-C6烷二基等，（Z2）+表示有机阳离子和在碱性水溶液中不溶或难溶的树脂，但通过酸的作用变得可溶于碱性水溶液。

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