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21. 发明专利

JP2007123289A Method and apparatus for observing micro sample forming process 有权
标题翻译：观察微型成型工艺的方法和装置
公开(公告)号：JP2007123289A
公开(公告)日：2007-05-17
申请号：JP2007020310
申请日：2007-01-31
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKUDA MITSUO , FUKUDA MUNEYUKI , MITSUI YASUHIRO , KOIKE HIDEMI , TOMIMATSU SATOSHI , SHICHI HIROYASU
IPC分类号： H01J37/28 , G01N1/28 , H01J37/30 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To realize an apparatus for observing the process of forming a micro sample and a method of observing the process of forming the micro sample, in which a cross sectional observation or an analysis of a wafer cross section from the direction of horizontal to vertical with high resolution, high precision and high throughput without breaking the wafer to be the sample. SOLUTION: The apparatus for observing the process of forming the micro sample has a focused ion beam optical system 31 and an electro-optical system 41 in the same vacuum system. A prove 71 supported with a manipulator 14 is provided for extracting a separated micro sample 22 after a micro sample including a required region in a specimen is separated with a charged particle beam processing. The manipulator has a function to regulate the position and attitude of the micro sample extracted from the specimen. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了实现用于观察形成微量样品的方法的装置和观察形成微量样品的方法的方法，其中横截面观察或来自该样品的晶片横截面的分析方向水平垂直，分辨率高，精度高，产量高，不破坏晶片成为样品。解决方案：用于观察形成微量样品的过程的装置在相同的真空系统中具有聚焦离子束光学系统31和电光学系统41。提供了用操纵器14支撑的证明书71，用于在用带电粒子束处理分离样本中包含所需区域的微量样品后，提取分离的微量样品22。操纵器具有调节从样品提取的微量样品的位置和姿态的功能。版权所有（C）2007，JPO＆INPIT

22. 发明专利

JP2007047162A Charged particle beam device and sample preparing device 有权
标题翻译：充电颗粒光束装置和样品制备装置
公开(公告)号：JP2007047162A
公开(公告)日：2007-02-22
申请号：JP2006214034
申请日：2006-08-07
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： KASHIMA HIDEO , SHICHI HIROYASU , TOMIMATSU SATOSHI , UMEMURA KAORU , KOIKE HIDEMI , TOKUDA MITSUO
IPC分类号： G01N1/28 , G01R31/302 , H01J37/20 , H01J37/31 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide a small sample preparing device and evaluating device having operability equivalent to that of a conventional device, by applying a probe moving mechanism for a large-diameter wafer and a side entry type sample stage to the sample preparing device and a failure inspection device.
SOLUTION: The probe moving mechanism and a fine-moving mechanism of the side entry type sample stage are used which have a vacuum introducing means capable of taking in or out the probe and side entry type sample stage from a vacuum vessel without opening the vacuum vessel to the atmosphere with a tilt angle passing the intersection of the ion beam irradiation optical axis and a wafer face. The side entry type sample stage having a degree of rotation freedom for making a sample piece installation part of a sample holder of the side entry type sample stage parallel to the wafer face is used. The sample preparing device for the large-diameter wafer and the evaluating device can be achieved that require necessary minimum volume of the vacuum vessel, require small installation area, are small, and are user-friendly.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有与常规装置相当的可操作性的小样品制备装置和评估装置，通过将大直径晶片和侧入式样品台的探针移动机构应用于样品准备装置和故障检查装置。
解决方案：使用侧入式样品台的探针移动机构和微细移动机构，其具有能够从真空容器进入或离开探针和侧进样式样品台的真空引入装置，而不打开真空容器通过离子束照射光轴和晶片面之间的倾斜角度向大气提供。使用具有用于使侧入口型样品台的样品架的样品安装部平行于晶片面的旋转自由度的侧入式样品台。可以实现用于大直径晶片和评估装置的样品制备装置，其需要真空容器的必要最小体积，需要小的安装面积，并且是用户友好的。版权所有（C）2007，JPO＆INPIT

23. 发明专利

JP2005203382A Micro testpiece processing and observation method and device 有权
标题翻译：微型加工和观察方法和装置
公开(公告)号：JP2005203382A
公开(公告)日：2005-07-28
申请号：JP2005107009
申请日：2005-04-04
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKUDA MITSUO , FUKUDA MUNEYUKI , MITSUI YASUHIRO , KOIKE HIDEMI , TOMIMATSU SATOSHI , SHICHI HIROYASU
IPC分类号： H01J37/20 , H01J37/28 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To realize a micro testpiece processing and observation device in which cross-sectional observation and analysis of the wafer cross-section from horizontal to vertical direction can be made in high resolution and high precision with a high throughput, without splitting in pieces the wafer being a testpiece, and a micro testpiece processing and observation method.
SOLUTION: In the micro testpiece processing and observation device, a focused ion beam optical system and an electron optical system are equipped in an identical vacuum device, and a micro testpiece including the desired region of the testpiece is separated by a charged particle beam forming process, and a probe for sampling the micro testpiece separated is provided.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题为了实现以高分辨率和高精度以高生产率制造从水平方向到垂直方向的晶片横截面的横截面观察和分析的微型试件加工和观察装置，而不会将作为试件的晶片分开，以及微型试件的加工和观察方法。解决方案：在微型试件处理和观察装置中，在相同的真空装置中装备聚焦离子束光学系统和电子光学系统，并且包括试样的所需区域的微型试样由带电粒子分离梁形成工艺和用于取样分离的微型试件的探针。版权所有（C）2005，JPO＆NCIPI

24. 发明专利

JP2005100995A Sample preparation device and sample preparation method 有权
标题翻译：样品制备装置和样品制备方法
公开(公告)号：JP2005100995A
公开(公告)日：2005-04-14
申请号：JP2004325816
申请日：2004-11-10
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： UMEMURA KAORU , KOIKE HIDEMI , TOMIMATSU SATOSHI
IPC分类号： G01N1/32 , G01N1/28 , H01J37/20 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide a sample preparation device simplified in work from sample preparation to observation, enabled to prepare a sample in one device, and by which the handing-over of the sample prepared to an analysis device is easy.
SOLUTION: The sample preparation device is structured of at least an irradiation optical system of ion beams, a secondary particle detection means detecting secondary particles generated from a sample piece by the irradiation of the ion beams, a sample stage of a side-entry type to put on a sample holder fixing an analysis sample on, and a transfer means for transferring an extracted sample as a part of the sample piece separated to the sample holder. By this, work from the sample preparation to the observation is simplified, the sample preparation can be made in one device, and it becomes easy to hand over the prepared sample to the analysis device, which reduces the fear of damages to samples.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供从样品制备到观察的简化工作的样品制备装置，能够在一个装置中制备样品，并且通过该样品准备到分析装置的样品的切换是容易的。解决方案：样品制备装置至少由离子束的照射光学系统构成，二次粒子检测装置通过离子束的照射检测从样品产生的二次粒子，将放置在固定分析样品的样品架上的入口类型和用于将提取的样品作为分离到样品保持器的样品的一部分进行转印的转印装置。由此可以简化样品制备到观察的工作，可以在一个装置中进行样品制备，容易将制备的样品交给分析装置，从而减少对样品的损害的恐惧。版权所有（C）2005，JPO＆NCIPI

25. 发明专利

JP2004309499A Apparatus for preparing testpiece and method for preparing testpiece 有权
公开(公告)号：JP2004309499A
公开(公告)日：2004-11-04
申请号：JP2004167929
申请日：2004-06-07
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： UMEMURA KAORU , KOIKE HIDEMI , TOMIMATSU SATOSHI
IPC分类号： G01N1/28 , H01J37/20 , H01J37/30 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for preparing a testpiece which allows easy operations for testpiece preparation through observation, a testpiece preparation in one apparatus, and an easy delivery of the prepared testpiece to an analyzer.
SOLUTION: The apparatus for preparing a testpiece comprises at least an ion-beam irradiation optical system, a secondary particles detection means which detects secondary particles generated from the testpiece by irradiation with the ion beam, a side-entry type testpiece stage which mounts a testpiece holder which mounts the testpiece and fixes a testpiece to be analyzed, and a transport means which transports an extracted testpiece obtained by separating a part of the testpiece, to the testpiece holder. The apparatus facilitates the delivery of a prepared testpiece to the analyzer, and reduces the possibility of a testpiece breakage.
COPYRIGHT: (C)2005,JPO&NCIPI

26. 发明专利

JP2003065905A Method and apparatus for sampling sample 有权
标题翻译：采样方法和装置
公开(公告)号：JP2003065905A
公开(公告)日：2003-03-05
申请号：JP2001253379
申请日：2001-08-23
申请人： Hitachi Ltd , Hitachi Sci Syst Ltd , National Institute Of Advanced Industrial & Technology , 株式会社日立サイエンスシステムズ , 株式会社日立製作所 , 独立行政法人産業技術総合研究所
发明人： UKIANA MOTOHIDE , FUJII KAZUHIRO , MORITA KAZUHIRO , ISAGOZAWA SHIGETO , KOIKE HIDEMI , TANIGAWA TAMIO , KOYANAI NORIO
IPC分类号： G01N1/00 , B25J7/00 , G01N1/28
摘要： PROBLEM TO BE SOLVED: To accurately perform sampling work of a sample piece performed after the sample piece is formed by focusing ion beam in the atmosphere at a low cost by a simple method, to realize the high magnification observation of TEM and to also enable the additional processing of the sample piece.
SOLUTION: After the fine sample piece is formed by irradiating a sample substrate 38 with focusing ion beam, the sample substrate 38 is fed to the region under an optical microscope 1 in the atmosphere and a micromanipulator 10 having a plurality of finger pieces at least one of which can perform fine three- degree-of-freedom operation is used under the optical microscope 1 to extract the sample piece from the sample substrate 38 to fix the same to a grid for transmission electron microscope observation.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了通过简单的方法以低成本将离子束聚焦在大气中而形成样品片之后进行的样品的取样工作，为了实现TEM的高倍率观察，附加处理样品。解决方案：在通过用聚焦离子束照射样品基板38形成细样品之后，将样品基板38送入大气中的光学显微镜1下的区域，并且具有多个手指片的显微操纵器10至少一个在光学显微镜1下使用可以进行精细的三自由度的操作，从样品基板38提取样品片，将其固定到用于透射电子显微镜观察的栅格。

27. 发明专利

JP2003035682A Sample holder and sample analysis method 有权
标题翻译：样本持有人和样本分析方法
公开(公告)号：JP2003035682A
公开(公告)日：2003-02-07
申请号：JP2001223167
申请日：2001-07-24
申请人： Hitachi Ltd , Hitachi Sci Syst Ltd , 株式会社日立サイエンスシステムズ , 株式会社日立製作所
发明人： YAGUCHI NORIE , UENO TAKEO , KOIKE HIDEMI
IPC分类号： G01N23/04 , G01N1/28 , G01R31/28 , G01R31/302 , H01J37/20
摘要： PROBLEM TO BE SOLVED: To observe a phenomenon that is generated in a device by directly applying a voltage to a specific section inside an LSI whose design dimensions are approximately 0.1 μm. SOLUTION: A process for mounting fine conductors 30a and 30b to an extracted fine sample piece 72, and a process for applying a voltage to the mounted fine conductors are added to a process for machining and extracting an arbitrary region in a target sample into fine sample pieces using charge particle beams.
摘要翻译：要解决的问题：通过直接向设计尺寸为约0.1μm的LSI内的特定部分施加电压来观察在器件中产生的现象。解决方案：将精细导体30a和30b安装到提取的细样品72上的过程以及向安装的细导体施加电压的处理被添加到用于将目标样品中的任意区域加工和提取为细样品的处理使用电荷粒子束。

28. 发明专利

JP2003022776A Sample production apparatus and sample production method 有权
标题翻译：样品生产设备和样品生产方法
公开(公告)号：JP2003022776A
公开(公告)日：2003-01-24
申请号：JP2001204768
申请日：2001-07-05
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOMIMATSU SATOSHI , KOIKE HIDEMI , ISHITANI TORU , SHICHI HIROYASU , KASHIMA HIDEO , FUKUDA MUNEYUKI
IPC分类号： G01N1/28 , H01J37/30 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To provide a sample production apparatus and a sample producing method, in which cross-sectional processing at an arbitrary angle is possible, in the ion beam processing in a non-inclining sample stand.
SOLUTION: The sample production apparatus is constituted so that a sample section may be formed by ion beam processing in the sample 1 held to the sample stand 2 using an ion beam optical system 5 which converges, scans, and deflects the ion beam 4 emitted from the ion source 9. It is constituted so that the angle, which is made by an ion beam optical axis of the ion beam optical system 5 and the sample stand 2 surface, may be fixed, and formation of the sample section may be controlled by rotation within the sample stand surface of the sample stand 2. With the apparatus arrangement by the non- inclining sample stand effective in reduction of apparatus manufacturing cost, the ion beam irradiation processing at arbitrary angles is attained, and an accurate section can be formed.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了提供在非倾斜样品台中的离子束处理中可以以任意角度进行横截面处理的样品制造装置和样品制造方法。解决方案：样品制备装置被构造成使得可以使用离子束光学系统5使样品1中保持的样品1中的离子束处理形成样品部分，该离子束光学系统5会聚，扫描和偏转从离子源9.它被构造成使得由离子束光学系统5的离子束光轴和样品台2的表面形成的角度可以被固定，并且样品部分的形成可以由在样品台2的样品台表面内的旋转。通过非倾斜样品台的设备布置有效地降低了设备制造成本，实现了任意角度的离子束照射处理，并且可以形成精确的部分。

29. 发明专利

JP2008277312A Sample manufacturing device 审中-公开
标题翻译：样品制造装置
公开(公告)号：JP2008277312A
公开(公告)日：2008-11-13
申请号：JP2008205170
申请日：2008-08-08
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SHICHI HIROYASU , ISHITANI TORU , KOIKE HIDEMI , UMEMURA KAORU , SEYA HIDEKAZU , TOKUDA MITSUO , TOMIMATSU SATOSHI , KASHIMA HIDEO
IPC分类号： H01J37/317 , G01N1/28 , H01J37/31
摘要： PROBLEM TO BE SOLVED: To provide a sample manufacturing method for analyzing of a micro region, observing or measuring by separating or preparing for separation of a minute sample containing a desired specific region from a sample of an electronic components or the like such as a semiconductor wafer or a device without inclining a sample stage, as well as a sample manufacturing device thereof. SOLUTION: In the sample manufacturing method, a focused ion beam is irradiated onto a sample at an irradiation angle of less than 90 degree at most to the sample surface, a periphery of the minute sample as a target is removed, and then, a sample stage is rotated with a perpendicular component to the sample surface as a rotation axis, the focused ion beam is irradiated onto the sample with the irradiation angle fixed to the sample surface, and the minute sample is separated or prepared to be separated. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于分析微区域的样品制造方法，通过分离或制备用于从包含电子部件等的样品中分离含有所需特定区域的微小样品的观察或测量，例如作为半导体晶片或不倾斜样品台的装置，以及其样品制造装置。解决方案：在样品制造方法中，将聚焦离子束以至少90度以下的照射角度照射到样品至样品表面，除去作为靶的微小样品的周边，然后样品台以垂直分量旋转到样品表面作为旋转轴线，聚焦离子束以固定在样品表面上的照射角度照射到样品上，并将微量样品分离或准备分离。版权所有（C）2009，JPO＆INPIT

30. 发明专利

JP2008210811A Minute sample processing observation method and device 有权
标题翻译：分钟样品处理观察方法和装置
公开(公告)号：JP2008210811A
公开(公告)日：2008-09-11
申请号：JP2008079493
申请日：2008-03-26
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKUDA MITSUO , FUKUDA MUNEYUKI , MITSUI YASUHIRO , KOIKE HIDEMI , TOMIMATSU SATOSHI , SHICHI HIROYASU
IPC分类号： H01J37/317 , G01N1/28 , G01N23/225 , H01J37/20 , H01J37/28 , H01J37/30
摘要： PROBLEM TO BE SOLVED: To achieve a minute sample processing observation device and a minute sample processing observation method where cross-sectional observation and analysis of a wafer cross section from a horizontal direction up to a vertical direction can be performed with high resolution, high precision and a high throughput, without breaking the wafer which is to become a sample.
SOLUTION: The minute sample processing observation device includes a focused ion beam optical system and an electron optical system in the same vacuum device, as well as a probe 72 separating a minute sample including a desired region of the sample by a charged particle beam molding work and picking up the separated minute sample.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题为了实现微小的样品处理观察装置和微小的样品处理观察方法，其可以以高分辨率执行从水平方向到垂直方向的晶片截面的横截面观察和分析，高精度和高产量，而不破坏成为样品的晶片。解决方案：微型样品处理观察装置包括在相同真空装置中的聚焦离子束光学系统和电子光学系统，以及探针72，其通过带电粒子分离包含样品的期望区域的微小样品光束成型工作并拾取分离的微小样品。版权所有（C）2008，JPO＆INPIT

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