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21. 发明授权

US4011381A Process for preparing thermosetting powder coating composition 失效
标题翻译：制备热成型粉末涂料组合物的方法
公开(公告)号：US4011381A
公开(公告)日：1977-03-08
申请号：US581430
申请日：1975-05-28
申请人： Naozumi Iwasawa , Nobuo Sugiyama , Ichiro Yoshihara , Tadashi Watanabe , Taizo Kondo
发明人： Naozumi Iwasawa , Nobuo Sugiyama , Ichiro Yoshihara , Tadashi Watanabe , Taizo Kondo
IPC分类号： C09D5/03 , C08G59/32 , C08G59/42 , C08J3/20 , C09D5/46 , C09D157/04 , C08F220/14
CPC分类号： C08G59/42 , C08G59/3209 , C08K3/0033 , C08K5/0041 , C08K5/09 , C09D157/04 , Y10T428/31855
摘要： A process for preparing a thermosetting powder coating composition comprising the steps of copolymerizing 5 to 25 wt.% of at least one of glycidyl acrylate and glycidyl methacrylate with 95 to 75 wt.% of an ethylenically unsaturated compound in a solvent having a boiling point of up to 170.degree. C to obtain a solution of copolymer, the copolymer having a number average molecular weight of 2,000 to 30,000 and a melt viscosity of 100 to 500 poises at 160.degree. C, uniformly dispersing a pigment into the copolymer solution, removing the solvent from the resulting mixture at a temperature of 170.degree. to 220.degree. C and reduced pressure, thereafter admixing a di- or tri-carboxylic acid cross-linking agent with the mixture with heating at a temperature of up to 120.degree. C, and pulverizing the solid mixture obtained.

22. 发明授权

US5650259A Processes for pattern formation using photosensitive compositions and liquid development 失效
标题翻译：使用光敏组合物和液体显影的图案形成方法
公开(公告)号：US5650259A
公开(公告)日：1997-07-22
申请号：US553978
申请日：1995-11-06
申请人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
发明人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
IPC分类号： G03F7/004 , G03F7/027 , G03F7/30 , G03F7/38 , G03F7/40
CPC分类号： G03F7/0045 , G03F7/027
摘要： A photosensitive composition which comprises, as essential components:(A) a polymer having carboxyl group(s) and hydroxyphenyl group(s), or (A') a polymer having carboxy group(s) and (A") a polymer having hydroxyphenyl group(s),(B) a compound having at least two vinyl ether groups in the molecule, and(C) a compound which generates an acid when irradiated with am actinic ray, and which is useful as a positive type photoresist having high resolution and excellent formability of fine image pattern, a material for printing, etc.; and a process for pattern formation using said composition.
摘要翻译：作为必要成分的感光性组合物：（A）具有羧基和羟基苯基的聚合物，或（A'）具有羧基的聚合物和（A“）具有羟基苯基，（B）分子中具有至少两个乙烯基醚基的化合物，（C）当用光激光照射时产生酸的化合物，并且可用作具有高分子量的正型光致抗蚀剂精细图像图案的分辨率和优异的成形性，印刷材料等; 以及使用所述组合物的图案形成方法。

23. 发明授权

US5455116A Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method 失效
标题翻译：电磁波防反射材料和电磁波反射防止方法
公开(公告)号：US5455116A
公开(公告)日：1995-10-03
申请号：US140556
申请日：1993-10-25
申请人： Toshiaki Nagano , Hideo Kogure , Tetsu Maki , Naozumi Iwasawa
发明人： Toshiaki Nagano , Hideo Kogure , Tetsu Maki , Naozumi Iwasawa
IPC分类号： G21F1/12 , H05K9/00 , B32B9/00
CPC分类号： H05K9/0086 , G21F1/125 , G21Y2002/301 , G21Y2004/10 , G21Y2004/30 , Y10T428/12007 , Y10T428/12014 , Y10T428/12035
摘要： An electromagnetic wave reflection-preventing material having a structure formed by successively laminating (A) an electromagnetic wave reflecting material layer, if needed, (B) a supporting layer, (C) a resin layer, if needed, (D) a supporting layer, and (E) a metallic pattern layer prepared by arranging at least one of a pattern unit comprising a geometrical pattern formed by use of a continuous metallic band, or comprising a multi-figured structure formed by combining a plurality of band-shaped metallic figures so as not to contact with each other; and an electromagnetic wave reflection-preventing method by use of the electromagnetic wave reflection-preventing material.
摘要翻译：一种电磁波反射防止材料，具有如下需要，依次层叠（A）电磁波反射材料层，（B）支撑层，（C）树脂层，（D）支撑层和（E）通过布置包括通过使用连续金属带形成的几何图案的图案单元中的至少一个而制备的金属图案层，或者包括通过组合多个带状金属图形而形成的多构造结构以免彼此接触; 以及使用电磁波防反射材料的电磁波反射防止方法。

24. 发明授权

US5134054A Positive-type photosensitive electrodeposition coating composition and process for producing circuit plate 失效
标题翻译：正型感光电沉积涂料组合物及其制造方法
公开(公告)号：US5134054A
公开(公告)日：1992-07-28
申请号：US476543
申请日：1992-02-07
申请人： Naozumi Iwasawa , Junichi Higashi
发明人： Naozumi Iwasawa , Junichi Higashi
IPC分类号： C09D5/44 , C09D133/04 , C09D175/04 , G03F7/023 , G03F7/16 , H05K3/06
CPC分类号： G03F7/023 , G03F7/164
摘要： A positive-type photosensitive electrodeposition coating composition comprising(A) a photosensitive compound having a molecular weight of less than 6,000 and containing at least one modified quinonediazidesulfone units represented by the following formula (I) ##STR1## wherein R.sub.1 represents ##STR2## R.sub.2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group, andR.sub.3 represents an alkylene group, a cycloalkylene group or an alkylene ether group, in the molecule and(B) an acrylic resin having a salt-forming group.
摘要翻译：一种正型光敏电沉积涂料组合物，其包含（A）分子量小于6000的感光性化合物，并含有至少一种由下式（I）表示的改性醌二叠氮化物单元，其中R1表示 R 2表示分子中的氢原子，烷基，环烷基或烷基醚基，R 3表示亚烷基，亚环烷基或亚烷基醚基，（B）具有盐 - 成型组。

25. 发明授权

US5070000A Electrodeposition coating composition for use in printed circuit board photo resist 失效
标题翻译：用于印刷电路板光刻胶的电沉积涂料组合物
公开(公告)号：US5070000A
公开(公告)日：1991-12-03
申请号：US265770
申请日：1988-11-01
申请人： Kenji Seko , Yuu Akaki , Naozumi Iwasawa , Toshio Kondo
发明人： Kenji Seko , Yuu Akaki , Naozumi Iwasawa , Toshio Kondo
IPC分类号： C09D5/44 , G03C1/74 , G03F7/032 , G03F7/038 , G03F7/16 , H05K3/00 , H05K3/06
CPC分类号： G03F7/0388 , G03F7/164 , H05K3/0076
摘要： Disclosed is an electrodeposition coating composition for use in printed circuit board photo resist, comprising (a) an acrylic resin containing (meth)acryloyl group and obtained by use of diacetone (meth)acrylamide as an essential monomer component, said acrylic resin being a water-soluble or water-dispersible photo-curable unsaturated resin having an acid value of 20 to 300, a degree of unsaturation of 0.2 to 4.5 moles/kg, a number average molecular weight of 1,000 to 100,000 and a glass transition temperature of 0.degree. to 100.degree. C., and (b) a water-insoluble photopolymerization initiator.
摘要翻译：公开了一种用于印刷电路板光致抗蚀剂的电沉积涂料组合物，其包含（a）含有（甲基）丙烯酰基并通过使用双丙酮（甲基）丙烯酰胺作为必需单体成分得到的丙烯酸树脂，所述丙烯酸树脂为水 - 可溶性或水分散性光固化型不饱和树脂，其酸值为20〜300，不饱和度为0.2〜4.5摩尔/千克，数均分子量为1,000〜100,000，玻璃化转变温度为0〜 100℃，（b）水不溶性光聚合引发剂。

26. 发明授权

US5045434A Visible radiation sensitive composition containing substituted 3-(benzothiazo-2-yl)-7-diethylaminocoumarin as sensitizers 失效
标题翻译：含有取代的3-（苯并噻唑-2-基）-7-二乙氨基香豆素作为敏化剂的可见辐射敏感组合物
公开(公告)号：US5045434A
公开(公告)日：1991-09-03
申请号：US629484
申请日：1990-12-18
申请人： Ichiro Yoshihara , Motoko Okuhara , Takao Yamamoto , Naozumi Iwasawa , Yasuo Doi , Tsukasa Ohyama , Kazuhiko Murayama , Yoriaki Matsuzaki , Susumu Kasamatsu , Keisuke Takuma , Kimitoshi Kato
发明人： Ichiro Yoshihara , Motoko Okuhara , Takao Yamamoto , Naozumi Iwasawa , Yasuo Doi , Tsukasa Ohyama , Kazuhiko Murayama , Yoriaki Matsuzaki , Susumu Kasamatsu , Keisuke Takuma , Kimitoshi Kato
IPC分类号： C08F2/50 , G03F7/031 , G03F7/038
CPC分类号： G03F7/031 , C08F2/50 , G03F7/0388 , Y10S430/115 , Y10S430/116 , Y10S430/127 , Y10S430/136 , Y10S430/148
摘要： A visible radiation sensitive composition comprising:(A) a photosetting resin containing a photosensitive group capable of crosslinking or polymerizing by photoirradiation,(B) a sensitizer represented by the formula (i): ##STR1## wherein R.sub.1 and R.sub.2 are the same or different lower alkyl, and R.sub.3 is a hydrogen atom, lower alkyl group, alkoxyalkyl group, hydroxyalkoxyalkyl group or alkoxycarbonylalkyl group, and(C) a polymerization initiator.

27. 发明授权

US4329266A Water-dispersed coating composition comprising an acrylic graft polymer containing carboxyl groups, hydroxyl and/or amide groups 失效
标题翻译：包含含有羧基，羟基和/或酰胺基团的丙烯酸接枝聚合物的水分散涂料组合物
公开(公告)号：US4329266A
公开(公告)日：1982-05-11
申请号：US186557
申请日：1980-09-12
申请人： Yukio Suzuki , Naozumi Iwasawa , Tadashi Watanabe
发明人： Yukio Suzuki , Naozumi Iwasawa , Tadashi Watanabe
IPC分类号： C08F290/12 , C09D151/00 , C08L61/28
CPC分类号： C08F290/126 , C09D151/003
摘要： A water-dispersed coating composition comprising (1) a dispersion of a water-dispersible form of an acrylic graft polymer containing carboxyl groups and hydroxyl and/or amide groups in an aqueous medium containing 60 to 90% by weight of water, and (2) an amino resin. The water-dispersible form of this polymer is obtained by neutralizing at least 50% of the carboxyl groups of the polymer with a basic substance. Prior to neutralization, the polymer has an acid value of 15 to 40 and a glass transition temperature of -10.degree. C. to 70.degree. C., and is produced by polymerizing (A) an acrylic copolymer and (B) a mixture of an alpha,beta-ethylenically unsaturated carboxylic acid and another copolymerizable unsaturated monomer. The copolymer (A) and the mixture (B) is selected so that either one of them has hydroxyl and/or amide groups and the difference between the acid value of the copolymer (A) and that of the mixture (B) is from 25 to 200. The present invention also provides a water-dispersed coating composition comprising a dispersion of a water-dispersible form of a self-curable acrylic graft polymer without an amino resin.
摘要翻译：一种水分散涂料组合物，其包含（1）含水分散体形式的含羧基和羟基和/或酰胺基的丙烯酸接枝聚合物在含有60-90％重量水的水性介质中的分散体，和（2））氨基树脂。该聚合物的水分散形式通过用碱性物质中和聚合物的至少50％的羧基而获得。在中和之前，聚合物的酸值为15至40，玻璃化转变温度为-10℃至70℃，并通过聚合（A）丙烯酸共聚物和（B）将 α，β-烯属不饱和羧酸和另一种可共聚的不饱和单体。选择共聚物（A）和混合物（B），使得它们中的任一个具有羟基和/或酰胺基，并且共聚物（A）和混合物（B）的酸值之间的差异为25 本发明还提供一种水分散涂料组合物，其包含不具有氨基树脂的可分散自由基的丙烯酸接枝聚合物的分散体。

28. 发明授权

US4089910A Thermosetting powder coating compositions 失效
标题翻译：热固性粉末涂料组合物
公开(公告)号：US4089910A
公开(公告)日：1978-05-16
申请号：US588709
申请日：1975-06-20
申请人： Minoru Shibata , Naozumi Iwasawa , Tadashi Watanabe , Ichiro Yoshihara
发明人： Minoru Shibata , Naozumi Iwasawa , Tadashi Watanabe , Ichiro Yoshihara
IPC分类号： B05D7/14 , B05D1/38 , C08F299/04 , C08G59/32 , C08G59/42 , C08L63/00
CPC分类号： C08G59/42 , C08F299/0478 , C08G59/3209 , Y10S524/904 , Y10T428/31529
摘要： A thermosetting powder coating composition comprising:(A) a graft copolymer ofA. 10 to 40 percent of a linear polyester having a number average molecular weight of 600 to 3,000 and containing one ethylenically unsaturated double bond only at one end of the molecule,B. 5 to 30 percent of at least one of glycidyl esters having the formula ##STR1## wherein R.sub.1 is hydrogen or methyl, and C. 10 TO 85 PERCENT OF AT LEAST ONE OF ACRYLIC COMPOUNDS HAVING THE FORMULA OF CH.sub.2 .dbd.C(R.sub.2)COOR.sub.3, wherein R.sub.2 is hydrogen or methyl and R.sub.3 is alkyl having 1 to 14 carbon atoms, cyclohexyl or hydroxyalkyl represented by ##STR2## wherein R.sub.4 is hydrogen, methyl or ethyl, said graft copolymer having a softening point of 70.degree. to 110.degree. C and a number average molecular weight of 2,000 to 30,000; and(B) at least one of polycarboxylic acids and anhydrides thereof in an amount of 0.6 to 1.2 moles in terms of carboxyl group per mole of the glycidyl group contained in the graft copolymer.
摘要翻译：一种热固性粉末涂料组合物，

29. 发明授权

US07179358B2 Method for forming electrodeposition coating film 失效
标题翻译：电沉积涂膜形成方法
公开(公告)号：US07179358B2
公开(公告)日：2007-02-20
申请号：US10417184
申请日：2003-04-17
申请人： Akira Tominaga , Naozumi Iwasawa , Koji Kamikado , Yasuyuki Hirata , Susumu Midogochi
发明人： Akira Tominaga , Naozumi Iwasawa , Koji Kamikado , Yasuyuki Hirata , Susumu Midogochi
IPC分类号： C25D13/12
CPC分类号： C25D13/22
摘要： A method for forming an electrodeposition coating film, comprises a step of subjecting a steric metal article to be coated to electrodeposition coating, and a step of selectively heating/drying the resultant coating film by a plurality of induction heating devices.
摘要翻译：一种形成电沉积涂膜的方法，包括对空间金属制品进行电沉积涂布的步骤，以及通过多个感应加热装置选择性地加热/干燥所得涂膜的步骤。

30. 发明授权

US5624781A Positive type anionic electrodeposition photo-resist composition and process for pattern formation using said composition 失效
标题翻译：正型阴离子电沉积光致抗蚀剂组合物和使用所述组合物的图案形成方法
公开(公告)号：US5624781A
公开(公告)日：1997-04-29
申请号：US250623
申请日：1994-05-27
申请人： Keisuke Naruse , Yukari Takeda , Naozumi Iwasawa , Hideo Kogure
发明人： Keisuke Naruse , Yukari Takeda , Naozumi Iwasawa , Hideo Kogure
IPC分类号： C09D5/44 , G03F7/023 , G03F7/16 , C25D13/00 , G03F7/38 , G03F7/40
CPC分类号： C09D5/4484 , G03F7/0233 , G03F7/164
摘要： A positive type anionic electrodeposition photoresist composition comprising, as a main component, a dispersion obtained by neutralizing, with a base, a mixture comprising:(A) an acrylic resin containing carboxyl group(s) and hydroxyl group(s),(B) a vinylphenol resin containing a hydroxystyrene unit in an amount of at least 25% by weight based on the resin, and(C) an ester between a polyhydroxybenzophenone and 1,2-naphthoquinone diazide sulfonic acid or benzoquinone diazide sulfonic acid, and dispersing the resulting neutralization product in water.This composition is superior in running stability during electrodeposition and is useful for formation of highly reliable resist pattern or conductor pattern.
摘要翻译：一种正型阴离子电沉积光致抗蚀剂组合物，其包含作为主要成分的通过用碱中和混合物获得的分散体，所述混合物包含：（A）含有羧基和羟基的丙烯酸树脂，（B）含有基于树脂的至少25重量％的羟基苯乙烯单元的乙烯基酚树脂和（C）多羟基二苯甲酮与1,2-萘醌二叠氮化物磺酸或苯醌二叠氮磺酸之间的酯，并将所得中和产品在水中。该组合物在电沉积中的运行稳定性优异，并且可用于形成高度可靠的抗蚀剂图案或导体图案。

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