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1. 发明授权

US08900477B2 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same 有权
标题翻译：金属抛光液用金属，金属研磨液，其制造方法以及使用其的研磨方法
公开(公告)号：US08900477B2
公开(公告)日：2014-12-02
申请号：US12015533
申请日：2008-01-17
申请人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
IPC分类号： C09K13/00 , C03C15/00 , C03C25/68 , H01L21/302 , H01L21/321 , C09G1/04 , C09G1/02 , C23F3/06 , C23F3/00 , C23F3/04
CPC分类号： C09G1/04 , C09G1/02 , C09K13/00 , C23F3/00 , C23F3/04 , C23F3/06 , H01L21/3212
摘要： Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
摘要翻译：提供一种金属抛光液体，其包含氧化剂，氧化金属蚀刻剂，保护膜形成剂，保护膜形成剂的溶解促进剂和水; 一种生产它的方法; 和使用它的抛光方法。还提供了金属抛光液的材料，其包括氧化金属蚀刻剂，保护膜形成剂和用于保护膜形成剂的溶解促进剂。

2. 发明申请

US20120048830A1 Abrasive Liquid For Metal and Method for Polishing 有权
标题翻译：金属研磨液和抛光方法
公开(公告)号：US20120048830A1
公开(公告)日：2012-03-01
申请号：US13218590
申请日：2011-08-26
申请人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
IPC分类号： C23F1/16 , C23F1/00
CPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/3212
摘要： An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.
摘要翻译：一种用于金属的研磨液，包括（1）金属氧化剂，（2）氧化金属的溶解剂，（3）第一保护膜形成剂，例如氨基酸或唑，物理上吸附金属的表面和/或形成化学键，从而形成保护膜，（4）辅助第一保护膜形成剂的第二保护膜形成剂如聚丙烯酸，聚酰胺或其盐形成保护膜和（5）水; 和抛光方法。

3. 发明申请

US20080121840A1 MATERIALS FOR POLISHING LIQUID FOR METAL, POLISHING LIQUID FOR METAL, METHOD FOR PREPARATION THEREOF AND POLISHING METHOD USING THE SAME 有权
标题翻译：用于金属抛光液体的金属材料，用于金属的抛光液，其制备方法和使用其的抛光方法
公开(公告)号：US20080121840A1
公开(公告)日：2008-05-29
申请号：US12015533
申请日：2008-01-17
申请人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
IPC分类号： C09K13/00
CPC分类号： C09G1/04 , C09G1/02 , C09K13/00 , C23F3/00 , C23F3/04 , C23F3/06 , H01L21/3212
摘要： Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
摘要翻译：提供一种金属抛光液体，其包含氧化剂，氧化金属蚀刻剂，保护膜形成剂，保护膜形成剂的溶解促进剂和水; 一种生产它的方法; 和使用它的抛光方法。还提供了金属抛光液的材料，其包括氧化金属蚀刻剂，保护膜形成剂和用于保护膜形成剂的溶解促进剂。

4. 发明授权

US06899821B2 Abrasive liquid for metal and method for polishing 有权
标题翻译：金属研磨液和抛光方法
公开(公告)号：US06899821B2
公开(公告)日：2005-05-31
申请号：US09976001
申请日：2001-10-15
申请人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
IPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/321 , C09K13/00 , C09K13/06 , H01L21/302
CPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/3212
摘要： An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent informing a protecting film and (5) water; and a method for polishing.
摘要翻译：一种用于金属的研磨液，包括（1）金属氧化剂，（2）氧化金属的溶解剂，（3）第一保护膜形成剂，例如氨基酸或唑，物理上吸附金属的表面和/或形成化学键，从而形成保护膜，（4）辅助第一保护膜形成剂的第二保护膜形成剂如聚丙烯酸，聚酰胺或其盐通知保护膜和（5）水; 和抛光方法。

5. 发明申请

US20050095860A1 Abrasive liquid for metal and method for polishing 有权
公开(公告)号：US20050095860A1
公开(公告)日：2005-05-05
申请号：US10995494
申请日：2004-11-24
申请人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
IPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/321 , H01L21/4763 , H01L21/302 , H01L21/461
CPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/3212
摘要： An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.

6. 发明授权

US5929057A Pharmaceutical composition for the treatment of leukemia containing 9-cis-retinoic acid-.alpha.-tocopherol ester 失效
标题翻译：用于治疗含有9-顺式 - 视黄酸-α-生育酚酯的白血病的药物组合物
公开(公告)号：US5929057A
公开(公告)日：1999-07-27
申请号：US92143
申请日：1998-06-05
申请人： Makoto Makishima , Yasuhiro Kanatani , Yoshio Honma , Kohei Inomata , Takao Kishiye
发明人： Makoto Makishima , Yasuhiro Kanatani , Yoshio Honma , Kohei Inomata , Takao Kishiye
IPC分类号： A61K31/355 , A61K31/59 , A61K31/20
CPC分类号： A61K31/355 , A61K31/59
摘要： 9-Cis-retinoic acid-.alpha.-tocopherol esters, pharmaceutical compositions containing the same and use of the same as a medicine for the treatment of leukemia, in particular, the remission of leukemia are provided and a combined use of a 9-cis-retinoic acid-.alpha.-tocopherol ester and either 1.alpha.,25-dihydroxyvitamin D.sub.3 or 9-cis-retinoic acid exhibits a synergistic effect in the treatment of leukemia without any side effects caused by 1.alpha.,25-dihydroxyvitamin D.sub.3 or 9-cis-retinoic acid.
摘要翻译：提供9-顺式视黄酸-α-生育酚酯，含有该组合物的药物组合物，以及用于治疗白血病药物，特别是白血病缓解的药物组合物，并结合使用9-顺式 - 视黄酸-α-生育酚酯和1α，25-二羟基维生素D3或9-顺式 - 视黄酸在治疗白血病中表现出协同效应，而没有由1α，25-二羟基维生素D 3或9-顺式 - 视黄酸引起的任何副作用，视黄酸。

7. 发明授权

US4939156A New tetramethyl-cis-diaza-bicyclo{4.2.0}octane-3,5-dione derivatives having differentiation-inducing activity and antiviral activity 失效
标题翻译：具有分化诱导活性和抗病毒活性的新的四甲基 - 顺 - 二氮杂双环{4.2.0}辛烷-3,5-二酮衍生物
公开(公告)号：US4939156A
公开(公告)日：1990-07-03
申请号：US219200
申请日：1988-07-08
申请人： Motoo Hozumi , Tsuneo Itoh , Yoshio Honma , Norio Kawahara , Ichiro Ishikawa , Haruo Ogura
发明人： Motoo Hozumi , Tsuneo Itoh , Yoshio Honma , Norio Kawahara , Ichiro Ishikawa , Haruo Ogura
IPC分类号： C07D239/70 , C07H19/06
CPC分类号： C07H19/06 , C07D239/70
摘要： As new compounds are now provided 7,7,8,8,-tetramethyl-cis-diaza-bicyclo{4.2.0}octane-3,5,-dione derivatives which have an activity to induce the differentiation of tumor cells and are useful as antitumor agent, and which also have an antiviral activity against various viruses and are useful as antiviral agent. These new derivatives may be produced by a photo-addition reaction of a uracil compound with 2,3-dimethyl-2-butene.

8. 发明授权

US4792842A Semiconductor device with wiring layer using bias sputtering 失效
标题翻译：具有使用偏置溅射的布线层的半导体器件
公开(公告)号：US4792842A
公开(公告)日：1988-12-20
申请号：US129393
申请日：1987-11-24
申请人： Yoshio Honma , Sukeyoshi Tsunekawa , Natsuki Yokoyama , Hiroshi Morisaki
发明人： Yoshio Honma , Sukeyoshi Tsunekawa , Natsuki Yokoyama , Hiroshi Morisaki
IPC分类号： H01L23/522 , H01L21/3205 , H01L21/768 , H01L23/485 , H01L23/48
CPC分类号： H01L23/485 , H01L21/76877 , H01L21/76886 , H01L2924/0002
摘要： Disclosed is a semiconductor device and method for manufacturing the same, which is provided with a first wiring layer whose thickness within a contact hole is great in a lower portion of the contact hole and is small in an upper portion thereof. Since the first wiring layer at the lower portion of the contact hole is sufficiently thick, reaction between a second wiring layer formed on the first wiring layer and a substrate is effectively prevented. The first wiring layer is formed by bias sputtering in which a bias voltage is applied to the substrate.
摘要翻译：公开了一种半导体器件及其制造方法，其具有第一布线层，其第一布线层的接触孔的厚度在接触孔的下部较大，上部较小。由于接触孔下部的第一布线层足够厚，因此有效地防止了形成在第一布线层上的第二布线层与基板之间的反应。第一布线层通过偏置溅射形成，其中偏置电压被施加到基板。

9. 发明授权

US3978917A Descaling system for the cooling water tubes of a steam condenser 失效
标题翻译：蒸汽冷凝器冷却水管除垢系统
公开(公告)号：US3978917A
公开(公告)日：1976-09-07
申请号：US503315
申请日：1974-09-05
申请人： Yoshio Honma , Junichi Takahashi
发明人： Yoshio Honma , Junichi Takahashi
IPC分类号： F28G1/12 , F28G1/00
CPC分类号： F28G1/12
摘要： Descaling elements for cleaning cooling water tubes within a steam condenser are received within a water soaking vessel. A wire net is stretched within said vessel, and said vessel is charged with water until the water level reaches a predetermined limit line above said wire net. The presence of the wire net prevents the descaling elements from being floated up to the water surface. A considerably large space is formed between the water surface and the ceiling of the vessel. Said space communicates with an evacuating device for deaerating the interior of the vessel, and no air filter or air separator is required for said evacuating device.BACKGROUND OF THE INVENTIONThis invention relates to the heat exchanging tubes of a heat exchanger, and more particularly to a descaling system for cleaning the cooling water tubes of a steam condenser, and further in detail to a descaling system for removing substances deposited on the inner walls of the cooling water tubes of a steam condenser by continuously forcing a large number of descaling elements such as water-soaked sponge balls through said tubes.As above described, a descaling system is known which uses water-holding descaling elements for the purpose of cleaning the steam condenser tubes. For example, in the known descaling system a circulation passageway for passing descaling elements therethrough connects with the cooling water inlet pipe and outlet pipe of a steam condenser. In the course of said passageway a water-soaking vessel within which descaling elements are received and which is charged with cooling water is provided. Said vessel is provided with an evacuating device for evacuating the vessel interior up to a prescribed vacuum level. Said evacuating device is generally provided with plural deaeration valves and vacuum pump or air ejector and, in addition, provided with an air filter or air separator for removing water so as to prevent it from entering said pump or ejector.The above-mentioned descaling system has the drawbacks that all of the descaling elements can not be evenly, fully soaked with water because many of the descaling elements are floated up to the proximity of the water surface within the vessel; and a water separator or filter should be provided and the piping line should also be of water-resistant quality because when the vessel interior is deaerated by the evacuating device, water is also soaked into the piping line of said device, resulting in a complicated construction of the evacuating device and an increase in its manufacturing cost.SUMMARY OF THE INVENTIONThe general object of the invention is to provide an improved descaling system eliminating the drawbacks in the foregoing conventional descaling system.In the descaling system of the invention, a wire net is stretched within a water-soaking vessel having descaling elements received therein; said descaling elements are received below said wire net; said vessel is charged with water up to a predetermined limit line above the wire net; said wire net is in a state always immersed in water during the water soaking operation for the descaling elements; and a considerably large volume of space is provided in the upper part of the vessel interior and the water within the vessel has a free surface.Accordingly, in the descaling system of the invention, when the water-soaking vessel is deaerated by an evacuating device associated with said vessel, there is a reduced possibility of water being entered into the piping line of said device because of the presence of a considerably large volume of space. As the result, the necessity of providing a water filter or water separator within said device is reduced, offering the advantage of attaining the manufacturing cost reduction of the evacuating device.Since the descaling elements are prevented from being floated on the water surface by the wire net, they are fully immersed in the water, offering the advantage of reliably enabling the water soaking.Accordingly, an object of the invention is to provide a descaling system low in manufacturing cost.Another object of the invention is to provide a descaling system enabling the water soaking operation for the descaling elements to be reliably carried out, thereby attaining a good descaling effect.A still another object of the invention is to provide a descaling system enabling the water soaking operation for the descaling elements to be carried out for a short time with high efficiency.
摘要翻译：用于清洁蒸汽冷凝器内的冷却水管的除垢元件被接纳在水浸泡容器内。电网在所述容器内拉伸，所述容器用水充电直到水位达到所述金属丝网上方的预定极限线。丝网的存在防止除垢元件浮在水面上。在水面和容器的天花板之间形成相当大的空间。所述空间与用于对容器内部进行脱气的排气装置连通，并且所述抽空装置不需要空气过滤器或空气分离器。

10. 发明授权

US08491807B2 Abrasive liquid for metal and method for polishing 有权
标题翻译：金属研磨液和抛光方法
公开(公告)号：US08491807B2
公开(公告)日：2013-07-23
申请号：US13218590
申请日：2011-08-26
申请人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
IPC分类号： H01L21/302
CPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/3212
摘要： An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.
摘要翻译：一种用于金属的研磨液，包括（1）金属氧化剂，（2）氧化金属的溶解剂，（3）第一保护膜形成剂，例如氨基酸或唑，物理上吸附金属的表面和/或形成化学键，从而形成保护膜，（4）辅助第一保护膜形成剂的第二保护膜形成剂如聚丙烯酸，聚酰胺或其盐形成保护膜和（5）水; 和抛光方法。

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