专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US08382558B2 Apparatus for dressing a polishing pad, chemical mechanical polishing apparatus and method 有权
标题翻译：用于修整抛光垫的装置，化学机械抛光装置和方法
公开(公告)号：US08382558B2
公开(公告)日：2013-02-26
申请号：US12690408
申请日：2010-01-20
申请人： Katsuhide Watanabe , Ryuichi Kosuge , Soichi Isobe
发明人： Katsuhide Watanabe , Ryuichi Kosuge , Soichi Isobe
IPC分类号： B24B53/02 , B24B5/02
CPC分类号： B24B53/017
摘要： An apparatus dresses a polishing pad. The apparatus includes a dresser drive shaft which is rotatable and vertically movable, a dresser flange coupled to the dresser drive shaft and configured to secure a dressing member thereto, a spherical bearing provided in the dresser flange and configured to allow the dressing member to tilt with respect to the dresser drive shaft, and a spring mechanism configured to generate a force against a tilting motion of the dressing member.
摘要翻译：一种装置装饰抛光垫。该装置包括可旋转和可垂直移动的修整器驱动轴，连接到修整器驱动轴并构造成将修整构件固定到其上的修整器法兰，设置在修整器法兰中的球形轴承，并且构造成允许修整构件以相对于修整器驱动轴，以及弹簧机构，其构造成产生抵抗修整构件的倾斜运动的力。

22. 发明申请

US20070111542A1 SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD 审中-公开
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20070111542A1
公开(公告)日：2007-05-17
申请号：US11615676
申请日：2006-12-22
申请人： Hiroyuki Shinozaki , Norihiro Yamaguchi , Katsuhide Watanabe
发明人： Hiroyuki Shinozaki , Norihiro Yamaguchi , Katsuhide Watanabe
IPC分类号： B05C13/02 , H01L21/20 , H01L21/31
CPC分类号： H01L21/6831 , H01L21/67259
摘要： A substrate treatment apparatus is disclosed. The substrate treatment apparatus has an electrostatic chuck mechanism, a grounding mechanism, and an electron beam radiating mechanism. The electrostatic chuck mechanism electrostatically sucks and holds a substrate under treatment. The grounding mechanism freely contacts a predetermined film of a plurality of films formed on a treatment surface of the substrate under treatment sucked and held by the electrostatic chuck mechanism. The electron beam radiating mechanism radiates a resist film formed on the treatment surface side of the substrate under treatment with an electron beam.
摘要翻译：公开了一种基板处理装置。基板处理装置具有静电卡盘机构，接地机构和电子束照射机构。静电吸盘机构静电吸附并保持处理的基板。接地机构自由地接触由静电卡盘机构吸引并保持的处理的处理面上形成的多个膜的规定膜。电子束照射机构利用电子束照射形成在基板的处理面侧的抗蚀剂膜。

23. 发明申请

US20060097165A1 Electron beam apparatus and method for manufacturing semiconductor device 失效
标题翻译：电子束装置及半导体装置的制造方法
公开(公告)号：US20060097165A1
公开(公告)日：2006-05-11
申请号：US11247263
申请日：2005-10-12
申请人： Atsushi Ando , Katsuhide Watanabe
发明人： Atsushi Ando , Katsuhide Watanabe
IPC分类号： G21K7/00
CPC分类号： H01J37/09 , H01J37/24 , H01J2237/0264 , H01J2237/26 , H01J2237/3175
摘要： A sample chamber and a column are connected to each other and comprise a magnetic substance. An exhaust section controls a pressure in the sample chamber and the column. A stage controller controls a stage, above which a sample is placed, in the sample chamber. An electron beam source power supply supplies power to an electron beam source, which emits an electron beam to the sample. A power supply supplies voltage to electron optic system, which controls the electron beam. The sample chamber, exhaust section, stage controller, electron beam source power supply and power supply are grounded by a first, second, third, fourth and fifth grounding point, respectively. The electron beam source and the electron optic system are electrically insulated from the sample chamber, column, exhaust section and stage. One of the first, second and third grounding point is different from the fourth or fifth grounding point.
摘要翻译：样品室和色谱柱彼此连接并包含磁性物质。排气部分控制样品室和柱中的压力。舞台控制器控制在样品室中放置样品的阶段。电子束源电源向电子束源供电，该电子束向样品发射电子束。电源将电压供给控制电子束的电子光学系统。样品室，排气段，载物台控制器，电子束源电源和电源分别由第一，第二，第三，第四和第五接地点接地。电子束源和电子光学系统与样品室，色谱柱，排气部分和电极电绝缘。第一，第二和第三接地点之一与第四或第五接地点不同。

24. 发明授权

US06515388B1 Magnetic levitation control apparatus 失效
标题翻译：磁悬浮控制装置
公开(公告)号：US06515388B1
公开(公告)日：2003-02-04
申请号：US09680954
申请日：2000-10-10
申请人： Shinichi Moriyama , Katsuhide Watanabe , Takahide Haga
发明人： Shinichi Moriyama , Katsuhide Watanabe , Takahide Haga
IPC分类号： H02K709
CPC分类号： F16C32/0448 , F16C32/0451 , H02N15/00
摘要： A magnetic levitation control apparatus comprises a pair of electromagnets for holding a levitated body having a magnetic body in the levitated state. A signal source for supplying a voltage signal of a frequency on a level such that enables the electromagnets to function as the position sensor, wherein a control voltage signal for controlling the magnetic attraction of the electromagnets is superimposed on the voltage signal. A circuit differentially supplies the voltage signal to the pair of electromagnets to form a position signal of the levitated body from an add signal of currents respectively from the electromagnets, and a circuit detects a control current of the electromagnets from a subtraction signal of currents respectively from the electromagnets. A controller generates a control voltage signal of the electromagnets from the detected position signal of the levitated body and, in addition, corrects the position signal detected from the detected control current of the electromagnets.
摘要翻译：一种磁悬浮控制装置包括一对电磁体，用于保持具有处于悬浮状态的磁体的悬浮体。一种用于提供频率电压信号的信号源，其电平使得电磁体能够用作位置传感器，其中用于控制电磁体的磁吸引力的控制电压信号叠加在电压信号上。电路差分地将电压信号提供给该对电磁体，以从电磁体分别从电流的相加信号形成悬浮体的位置信号，并且电路从电流的减法信号分别检测电磁体的控制电流电磁铁。控制器根据检测到的悬浮体的位置信号产生电磁体的控制电压信号，并且还校正从检测到的电磁体的控制电流检测的位置信号。

25. 发明授权

US06183342B2 Polishing apparatus 有权
标题翻译：抛光设备
公开(公告)号：US06183342B2
公开(公告)日：2001-02-06
申请号：US09276154
申请日：1999-03-25
申请人： Katsuhide Watanabe , Noburu Shimizu , Ichiju Satoh
发明人： Katsuhide Watanabe , Noburu Shimizu , Ichiju Satoh
IPC分类号： B24B100
CPC分类号： F16C32/044
摘要： The polishing apparatus can control the attitude of the top ring with respect to a surface of a turntable of a polishing apparatus is controlled so as to provide a uniform polish surface pressure across the entire polish surface. The polishing apparatus includes the turntable having an abrading surface, a top ring for holding an object to be polished to keep the object surface in moving contact with the abrading surface while rotating the turntable and the top ring, a magnetic bearing assembly for supporting a rotation shaft of the top ring by means of a thrust bearing device and at least one radial bearing device, and an attitude controller for controlling an orientation of the top ring with respect to the turntable through the magnetic bearing assembly.
摘要翻译：抛光装置可以控制顶环相对于抛光装置的转盘表面的姿态，以便在整个抛光表面上提供均匀的抛光表面压力。抛光装置包括具有研磨表面的转盘，用于保持待抛光物体的顶环，用于在转动转台和顶环的同时使物体表面与研磨表面保持移动接触，用于支撑旋转的磁轴承组件通过推力轴承装置和至少一个径向轴承装置的顶环的轴以及用于通过磁轴承组件控制顶环相对于转台的定向的姿态控制器。

26. 发明授权

US6042454A System for detecting the endpoint of the polishing of a semiconductor wafer by a semiconductor wafer polisher 失效
标题翻译：用于通过半导体晶片抛光机检测半导体晶片的抛光的终点的系统
公开(公告)号：US6042454A
公开(公告)日：2000-03-28
申请号：US90265
申请日：1998-06-04
申请人： Katsuhide Watanabe , Akira Ogata , Fumihiko Sakata
发明人： Katsuhide Watanabe , Akira Ogata , Fumihiko Sakata
IPC分类号： B24B37/013 , B24B49/04 , H01L21/304 , B24B49/00
CPC分类号： B24B37/013 , B24B37/04 , B24B49/04
摘要： A polisher provided with a vibration detection system which can detect vibration caused by rubbing between an article to be polished and a polishing member without any noise which is generated in prior art polishers. The polisher includes a turntable assembly with a polishing surface, a rotatable carrier assembly for holding an article to be polished in such a manner that the article is kept in contact, under pressure with the polishing member while being polished. A vibration detector is provided on the rotatable carrier assembly in order to detect the vibration caused by the rubbing between the article and the polishing member of the turntable assembly. A light signal emission device is provided on the rotatable carrier assembly and is adapted to receive electrical signals transmitted from the vibration detector to generate and emit light signals in response to the vibration detected by the detector. A light signal receiving device is provided on a stationary part of the polisher. The light emission device may be an infrared light emission device.
摘要翻译：具有振动检测系统的抛光机，其能够检测在待抛光制品和抛光部件之间摩擦所产生的振动，而不会在现有技术抛光机中产生任何噪音。抛光机包括具有抛光表面的转盘组件，可旋转的载体组件，用于在抛光时在抛光构件的压力下保持物品保持接触的方式保持要抛光的物品。振动检测器设置在可旋转托架组件上，以便检测由物品与转盘组件的抛光部件之间的摩擦引起的振动。光信号发射装置设置在可旋转载体组件上，并且适于接收从振动检测器传送的电信号，以响应于由检测器检测到的振动而产生和发射光信号。光信号接收装置设置在抛光机的固定部分上。发光装置可以是红外发光装置。

27. 发明授权

US5760578A Inductive displacement sensor system detecting displacements in two directions using a multi-bridge circuit 失效
标题翻译：感应位移传感器，用于使用多桥电路检测两个方向的位移
公开(公告)号：US5760578A
公开(公告)日：1998-06-02
申请号：US697007
申请日：1996-08-16
申请人： Katsuhide Watanabe , Naoji Hiraki , Shinichi Moriyama
发明人： Katsuhide Watanabe , Naoji Hiraki , Shinichi Moriyama
IPC分类号： G01B7/14 , G01B7/312 , G01D5/20
CPC分类号： G01D5/2013 , G01B7/14 , G01B7/312
摘要： A displacement sensor system is provided which is capable of simultaneously and independently detecting displacements in two directions orthogonal to an axis of an object to be detected, using a less number of displacement sensors than before. The displacement sensor system, for enabling the simultaneous detection of displacements in two directions orthogonal to an axial direction of a pillar-shaped member, has a plurality of displacement sensors positioned around the pillar-shaped member, and a detector circuit for receiving outputs of the plurality of displacement sensors to output signals indicative of displacements in the two directions orthogonal to the axial direction of the pillar-shaped member. The detector circuit includes a multi-bridge circuit for parallelly connecting a circuit having the plurality of displacement sensors connected in series to a plurality of resistor circuits. In one embodiment of the present invention, the pillar-shaped member has a square prism portion, and the plurality of displacement sensors include four displacement sensors, where the displacement sensors are positioned in a plane parallel to a set of opposite surfaces of the square prism portion and in the vicinity of four corners of the square prism portion, respectively. The four displacement sensors are connected in series to form an inductance circuit which constitutes a part of the multi-bridge circuit.
摘要翻译：提供一种位移传感器系统，其能够使用比以前更少数量的位移传感器来同时且独立地检测与待检测物体的轴线正交的两个方向上的位移。位移传感器系统，用于能够同时检测与柱状构件的轴向正交的两个方向上的位移，具有位于柱状构件周围的多个位移传感器，以及检测器电路，其用于接收多个位移传感器，以输出指示与柱状构件的轴向正交的两个方向上的位移的信号。检测器电路包括用于并联连接具有与多个电阻器电路串联连接的多个位移传感器的电路的多桥电路。在本发明的一个实施例中，柱状部件具有正方形棱镜部分，并且多个位移传感器包括四个位移传感器，其中位移传感器位于与正方形棱镜的一组相对表面平行的平面中并且分别在正方形棱镜部分的四个角附近。四个位移传感器串联连接以形成构成多桥电路的一部分的电感电路。

28. 发明授权

US5142175A Magnetic bearing system 失效
标题翻译：磁轴承系统
公开(公告)号：US5142175A
公开(公告)日：1992-08-25
申请号：US758517
申请日：1991-09-06
申请人： Katsuhide Watanabe
发明人： Katsuhide Watanabe
IPC分类号： F16C39/06
CPC分类号： F16C32/0444 , F16C32/0459
摘要： A system for supporting a rotor without contact with a stator comprising a magnetic bearing apparatus mounted on the stator and including a controlling magnet means fixed to the stator, a non-controlling magnetic pole fixed to the stator, a biasing magnetic poles sandwiched between the controlling magnet and the non-controlling magnetic pole, and a rotor magnetic pole fixed to the rotor to enable the magnetic path of a biasing flux to run in a plane which includes the longitudinal axis of the stator. The non-controlling and rotor magnetic poles may have teeth facing each other.
摘要翻译：一种用于支撑转子而不与定子接触的系统，包括安装在定子上的磁性轴承装置，并且包括固定到定子的控制磁体装置，固定到定子的非控制磁极，夹在控制器之间的偏置磁极磁体和非控制磁极以及固定到转子的转子磁极，使得偏置磁通的磁路能够在包括定子的纵轴的平面内运行。非控制和转子磁极可以具有彼此面对的齿。

29. 发明授权

US08932106B2 Polishing apparatus having thermal energy measuring means 有权
标题翻译：具有热能测量装置的抛光装置
公开(公告)号：US08932106B2
公开(公告)日：2015-01-13
申请号：US13226800
申请日：2011-09-07
申请人： Makoto Fukushima , Katsuhide Watanabe , Hozumi Yasuda , Satoru Yamaki
发明人： Makoto Fukushima , Katsuhide Watanabe , Hozumi Yasuda , Satoru Yamaki
IPC分类号： B24B49/00 , B24B51/00 , B24B37/30 , B24B37/015
CPC分类号： B24B37/005 , B24B37/015 , B24B37/10 , B24B37/30 , H01L21/67017 , H01L21/67092 , H01L21/6838
摘要： A polishing apparatus is used for polishing a substrate such as a semiconductor wafer to a flat mirror finish. The polishing apparatus includes a polishing table having a polishing surface, a substrate holding apparatus configured to hold the substrate and to press the substrate against the polishing surface, and a controller. The substrate holding apparatus includes an elastic membrane configured to form a substrate holding surface which is brought into contact with the substrate, a carrier provided above the elastic membrane, at least one pressure chamber formed between the elastic membrane and the carrier, and an infrared light detector configured to measure thermal energy from the elastic membrane. The controller calculates an estimate value of a temperature of the elastic membrane using a measured value of the infrared light detector.
摘要翻译：抛光装置用于将半导体晶片等基板研磨成平面镜面。抛光装置包括具有抛光表面的抛光台，配置成保持基板并将基板压靠在抛光表面上的基板保持装置和控制器。基板保持装置包括：弹性膜，其构造成形成与基板接触的基板保持面，设置在弹性膜上方的载体，形成在弹性膜与载体之间的至少一个压力室，以及红外线检测器被配置为测量来自弹性膜的热能。控制器使用红外光检测器的测量值来计算弹性膜的温度的估计值。

30. 发明授权

US07372027B2 Electron beam apparatus and method for manufacturing semiconductor device 失效
标题翻译：电子束装置及半导体装置的制造方法
公开(公告)号：US07372027B2
公开(公告)日：2008-05-13
申请号：US11247263
申请日：2005-10-12
申请人： Atsushi Ando , Katsuhide Watanabe
发明人： Atsushi Ando , Katsuhide Watanabe
IPC分类号： G01N23/00
CPC分类号： H01J37/09 , H01J37/24 , H01J2237/0264 , H01J2237/26 , H01J2237/3175
摘要： A sample chamber and a column are connected to each other and comprise a magnetic substance. An exhaust section controls a pressure in the sample chamber and the column. A stage controller controls a stage, above which a sample is placed, in the sample chamber. An electron beam source power supply supplies power to an electron beam source, which emits an electron beam to the sample. A power supply supplies voltage to electron optic system, which controls the electron beam. The sample chamber, exhaust section, stage controller, electron beam source power supply and power supply are grounded by a first, second, third, fourth and fifth grounding point, respectively. The electron beam source and the electron optic system are electrically insulated from the sample chamber, column, exhaust section and stage. One of the first, second and third grounding point is different from the fourth or fifth grounding point.
摘要翻译：样品室和色谱柱彼此连接并包含磁性物质。排气部分控制样品室和柱中的压力。舞台控制器控制在样品室中放置样品的阶段。电子束源电源向电子束源供电，该电子束向样品发射电子束。电源将电压供给控制电子束的电子光学系统。样品室，排气段，载物台控制器，电子束源电源和电源分别由第一，第二，第三，第四和第五接地点接地。电子束源和电子光学系统与样品室，色谱柱，排气部分和电极电绝缘。第一，第二和第三接地点之一与第四或第五接地点不同。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式