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21. 发明授权

US06786945B2 Polishing compound and method for polishing substrate 有权
公开(公告)号：US06786945B2
公开(公告)日：2004-09-07
申请号：US10467864
申请日：2003-08-13
申请人： Youichi Machii , Naoyuki Koyama , Masaya Nishiyama , Masato Yoshida
发明人： Youichi Machii , Naoyuki Koyama , Masaya Nishiyama , Masato Yoshida
IPC分类号： C09G102
CPC分类号： C09K3/1454 , C01F17/0043 , C01G25/00 , C01P2004/62 , C01P2004/64 , C01P2006/10 , C01P2006/12 , C09G1/02 , C09K3/1436 , C09K3/1463 , H01L21/31053
摘要： A polishing slurry and a polishing method which are suitably used in a CMP technique for flattening a surface of a substrate in a production process of a semiconductor device. The polishing slurry comprises particles and a medium in which at least a part of the particles are dispersed, wherein the particles are made of at least one of (1) a cerium compound selected from cerium oxide, cerium halide and cerium sulfide and having a density of 3 to 6 g/cm3 and an average particle diameter of secondary particles of 1 to 300 nm and (2) a tetravalent metal hydroxide. A polishing method using the polishing slurry takes advantage of a chemical action of particles in the polishing slurry and minimizes a mechanical action of the particles, thereby achieving a decrease in scratches caused by the particles and an increase in polishing rate at the same time.

22. 发明授权

US08617275B2 Polishing agent and method for polishing substrate using the polishing agent 有权
公开(公告)号：US08617275B2
公开(公告)日：2013-12-31
申请号：US12988898
申请日：2009-04-22
申请人： Yousuke Hoshi , Daisuke Ryuzaki , Naoyuki Koyama , Shigeru Nobe
发明人： Yousuke Hoshi , Daisuke Ryuzaki , Naoyuki Koyama , Shigeru Nobe
IPC分类号： H01L21/31053 , H01L21/3213
CPC分类号： C09G1/02 , B24B37/044 , C09K3/1463 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/76224
摘要： Disclosed is a polishing agent comprising: water; tetravalent metal hydroxide particles; and an additive, wherein the additive contains at least one of a cationic polymer and a cationic polysaccharide. The present invention can provide a polishing agent which is capable of polishing an insulating film at a high speed with less polishing flaws, and having a high polishing rate ratio of a silicon oxide film and a stopper film, in the CMP technology of flattening insulating film. The present invention can also provide a polishing agent set for storing the polishing agent, and a method for polishing a substrate using this polishing agent.

23. 发明授权

US4979181A Vacuum laser irradiating apparatus 失效
标题翻译：真空激光照射装置
公开(公告)号：US4979181A
公开(公告)日：1990-12-18
申请号：US503756
申请日：1990-04-03
申请人： Megumi Nakanose , Naoyuki Koyama , Mitsunori Aoshiba , Tadao Motegi
发明人： Megumi Nakanose , Naoyuki Koyama , Mitsunori Aoshiba , Tadao Motegi
IPC分类号： B01J3/03 , B01J19/12 , B23K26/12
CPC分类号： B23K26/123 , B01J19/121 , B01J3/03 , B23K26/1224
摘要： In a vacuum laser irradiating apparatus disposed between a laser generator and a vacuum vessel in which an object to be irradiated with a laser beam is placed, an outer window plate is airtightly fixed to the outer opening of the apparatus body to maintain the internal cavity of the apparatus body under a vacuum and to pass the laser beam therethrough. This outer window plate is reinforced so as not to be distorted due to pressure difference between an inside vacuum of the apparatus body and an outside atmospheric pressure. This is because the outer window plate is made of an expensive pure monocrystalline material and therefore it is preferably to reduce the thickness thereof for material cost reduction.
摘要翻译：在设置在激光发生器和放置有激光束照射物体的真空容器之间的真空激光照射装置中，将外窗板气密地固定在装置主体的外侧开口部，该设备本体在真空下并使激光束通过其中。该外窗板被加强，以便由于装置主体的内部真空和外部大气压之间的压力差而不会变形。这是因为外窗板由昂贵的纯单晶材料制成，因此优选为了降低材料成本而减小其厚度。

24. 发明申请

US20110039475A1 POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLSHING AGENT 有权
标题翻译：抛光剂和使用抛光剂抛光底物的方法
公开(公告)号：US20110039475A1
公开(公告)日：2011-02-17
申请号：US12988898
申请日：2009-04-22
申请人： Yousuke Hoshi , Daisuke Ryuzaki , Naoyuki Koyama , Shigeru Nobe
发明人： Yousuke Hoshi , Daisuke Ryuzaki , Naoyuki Koyama , Shigeru Nobe
IPC分类号： B24B29/00 , C09K3/14
CPC分类号： C09G1/02 , B24B37/044 , C09K3/1463 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/76224
摘要： Disclosed is a polishing agent comprising: water; tetravalent metal hydroxide particles; and an additive, wherein the additive contains at least one of a cationic polymer and a cationic polysaccharide. The present invention can provide a polishing agent which is capable of polishing an insulating film at a high speed with less polishing flaws, and having a high polishing rate ratio of a silicon oxide film and a stopper film, in the CMP technology of flattening insulating film. The present invention can also provide a polishing agent set for storing the polishing agent, and a method for polishing a substrate using this polishing agent.
摘要翻译：公开了一种抛光剂，其包括：水; 四价金属氢氧化物颗粒; 和添加剂，其中所述添加剂含有阳离子聚合物和阳离子多糖中的至少一种。本发明可以提供一种抛光剂，其能够在平坦化绝缘膜的CMP技术中以高速抛光较少的抛光缺陷并且具有高的氧化硅膜和阻挡膜的抛光速率比的抛光剂。本发明还可以提供用于储存抛光剂的抛光剂组，以及使用该研磨剂研磨基材的方法。

25. 发明申请

US20070270085A1 CHEMICAL MECHANICAL POLISHING SLURRY, CMP PROCESS AND ELECTRONIC DEVICE PROCESS 审中-公开
标题翻译：化学机械抛光浆，CMP工艺和电子设备工艺
公开(公告)号：US20070270085A1
公开(公告)日：2007-11-22
申请号：US11679215
申请日：2007-02-27
申请人： Ryo Ota , Takayuki Nakakawaji , Toranosuke Ashizawa , Naoyuki Koyama
发明人： Ryo Ota , Takayuki Nakakawaji , Toranosuke Ashizawa , Naoyuki Koyama
IPC分类号： B24B1/00
CPC分类号： C09K3/1463 , C09G1/02 , C09K3/1436 , H01L21/31053
摘要： To provide a slurry for Chemical Mechanical Polishing, a Chemical Mechanical Polishing method using said slurry, and a method of producing electronic devices using said method that makes it possible to achieve a low scratch process capability in processing surfaces such as SiO2 film surfaces and the like and also to enable speed polishing to attain a high processing efficiency.Slurry for Chemical Mechanical Polishing characterized in comprising abrasive grains and water, wherein said abrasive grains are composite particles coated with ceria particles consisting of organic host particles and ceria particles, zeta potential of said composite particles being a negative potential, the organic host particles constituting the composite particles coated with ceria particles are organic host particles to which carboxyl groups and sulfonyl groups are introduced; the slurry is added with panarization additive; and the planarization additive is poly(methyl)acrylic acid ammonium salt.
摘要翻译：为了提供化学机械抛光的浆料，使用所述浆料的化学机械抛光方法，以及使用所述方法制造电子器件的方法，其使得可以在诸如SiO 2的处理表面中实现低的划痕处理能力， / SUB>膜表面等，并且还能够进行速度抛光以获得高处理效率。用于化学机械抛光的浆料，其特征在于包括磨粒和水，其中所述磨粒是由有机主体颗粒和二氧化铈颗粒组成的二氧化铈颗粒涂覆的复合颗粒，所述复合颗粒的ζ电位为负电位，有机主体颗粒构成涂覆有二氧化铈颗粒的复合颗粒是引入羧基和磺酰基的有机主体颗粒; 将浆料加入泛化添加剂; 平面化添加剂是聚（甲基）丙烯酸铵盐。

26. 发明申请

US20070167017A1 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same 有权
标题翻译：金属抛光液用金属，金属研磨液，其制造方法以及使用其的研磨方法
公开(公告)号：US20070167017A1
公开(公告)日：2007-07-19
申请号：US11715843
申请日：2007-03-09
申请人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
IPC分类号： H01L21/461 , C09K13/00
CPC分类号： C09G1/04 , C09G1/02 , C09K13/00 , C23F3/00 , C23F3/04 , C23F3/06 , H01L21/3212
摘要： Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
摘要翻译：提供一种金属抛光液体，其包含氧化剂，氧化金属蚀刻剂，保护膜形成剂，保护膜形成剂的溶解促进剂和水; 一种生产它的方法; 和使用它的抛光方法。还提供了金属抛光液的材料，其包括氧化金属蚀刻剂，保护膜形成剂和用于保护膜形成剂的溶解促进剂。

27. 发明授权

US06642917B1 Sign perception system, game system, and computer-readable recording medium having game program recorded thereon 有权
标题翻译：标志感知系统，游戏系统和记录有游戏程序的计算机可读记录介质
公开(公告)号：US06642917B1
公开(公告)日：2003-11-04
申请号：US09709442
申请日：2000-11-13
申请人： Naoyuki Koyama , Shigeki Tooyama
发明人： Naoyuki Koyama , Shigeki Tooyama
IPC分类号： G09G500
CPC分类号： G06F3/0421 , G06F3/04883
摘要： There is provided a game system which perceives a sign intended by a game player from the motion of a finger or hand of the player and controls the motions of game characters or the situation of a game in accordance with the sign. A game machine includes a received-light pattern detection apparatus for detecting the motion of a hand of a game player as a received-light pattern; a sign perception system for perceiving a sign from the received-light pattern input from the received-light pattern detection apparatus, and a main CPU for controlling a game in accordance with the sign perceived by the sign perception system.
摘要翻译：提供了一种游戏系统，其根据玩家的手指或手的运动感知游戏玩家想要的标志，并根据该符号控制游戏角色的动作或游戏的情况。游戏机包括：接收光图案检测装置，用于检测作为接收光图案的游戏者的手的运动; 用于感知从接收光图案检测装置输入的接收光图案中的符号的符号感知系统，以及用于根据由符号感知系统感知到的符号来控制游戏的主CPU。

28. 发明授权

US08900477B2 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same 有权
标题翻译：金属抛光液用金属，金属研磨液，其制造方法以及使用其的研磨方法
公开(公告)号：US08900477B2
公开(公告)日：2014-12-02
申请号：US12015533
申请日：2008-01-17
申请人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
IPC分类号： C09K13/00 , C03C15/00 , C03C25/68 , H01L21/302 , H01L21/321 , C09G1/04 , C09G1/02 , C23F3/06 , C23F3/00 , C23F3/04
CPC分类号： C09G1/04 , C09G1/02 , C09K13/00 , C23F3/00 , C23F3/04 , C23F3/06 , H01L21/3212
摘要： Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
摘要翻译：提供一种金属抛光液体，其包含氧化剂，氧化金属蚀刻剂，保护膜形成剂，保护膜形成剂的溶解促进剂和水; 一种生产它的方法; 和使用它的抛光方法。还提供了金属抛光液的材料，其包括氧化金属蚀刻剂，保护膜形成剂和用于保护膜形成剂的溶解促进剂。

29. 发明申请

US20080121840A1 MATERIALS FOR POLISHING LIQUID FOR METAL, POLISHING LIQUID FOR METAL, METHOD FOR PREPARATION THEREOF AND POLISHING METHOD USING THE SAME 有权
标题翻译：用于金属抛光液体的金属材料，用于金属的抛光液，其制备方法和使用其的抛光方法
公开(公告)号：US20080121840A1
公开(公告)日：2008-05-29
申请号：US12015533
申请日：2008-01-17
申请人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
IPC分类号： C09K13/00
CPC分类号： C09G1/04 , C09G1/02 , C09K13/00 , C23F3/00 , C23F3/04 , C23F3/06 , H01L21/3212
摘要： Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
摘要翻译：提供一种金属抛光液体，其包含氧化剂，氧化金属蚀刻剂，保护膜形成剂，保护膜形成剂的溶解促进剂和水; 一种生产它的方法; 和使用它的抛光方法。还提供了金属抛光液的材料，其包括氧化金属蚀刻剂，保护膜形成剂和用于保护膜形成剂的溶解促进剂。

30. 发明授权

US4756284A Intake system for internal combustion engine 失效
标题翻译：内燃机进气系统
公开(公告)号：US4756284A
公开(公告)日：1988-07-12
申请号：US5780
申请日：1987-01-21
申请人： Haruo Okimoto , Seiji Tashima , Naoyuki Koyama
发明人： Haruo Okimoto , Seiji Tashima , Naoyuki Koyama
IPC分类号： F02B27/02 , F02B53/04 , F02B55/16 , F02B75/18 , F02B75/20 , F02B27/00
CPC分类号： F02B27/021 , F02B27/006 , F02B27/0252 , F02B53/04 , F02B55/16 , F02B2053/005 , F02B2075/1824 , F02B27/0273 , F02B27/0284 , F02B27/0294 , F02B75/20 , Y02T10/146 , Y02T10/17
摘要： An intake system for an internal combustion engine having a plurality of engine sections for utilizing the interference effect between engine sections to increase the intake charge for at least two engine sections, has a first intake passage connected to a first intake port of one engine section of the at least two engine sections, and a second intake passage connected to a second intake port of another engine section. The first and second intake passages are communicated with each other by a communicating passage and join each other at a junction portion at upstream ends thereof. The first and second intake passages and the communicating passage are arranged so as to have a common axis in the vicinity of the communicating passage. The junction portion is communicated with the atmosphere and a valve is provided for controlling the opening of the communicating passage in accordance with engine operating condition. The valve is located within the communicating passage. The respective lengths of a passage consisting of a part of the first and second passages and the communicating passage, and a passage consisting of the first and second intake passages and the junction portion are determined so that a compression wave produced in one of the first and second passages can be transmitted to the intake port connected to the other intake passage just before the intake port is closed. This intake system has an advantage that a dynamic effect, particularly an interference effect can be effectively utilized to remarkably increase the intake charge.
摘要翻译：一种用于内燃机的进气系统，具有多个发动机部分，用于利用发动机部分之间的干扰效应来增加至少两个发动机部分的进气量，具有连接到一个发动机部分的第一进气口的第一进气通道所述至少两个发动机部分和连接到另一发动机部分的第二进气口的第二进气通道。第一和第二进气通道通过连通通道彼此连通，并在其上游端处的接合部处彼此连接。第一和第二进气通道和连通通道布置成在连通通道附近具有公共轴线。接合部与大气连通，并且设置有阀，用于根据发动机工作条件控制连通通道的开度。阀位于连通通道内。由第一和第二通道的一部分和连通通道组成的通道的相应长度以及由第一和第二进气通道和接合部分组成的通道被确定为使得在第一和第二通道第二通道可以在进气口关闭之前传递到连接到另一个进气通道的进气口。这种进气系统具有可以有效地利用动态效果，特别是干扰效应来显着增加进气量的优点。

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