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    • 32. 发明授权
    • Thin-film transistor and method of manufacturing the same
    • 薄膜晶体管及其制造方法
    • US08823005B2
    • 2014-09-02
    • US13167668
    • 2011-06-23
    • O-Sung SeoSeong-Hun KimYang-Ho BaeJean-Ho Song
    • O-Sung SeoSeong-Hun KimYang-Ho BaeJean-Ho Song
    • H01L29/66H01L29/45H01L29/786
    • H01L29/78618H01L29/458H01L29/66765
    • A thin-film transistor (TFT) and a method of manufacturing the same are disclosed herein. The TFT may include a gate electrode disposed on an insulating substrate, an insulating layer disposed on the insulating substrate and the gate electrode, an active layer pattern disposed on the insulating layer to overlap the gate electrode, a source electrode disposed on the insulating layer and at least part of which overlaps the active layer pattern, and a drain electrode which is separated from the source electrode and at least part of which overlaps the active layer pattern. A first ohmic contact layer pattern may be disposed between the active layer pattern and the source electrode and between the active layer pattern and the drain electrode. The first ohmic contact layer may have higher nitrogen content on its surface than in other portions of the first ohmic contact layer.
    • 本文公开了一种薄膜晶体管(TFT)及其制造方法。 TFT可以包括设置在绝缘基板上的栅电极,设置在绝缘基板上的绝缘层和栅电极,设置在绝缘层上的与栅电极重叠的有源层图案,设置在绝缘层上的源电极和 其至少一部分与有源层图案重叠,以及与源电极分离并且其至少一部分与有源层图案重叠的漏电极。 可以在有源层图案和源电极之间以及有源层图案和漏电极之间设置第一欧姆接触层图案。 第一欧姆接触层在其表面上可以具有比在第一欧姆接触层的其它部分更高的氮含量。
    • 34. 发明授权
    • Method for manufacturing thin film transistor array panel
    • 制造薄膜晶体管阵列面板的方法
    • US08476123B2
    • 2013-07-02
    • US13109686
    • 2011-05-17
    • Dong-Ju YangYu-Gwang JeongJean-Ho SongKi-Yeup LeeShin-Il ChoiTae-Woo Kim
    • Dong-Ju YangYu-Gwang JeongJean-Ho SongKi-Yeup LeeShin-Il ChoiTae-Woo Kim
    • H01L21/84
    • H01L27/1288H01L21/32138H01L27/1214H01L27/1255H01L29/458
    • A method for manufacturing a thin film transistor array panel includes forming a gate line; forming an insulating layer on the gate line; forming first and second silicon layers first and second metal layers; forming a photoresist pattern having first and second portions; forming first and second metal patterns by etching the first and second metal layers; processing the first metal pattern with SF6 or SF6/He; forming silicon and semiconductor patterns by etching the second and first silicon layers; removing the first portion of the photoresist pattern; forming an upper layer of a data wire by wet etching the second metal pattern; forming a lower layer of the data wire and an ohmic contact by etching the first metal and amorphous silicon patterns; forming a passivation layer including a contact hole on the upper layer; and forming a pixel electrode on the passivation layer.
    • 薄膜晶体管阵列板的制造方法包括:形成栅极线; 在栅极线上形成绝缘层; 第一和第二硅层第一和第二金属层; 形成具有第一和第二部分的光致抗蚀剂图案; 通过蚀刻第一和第二金属层来形成第一和第二金属图案; 用SF6或SF6 / He处理第一金属图案; 通过蚀刻第二和第一硅层形成硅和半导体图案; 去除光致抗蚀剂图案的第一部分; 通过湿法蚀刻第二金属图案形成数据线的上层; 通过蚀刻第一金属和非晶硅图案形成数据线的下层和欧姆接触; 在上层形成包括接触孔的钝化层; 以及在所述钝化层上形成像素电极。
    • 40. 发明申请
    • THIN-FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
    • 薄膜晶体管及其制造方法
    • US20120037913A1
    • 2012-02-16
    • US13167668
    • 2011-06-23
    • O-Sung SEOSeong-Hun KIMYang-Ho BAEJean-Ho SONG
    • O-Sung SEOSeong-Hun KIMYang-Ho BAEJean-Ho SONG
    • H01L29/786H01L21/336
    • H01L29/78618H01L29/458H01L29/66765
    • A thin-film transistor (TFT) and a method of manufacturing the same are disclosed herein. The TFT may include a gate electrode disposed on an insulating substrate, an insulating layer disposed on the insulating substrate and the gate electrode, an active layer pattern disposed on the insulating layer to overlap the gate electrode, a source electrode disposed on the insulating layer and at least part of which overlaps the active layer pattern, and a drain electrode which is separated from the source electrode and at least part of which overlaps the active layer pattern. A first ohmic contact layer pattern may be disposed between the active layer pattern and the source electrode and between the active layer pattern and the drain electrode. The first ohmic contact layer may have higher nitrogen content on its surface than in other portions of the first ohmic contact layer.
    • 本文公开了一种薄膜晶体管(TFT)及其制造方法。 TFT可以包括设置在绝缘基板上的栅电极,设置在绝缘基板上的绝缘层和栅电极,设置在绝缘层上的与栅电极重叠的有源层图案,设置在绝缘层上的源电极和 其至少一部分与有源层图案重叠,以及与源电极分离并且其至少一部分与有源层图案重叠的漏电极。 可以在有源层图案和源电极之间以及有源层图案和漏电极之间设置第一欧姆接触层图案。 第一欧姆接触层在其表面上可以具有比在第一欧姆接触层的其它部分更高的氮含量。