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    • 21. 发明申请
    • Portable imaging device
    • 便携式成像设备
    • US20050195293A1
    • 2005-09-08
    • US11046864
    • 2005-02-01
    • Satoru KobayashiToshio Masuda
    • Satoru KobayashiToshio Masuda
    • H04N5/76
    • H04N5/23293H04N5/772H04N9/7921
    • A portable imaging device has a memory which stores a device image. This device image shows a part of an outside of the portable image device itself including a plurality of selectable portions relating to the control members of the portable image device. The device image is read and is indicated on the LCD of the portable image device. With the portable image at least one of characters is indicated on the LCD. The characters correspond to selectable portions. One of the selectable portions is selected as a selected portion. The selected portion is distinguished from other selectable portion by the characters. The function relating to the selected portion is indicated on the LCD.
    • 便携式成像装置具有存储装置图像的存储器。 该装置图像示出了便携式图像装置本身的外部的一部分,其包括与便携式图像装置的控制构件相关的多个可选择部分。 读取设备图像,并在便携式图像设备的LCD上指示。 在LCD上指示至少一个字符的便携式图像。 字符对应于可选部分。 可选部分之一被选择为选定部分。 所选择的部分通过字符与其他可选择部分区分开。 与所选部分相关的功能在LCD上显示。
    • 23. 发明申请
    • Method for monitoring plasma processing apparatus
    • 等离子体处理装置的监视方法
    • US20050051270A1
    • 2005-03-10
    • US10944796
    • 2004-09-21
    • Ichiro SasakiToshio MasudaMuneo FuruseHideyuki Yamamoto
    • Ichiro SasakiToshio MasudaMuneo FuruseHideyuki Yamamoto
    • H01L21/3065H01J37/32H01L21/66C23F1/00
    • H01J37/32009H01J37/32935
    • The present apparatus comprises a vacuum process chamber 100 that contains an upper electrode 110 having a conductive plate 115 with gas supply holes for supplying a process gas and a lower electrode 130 having a platform on which a sample is to be mounted; process gas supply means 117 for supplying the process gas to the gas supply holes in the upper electrode 110 and exhaust means 106 for exhausting the vacuum process chamber; a high frequency power supply 121 for applying a high frequency power to the upper electrode to generate a plasma between the upper and lower electrodes; a high frequency bias power supply 122 for applying a high frequency power to the upper electrode to generate a direct current bias potential in the upper electrode; and abnormal discharge determination means 152 for determining whether an abnormal discharge has occurred or not based on the direct current bias potential generated in the upper electrode.
    • 本装置包括真空处理室100,其包含具有导电板115的上电极110,该导电板115具有用于供应处理气体的气体供应孔和具有其上将要安装样品的平台的下电极130; 用于将处理气体供给到上电极110中的气体供给孔和用于排出真空处理室的排气装置106的处理气体供给装置117; 用于向上部电极施加高频电力以在上部电极和下部电极之间产生等离子体的高频电源121; 用于向上部电极施加高频电力以在上部电极中产生直流偏置电位的高频偏置电源122; 以及异常放电判定单元152,用于根据在上部电极中产生的直流偏置电位来判定是否发生异常放电。
    • 25. 发明授权
    • Module carrier structure for vehicle front end having a groove for a
wire harness
    • 用于车辆前端的模块载体结构具有用于线束的凹槽
    • US5573299A
    • 1996-11-12
    • US327473
    • 1994-10-21
    • Toshio Masuda
    • Toshio Masuda
    • B60K11/04B60R19/26B62D25/08
    • B60K11/04B60R19/26B62D25/084
    • A module carrier structure for the vehicle front end includes a horizontal upper frame portion and a horizontal middle frame portion that constitute a radiator assembly frame. The middle frame portion simply rests on a rear bumper beam of a front bumper when the carrier structure is fastened to the front of the vehicle body. The middle frame portion has in its forward surface a groove for accommodating a wire harness whereby the wire harness is protected from heat damage by the radiator and condenser in the engine compartment. The wire harness is free from damage due to a light collision of the vehicle because the bumper beam can slide relative to the middle frame portion. The harness groove may be provided in an attachment below the middle frame portion.
    • 用于车辆前端的模块承载结构包括构成散热器组件框架的水平上框架部分和水平中间框架部分。 当载体结构紧固在车身前部时,中间框架部分简单地靠在前保险杠的后保险杠梁上。 中间框架部分在其前表面上具有用于容纳线束的凹槽,由此保护线束免受发动机室中的散热器和冷凝器的热损伤。 由于保险杠梁相对于中间框架部分滑动,线束不会因车辆的轻微碰撞而受到损坏。 线束槽可以设置在中间框架部分下方的附件中。
    • 30. 发明授权
    • Plasma processing apparatus and plasma processing method
    • 等离子体处理装置和等离子体处理方法
    • US07147747B2
    • 2006-12-12
    • US10377826
    • 2003-03-04
    • Go MiyaHiroyuki KitsunaiJunichi TanakaToshio MasudaHideyuki Yamamoto
    • Go MiyaHiroyuki KitsunaiJunichi TanakaToshio MasudaHideyuki Yamamoto
    • H01L21/00C23C16/00
    • G01N21/73H01J37/32935H01J37/32963H01L21/67253H05H1/0037
    • A plasma processing apparatus having a process chamber in which an object to be processed is subjected to plasma processing includes a light-receiving part for a spectrometer unit, an arithmetic unit, a database, a determination unit and an apparatus controller. The determination unit determines a condition in the processing chamber that an end point of seasoning is reached. The determination of the condition is performed so that one or more differences between one or more output signals derived from a batch of plasma emission data by multivariate analysis and one or more output signals derived from a preceding batch of plasma emission data are found, an average value of the differences in one batch, a difference between a maximum and a minimum of the differences in one batch and a standard deviation of the differences in one batch are determined, and the values are compared with a preset threshold.
    • 一种具有处理室的等离子体处理装置,其中待处理物体经受等离子体处理,其包括用于分光计单元的光接收部分,运算单元,数据库,确定单元和装置控制器。 确定单元确定处理室中达到调味品终点的状态。 执行条件的确定,使得发现通过多变量分析从一批等离子体发射数据得到的一个或多个输出信号与从前一批等离子体发射数据得到的一个或多个输出信号之间的一个或多个差异,平均值 确定一批中的差异值,确定一批中的差异的最大值和最小值之间的差异以及一批中的差异的标准偏差,并将该值与预设阈值进行比较。