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21. 发明授权

US06801827B2 Overlay inspection apparatus for semiconductor substrate and method thereof 失效
标题翻译：半导体衬底叠层检查装置及其方法
公开(公告)号：US06801827B2
公开(公告)日：2004-10-05
申请号：US10268716
申请日：2002-10-09
申请人： Yasuhiro Yoshitake , Shunichi Matsumoto , Toshiharu Miwa
发明人： Yasuhiro Yoshitake , Shunichi Matsumoto , Toshiharu Miwa
IPC分类号： G06F1900
CPC分类号： H01L21/67253 , G03F7/70125 , G03F7/705 , G03F7/70525 , G03F7/706 , G03F7/70633
摘要： A system for manufacturing a semiconductor device which predicts a difference in registration error between a circuit pattern and an overlay mark from a pattern dimension, illumination conditions and the wave aberration of an exposure lens, feeds a correction value based on the predicted difference back to an exposure device and modifies an overlay inspection data control limit.
摘要翻译：用于制造半导体器件的系统，其根据图案尺寸，照射条件和曝光透镜的波像差来预测电路图案和覆盖标记之间的配准误差的差异，将基于预测差异的校正值反馈给曝光装置和修改覆盖检查数据控制限制。

22. 发明授权

US06542830B1 Process control system 有权
标题翻译：过程控制系统
公开(公告)号：US06542830B1
公开(公告)日：2003-04-01
申请号：US09142546
申请日：1998-09-10
申请人： Fumio Mizuno , Seiji Isogai , Kenji Watanabe , Yasuhiro Yoshitake , Terushige Asakawa , Yuichi Ohyama , Hidekuni Sugimoto , Seiji Ishikawa , Masataka Shiba , Jun Nakazato , Makoto Ariga , Tetsuji Yokouchi , Toshimitsu Hamada , Ikuo Suzuki , Masami Ikota , Mari Nozoe , Isao Miyazaki , Yoshiharu Shigyo
发明人： Fumio Mizuno , Seiji Isogai , Kenji Watanabe , Yasuhiro Yoshitake , Terushige Asakawa , Yuichi Ohyama , Hidekuni Sugimoto , Seiji Ishikawa , Masataka Shiba , Jun Nakazato , Makoto Ariga , Tetsuji Yokouchi , Toshimitsu Hamada , Ikuo Suzuki , Masami Ikota , Mari Nozoe , Isao Miyazaki , Yoshiharu Shigyo
IPC分类号： H01L2166
CPC分类号： H01L22/20 , G01N21/9501 , G01R31/2894 , G01R33/06 , H01L2223/54466 , H01L2924/0002 , H01L2924/00
摘要： A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses being collected to construct a data base and an image file, therein definition of defects is given by combinations of elements which characterize the defect based on the inspection information and the image information obtained from the inspection apparatuses. By giving definition of the defect, characteristics of the defect can be subdivided and known. Therefore, the cause of a defect can be studied.
摘要翻译：根据本发明的处理管理系统包括用于检查晶片上的缺陷的检查装置，通过通信网络连接的检查装置，从这些检查装置获得的检查信息和图像信息被收集以构建数据库和图像文件，其中缺陷的定义通过基于检查信息和从检查装置获得的图像信息来表征缺陷的元件的组合来给出。通过给出缺陷的定义，可以细分和知道缺陷的特征。因此，可以研究缺陷的原因。

23. 发明授权

US08736830B2 Pattern inspection device of substrate surface and pattern inspection method of the same 有权
标题翻译：基板表面图案检查装置及图案检验方法相同
公开(公告)号：US08736830B2
公开(公告)日：2014-05-27
申请号：US13145968
申请日：2009-12-10
申请人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
发明人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
IPC分类号： G01N21/00
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译：提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

24. 发明授权

US08730471B2 DUV-UV band spectroscopic optical system and spectrometer using same 有权
标题翻译： DUV-UV光谱分光光学系统和光谱仪
公开(公告)号：US08730471B2
公开(公告)日：2014-05-20
申请号：US13145942
申请日：2009-12-17
申请人： Keiko Oka , Yasuhiro Yoshitake
发明人： Keiko Oka , Yasuhiro Yoshitake
IPC分类号： G01J3/28
CPC分类号： G01B11/0625 , G01B2210/56 , G01J3/02 , G01J3/0208 , G01J3/0278 , G01J3/0297 , G01J3/10 , G01N21/9501 , G01N21/956 , G02B13/143 , G02B21/16 , G02B27/0025 , G11B5/84
摘要： Disclosed are a spectroscopic optical system and a spectrometer both enabling vertical illumination by means of an optical system using only refractive lenses and enabling wide-band color correction in the DUV-UV (190 to 400 nm) range. The spectroscopic optical system and spectrometer each comprise a light source (100), a folding mirror (110), a field stop (120), an object-side focusing lens system (130) for focusing light onto a sample, an image-side focusing lens (140) disposed on the image forming plane of the object-side focusing lens system, and a spectroscope (150) for dispersing regularly reflected light from the sample. The object-side focusing lens system (130) and the image-side focusing lens system (140) are each a spectroscopic optical system corrected with respect to color in a broad band of wavelength from 190 to 400 nm and configured from only refractive lenses enabling vertical illumination. The working distance (WD) of each lens is set shorter than a predetermined distance, and the doublet interval (D) is set longer than a predetermined distance.
摘要翻译：公开了一种分光光学系统和光谱仪，其通过仅使用折射透镜的光学系统实现垂直照明，并且能够在DUV-UV（190-400nm）范围内实现宽带色彩校正。分光光学系统和光谱仪各自包括光源（100），折叠镜（110），场停止器（120），用于将光聚焦到样本上的物体侧聚焦透镜系统（130），图像侧设置在物体侧聚焦透镜系统的图像形成平面上的聚焦透镜（140）以及用于从样品中均匀地分散反射光的分光镜（150）。物体侧聚焦透镜系统（130）和图像侧聚焦透镜系统（140）分别是相对于190至400nm的波长宽带中的颜色校正的分光光学系统，并且仅由折射透镜构成，使得能够垂直照明每个透镜的工作距离（WD）设定为短于预定距离，并且双重间隔（D）被设定为比预定距离长。

25. 发明授权

US08553216B2 Defect inspection device using catadioptric objective lens 有权
标题翻译：使用反折射物镜的缺陷检查装置
公开(公告)号：US08553216B2
公开(公告)日：2013-10-08
申请号：US12747949
申请日：2008-12-19
申请人： Keiko Yoshimizu , Yasuhiro Yoshitake
发明人： Keiko Yoshimizu , Yasuhiro Yoshitake
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/94 , G02B17/0808 , G02B21/0016 , G02B21/04 , G02B27/46
摘要： A defect inspection device comprises an inspection optical system including a light source, a half mirror for reflecting illumination light emitted from the light source, a catadioptric objective lens for collecting reflected light from the sample by illumination light reflected by the half mirror, an imaging lens for focusing the reflected light transmitted through the catadioptric objective lens, a relay lens having a blocking member provided at a position at which specularly reflected light from the sample is focused by the imaging lens, and a detector for detecting specularly reflected light not blocked by the blocking member; and a computation processing unit for detecting defects of the sample on the basis of the signals detected by the detector.
摘要翻译：缺陷检查装置包括检查光学系统，包括光源，用于反射从光源发射的照明光的半反射镜，用于通过由半反射镜反射的照明光收集来自样品的反射光的反射折射物镜，成像透镜用于对透射反射折射物镜透射的反射光进行聚焦的中继透镜，具有设置在通过成像透镜聚焦的来自样品的镜面反射光的位置处的阻挡构件的中继透镜，以及检测器，用于检测未被该反射折射物镜遮挡的镜面反射光阻挡构件; 以及计算处理单元，用于基于由检测器检测到的信号来检测样本的缺陷。

26. 发明授权

US08259414B2 Magnetic recording disk having aligning pattern and method for aligning thereof 有权
标题翻译：具有对准图案的磁记录盘及其对准方法
公开(公告)号：US08259414B2
公开(公告)日：2012-09-04
申请号：US12156338
申请日：2008-05-29
申请人： Takenori Hirose , Yasuhiro Yoshitake
发明人： Takenori Hirose , Yasuhiro Yoshitake
IPC分类号： G11B5/82
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/855
摘要： Embodiments of the invention provide patterned media in which the center and the direction of the disk can be detected. According to one embodiment, patterned media has a bit pattern including convex portions of a magnetic material on one surface or both surfaces of a nonmagnetic substrate having a central hole. A diffraction grating pattern is formed as an alignment pattern in the inner circumference (or outer circumference) of the patterned media. The diffraction grating pattern is a pattern having a repetitive configuration, and includes a pattern with a repetitive pitch different from that in other portions, or a portion having no pattern, at least one region on a circumference. The diffraction grating pattern is irradiated with detection light and diffracted light is detected, thereby a center and a direction of the disk can be detected.
摘要翻译：本发明的实施例提供了可以检测盘的中心和方向的图案化介质。根据一个实施例，图案化介质具有在具有中心孔的非磁性基板的一个表面或两个表面上具有包括磁性材料的凸部的位图案。在图案化介质的内圆周（或外圆周）上形成衍射光栅图案作为对准图案。衍射光栅图案是具有重复构造的图案，并且包括具有与其它部分不同的重复间距的图案，或者具有无图案的部分，圆周上的至少一个区域。用检测光照射衍射光栅图案，并检测衍射光，从而可以检测光盘的中心和方向。

27. 发明申请

US20120013890A1 PATTERN INSPECTION DEVICE OF SUBSTRATE SURFACE AND PATTERN INSPECTION METHOD OF THE SAME 有权
标题翻译：基板表面图案检测装置及其图案检测方法
公开(公告)号：US20120013890A1
公开(公告)日：2012-01-19
申请号：US13145968
申请日：2009-12-10
申请人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
发明人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
IPC分类号： G01N21/956 , G01N21/47
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译：提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

28. 发明申请

US20110069895A1 DEFECT INSPECTION SYSTEM 有权
标题翻译：缺陷检查系统
公开(公告)号：US20110069895A1
公开(公告)日：2011-03-24
申请号：US12957018
申请日：2010-11-30
申请人： Taketo Ueno , Yasuhiro Yoshitake
发明人： Taketo Ueno , Yasuhiro Yoshitake
IPC分类号： G06K9/68
CPC分类号： G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
摘要： The present invention relates to a defect inspection system which can perform inspection condition setting easily in a relatively short period of time, can examine the inspection condition setting even when there is no sample, and further can provide an inspection condition and a defect signal intensity to a person, who sets the inspection condition, to assist the inspection condition setting. In the defect inspection system, a defective image, which is an inspection image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image are digitalized as a defect signal intensity and accumulated in association with the inspection condition, and the inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. After all the evaluations are completed, if there are a plurality of defects to be inspected, the work is repeated by times corresponding to the number of kinds of the defects and a recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and is provided to the person who sets the inspection condition. And, appearance inspection for detecting a pattern defect or a foreign material defect on a substrate is performed.
摘要翻译：本发明涉及一种能够在较短时间内容易进行检查条件设定的缺陷检查系统，即使没有样本也能够检查检查条件设定，并且还可以提供检查条件和缺陷信号强度设定检查条件的人员，以协助检查条件设定。在缺陷检查系统中，作为检查图像的缺陷图像和与其对应的参考图像和缺陷图像和参考图像的不匹配部分被数字化为缺陷信号强度并且与检查条件相关联地累积，并且在重复累积工作的同时改变检查条件以重复评估，直到完成对设定范围内的所有检查条件的评估。在完成所有评估之后，如果存在多个待检查的缺陷，则对与缺陷的种类数量相对应的次数和包括具有高缺陷信号强度和检查的累积条件的配方文件重复工作条件项目分配作为检查条件配方自动输出，并提供给设置检查条件的人员。并且，进行用于检测基板上的图案缺陷或异物缺陷的外观检查。

29. 发明授权

US07894029B2 Apparatus for optically arranging surface of alignment film and method for manufacturing liquid crystal display device using the same 有权
标题翻译：用于光学配置取向膜表面的装置及使用其制造液晶显示装置的方法
公开(公告)号：US07894029B2
公开(公告)日：2011-02-22
申请号：US11103491
申请日：2005-04-12
申请人： Takeshi Arai , Yasuhiro Yoshitake , Shigeru Matsuyama
发明人： Takeshi Arai , Yasuhiro Yoshitake , Shigeru Matsuyama
IPC分类号： G02F1/1337
CPC分类号： G02F1/133788 , G02B27/28
摘要： Work is irradiated with polarized light generated by configuring in such a manner as to have a polarizer using a grating that separates polarized light from non-polarized light, a lamp and a condenser mirror that allow light to fall on the polarizer, a collimator lens that converts the incoming light into parallel beams, an integrator lens that uniformizes intensity distribution of light radiated from the polarizer, and a diffusion lens with functions to enlarge or contract the irradiated range to the work size, and by forming protrusions and recesses of the shape, material, and size that fit to the desired wavelength on a substrate such as quartz, etc. that transmit ultraviolet light, and by providing the light-polarizing performance by appropriately providing an incident angle. By carrying out this processing, the alignment film in the liquid crystal display element can be photo-aligned at high accuracy and uniformly.
摘要翻译：用通过配置的偏振光照射产生的偏振光，使得具有使偏振光与非偏振光分离的光栅的偏振器，允许光落在偏振器上的灯和聚光镜，准直透镜将入射光转换为平行光束，使从偏振器辐射的光的强度分布均匀的积分透镜和具有将照射范围扩大或收缩至工作尺寸的功能的漫射透镜，并且通过形成形状的突起和凹部，材料和尺寸，其适合于透射紫外光的基板（例如石英等）上的期望波长，并且通过适当地提供入射角提供光偏振性能。通过进行这种处理，液晶显示元件中的取向膜可以高精度和均匀地光取向。

30. 发明申请

US20090279079A1 METHOD AND APPARATUS FOR INSPECTING DEFECTS 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US20090279079A1
公开(公告)日：2009-11-12
申请号：US12423902
申请日：2009-04-15
申请人： Yukihiro Shibata , Yasuhiro Yoshitake
发明人： Yukihiro Shibata , Yasuhiro Yoshitake
IPC分类号： G01N21/88
CPC分类号： G01N21/95623 , G01N2021/9563 , G03F7/7065
摘要： To provide a defect inspection apparatus for inspecting defects of a specimen without lowering resolution of a lens, without depending on a polarization characteristic of a defect scattered light, and with high detection sensitivity that is realized by the following. A detection optical path is branched by at least one of spectral splitting and polarization splitting, a spatial filter in the form of a two-dimensional array is disposed after the branch, and only diffracted light is shielded by the spatial filter in the form of a two-dimensional array.
摘要翻译：提供一种用于检查样本缺陷的缺陷检查装置，而不会降低透镜的分辨率，而不依赖于缺陷散射光的偏振特性，并且具有通过以下实现的高检测灵敏度。通过光谱分离和偏振分割中的至少一个来分支检测光路，在分支之后设置二维阵列形式的空间滤波器，只有衍射光被空间滤波器屏蔽二维数组。

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