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21. 发明授权

US5787218A Liquid curable urethane (meth)acrylate containing resin composition 失效
标题翻译：含有（甲基）丙烯酸酯的树脂组合物
公开(公告)号：US5787218A
公开(公告)日：1998-07-28
申请号：US513231
申请日：1995-08-10
申请人： Tohru Ohtaka , Yuichi Hashiguchi , Mitsuhito Suwa , Katsutoshi Igarashi
发明人： Tohru Ohtaka , Yuichi Hashiguchi , Mitsuhito Suwa , Katsutoshi Igarashi
IPC分类号： C08F2/50 , C08G18/67 , C08G18/81 , C09D4/00 , G02B6/44 , C08G18/32 , G02B6/02 , G02B6/14
CPC分类号： G02B6/443 , C08G18/672 , C08G18/8175 , C09D4/00 , Y10T428/2938
摘要： A liquid curable resin composition containing urethane bond at a concentration of 2.0.times.10.sup.-3 mole/gm or more and comprising: (a) a urethane (meth)acrylate having at least three cyclic structures in the molecule; (b) a polymerizable mono-functional vinyl monomer of which the homopolymer has a glass transition point of 50.degree. C. or more; and (c) a polymerization initiator. The liquid curable resin composition possesses a high Young's modulus, exhibits very little contraction stress, has high tenacity and good curing characteristics. Along with these superior characteristics, the high reliability of the composition makes it a suitable coating material for optical fiber. Furthermore, since the resin composition possesses a high Young's modulus and high tenacity, it is also useful as a protective coating material for metals, plastics, wood, ceramics, glass, and the like.
摘要翻译：一种含有浓度为2.0×10 -3摩尔/克以上的氨基甲酸酯键的液体固化型树脂组合物，其包含：（a）在分子中具有至少三个环状结构的氨基甲酸酯（甲基）丙烯酸酯; （b）均聚物的玻璃化转变点为50℃以上的可聚合单官能乙烯基单体; 和（c）聚合引发剂。液体固化性树脂组合物具有高的杨氏模量，表现出非常小的收缩应力，具有高强度和良好的固化特性。随着这些优异的特性，组合物的高可靠性使其成为适用于光纤的涂料。此外，由于树脂组合物具有高的杨氏模量和高强度，它也可用作金属，塑料，木材，陶瓷，玻璃等的保护涂层材料。

22. 发明授权

US08338510B2 Photosensitive siloxane composition, cured film formed therefrom and device having the cured film 有权
标题翻译：光敏硅氧烷组合物，由其形成的固化膜和具有固化膜的装置
公开(公告)号：US08338510B2
公开(公告)日：2012-12-25
申请号：US12517186
申请日：2007-11-21
申请人： Mitsuhito Suwa
发明人： Mitsuhito Suwa
IPC分类号： C08K5/00 , B41M5/00 , C08F2/50 , C08F283/04 , C08G69/08 , C08G63/18
CPC分类号： G03F7/0233 , G03F7/0755 , G03F7/0757 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3122 , Y10T428/24802
摘要： Various embodiments provide a photosensitive siloxane composition containing (a) polysiloxane, (b) a quinone diazide compound, (c) a solvent, and (d) one or more kinds of specified imidosilane compounds. Various embodiments also provide a cured film obtained by applying and/or patterning the photosensitive siloxane composition. Various embodiments further provide a device including the cured film.
摘要翻译：各种实施方案提供了含有（a）聚硅氧烷，（b）醌二叠氮化合物，（c）溶剂和（d）一种或多种指定的酰亚胺硅烷化合物的光敏性硅氧烷组合物。各种实施方案还提供通过施加和/或图案化光敏硅氧烷组合物获得的固化膜。各种实施例还提供包括固化膜的装置。

23. 发明申请

US20120244473A1 PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE UTILIZING SAME AND SOLID-STATE IMAGING DEVICE 有权
标题翻译：感光树脂组合物，使用相同的层压体和固态成像装置
公开(公告)号：US20120244473A1
公开(公告)日：2012-09-27
申请号：US13513464
申请日：2010-10-26
申请人： Yumiko Okuda , Toru Okazawa , Masao Kamogawa , Mitsuhito Suwa
发明人： Yumiko Okuda , Toru Okazawa , Masao Kamogawa , Mitsuhito Suwa
IPC分类号： G03F7/004
CPC分类号： G03F7/037 , G03F7/031 , G03F7/091
摘要： A photosensitive resin composition which can impart insulating properties and light-shielding properties against light having a wavelength lying in an ultra-violet range, a visible range and a near-infrared range to a substrate more readily when applied onto the substrate, wherein the substrate has such properties that the permeability to light having a wavelength of 400 to 900 nm inclusive is less than 3.0% and the maximum value of the permeability to light having a wavelength of longer than 900 nm and not longer than 1300 nm is 3.0% or more. The photosensitive resin composition is characterized by comprising (a) an alkali soluble resin, (b) a specific tungsten oxide and/or a specific composite tungsten oxide, (c) a photopolymerizable compound having at least two polymerizable groups, (d) an oxime-type photopolymerization initiator, and (e) a solvent.
摘要翻译：一种光敏树脂组合物，其能够在施加到基板上时更容易地赋予波长在紫外范围，可见光范围和近红外范围内的光的绝缘性能和遮光性，其中基材具有波长为400〜900nm以上的光的透过率小于3.0％，波长在900nm以上1300nm以下的光的透过率的最大值为3.0％以上的特性。光敏树脂组合物的特征在于包含（a）碱溶性树脂，（b）特定的氧化钨和/或特定的复合氧化钨，（c）具有至少两个可聚合基团的光聚合化合物，（d）肟型光聚合引发剂，和（e）溶剂。

24. 发明申请

US20120178022A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM OBTAINED USING SAME, AND OPTICAL DEVICE 有权
标题翻译：阳性感光树脂组合物，使用其的固化膜和光学装置
公开(公告)号：US20120178022A1
公开(公告)日：2012-07-12
申请号：US13496717
申请日：2010-09-16
申请人： Masao Kamogawa , Toru Okazawa , Mitsuhito Suwa
发明人： Masao Kamogawa , Toru Okazawa , Mitsuhito Suwa
IPC分类号： G03F7/004
CPC分类号： G03F7/0047 , C08K3/22 , C08K3/36 , C08K5/42 , C08L83/06 , G02B1/04 , G03F7/0233 , G03F7/0757 , C08L83/04
摘要： Disclosed is a positive photosensitive resin composition which is characterized by containing (a) a polysiloxane that is synthesized by hydrolyzing and partially condensing a specific organosilane and an organosilane oligomer, (b) aluminum compound particles, tin compound particles, titanium compound particles, zirconium compound particles, composite particles of the aforementioned compounds or composite particles of any of the aforementioned compounds and a silicon compound, (c) a naphthoquinonediazide compound and (d) a solvent. The positive photosensitive resin composition is also characterized in that the organosilane oligomer contains a specific organosilane. The positive photosensitive resin composition has achieved excellent sensitivity and resolution without deteriorating high refractive index and high transparency.
摘要翻译：公开了一种正型光敏树脂组合物，其特征在于含有（a）通过水解和部分冷凝特定的有机硅烷和有机硅烷低聚物而合成的聚硅氧烷，（b）铝化合物颗粒，锡化合物颗粒，钛化合物颗粒，锆化合物上述化合物的颗粒，复合颗粒或任何上述化合物的复合颗粒和硅化合物，（c）萘醌二叠氮化合物和（d）溶剂。正型感光性树脂组合物的特征还在于，有机硅烷低聚物含有特定的有机硅烷。正型感光性树脂组合物在不劣化高折射率和高透明性的情况下实现了优异的灵敏度和分辨率。

25. 发明申请

US20100129618A1 PHOTOSENSITIVE SILOXANE COMPOSITION, CURED FILM FORMED THEREFROM AND DEVICE HAVING THE CURED FILM 有权
标题翻译：感光性硅氧烷组合物，其固化膜和具有固化膜的装置
公开(公告)号：US20100129618A1
公开(公告)日：2010-05-27
申请号：US12517186
申请日：2007-11-21
申请人： Mitsuhito Suwa
发明人： Mitsuhito Suwa
IPC分类号： C08F2/50 , B32B3/10
CPC分类号： G03F7/0233 , G03F7/0755 , G03F7/0757 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3122 , Y10T428/24802
摘要： It is intended to provide a photosensitive siloxane composition comprising (a) polysiloxane, (b) a quinone diazide compound, (c) a solvent and (d) one or more kinds of imidosilane compounds represented by the general formulas (1) to (3): which makes it possible to provide a cured film having low shrinkage during curing and high transparency after thermal curing, suppressing the occurrence of cracks after dipping in an alkaline solvent and exhibiting excellent adhesiveness to a substrate, wherein R1s may be the same or different and each represents an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a phenyl group, a phenoxy group or an organic group replaced with them, R2 and R4 represent each a divalent organic group having 1 to 10 carbon atoms, R3 represents an organic group not containing a silicon atom and having 2 to 20 carbon atoms (provided that R3 represents an organic group other than a phenyl group in the general formula (1) and represents an organic group not containing an unsaturated bond other than an alicyclic group in the general formula (2)), and Ra represents a hydrogen atom or an organic group not containing a silicon atom and having 1 to 20 carbon atoms.
摘要翻译：旨在提供一种感光性硅氧烷组合物，其包含（a）聚硅氧烷，（b）醌二叠氮化合物，（c）溶剂和（d）一种或多种由通式（1）至（3）表示的酰氨基硅烷化合物）：这使得可以提供固化后的低收缩率和热固化后的高透明度的固化膜，抑制在碱溶剂中浸渍之后出现裂纹，并且对基材具有优异的粘合性，其中R 1可以相同或不同各自表示碳原子数1〜6的烷基，碳原子数1〜6的烷氧基，苯基，苯氧基或被它们取代的有机基，R2和R4分别表示1〜 10个碳原子，R 3表示不含硅原子且具有2〜20个碳原子的有机基团（条件是R 3表示通式（1）中的苯基以外的有机基团，表示 n通式（2）中不含脂环族基团以外的不饱和键的有机基团），Ra表示氢原子或不含硅原子且具有1〜20个碳原子的有机基团。

26. 发明授权

US07507518B2 Photosensitive resin precursor composition 有权
标题翻译：感光树脂前体组合物
公开(公告)号：US07507518B2
公开(公告)日：2009-03-24
申请号：US10885100
申请日：2004-07-07
申请人： Yoji Fujita , Tomoyuki Yuba , Mitsuhito Suwa
发明人： Yoji Fujita , Tomoyuki Yuba , Mitsuhito Suwa
IPC分类号： G03F7/021 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0233 , G03F7/0045 , G03F7/0751
摘要： The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure.A photosensitive resin precursor composition comprises (a) a polymer essentially composed of a structural unit expressed by formula (1); (b) at least two photo acid generators; and (c) a compound having an alkoxymethyl group: wherein R1 represents an organic group with a valence of 2 to 8, having at least two carbon atoms; R2 represents an organic group with a valence of 2 to 6, having at least two carbon atoms; R3 represents hydrogen or an organic group having a carbon number in the range of 1 to 20; n represents a number ranging from 10 to 100,000; m represents an integer in the range of 0 to 2; and p and q represent integers in the range of 0 to 4 and satisfy p+q>0.
摘要翻译：本发明涉及曝光后显示良好的储存稳定性的正型感光性树脂前体组合物。光敏树脂前体组合物包含（a）基本上由式（1）表示的结构单元组成的聚合物; （b）至少两个光酸产生剂; 和（c）具有烷氧基甲基的化合物：其中R1表示具有至少两个碳原子的价数为2至8的有机基团; R2表示具有至少2个碳原子的2价至6价的有机基团; R3表示氢或碳数为1〜20的有机基团; n表示10〜100,000的数; m表示0〜2的整数， p和q表示0〜4的整数，满足p + q> 0。

27. 发明申请

US20080108723A1 Photosensitive Resin Composition 有权
标题翻译：感光树脂组合物
公开(公告)号：US20080108723A1
公开(公告)日：2008-05-08
申请号：US11886339
申请日：2006-03-14
申请人： Ryuichiro Taniguchi , Hiroko Mitsui , Mitsuhito Suwa
发明人： Ryuichiro Taniguchi , Hiroko Mitsui , Mitsuhito Suwa
IPC分类号： C08J3/28
CPC分类号： G03F7/027 , C08G73/101 , G03F7/037 , G03F7/0751 , G03F7/0757
摘要： Using a photosensitive resin composition comprising a polyimide (a) having, at the end of the main chain, at least one group selected from the group consisting of a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and a thiol group, an unsaturated bond-containing polymerizable compound (b1) represented by the general formula (1), and a photopolymerization initiator (c), it is possible to conduct alkaline development and to form a polyimide film having excellent heat resistance, strength and elongation.
摘要翻译：使用包含在主链末端具有选自羧基，酚羟基，磺酸基和硫醇基中的至少一个基团的聚酰亚胺（a）的感光性树脂组合物，由通式（1）表示的含不饱和键的聚合性化合物（b1）和光聚合引发剂（c）可以进行碱显影，形成耐热性，强度和伸长率优异的聚酰亚胺膜。

28. 发明申请

US20070266896A1 Siloxane-Based Coating Material, Optical Article, and Production Method of Siloxane-Based Coating Material 审中-公开
标题翻译：硅氧烷基涂料，光学制品和硅氧烷基涂料的制备方法
公开(公告)号：US20070266896A1
公开(公告)日：2007-11-22
申请号：US11628798
申请日：2005-06-10
申请人： Mitsuhito Suwa , Hiroshi Hosono , Sayaka Takeda , Takashi Taniguchi , Hisashi Minamiguchi
发明人： Mitsuhito Suwa , Hiroshi Hosono , Sayaka Takeda , Takashi Taniguchi , Hisashi Minamiguchi
IPC分类号： C09D183/04 , B32B7/02 , C09D5/16 , C08J7/04
CPC分类号： C09D5/006 , C08K3/36 , C09D7/61 , C09D7/67 , C09D7/68 , C09D183/04 , G02B1/105 , G02B1/11 , G02B1/14
摘要： The invention provides a coating material containing silica fine particles, a siloxane compound, and a curing agent and giving an even coating film in the case it is used for forming a coating film. The invention gives a siloxane-based coating material excellent in storage stability and giving high surface hardness of a coating film when the coating material is used for forming the coating film. The invention also provides an optical article excellent in anti-reflection property and scratching resistance.
摘要翻译：本发明提供了含有二氧化硅微粒，硅氧烷化合物和固化剂的涂料，并且在用于形成涂膜的情况下得到均匀的涂膜。本发明提供了当涂料用于形成涂膜时，保存稳定性优异且赋予涂膜高表面硬度的硅氧烷类涂料。本发明还提供了抗反射性和抗划伤性优异的光学制品。

29. 发明授权

US06887643B2 Photosensitive resin precursor composition 有权
标题翻译：感光树脂前体组合物
公开(公告)号：US06887643B2
公开(公告)日：2005-05-03
申请号：US10623680
申请日：2003-07-22
申请人： Yoji Fujita , Mitsuhito Suwa , Masao Tomikawa
发明人： Yoji Fujita , Mitsuhito Suwa , Masao Tomikawa
IPC分类号： C08G73/10 , G03F7/004 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0233 , G03F7/0048 , Y10S430/108
摘要： A photosensitive resin precursor composition exhibiting an excellent film thickness uniformity contains: a heat resistant resin precursor polymer; a radiation sensitive compound; and a solvent expressed by formula (1): R1 represents an alkyl group having a carbon number in the range of 1 to 3. R2, R3, R4, and R5 each represent hydrogen or an alkyl group having a carbon number in the range of 1 to 3, and l represents an integer in the range of 0 to 3.
摘要翻译：表现出优异的膜厚均匀性的感光性树脂前体组合物包含：耐热树脂前体聚合物; 辐射敏感化合物; 和由式（1）表示的溶剂：R 1表示碳数在1至3的范围内的烷基。R 2，R 3 R 4，R 4和R 5各自表示氢或碳数为1〜3的烷基，l表示范围为0到3。

30. 发明申请

US20050014876A1 Photosensitive resin precursor composition 有权
标题翻译：感光树脂前体组合物
公开(公告)号：US20050014876A1
公开(公告)日：2005-01-20
申请号：US10885100
申请日：2004-07-07
申请人： Yoji Fujita , Tomoyuki Yuba , Mitsuhito Suwa
发明人： Yoji Fujita , Tomoyuki Yuba , Mitsuhito Suwa
IPC分类号： G03F7/022 , G03F7/004 , G03F7/023 , G03F7/075 , C08L1/00
CPC分类号： G03F7/0233 , G03F7/0045 , G03F7/0751
摘要： The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure. A photosensitive resin precursor composition comprises (a) a polymer essentially composed of a structural unit expressed by formula (1); (b) at least two photo acid generators; and (c) a compound having an alkoxymethyl group: wherein R1 represents an organic group with a valence of 2 to 8, having at least two carbon atoms; R2 represents an organic group with a valence of 2 to 6, having at least two carbon atoms; R3 represents hydrogen or an organic group having a carbon number in the range of 1 to 20; n represents a number ranging from 10 to 100,000; m represents an integer in the range of 0 to 2; and p and q represent integers in the range of 0 to 4 and satisfy p+q>0.
摘要翻译：本发明涉及曝光后显示良好的储存稳定性的正型感光性树脂前体组合物。光敏树脂前体组合物包含（a）基本上由式（1）表示的结构单元组成的聚合物; （b）至少两个光酸产生剂; 和（c）具有烷氧基甲基的化合物：其中R 1表示具有至少两个碳原子的价数为2至8的有机基团; R 2表示具有至少两个碳原子的价数为2至6的有机基团; R 3表示氢或碳数为1〜20的有机基团; n表示10〜100,000的数; m表示0〜2的整数， p和q表示0〜4的整数，满足p + q> 0。

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