专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20070266896A1 Siloxane-Based Coating Material, Optical Article, and Production Method of Siloxane-Based Coating Material 审中-公开
标题翻译：硅氧烷基涂料，光学制品和硅氧烷基涂料的制备方法
公开(公告)号：US20070266896A1
公开(公告)日：2007-11-22
申请号：US11628798
申请日：2005-06-10
申请人： Mitsuhito Suwa , Hiroshi Hosono , Sayaka Takeda , Takashi Taniguchi , Hisashi Minamiguchi
发明人： Mitsuhito Suwa , Hiroshi Hosono , Sayaka Takeda , Takashi Taniguchi , Hisashi Minamiguchi
IPC分类号： C09D183/04 , B32B7/02 , C09D5/16 , C08J7/04
CPC分类号： C09D5/006 , C08K3/36 , C09D7/61 , C09D7/67 , C09D7/68 , C09D183/04 , G02B1/105 , G02B1/11 , G02B1/14
摘要： The invention provides a coating material containing silica fine particles, a siloxane compound, and a curing agent and giving an even coating film in the case it is used for forming a coating film. The invention gives a siloxane-based coating material excellent in storage stability and giving high surface hardness of a coating film when the coating material is used for forming the coating film. The invention also provides an optical article excellent in anti-reflection property and scratching resistance.
摘要翻译：本发明提供了含有二氧化硅微粒，硅氧烷化合物和固化剂的涂料，并且在用于形成涂膜的情况下得到均匀的涂膜。本发明提供了当涂料用于形成涂膜时，保存稳定性优异且赋予涂膜高表面硬度的硅氧烷类涂料。本发明还提供了抗反射性和抗划伤性优异的光学制品。

2. 发明申请

US20050008863A1 Hardcoat film, antireflection film and equipment for display 失效
标题翻译：硬涂膜，防反射膜和显示设备
公开(公告)号：US20050008863A1
公开(公告)日：2005-01-13
申请号：US10879595
申请日：2004-06-30
申请人： Takashi Mimura , Tatsuro Tsuchimoto , Satoshi Kojima , Hisashi Minamiguchi , Minoru Yoshida
发明人： Takashi Mimura , Tatsuro Tsuchimoto , Satoshi Kojima , Hisashi Minamiguchi , Minoru Yoshida
IPC分类号： B32B27/36 , B32B7/02 , G02B1/10 , G02B1/11 , G09F9/00 , B32B3/10
CPC分类号： G02B1/11 , Y10T428/24355 , Y10T428/24851 , Y10T428/24942 , Y10T428/31 , Y10T428/31565 , Y10T428/31576 , Y10T428/31786 , Y10T428/31928 , Y10T428/31935
摘要： A hardcoat film comprises a substrate film, and a hardcoat layer laminated on at least one side of the substrate film, wherein a reflectance of the hardcoat layer at a wavelength within 400 to 600 nm has a mean ripple amplitude of 1% or less. The hardcoat film has decreased iris patterns. There is also provided an antireflection film having a low surface reflectance and a neutral tone of color, and an equipment for display including the film.
摘要翻译：硬涂层包括基板膜和层压在基板膜的至少一侧上的硬涂层，其中硬涂层在400至600nm波长内的反射率具有1％或更小的平均纹波幅度。硬涂膜具有减少的虹膜图案。还提供了具有低表面反射率和中性色调的抗反射膜，以及包括该膜的显示设备。

3. 发明授权

US06953388B2 Polishing pad, and method and apparatus for polishing 失效
标题翻译：抛光垫，抛光方法和装置
公开(公告)号：US06953388B2
公开(公告)日：2005-10-11
申请号：US10168664
申请日：2000-12-18
申请人： Masaaki Shimagaki , Hisashi Minamiguchi , Masami Ohta
发明人： Masaaki Shimagaki , Hisashi Minamiguchi , Masami Ohta
IPC分类号： B24B37/26 , B24B57/02 , B24D3/28 , B24D11/00 , B24D13/14 , B24B1/00
CPC分类号： B24B37/26 , B24B57/02 , B24D3/28 , B24D11/001
摘要： A polishing pad characterized by having a mechanism for supplying water to the plane of the polishing pad in contact with the article to be polished, in particular, in case the mechanism comprises a domain structure having an area of 1×10−6 m2 or smaller, reduces the generation of scratches and the dust adhesion on the surface of the article to be polished, while increasing polishing rate at low dishing and erosion; hence, the product is applicable to the field of surface polishing of semiconductor thin films.
摘要翻译：一种抛光垫，其特征在于具有用于向研磨垫的平面供应水的机构，特别是在机构包括面积为1×10 -6的区域结构的情况下， SUP> m 2以下，减少了待抛光制品表面上的划痕和灰尘粘附的产生，同时增加了低凹陷和侵蚀的抛光速率; 因此，该产品适用于半导体薄膜的表面抛光领域。

4. 发明授权

US06362107B1 Polishing pad and polishing device 有权
标题翻译：抛光垫和抛光装置
公开(公告)号：US06362107B1
公开(公告)日：2002-03-26
申请号：US09831292
申请日：2001-05-08
申请人： Kuniyasu Shiro , Hisashi Minamiguchi , Tetsuo Oka
发明人： Kuniyasu Shiro , Hisashi Minamiguchi , Tetsuo Oka
IPC分类号： H01L21302
CPC分类号： B24B37/24 , Y10S438/959
摘要： The present invention relates to a polishing pad which is characterized in that it has a polishing layer of rubber A-type microhardness at least 80° and a cushioning layer of bulk modulus at least 40 MPa and tensile modulus in the range 0.1 MPa to 20 MPa, and to a polishing device which is characterized in that a semiconductor substrate is fixed to the polishing head, and an aforesaid polishing pad is fixed to the polishing platen so that the polishing layer faces the semiconductor substrate, and by rotating the aforesaid polishing head or the polishing platen, or both, the semiconductor substrate is polished. With the polishing device or polishing pad of the present invention for use in the mechanical planarizing process wherein the surface of the insulating layers or metal interconnects formed on a semiconductor substrate are smoothened, it is possible to uniformly planarize the entire semiconductor face and perform uniform polishing close up to the wafer edge and, furthermore, it is possible to provide a technique for achieving both uniformity and planarity under conditions of high platen rotation rate.
摘要翻译：抛光垫技术领域本发明涉及一种抛光垫，其特征在于，具有橡胶A型显微硬度至少为80°的抛光层和体积弹性模量至少为40MPa的缓冲层，拉伸模量为0.1MPa〜20MPa 以及研磨装置，其特征在于，将半导体基板固定在研磨头上，将上述研磨垫固定在研磨台板上，使得研磨层面向半导体基板，通过旋转上述研磨头或研磨台板或二者半导体衬底被抛光。通过本发明的抛光装置或抛光垫用于机械平面化处理中，其中形成在半导体衬底上的绝缘层或金属互连件的表面平滑化，可以使整个半导体面均匀平坦化，并且在晶片边缘附近进行均匀的抛光，此外是可能提供在高压板旋转速度的条件下实现均匀性和平面性的技术。

5. 发明授权

US07332213B2 Hardcoat film, antireflection film and equipment for display 失效
标题翻译：硬涂膜，防反射膜和显示设备
公开(公告)号：US07332213B2
公开(公告)日：2008-02-19
申请号：US10879595
申请日：2004-06-30
申请人： Takashi Mimura , Tatsuro Tsuchimoto , Satoshi Kojima , Hisashi Minamiguchi , Minoru Yoshida
发明人： Takashi Mimura , Tatsuro Tsuchimoto , Satoshi Kojima , Hisashi Minamiguchi , Minoru Yoshida
IPC分类号： B32B7/02 , B32B3/00 , B32B7/14
CPC分类号： G02B1/11 , Y10T428/24355 , Y10T428/24851 , Y10T428/24942 , Y10T428/31 , Y10T428/31565 , Y10T428/31576 , Y10T428/31786 , Y10T428/31928 , Y10T428/31935
摘要： A hardcoat film comprises a substrate film, and a hardcoat layer laminated on at least one side of the substrate film, wherein a reflectance of the hardcoat layer at a wavelength within 400 to 600 nm has a mean ripple amplitude of 1% or less. The hardcoat film has decreased iris patterns. There is also provided an antireflection film having a low surface reflectance and a neutral tone of color, and an equipment for display including the film.
摘要翻译：硬涂层包括基板膜和层压在基板膜的至少一侧上的硬涂层，其中硬涂层在400至600nm波长内的反射率具有1％或更小的平均纹波幅度。硬涂膜具有减少的虹膜图案。还提供了具有低表面反射率和中性色调的抗反射膜，以及包括该膜的显示设备。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式