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1. 发明申请

US20120100483A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120100483A1
公开(公告)日：2012-04-26
申请号：US13281145
申请日：2011-10-25
申请人： Tatsuro MASUYAMA , Satoshi YAMAMOTO , Koji ICHIKAWA
发明人： Tatsuro MASUYAMA , Satoshi YAMAMOTO , Koji ICHIKAWA
IPC分类号： G03F7/20 , G03F7/027 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
摘要翻译：抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

2. 发明申请

US20120100482A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120100482A1
公开(公告)日：2012-04-26
申请号：US13280969
申请日：2011-10-25
申请人： Tatsuro MASUYAMA , Satoshi YAMAMOTO , Koji ICHIKAWA
发明人： Tatsuro MASUYAMA , Satoshi YAMAMOTO , Koji ICHIKAWA
IPC分类号： G03F7/20 , G03F7/027 , G03F7/004
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A resist composition contains a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
摘要翻译：抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C36脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

3. 发明申请

US20120052443A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120052443A1
公开(公告)日：2012-03-01
申请号：US13221597
申请日：2011-08-30
申请人： Tatsuro MASUYAMA , Satoshi YAMAMOTO , Koji ICHIKAWA
发明人： Tatsuro MASUYAMA , Satoshi YAMAMOTO , Koji ICHIKAWA
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/30 , G03F7/38 , Y10S430/111 , Y10S430/126
摘要： A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator. wherein R1 represents a hydrogen atom or a methyl group; R2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; A1 represents an optionally substituted C1 to C6 alkanediyl group or a group represented by the formula (a-g1); wherein s represents 0 or 1; A10 and A12 independently represent an optionally substituted C1 to C5 aliphatic hydrocarbon group; A11 represents a single bond or an optionally substituted C1 to C5 aliphatic hydrocarbon group; X10 and X11 independently represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group; provided that a total number of the carbon atom of A10, A11, A12, X10 and X11 is 6 or less.
摘要翻译：抗蚀剂组合物含有具有衍生自由式（a）表示的化合物的结构单元的树脂; 和酸发生剂。其中R1表示氢原子或甲基; R2代表任选取代的C1至C18脂族烃基; A1表示任意取代的C1〜C6烷二基或式（a-g1）表示的基团。其中s表示0或1; A10和A12独立地表示任选取代的C1至C5脂族烃基; A11表示单键或任选取代的C1至C5脂族烃基; X 10和X 11独立地表示氧原子，羰基，羰氧基或氧羰基; A10，A11，A12，X10和X11的碳原子总数为6以下。

4. 发明申请

US20130022922A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20130022922A1
公开(公告)日：2013-01-24
申请号：US13552273
申请日：2012-07-18
申请人： Koji ICHIKAWA , Yuichi MUKAI , Satoshi YAMAMOTO
发明人： Koji ICHIKAWA , Yuichi MUKAI , Satoshi YAMAMOTO
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, R23, R24, R25, X21 and Z1+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸衍生物和由式（II）表示的酸产生剂，其中R1，A1，A13，A14，X12，R23，R24，R25，X21和Z1 +在说明书中定义。

5. 发明申请

US20120219904A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120219904A1
公开(公告)日：2012-08-30
申请号：US13404226
申请日：2012-02-24
申请人： Koji ICHIKAWA , Yuichi MUKAI , Satoshi YAMAMOTO
发明人： Koji ICHIKAWA , Yuichi MUKAI , Satoshi YAMAMOTO
IPC分类号： G03F7/20 , G03F7/027
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/115 , Y10S430/122 , Y10S430/124 , Y10S430/126
摘要： A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, and (B) an acid generator represented by the formula (II). wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom; R3 and R4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; X1 represents an C1 to C17 divalent saturated hydrocarbon group; R5 represents a group having cyclic ether structure; and Z1+ represents an organic cation.
摘要翻译：抗蚀剂组合物含有（A1）具有由式（I）表示的结构单元的树脂，（A2）不溶于碱性水溶液或难溶于碱性水溶液的树脂，但通过酸的作用变得可溶于碱性水溶液，（B）由式（II）表示的酸发生剂。其中R1表示氢原子或甲基; A1表示C1〜C6烷二基; R2表示具有氟原子的C1〜C10烃基; R3和R4独立地表示氟原子或C1〜C6全氟烷基; X1表示C1〜C17二价饱和烃基; R5表示具有环醚结构的基团; Z1 +表示有机阳离子。

6. 发明申请

US20170329199A1 ELECTROCHROMIC DEVICE 审中-公开
公开(公告)号：US20170329199A1
公开(公告)日：2017-11-16
申请号：US15585207
申请日：2017-05-03
申请人： Tohru YASHIRO , Yoshinori OKADA , Keigo TAKAUJI , Satoshi YAMAMOTO , Daisuke GOTO , Toshiya SAGISAKA , Masato SHINODA
发明人： Tohru YASHIRO , Yoshinori OKADA , Keigo TAKAUJI , Satoshi YAMAMOTO , Daisuke GOTO , Toshiya SAGISAKA , Masato SHINODA
IPC分类号： G02F1/15 , C09K9/02 , G02F1/155 , G02F1/153
CPC分类号： G02F1/1503 , C09K9/02 , C09K2211/1048 , G02F1/15165 , G02F1/1533 , G02F1/155 , G02F2001/1536 , G02F2203/11
摘要： An electrochromic device is provided including a first substrate, a first electrode on the first substrate, a second substrate, a second electrode on the second substrate facing the first electrode, an electrochromic layer in contact with the first electrode, an anti-deterioration layer in contact with the second electrode facing the first electrode, and an electrolyte layer in contact with both the electrochromic layer and the anti-deterioration layer. At least one of the first electrode and the second electrode includes In2O3, and has an infrared light transmittance of 70% or more at a wavelength of 1,500 nm. The electrochromic layer includes a triarylamine-containing radical polymerizable compound represented by a specific formula.

7. 发明申请

US20120312420A1 FILLING PORT STRUCTURE FOR FUEL TANK 有权
标题翻译：燃油箱填充口结构
公开(公告)号：US20120312420A1
公开(公告)日：2012-12-13
申请号：US13485263
申请日：2012-05-31
申请人： Chiaki KATAOKA , Satoshi YAMAMOTO , Masaki AKAGI
发明人： Chiaki KATAOKA , Satoshi YAMAMOTO , Masaki AKAGI
IPC分类号： B60K15/04
CPC分类号： B60K15/04 , B60K2015/0483
摘要： A filling port structure for a fuel tank includes a filling port member that defines a filling port, an open/close valve that opens and closes the filling port, a rotary member that attaches the open/close valve to the filling port member in a manner such that the open/close valve is rotatable between an open position and a closed position, a locking member that is provided in the filling port member and is movable between a locking position to lock the open/close valve in the closed position and an unlocking position to unlock the open/close valve, an unlocking member that moves the locking member to the unlocking position when pressed by a fuel gun, and a retention portion that holds the locking member in the unlocking position at least when the open/close valve is in the open position.
摘要翻译：一种用于燃料箱的填充口结构包括一个限定一个填充口的填充口构件，一个打开和关闭填充口的开关阀，一个将打开/关闭阀以一种方式连接到填充口构件的旋转构件使得所述打开/关闭阀能够在打开位置和关闭位置之间旋转;锁定构件，其设置在所述填充口构件中并且可在锁定位置之间移动，所述锁定位置将打开/关闭阀锁定在关闭位置，并且解锁打开/关闭阀的位置，解锁构件，其在被燃料枪按压时将锁定构件移动到解锁位置;以及保持部，其至少在打开/关闭阀为止动件时将锁定构件保持在解锁位置在公开的位置。

8. 发明申请

US20120205148A1 DEVICE PACKAGING STRUCTURE AND DEVICE PACKAGING METHOD 审中-公开
公开(公告)号：US20120205148A1
公开(公告)日：2012-08-16
申请号：US13452109
申请日：2012-04-20
申请人： Satoshi YAMAMOTO , Hiroyuki HIRANO , Takanao SUZUKI
发明人： Satoshi YAMAMOTO , Hiroyuki HIRANO , Takanao SUZUKI
IPC分类号： H05K1/18 , H05K3/06
CPC分类号： H01L23/49827 , H01L21/486 , H01L23/473 , H01L23/49816 , H01L25/0657 , H01L2224/16225 , H01L2225/06517 , H01L2225/06572 , H01L2225/06589 , H01L2924/09701 , H01L2924/1461 , H05K1/113 , H05K2201/09836 , H05K2201/10378 , H05K2201/10545 , H01L2924/00
摘要： Provided is a device packaging structure including: an interposer substrate including a substrate, and a plurality of through-hole interconnections formed inside a plurality of through-holes passing through the substrate from a first main surface toward a second main surface, the first main surface being one main surface of the substrate, the second main surface being the other main surface thereof; a first device which includes a plurality of electrodes and is arranged so that these electrodes face the first main surface; and a second device which includes a plurality of electrodes of which an arrangement is different from an arrangement of each of the electrodes of the first device, and is arranged so that these electrodes face the second main surface.

9. 发明申请

US20120039055A1 DEVICE MOUNTING STRUCTURE AND DEVICE MOUNTING METHOD 审中-公开
标题翻译：器件安装结构和器件安装方法
公开(公告)号：US20120039055A1
公开(公告)日：2012-02-16
申请号：US13283185
申请日：2011-10-27
申请人： Satoshi YAMAMOTO , Hirokazu HASHIMOTO
发明人： Satoshi YAMAMOTO , Hirokazu HASHIMOTO
IPC分类号： H05K7/02 , H05K3/00
CPC分类号： H05K1/181 , H01L23/3128 , H01L23/49827 , H01L23/49838 , H01L24/06 , H01L24/16 , H01L25/0657 , H01L2224/0401 , H01L2224/05555 , H01L2224/16235 , H01L2225/06517 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01014 , H01L2924/01019 , H01L2924/01029 , H01L2924/01033 , H01L2924/0105 , H01L2924/01072 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/014 , H01L2924/09701 , H01L2924/12042 , H01L2924/14 , H01L2924/1461 , H01L2924/15184 , H01L2924/15311 , H01L2924/15321 , H01L2924/15787 , H01L2924/15788 , H01L2924/1579 , H01L2924/16152 , H01L2924/181 , H05K1/0272 , H05K1/115 , H05K2201/09836 , H05K2201/10545 , Y02P70/611 , Y10T29/49124 , H01L2924/00
摘要： Provided is a device mounting structure that includes: a interposer substrate including a substrate and a plurality of through-hole interconnection; a first device including a plurality of electrodes arranged so as to face the first principal surface of the substrate; and a second device including a plurality of electrodes whose arrangement is different from that of the first device, with the electrodes arranged so as to face the second principal surface of the substrate. Each through-hole interconnection includes a first conductive portion provided at a position on the first principal surface corresponding to the electrode of the first device, and a second conductive portion provided at a position on the second principal surface corresponding to the electrode of the second device. Each electrode of the first device is electrically connected with the first conductive portion. Each electrode of the second device is electrically connected with the second conductive portion.
摘要翻译：提供一种装置安装结构，其包括：内插基板，包括基板和多个通孔互连; 第一装置，其包括布置成面对基板的第一主表面的多个电极; 以及第二装置，其包括多个电极，其布置与第一装置的布置不同，其中电极布置成面对基板的第二主表面。每个通孔互连包括设置在与第一器件的电极对应的第一主表面上的位置处的第一导电部分和设置在第二主表面上对应于第二器件的电极的位置处的第二导电部分。第一装置的每个电极与第一导电部分电连接。第二装置的每个电极与第二导电部分电连接。

10. 发明申请

US20110215306A1 ORGANIC SEMICONDUCTOR ELEMENT AND ORGANIC ELECTRODE 审中-公开
标题翻译：有机半导体元件和有机电极
公开(公告)号：US20110215306A1
公开(公告)日：2011-09-08
申请号：US13037930
申请日：2011-03-01
申请人： Takuji KATO , Satoshi YAMAMOTO , Toshiya SAGISAKA , Takanori TANO , Masato SHINODA , Daisuke GOTO , Shinji MATSUMOTO , Masataka MOHRI , Keiichiro YUTANI , Chihaya ADACHI , Masafumi TORII
发明人： Takuji KATO , Satoshi YAMAMOTO , Toshiya SAGISAKA , Takanori TANO , Masato SHINODA , Daisuke GOTO , Shinji MATSUMOTO , Masataka MOHRI , Keiichiro YUTANI , Chihaya ADACHI , Masafumi TORII
IPC分类号： H01L51/30
CPC分类号： H01L51/0051 , B82Y10/00 , H01L51/0045 , H01L51/0074 , H01L51/0562 , H01L51/102
摘要： To provide an organic semiconductor element, containing: a source electrode containing a first organic compound layer and a second organic compound layer, at least one of the layers having an organic semiconductor active region; and a drain electrode containing the first organic compound layer and the second organic compound layer, as well as providing an organic electrode, containing: a laminated film, in which a layer of a tetrathiafulvalene derivative expressed by the following general formula I and a layer of an electron accepting compound are laminated:
摘要翻译：为了提供一种有机半导体元件，其含有：包含第一有机化合物层和第二有机化合物层的源电极，所述层中的至少一层具有有机半导体活性区域; 以及含有第一有机化合物层和第二有机化合物层的漏电极，以及提供有机电极，其包含：层叠膜，其中由以下通式I表示的四硫富瓦烯衍生物层和层叠电子接受性化合物

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