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    • 24. 发明授权
    • PIN diode structure with zinc diffusion region
    • PIN二极管结构与锌扩散区
    • US08022495B2
    • 2011-09-20
    • US12420213
    • 2009-04-08
    • Xiang GaoAlex CeruzziLinlin LiuStephen Schwed
    • Xiang GaoAlex CeruzziLinlin LiuStephen Schwed
    • H01L31/06
    • H01L31/105
    • A PIN photodiode having a substrate, a first type electrode layer disposed on the substrate, a first layer of intrinsic material disposed over a portion of the first-type electrode layer, and a first type window layer disposed over the intrinsic layer. An island shaped region of intrinsic material is disposed over the window layer and a dielectric layer is disposed over the island region and at least the peripheral portion of said island shaped region whereby an opening is formed in the island shaped region. A dopant is diffused through the opening so as to form a PN junction that extends into the first layer of intrinsic material.
    • PIN光电二极管,其具有基板,设置在基板上的第一类型电极层,设置在第一类型电极层的一部分上的第一本征材料层,以及设置在本征层上的第一类型窗口层。 本征材料的岛状区域设置在窗口层上方,并且电介质层设置在岛状区域和至少所述岛状区域的周边部分上,从而在岛状区域中形成开口。 掺杂剂通过开口扩散,以便形成延伸到本征材料的第一层中的PN结。