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21. 发明申请

US20120241023A1 CONTROL VALVE DEVICE 审中-公开
标题翻译：控制阀装置
公开(公告)号：US20120241023A1
公开(公告)日：2012-09-27
申请号：US13508448
申请日：2010-10-29
申请人： Nobukazu Ikeda , Michio Yamaji , Tsuyoshi Tanikawa , Hiroshi Kaneko , Yasushi Yagi , Yuji Ono , Tadahiro Ohmi , Yasuyuki Shirai
发明人： Nobukazu Ikeda , Michio Yamaji , Tsuyoshi Tanikawa , Hiroshi Kaneko , Yasushi Yagi , Yuji Ono , Tadahiro Ohmi , Yasuyuki Shirai
IPC分类号： F16K31/128 , F16K1/34
CPC分类号： F16K31/126 , F16K1/34 , F16K25/005 , Y10T137/776
摘要： A control valve device develops opening/closing accuracy of a valve assembly. The valve head 310a is configured to open and close a transfer path formed in the valve housing 305 by transmitting the power to the valve assembly 310 from the power transmission member according to a pressure ratio between working fluid supplied to the first space Us and the second space Ls, respectively. The valve head has a Vickers hardness larger than a Vickers hardness of a valve seat of the transfer path to be in contact with the valve head, and a hardness difference therebetween is set to be about 200 Hv to about 300 Hv.
摘要翻译：控制阀装置产生阀组件的开/关精度。阀头310a被构造成通过根据供应到第一空间Us的工作流体与第二空间的第二压力之间的压力比将从动力传递构件传递到阀组件310的动力来打开和关闭形成在阀壳体305中的传送路径空间Ls。阀头的维氏硬度大于与阀头接触的传送路径的阀座的维氏硬度，并且其间的硬度差设定为约200Hv至约300Hv。

22. 发明授权

US08263174B2 Light emitting device and method for manufacturing light emitting device 有权
标题翻译：发光装置及其制造方法
公开(公告)号：US08263174B2
公开(公告)日：2012-09-11
申请号：US12304316
申请日：2007-06-13
申请人： Yasushi Yagi , Shingo Watanabe , Toshihisa Nozawa , Chuichi Kawamura , Kimihiko Yoshino , Tadahiro Ohmi
发明人： Yasushi Yagi , Shingo Watanabe , Toshihisa Nozawa , Chuichi Kawamura , Kimihiko Yoshino , Tadahiro Ohmi
IPC分类号： B05D5/06 , B05D5/12 , C23C16/00 , H01J9/00
CPC分类号： H01L51/001 , C23C14/12 , C23C14/28 , H01L51/56
摘要： Disclosed is a light emitting device manufacturing apparatus including a plurality of processing chambers for performing a substrate processing for forming, on a target substrate, a light emitting device having multiple layers including an organic layer, wherein each of the plurality of processing chambers is configured to perform a substrate process on the target substrate while maintaining the target substrate such that its device forming surface, on which the light emitting device is to be formed, is oriented toward a direction opposite to a direction of gravity.
摘要翻译：公开了一种发光器件制造设备，包括：多个处理室，用于执行用于在目标衬底上形成包括有机层的多层的发光器件的衬底处理，其中，所述多个处理室中的每一个被配置为在目标衬底上执行衬底处理，同时保持目标衬底，使得要在其上形成发光器件的器件形成表面朝向与重力方向相反的方向。

23. 发明授权

US08261692B2 Substrate processing apparatus and reaction container 有权
标题翻译：基材加工设备和反应容器
公开(公告)号：US08261692B2
公开(公告)日：2012-09-11
申请号：US12823001
申请日：2010-06-24
申请人： Tadashi Kontani , Kazuyuki Toyoda , Taketoshi Sato , Toru Kagaya , Nobuhito Shima , Nobuo Ishimaru , Masanori Sakai , Kazuyuki Okuda , Yasushi Yagi , Seiji Watanabe , Yasuo Kunii
发明人： Tadashi Kontani , Kazuyuki Toyoda , Taketoshi Sato , Toru Kagaya , Nobuhito Shima , Nobuo Ishimaru , Masanori Sakai , Kazuyuki Okuda , Yasushi Yagi , Seiji Watanabe , Yasuo Kunii
IPC分类号： C23C16/50 , C23C16/509 , C23C16/503 , C23C16/505 , C23C16/458 , C23F1/00 , H01L21/306
CPC分类号： C23C16/45546 , C23C16/452 , C23C16/45542 , C23C16/45578 , C23C16/4583 , H01J37/3244
摘要： A substrate processing apparatus comprises a reaction chamber which is to accommodate stacked substrates, a gas introducing portion, and a buffer chamber, wherein the gas introducing portion is provided along a stacking direction of the substrates, and introduces substrate processing gas into the buffer chamber, the buffer chamber includes a plurality of gas-supply openings provided along the stacking direction of the substrates, and the processing gas introduced from the gas introducing portion is supplied from the gas-supply openings to the reaction chamber.
摘要翻译：基板处理装置包括容纳层叠基板的反应室，气体导入部和缓冲室，其中，沿着基板的堆叠方向设置气体导入部，并将基板处理气体导入缓冲室，缓冲室包括沿着基板的层叠方向设置的多个气体供给开口，从气体导入部导入的处理气体从气体供给口供给到反应室。

24. 发明授权

US08005279B2 Capsule endoscope image display controller 有权
标题翻译：胶囊内窥镜图像显示控制器
公开(公告)号：US08005279B2
公开(公告)日：2011-08-23
申请号：US11883551
申请日：2005-12-19
申请人： Yasushi Yagi , Tomio Echigo , Ryusuke Sagawa , Hai Vu
发明人： Yasushi Yagi , Tomio Echigo , Ryusuke Sagawa , Hai Vu
IPC分类号： G06K9/00
CPC分类号： A61B1/00009 , A61B1/00016 , A61B1/041 , A61B1/042 , A61B5/7264 , G06F19/00 , G06T7/0012 , G06T7/20 , G06T2207/10068 , G06T2207/30028 , H04N2005/2255
摘要： The present invention discloses a capsule endoscope image display controller (26) including: an image-to-image similarity calculating unit (36) that calculates, for each image included in an image sequence captured by a capsule endoscope which moves within the digestive organs, a similarity between the image and its temporally consecutive image; an amount-of-movement calculating unit (47) that calculates, for each image included in the image sequence, an amount of movement of a feature area included in the image; a video state classifying unit (41) that classifies, for each image included in the image sequence, a video state of the image into one of the following states, based on the video state, the similarity, and the amount of movement of the image: (a) “stationary state” indicating that the capsule endoscope is stationary, (b) “digestive organs deformation state” indicating that the digestive organs are deformed, and (c) “capsule moving state” indicating that the capsule endoscope is moving, based on the similarity and the amount of movement of the image; a rendering duration determining unit (42) that determines, for each image included in the image sequence, a rendering duration between the image and its temporally consecutive image; and a display controlling unit (44) that sequentially displays, on a screen, the images included in the image sequence with the determined rendering durations.
摘要翻译：本发明公开了一种胶囊型内窥镜图像显示控制器（26），包括：图像相似度计算单元，对于在消化器官内移动的胶囊型内窥镜拍摄的图像序列中包含的各图像，图像与其时间上连续的图像之间的相似性; 移动量计算单元（47）针对包括在图像序列中的每个图像计算图像中包括的特征区域的移动量; 视频状态分类单元，根据视频状态，相似度和图像的移动量，将包括在图像序列中的每个图像的图像的视频状态分类为以下状态之一：（a）表示胶囊型内窥镜静止的“静止状态”，（b）表示消化器官变形的“消化器官变形状态”，（c）表示胶囊型内窥镜正在移动的“胶囊移动状态” 基于图像的相似性和移动量; 对于包括在图像序列中的每个图像，确定图像与其时间上连续的图像之间的渲染持续时间的渲染持续时间确定单元（42）以及显示控制单元，其在屏幕上依次在所确定的渲染持续时间内显示包括在图像序列中的图像。

25. 发明申请

US20100055816A1 Light Emitting Device Manufacturing Apparatus and Method 审中-公开
标题翻译：发光装置制造装置及方法
公开(公告)号：US20100055816A1
公开(公告)日：2010-03-04
申请号：US12303568
申请日：2007-06-07
申请人： Toshihisa Nozawa , Yasushi Yagi
发明人： Toshihisa Nozawa , Yasushi Yagi
IPC分类号： H01L51/56 , C23C16/458 , C23C14/34 , C23F1/08
CPC分类号： C23C16/00 , C23C14/12 , C23C14/3464 , H01L51/56 , H05B33/10
摘要： A disclosed light-emitting-device manufacturing apparatus for manufacturing a light emitting device by forming, on an in-process substrate, an organic layer including an emitting layer includes multiple processing chambers to which the in-process substrate is sequentially transferred to be subjected to multiple substrate processing steps; and multiple substrate transfer chambers, each of which is connected to a different one of the processing chambers. A substrate holding container configured to contain the in-process substrate is sequentially connected to the substrate transfer chambers in order so that the in-process substrate is sequentially transferred to the processing chambers to be subjected to the substrate processing steps.
摘要翻译：所公开的用于通过在工艺衬底上形成包括发光层的有机层来制造发光器件的发光器件制造装置包括多个处理室，其中处理前衬底被依次转印到其上多个基板加工步骤; 以及多个衬底传送室，每个衬底传送室连接到不同的一个处理室。被配置为容纳处理前基板的基板保持容器依次连接到基板传送室，使得处理前基板被顺序地转移到处理室以进行基板处理步骤。

26. 发明申请

US20090156084A1 LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING LIGHT EMITTING DEVICE 有权
标题翻译：发光装置及制造发光装置的方法
公开(公告)号：US20090156084A1
公开(公告)日：2009-06-18
申请号：US12304316
申请日：2007-06-13
申请人： Yasushi Yagi , Shingo Watanabe , Toshihisa Nozawa , Chuichi Kawamura , Kimihiko Yoshino , Tadahiro Ohmi
发明人： Yasushi Yagi , Shingo Watanabe , Toshihisa Nozawa , Chuichi Kawamura , Kimihiko Yoshino , Tadahiro Ohmi
IPC分类号： H01J9/00 , H05B33/10
CPC分类号： H01L51/001 , C23C14/12 , C23C14/28 , H01L51/56
摘要： Disclosed is a light emitting device manufacturing apparatus including a plurality of processing chambers for performing a substrate processing for forming, on a target substrate, a light emitting device having multiple layers including an organic layer, wherein each of the plurality of processing chambers is configured to perform a substrate process on the target substrate while maintaining the target substrate such that its device forming surface, on which the light emitting device is to be formed, is oriented toward a direction opposite to a direction of gravity.
摘要翻译：公开了一种发光器件制造设备，包括：多个处理室，用于执行用于在目标衬底上形成包括有机层的多层的发光器件的衬底处理，其中，所述多个处理室中的每一个被配置为在目标衬底上执行衬底处理，同时保持目标衬底，使得要在其上形成发光器件的器件形成表面朝向与重力方向相反的方向。

27. 发明授权

US06634370B2 Liquid treatment system and liquid treatment method 失效
标题翻译：液体处理系统和液体处理方法
公开(公告)号：US06634370B2
公开(公告)日：2003-10-21
申请号：US09849276
申请日：2001-05-07
申请人： Satoshi Nakashima , Wataru Okase , Takenobu Matsuo , Tameyasu Hyakuzuka , Yasushi Yagi , Yoshiyuki Harima , Jun Yamauchi , Hiroki Taniyama , Kyungho Park , Yoshitsugu Tanaka , Yoshinori Kato , Hiroshi Sato
发明人： Satoshi Nakashima , Wataru Okase , Takenobu Matsuo , Tameyasu Hyakuzuka , Yasushi Yagi , Yoshiyuki Harima , Jun Yamauchi , Hiroki Taniyama , Kyungho Park , Yoshitsugu Tanaka , Yoshinori Kato , Hiroshi Sato
IPC分类号： B08B300
CPC分类号： H01L21/67167 , C25D7/123 , C25D17/001 , H01L21/67178 , H01L21/6723 , H01L21/68707
摘要： Liquid treatment units are disposed in multi-tiers surrounding a main-arm 35. Among liquid treatment units, plating units M1 through M4 are disposed on a lower tier side, and a unit for post-treatment process such as a cleaning unit 70 where a cleaner atmosphere is necessary is disposed on an upper tier side. Thereby, an improvement in an area efficiency and the formation and maintenance of a clean atmosphere can be simultaneously obtained.
摘要翻译：液体处理单元设置在主臂35周围的多层中。在液体处理单元中，电镀单元M1至M4设置在下层侧，以及用于后处理处理的单元，例如清洁单元70，其中更清洁的气氛被设置在上层侧。由此，可以同时获得面积效率的提高，清洁气氛的形成和维护。

28. 发明授权

US5662469A Heat treatment method 失效
标题翻译：热处理方法
公开(公告)号：US5662469A
公开(公告)日：1997-09-02
申请号：US410538
申请日：1995-03-24
申请人： Wataru Okase , Yasushi Yagi , Satoshi Kawachi
发明人： Wataru Okase , Yasushi Yagi , Satoshi Kawachi
IPC分类号： C23C16/458 , C23C16/46 , C23C16/48 , C30B25/10 , C30B25/12 , C30B31/12 , C30B31/14 , H01L21/00 , H01L21/205 , H01L21/314 , F27D5/00 , F27D3/12
CPC分类号： C23C16/463 , C23C16/4583 , C23C16/46 , C23C16/481 , C30B25/10 , C30B25/12 , C30B31/12 , C30B31/14 , H01L21/67109
摘要： The present invention relates to a thermal processing method wherein a cylindrical process tube that has at one end an entrance/exit is provided at the other end thereof with a heat source, and thermal processing is performed on a workpiece which has been brought in from the entrance/exit of the process tube to a prescribed position therein. This thermal processing method and an apparatus therefor is characterized in that, when the workpiece is moved to the prescribed position, it is first moved to a proximity position that is closer to the heat source than the prescribed position, then it is returned therefrom to the prescribed position. The invention is further characterized in that, if the actual processing temperature at the prescribed position changes while the workpiece is undergoing thermal processing, the workpiece is moved such that the position of the workpiece with respect to the heat generation source is changed in order to return the processing temperature at the prescribed position, to the prescribed processing temperature. This ensures that the temperature of the workpiece can be rapidly raised to the prescribed processing temperature and also that, if the temperature of the workpiece should change, it can be rapidly returned to the prescribed processing temperature.
摘要翻译：本发明涉及一种热处理方法，其中在一端具有入口/出口的圆柱形处理管在其另一端设置有热源，并且对从已经从处理管的入口/出口到其中的规定位置。该热处理方法及其装置的特征在于，当工件移动到规定位置时，首先将其移动到比规定位置更靠近热源的接近位置，然后从其返回到规定的位置。本发明的特征还在于，如果在工件进行热加工时在规定位置处的实际加工温度变化，则工件被移动，使得工件相对于发热源的位置改变以返回处理温度在规定的位置，达到规定的加工温度。这样可以确保工件的温度快速提高到规定的加工温度，而且如果工件的温度变化，则可以迅速地恢复到规定的加工温度。

29. 发明授权

US5536918A Heat treatment apparatus utilizing flat heating elements for treating semiconductor wafers 失效
标题翻译：利用平面加热元件处理半导体晶片的热处理设备
公开(公告)号：US5536918A
公开(公告)日：1996-07-16
申请号：US248621
申请日：1994-05-16
申请人： Wataru Ohkase , Yasushi Yagi , Satoshi Kawachi
发明人： Wataru Ohkase , Yasushi Yagi , Satoshi Kawachi
IPC分类号： H01L21/00 , H01L21/205 , H01L21/22 , H01L21/285 , H01L21/31
CPC分类号： H01L21/67115
摘要： A heat treatment apparatus including a flat heat source having a plural number of ring-shaped heating units of different diameters arranged concentrically and so as to face a processing surface of a semiconductor wafer for example, a heat control portion which performs either independent or batch control of a plural number of ring-shaped heating units, a process tube which houses the object for processing, and a movement mechanism which brings a processing surface of the object for processing and the flat heat source into relative proximity. By this configuration, it is possible to have fast heat treatment such as oxidation and diffusion processing, or CVD processing, to a uniform temperature for the entire processing surface of a flat object for processing.
摘要翻译：一种热处理设备，包括具有多个不同直径的环形加热单元的平坦热源，其同心地布置并面对半导体晶片的处理表面，例如，执行独立或批量控制的热控制部分多个环状加热单元，容纳加工对象物的处理管，以及使处理对象物的处理面和平坦的热源相对靠近的移动机构。通过这种结构，可以对平坦化处理用的整个加工面进行均匀的温度处理，例如氧化，扩散处理，CVD处理等快速热处理。

30. 发明授权

US08972136B2 Control method and control apparatus for four-wheel drive vehicle 有权
标题翻译：四轮驱动车辆的控制方法和控制装置
公开(公告)号：US08972136B2
公开(公告)日：2015-03-03
申请号：US13559468
申请日：2012-07-26
申请人： Yasushi Yagi , Hiroto Kawano , Tomohiro Nozu , Akiyoshi Kakita , Ryohei Shigeta
发明人： Yasushi Yagi , Hiroto Kawano , Tomohiro Nozu , Akiyoshi Kakita , Ryohei Shigeta
IPC分类号： G06F7/00 , B60T8/175 , B60K17/35 , B60W50/06 , B60K17/02 , B60K17/34 , B60W10/02 , B60W30/18 , B60K23/08 , B60K23/04 , B60W10/184 , B60T8/1755 , B60T7/22 , B60W10/18 , B60T8/172
CPC分类号： B60T8/175 , B60K17/02 , B60K17/34 , B60K17/35 , B60K23/04 , B60K23/08 , B60K23/0808 , B60K2023/0858 , B60T7/22 , B60T8/172 , B60T8/1755 , B60T2201/14 , B60T2270/202 , B60T2270/302 , B60W10/02 , B60W10/18 , B60W10/184 , B60W30/18 , B60W50/06 , B60W2520/28 , B60W2720/403
摘要： Discloses is a method of controlling a four-wheel drive vehicle equipped with a torque distribution device capable of changing a torque distribution amount for secondary driven wheels according to an input current to be applied thereto. This method comprises the steps of: applying, to the torque distribution device, a current value corresponding to a target torque distribution amount; and, performing a current changing control for increasing and reducing the input current to the torque distribution device. The step of performing a current changing control includes causing the input current to the torque distribution device to be temporarily increased to a value greater than the current value corresponding to the target torque distribution amount, and then returned to the current value corresponding to the target torque distribution amount, and repeating the temporary increasing of the input current at least at intervals of a predetermined time.
摘要翻译：公开了一种控制配备有能够根据要施加的输入电流来改变二次从动轮的转矩分配量的扭矩分配装置的四轮驱动车辆的控制方法。该方法包括以下步骤：向扭矩分配装置施加与目标扭矩分配量对应的电流值; 并且执行用于增加和减小对扭矩分配装置的输入电流的电流变化控制。进行电流变化控制的步骤包括：使转矩分配装置的输入电流临时增加到与目标转矩分配量对应的电流值以上的值，然后返回到与目标转矩对应的电流值分配量，并且至少以预定时间的间隔重复输入电流的暂时增加。

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