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1. 发明专利

JP2012073265A Minute sample processing observation method and device thereof 有权
标题翻译：分钟样品处理观察方法及其装置
公开(公告)号：JP2012073265A
公开(公告)日：2012-04-12
申请号：JP2011248187
申请日：2011-11-14
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKUDA MITSUO , FUKUDA MUNEYUKI , MITSUI YASUHIRO , KOIKE HIDEMI , TOMIMATSU SATOSHI , SHICHI HIROYASU
IPC分类号： G01N1/28 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide a minute sample processing observation device and a minute sample processing observation method that carry out observation and analysis of a sectional face of a wafer from horizontal to vertical directions without breaking the wafer to be a sample with higher resolution, higher accuracy, and higher throughput.SOLUTION: The minute sample processing observation device includes a focused ion beam optical system 31 and an electron beam optical system 41 in an identical vacuum device, and a probe 72 that separates a minute sample containing a desired area of the wafer 21 by a charged particle beam type molding process and takes out the separated minute sample.
摘要翻译：要解决的问题：提供一种微小的样品处理观察装置和微小的样品处理观察方法，其从水平方向垂直方向对晶片的截面进行观察和分析，而不会将晶片破坏为样品，更高的分辨率，更高的精度和更高的吞吐量。解决方案：微小样品处理观察装置包括在相同的真空装置中的聚焦离子束光学系统31和电子束光学系统41以及分离包含晶片21的期望区域的微小样品的探针72，带电粒子束型成型工艺，取出分离的微小样品。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2011133493A Sample processing apparatus 有权
标题翻译：样品加工设备
公开(公告)号：JP2011133493A
公开(公告)日：2011-07-07
申请号：JP2011066959
申请日：2011-03-25
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SUGAYA MASAKAZU , SHICHI HIROYASU , FUKUDA MUNEYUKI , UMEMURA KAORU , KOIKE HIDEMI
IPC分类号： G01N1/28 , B25J7/00 , B81B3/00
摘要： PROBLEM TO BE SOLVED: To provide an apparatus and method for surely and stably separating, removing, and storing a minute test piece without contaminating the minute test piece and an area around the minute test piece. SOLUTION: A test piece including an area to be observed is separated from a sample substrate by ion beam sputtering. A beam member is used to remove the test piece from the sample substrate. After the test piece is moved onto a mounting table on which the test piece is mounted, the test piece is stored by separating the beam member and the test piece from each other. The beam member serves to push in a sample for retention and pull out the sample for separation. The beam member has a tip that is narrower than a root of the beam member, and the tip is in a divided shape. The beam member is composed of a rod-like member for holding the test piece by force of elastic deformation in a site, obtained by the shape, in which the test piece is held. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于可靠且稳定地分离，除去和存储微小试片而不污染微小试片和微小试片周围区域的装置和方法。解决方案：通过离子束溅射将包括待观察区域的试件与样品基板分离。使用梁构件从试样基板移除试验片。在将试件移动到安装有试验片的安装台上之后，通过将梁构件和试验片彼此分离来存储试验片。梁构件用于推入样品以保持并拉出样品以进行分离。梁构件具有比梁构件的根部窄的尖端，并且尖端处于分割形状。梁构件由用于通过弹性变形的力将试件保持在通过保持试件的形状得到的部位中的杆状构件构成。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2010232195A Method and device for observation of microsample processing 审中-公开
标题翻译：微观加工观察的方法和装置
公开(公告)号：JP2010232195A
公开(公告)日：2010-10-14
申请号：JP2010156306
申请日：2010-07-09
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKUDA MITSUO , FUKUDA MUNEYUKI , MITSUI YASUHIRO , KOIKE HIDEMI , TOMIMATSU SATOSHI , SHICHI HIROYASU
IPC分类号： H01J37/317 , H01J37/20
摘要： PROBLEM TO BE SOLVED: To provide a device and method for observation of microsample processing, in which a cross-sectional observation and analysis from the horizontal direction to the vertical direction with a high resolution, a high precision, and a high throughput on a wafer cross-section without breaking the wafer.
SOLUTION: The device includes a focused ion beam optical system and an electron optical system in the same vacuum device. A microsample including desired region is separated by a charged particle beam molding work, and a probe to extract the separated microsample is equipped.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于观察微量样品处理的装置和方法，其中以高分辨率，高精度和高生产量从水平方向到垂直方向的横截面观察和分析在晶片横截面上而不破坏晶片。解决方案：该装置在相同的真空装置中包括聚焦离子束光学系统和电子光学系统。通过带电粒子束模制工作分离包含所需区域的微样品，并配备提取分离的微量样品的探针。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2008286811A Sample preparing method 有权
标题翻译：样品制备方法
公开(公告)号：JP2008286811A
公开(公告)日：2008-11-27
申请号：JP2008223448
申请日：2008-09-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SHICHI HIROYASU , ISHITANI TORU , KOIKE HIDEMI , UMEMURA KAORU , SEYA HIDEKAZU , TOKUDA MITSUO , TOMIMATSU SATOSHI , KASHIMA HIDEO
IPC分类号： G01N1/32 , G01N1/28
摘要： PROBLEM TO BE SOLVED: To provide a sample preparing method for analyzing, observing, and measuring a minute region by separating, or separating and preparing a minute sample including a desired specific region from the sample, such as an electronic component of a semiconductor wafer and a device, without inclining a sample stage, and to provide a sample preparing apparatus. SOLUTION: In the sample preparing method, focusing ion beams are applied to the sample at an irradiation angle of less than 90° at the maximum to the sample surface, the periphery of a target fine sample is removed, the sample stage is rotated with a vertical segment to the sample surface as a rotary axis, the irradiation angle of the focusing ion beams to the sample surface is fixed and the ion beams are applied to the sample, and the minute sample is separated or separated and prepared. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于分析，观察和测量微小区域的样品制备方法，其通过从样品中分离或分离和制备包含所需特定区域的微小样品，例如半导体晶片和器件，而不倾斜样品台，并提供样品制备装置。解决方案：在样品制备方法中，将聚焦离子束以与样品表面最大的最小90°的照射角度施加到样品，去除目标细样品的外围，样品台为作为旋转轴以垂直段旋转到样品表面，将聚焦离子束照射到样品表面的照射角度是固定的，并将离子束施加到样品上，并将微量样品分离或分离并制备。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2007184295A Method and device of processing/observing minute sample 有权
公开(公告)号：JP2007184295A
公开(公告)日：2007-07-19
申请号：JP2007086320
申请日：2007-03-29
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKUDA MITSUO , FUKUDA MUNEYUKI , MITSUI YASUHIRO , KOIKE HIDEMI , TOMIMATSU SATOSHI , SHICHI HIROYASU
IPC分类号： H01J37/28 , G01N23/225 , H01J37/20 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide a device of processing/observing a minute sample and a method of processing/observing a minute sample, which can execute cross section observation and analysis of a wafer cross section from a horizontal direction to a vertical direction without dividing the wafer used as a sample, with high resolution, high precision and high throughput. SOLUTION: This device is provided with a focused ion beam optical system and an electronic optical system in the same vacuum device, and also provided with a probe for separating a minute sample including a desired area of a sample by a charged particle beam forming process, and for extracting the separated minute sample. COPYRIGHT: (C)2007,JPO&INPIT

6. 发明专利

JP2007128921A Minute sample processing observation method and device 有权
标题翻译：分钟样品处理观察方法和装置
公开(公告)号：JP2007128921A
公开(公告)日：2007-05-24
申请号：JP2007043132
申请日：2007-02-23
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKUDA MITSUO , FUKUDA MUNEYUKI , MITSUI YASUHIRO , KOIKE HIDEMI , TOMIMATSU SATOSHI , SHICHI HIROYASU
IPC分类号： H01J37/28 , H01J37/20
摘要： PROBLEM TO BE SOLVED: To provide a minute sample processing observation device and a minute sample processing observation method capable of executing cross-section observation and analysis of a wafer cross section from directions from a horizontal direction to a vertical direction without dividing a wafer used as a sample, with high resolution, high precision and high throughput.
SOLUTION: The device is equipped with a focused ion-beam optical system and an electro-optical system in the same vacuum device, as well as a probe for separating a minute sample including a desired area of the sample by a charged particle beam forming process, and for extracting the separated minute sample.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够从水平方向到垂直方向的方向执行晶片横截面的横截面观察和分析的微小的样品加工观察装置和微小的样品处理观察方法，而不分割晶圆用作样品，具有高分辨率，高精度和高产量。
解决方案：该装置在相同的真空装置中配备聚焦离子束光学系统和电光系统，以及用于通过带电粒子分离包含样品的期望面积的微小样品的探针波束形成过程，并用于提取分离的微小样品。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2006194907A Sample observation device and method using electron beam 审中-公开
标题翻译：样品观测装置和使用电子束的方法
公开(公告)号：JP2006194907A
公开(公告)日：2006-07-27
申请号：JP2006096411
申请日：2006-03-31
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： OCHIAI ISAO , KOIKE HIDEMI , TOMIMATSU SATOSHI , FUKUDA MUNEYUKI , SATO MITSUGI , ISHITANI SUSUMU
IPC分类号： G01N23/225 , G01N1/00 , G01N1/28 , G01N1/32 , H01J37/252
摘要： PROBLEM TO BE SOLVED: To provide a sample observation device and a sample observation method capable of irradiating a thinned film sample with an electron beam to be observed, in particular, capable of analyzing an element by X-ray detection, with high precision and high resolution, while reducing background noise.
SOLUTION: A member 56 comprising a light element material with a hole part is arranged just behind the thin film sample, and a specific part of the sample 22 is observed with the electron beam 8. In the present invention, an X-ray generated from a portion other than the sample, and the electron beam scattered by the portion other than the sample to get incident again into the sample can be reduced, when irradiating the thin film sample with the electron beam for observation, so as to allow secondary electron image observation and the element analysis of high accuracy and high sensitivity, and the sample observation device and the sample observation method capable of carrying out internal observation of an LSI device or the like getting finer, with the high precision and high resolution.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决问题的方案为了提供能够用待观察的电子束照射薄膜样品的样品观察装置和样品观察方法，特别是能够通过X射线检测分析元素，具有高的精准高分辨率，同时降低背景噪音。解决方案：包括具有孔部分的光元件材料的构件56恰好布置在薄膜样品的正后方，并且用电子束8观察样品22的特定部分。在本发明中，可以减少从样品之外的部分产生的射线，并且当用电子束照射观察时，可以减少由样品外的部分散射以再次入射到样品中的电子束，以便允许二次电子图像观察和高精度，高灵敏度的元件分析以及能够以高精度和高分辨率进行LSI器件等的内部观察的样品观察装置和样品观察方法更精细。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2004301853A Device and method for preparing sample 有权
标题翻译：用于制备样品的装置和方法
公开(公告)号：JP2004301853A
公开(公告)日：2004-10-28
申请号：JP2004167930
申请日：2004-06-07
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： UMEMURA KAORU , KOIKE HIDEMI , TOMIMATSU SATOSHI
IPC分类号： G01N23/00 , G01N1/28 , G01N1/32 , G01N27/62 , G01Q30/02 , G01Q30/08 , G01Q30/20 , H01J37/20 , H01J37/30 , H01J37/317 , G01N13/10
摘要： PROBLEM TO BE SOLVED: To simplify work from a sample preparation to an observation, to prepare a sample in one device, and to easily transfer the prepared sample to an analyzer. SOLUTION: This sample preparing device is constituted of at least an irradiation optical system for emitting an ion beam, a secondary particle detecting means for detecting a secondary particle generated from a sample piece by irradiation of the ion beam, a side entry type of sample stage for mounting a sample holder for mounting the sample piece to fix the analytical sample, and a transfer means for transferring the picked-up sample provided by separating one portion of the sample piece to the sample holder. The work from the sample preparation up to the observation is simplified thereby, the sample is prepared in one device, the prepared sample is easy to be transferred to the analyzer, and the possibility of sample damage is reduced thereby. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了简化样品制备到观察的工作，在一个装置中制备样品，并容易地将制备的样品转移到分析仪。解决方案：该样品制备装置至少由用于发射离子束的照射光学系统构成，二次粒子检测装置，用于通过离子束的照射检测由样品产生的二次粒子，侧入口型的样品台用于安装用于安装样品的样品架以固定分析样品;以及转印装置，用于将通过将样品的一部分分离到样品保持器而提供的拾取样品。从样品制备到观察的工作简化，样品在一个装置中制备，所制备的样品易于转移到分析仪中，从而降低样品损伤的可能性。版权所有（C）2005，JPO＆NCIPI

9. 发明专利

JP2009049021A Minute sample processing observation method and device 有权
标题翻译：分钟样品处理观察方法和装置
公开(公告)号：JP2009049021A
公开(公告)日：2009-03-05
申请号：JP2008305836
申请日：2008-12-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKUDA MITSUO , FUKUDA MUNEYUKI , MITSUI YASUHIRO , KOIKE HIDEMI , TOMIMATSU SATOSHI , SHICHI HIROYASU
IPC分类号： H01J37/317 , H01J37/20
摘要： PROBLEM TO BE SOLVED: To realize a minute sample processing observation device and a minute sample processing observation method where cross-sectional observation and analysis of a wafer cross section from a horizontal direction up to a vertical direction can be performed with high resolution, high precision and a high throughput, without breaking the wafer to be a sample. SOLUTION: The minute sample processing observation device includes a focused ion beam optical system and an electron optical system in the same vacuum device, as well as a probe separating a minute sample including a desired region of the sample by a charged particle beam molding work and picking up the separated minute sample. COPYRIGHT: (C)2009,JPO&INPIT

10. 发明专利

JP2008261891A Sample manufacturing method 有权
标题翻译：样品制造方法
公开(公告)号：JP2008261891A
公开(公告)日：2008-10-30
申请号：JP2008205173
申请日：2008-08-08
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SHICHI HIROYASU , ISHITANI TORU , KOIKE HIDEMI , UMEMURA KAORU , SEYA HIDEKAZU , TOKUDA MITSUO , TOMIMATSU SATOSHI , KASHIMA HIDEO
IPC分类号： G01N1/28
摘要： PROBLEM TO BE SOLVED: To provide a sample manufacturing method for separating a minute sample containing a desired region from a sample such as an electronic component or the like, for example, a semiconductor wafer or device without inclining a sample stage to perform the analysis or observation of a minute region, and a sample manufacturing apparatus.
SOLUTION: The surface of the sample is irradiated with a condensed ion beam at an irradiation angle below 90° to remove the target periphery of a minute sample and subsequently the sample stage is rotated on the segment vertical to the surface of the sample. The irradiation angle of the condensed ion beam to the surface of the sample is fixed to irradiate the sample to separate the minute sample.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种样品制造方法，用于从包含诸如电子部件等的样品例如半导体晶片或器件的样品中分离含有期望区域的微小样品，而不倾斜样品台进行微小区域的分析或观察，以及样品制造装置。
解决方案：以低于90°的照射角度的聚合离子束照射样品的表面以去除微小样品的目标周边，随后样品台在垂直于样品表面的片段上旋转。将凝结的离子束照射到样品表面的照射角度被固定以照射样品以分离微小样品。版权所有（C）2009，JPO＆INPIT

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