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    • 22. 发明授权
    • Screen printing device and screen printing method
    • 丝网印刷装置和丝网印刷法
    • US09076211B2
    • 2015-07-07
    • US13823885
    • 2011-10-17
    • Seikou AbeTakashi Yazawa
    • Seikou AbeTakashi Yazawa
    • G06T7/00B41F15/26B41M1/12H05K3/00
    • G06T7/004B41F15/26B41M1/12B41P2233/52G06T7/70H05K3/0008
    • Prior to a mark imaging process executed for the purpose of detecting a position of recognition marks for positioning the substrate and the mask, an optical axis calibration processing process of detecting a horizontal relative position between imaging optical axes, and a surface correction data creation processing process of detecting a local positional deviation of the imaging optical axes, which is caused by the travel of the imaging unit, are executed. Before starting production, a production pre-start precision evaluation process for evaluating a substrate positioning precision is executed by using a verification substrate and a verification mask, and after starting the production, a production post-start precision evaluation process for evaluating a substrate positioning precision after starting the production is executed by using a commercial production substrate and a commercial production mask.
    • 在为了检测用于定位基板和掩模的识别标记的位置而执行的标记成像处理之前,检测成像光轴之间的水平相对位置的光轴校准处理处理和表面校正数据创建处理处理 检测由成像单元的移动引起的成像光轴的局部位置偏差。 在开始生产之前,通过使用验证基板和验证掩模执行用于评估基板定位精度的生产预启动精度评估处理,并且在开始生产之后,用于评估基板定位精度的生产后启动精度评估处理 开始生产后,通过使用商业生产基材和商业生产掩模来执行生产。
    • 23. 发明授权
    • Screen printing device and screen printing method
    • 丝网印刷装置和丝网印刷法
    • US08820232B2
    • 2014-09-02
    • US13823825
    • 2011-10-17
    • Seikou AbeTakashi Yazawa
    • Seikou AbeTakashi Yazawa
    • B41F15/08B41F15/26B41M1/12H05K3/12G06K15/02H05K1/02
    • G06K15/02B41F15/26B41M1/12H05K1/0269H05K3/1216H05K2201/09918H05K2203/166
    • Prior to a mark imaging process executed for the purpose of detecting a position of recognition marks for positioning the substrate and the mask, an optical axis calibration processing process of detecting a horizontal relative position between imaging optical axes, and a surface correction data creation processing process of detecting a local positional deviation of the imaging optical axes, which is caused by the travel of the imaging unit, are executed. Before starting production, a production pre-start precision evaluation process for evaluating a substrate positioning precision is executed by using a verification substrate and a verification mask, and after starting the production, a production post-start precision evaluation process for evaluating a substrate positioning precision after starting the production is executed by using a commercial production substrate and a commercial production mask.
    • 在为了检测用于定位基板和掩模的识别标记的位置而执行的标记成像处理之前,检测成像光轴之间的水平相对位置的光轴校准处理处理和表面校正数据创建处理处理 检测由成像单元的移动引起的成像光轴的局部位置偏差。 在开始生产之前,通过使用验证基板和验证掩模执行用于评估基板定位精度的生产预启动精度评估处理,并且在开始生产之后,用于评估基板定位精度的生产后启动精度评估处理 开始生产后,通过使用商业生产基材和商业生产掩模来执行生产。
    • 25. 发明申请
    • SCREEN PRINTING DEVICE AND SCREEN PRINTING METHOD
    • 屏幕打印设备和画面打印方法
    • US20130169979A1
    • 2013-07-04
    • US13823825
    • 2011-10-17
    • Seikou AbeTakashi Yazawa
    • Seikou AbeTakashi Yazawa
    • G06K15/02
    • G06K15/02B41F15/26B41M1/12H05K1/0269H05K3/1216H05K2201/09918H05K2203/166
    • Prior to a mark imaging process executed for the purpose of detecting a position of recognition marks for positioning the substrate and the mask, an optical axis calibration processing process of detecting a horizontal relative position between imaging optical axes, and a surface correction data creation processing process of detecting a local positional deviation of the imaging optical axes, which is caused by the travel of the imaging unit, are executed. Before starting production, a production pre-start precision evaluation process for evaluating a substrate positioning precision is executed by using a verification substrate and a verification mask, and after starting the production, a production post-start precision evaluation process for evaluating a substrate positioning precision after starting the production is executed by using a commercial production substrate and a commercial production mask.
    • 在为了检测用于定位基板和掩模的识别标记的位置而执行的标记成像处理之前,检测成像光轴之间的水平相对位置的光轴校准处理处理和表面校正数据创建处理处理 检测由成像单元的移动引起的成像光轴的局部位置偏差。 在开始生产之前,通过使用验证基板和验证掩模执行用于评估基板定位精度的生产预启动精度评估处理,并且在开始生产之后,用于评估基板定位精度的生产后启动精度评估处理 开始生产后,通过使用商业生产基材和商业生产掩模来执行生产。
    • 29. 发明授权
    • Current lead
    • 当前铅
    • US5563369A
    • 1996-10-08
    • US180800
    • 1994-01-10
    • Takashi YazawaSatoshi Yasuda
    • Takashi YazawaSatoshi Yasuda
    • H01B7/42H01F6/06H01R4/68H01B12/00H01F6/00
    • H01B7/423H01F6/065H01R4/68Y10S505/885Y10S505/90
    • A superconducting magnet is arranged in a helium tank, and the superconducting magnet cooled to a very low temperature by liquid helium in the helium tank is connected to a power source kept at room temperature by a current lead and a current lead. The current leads are constituted by conductors made of copper or a copper alloy having a residual resistivity of 5.times.10.sup.-8 .OMEGA..multidot.m or more. In a helium tank, a persistent current switch, cooled by liquid helium, for connecting the conductor to the conductor, is arranged. The persistent current switch magnetizes the superconducting magnet to a persistent current mode and demagnetizes it from the persistent current mode. The helium tank is arranged in a vacuum housing.
    • 在氦罐中设置超导磁体,并且通过氦罐中的液氦将超导磁体冷却到非常低的温度通过电流引线和电流引线连接到保持在室温的电源。 电流引线由具有5×10 -8Ω以上的残留电阻率的铜或铜合金制成的导体构成。 在氦罐中,布置了用于将导体连接到导体的由液氦冷却的持续电流开关。 持续电流开关将超导磁体磁化成持久电流模式,并将其从持久电流模式中消磁。 氦罐被布置在真空壳体中。