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1. 发明专利

JP2008298797A Sample preparing device 有权
标题翻译：样品制备装置
公开(公告)号：JP2008298797A
公开(公告)日：2008-12-11
申请号：JP2008223457
申请日：2008-09-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SHICHI HIROYASU , ISHITANI TORU , KOIKE HIDEMI , UMEMURA KAORU , SEYA HIDEKAZU , TOKUDA MITSUO , TOMIMATSU SATOSHI , KASHIMA HIDEO
IPC分类号： G01N1/28 , H01J37/147 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide a sample preparing method and device for microregion assay, observation or measurement of a minute sample by separating or separating/preparing the minute sample containing a desired specific region from samples of electronic components such as semiconductor wafer and device, etc. without inclining the sample stage.
SOLUTION: This sample preparing method is characterized by that the sample surface is irradiated with focused ion beams at irradiation angle of not more than 90 degrees or less, the area around the target minute sample is removed, the sample stage is rotated with vertical line segment to the sample surface as an axis of rotation and then the sample is irradiated with the focused ion beam at the irradiation angle of the beam to the sample surface fixed, separating or separating/preparing the minute sample.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供用于微区域测定的样品制备方法和装置，通过从诸如半导体晶片的电子部件的样品中分离或分离/制备含有所需特定区域的微量样品来观察或测量微小样品和设备等，而不倾斜样品台。解决方案：该样品制备方法的特征在于，以不大于90度或更小的照射角度照射聚焦离子束，取出目标微小样品周围的区域，样品台用垂直线段到样品表面作为旋转轴，然后将样品用聚束离子束照射到束的照射角度，固定，分离或分离/制备微小样品。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2008261892A Sample manufacturing method 审中-公开
标题翻译：样品制造方法
公开(公告)号：JP2008261892A
公开(公告)日：2008-10-30
申请号：JP2008205228
申请日：2008-08-08
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SHICHI HIROYASU , ISHITANI TORU , KOIKE HIDEMI , UMEMURA KAORU , SEYA HIDEKAZU , TOKUDA MITSUO , TOMIMATSU SATOSHI , KASHIMA HIDEO
IPC分类号： G01N1/28
摘要： PROBLEM TO BE SOLVED: To provide a sample manufacturing method for separating a minute sample containing a desired region from a sample such as an electronic component or the like, for example, a semiconductor wafer or device without inclining a sample stage to perform the analysis or observation of a minute region, and a sample manufacturing apparatus.
SOLUTION: The surface of the sample is irradiated with a condensed ion beam at an irradiation angle of below 90° to remove the target periphery of a minute sample and the sample stage is subsequently rotated on the segment vertical to the surface of the sample. The irradiation angle of the condensed ion beam to the surface of the sample is fixed to irradiate the sample to separate the minute sample.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种样品制造方法，用于从包含诸如电子部件等的样品例如半导体晶片或器件的样品中分离含有期望区域的微小样品，而不倾斜样品台进行微小区域的分析或观察，以及样品制造装置。
解决方案：以低于90°的照射角度的聚合离子束照射样品的表面以去除微小样品的目标周边，并且样品台随后在垂直于表面的片段上旋转样品。将凝结的离子束照射到样品表面的照射角度被固定以照射样品以分离微小样品。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2008203271A Method and device for producing sample 审中-公开
标题翻译：生产样品的方法和装置
公开(公告)号：JP2008203271A
公开(公告)日：2008-09-04
申请号：JP2008122126
申请日：2008-05-08
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SHICHI HIROYASU , ISHITANI TORU , KOIKE HIDEMI , UMEMURA KAORU , SEYA HIDEKAZU , TOKUDA MITSUO , TOMIMATSU SATOSHI , KASHIMA HIDEO
IPC分类号： G01N1/28 , G01N1/32
摘要： PROBLEM TO BE SOLVED: To provide a method and device for producing a sample for separating or separately preparing a minute sample including a desired specific region from a sample such as a semiconductor wafer and an electronic part like a device without tilting a sample stage for the purpose of minute region analysis, observation, or measurement.
SOLUTION: The method is characterized in that an objective minute sample periphery is removed by irradiating the sample with a focused ion beam at an angle of less than 90° with respect to the surface of the sample surface; next, the sample stage is turned around the vertical line to the sample surface; and the sample is irradiated while the focused ion beam irradiation angle to the sample surface is fixed; and thereby the minute sample is separated or separately prepared.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于生产样品的方法和装置，用于从诸如半导体晶片的样品和类似器件的电子部件分离或分别制备包括期望的特定区域的微小样品，而不倾斜样品分段，观察或测量的目的。该方法的特征在于，通过用聚焦离子束照射样品相对于样品表面的表面以小于90°的角度去除目标微小的样品周边; 接下来，样品台围绕垂直线转到样品表面; 同时照射样品，同时对样品表面的聚焦离子束照射角度是固定的; 从而分离或分开制备微量样品。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2007123289A Method and apparatus for observing micro sample forming process 有权
标题翻译：观察微型成型工艺的方法和装置
公开(公告)号：JP2007123289A
公开(公告)日：2007-05-17
申请号：JP2007020310
申请日：2007-01-31
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKUDA MITSUO , FUKUDA MUNEYUKI , MITSUI YASUHIRO , KOIKE HIDEMI , TOMIMATSU SATOSHI , SHICHI HIROYASU
IPC分类号： H01J37/28 , G01N1/28 , H01J37/30 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To realize an apparatus for observing the process of forming a micro sample and a method of observing the process of forming the micro sample, in which a cross sectional observation or an analysis of a wafer cross section from the direction of horizontal to vertical with high resolution, high precision and high throughput without breaking the wafer to be the sample. SOLUTION: The apparatus for observing the process of forming the micro sample has a focused ion beam optical system 31 and an electro-optical system 41 in the same vacuum system. A prove 71 supported with a manipulator 14 is provided for extracting a separated micro sample 22 after a micro sample including a required region in a specimen is separated with a charged particle beam processing. The manipulator has a function to regulate the position and attitude of the micro sample extracted from the specimen. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了实现用于观察形成微量样品的方法的装置和观察形成微量样品的方法的方法，其中横截面观察或来自该样品的晶片横截面的分析方向水平垂直，分辨率高，精度高，产量高，不破坏晶片成为样品。解决方案：用于观察形成微量样品的过程的装置在相同的真空系统中具有聚焦离子束光学系统31和电光学系统41。提供了用操纵器14支撑的证明书71，用于在用带电粒子束处理分离样本中包含所需区域的微量样品后，提取分离的微量样品22。操纵器具有调节从样品提取的微量样品的位置和姿态的功能。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2007047162A Charged particle beam device and sample preparing device 有权
标题翻译：充电颗粒光束装置和样品制备装置
公开(公告)号：JP2007047162A
公开(公告)日：2007-02-22
申请号：JP2006214034
申请日：2006-08-07
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： KASHIMA HIDEO , SHICHI HIROYASU , TOMIMATSU SATOSHI , UMEMURA KAORU , KOIKE HIDEMI , TOKUDA MITSUO
IPC分类号： G01N1/28 , G01R31/302 , H01J37/20 , H01J37/31 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide a small sample preparing device and evaluating device having operability equivalent to that of a conventional device, by applying a probe moving mechanism for a large-diameter wafer and a side entry type sample stage to the sample preparing device and a failure inspection device.
SOLUTION: The probe moving mechanism and a fine-moving mechanism of the side entry type sample stage are used which have a vacuum introducing means capable of taking in or out the probe and side entry type sample stage from a vacuum vessel without opening the vacuum vessel to the atmosphere with a tilt angle passing the intersection of the ion beam irradiation optical axis and a wafer face. The side entry type sample stage having a degree of rotation freedom for making a sample piece installation part of a sample holder of the side entry type sample stage parallel to the wafer face is used. The sample preparing device for the large-diameter wafer and the evaluating device can be achieved that require necessary minimum volume of the vacuum vessel, require small installation area, are small, and are user-friendly.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有与常规装置相当的可操作性的小样品制备装置和评估装置，通过将大直径晶片和侧入式样品台的探针移动机构应用于样品准备装置和故障检查装置。
解决方案：使用侧入式样品台的探针移动机构和微细移动机构，其具有能够从真空容器进入或离开探针和侧进样式样品台的真空引入装置，而不打开真空容器通过离子束照射光轴和晶片面之间的倾斜角度向大气提供。使用具有用于使侧入口型样品台的样品架的样品安装部平行于晶片面的旋转自由度的侧入式样品台。可以实现用于大直径晶片和评估装置的样品制备装置，其需要真空容器的必要最小体积，需要小的安装面积，并且是用户友好的。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2005203382A Micro testpiece processing and observation method and device 有权
标题翻译：微型加工和观察方法和装置
公开(公告)号：JP2005203382A
公开(公告)日：2005-07-28
申请号：JP2005107009
申请日：2005-04-04
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKUDA MITSUO , FUKUDA MUNEYUKI , MITSUI YASUHIRO , KOIKE HIDEMI , TOMIMATSU SATOSHI , SHICHI HIROYASU
IPC分类号： H01J37/20 , H01J37/28 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To realize a micro testpiece processing and observation device in which cross-sectional observation and analysis of the wafer cross-section from horizontal to vertical direction can be made in high resolution and high precision with a high throughput, without splitting in pieces the wafer being a testpiece, and a micro testpiece processing and observation method.
SOLUTION: In the micro testpiece processing and observation device, a focused ion beam optical system and an electron optical system are equipped in an identical vacuum device, and a micro testpiece including the desired region of the testpiece is separated by a charged particle beam forming process, and a probe for sampling the micro testpiece separated is provided.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题为了实现以高分辨率和高精度以高生产率制造从水平方向到垂直方向的晶片横截面的横截面观察和分析的微型试件加工和观察装置，而不会将作为试件的晶片分开，以及微型试件的加工和观察方法。解决方案：在微型试件处理和观察装置中，在相同的真空装置中装备聚焦离子束光学系统和电子光学系统，并且包括试样的所需区域的微型试样由带电粒子分离梁形成工艺和用于取样分离的微型试件的探针。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2009049021A Minute sample processing observation method and device 有权
标题翻译：分钟样品处理观察方法和装置
公开(公告)号：JP2009049021A
公开(公告)日：2009-03-05
申请号：JP2008305836
申请日：2008-12-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKUDA MITSUO , FUKUDA MUNEYUKI , MITSUI YASUHIRO , KOIKE HIDEMI , TOMIMATSU SATOSHI , SHICHI HIROYASU
IPC分类号： H01J37/317 , H01J37/20
摘要： PROBLEM TO BE SOLVED: To realize a minute sample processing observation device and a minute sample processing observation method where cross-sectional observation and analysis of a wafer cross section from a horizontal direction up to a vertical direction can be performed with high resolution, high precision and a high throughput, without breaking the wafer to be a sample. SOLUTION: The minute sample processing observation device includes a focused ion beam optical system and an electron optical system in the same vacuum device, as well as a probe separating a minute sample including a desired region of the sample by a charged particle beam molding work and picking up the separated minute sample. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题：为了实现微小的样品加工观察装置和微小的样品处理观察方法，其可以以高分辨率进行从水平方向直到垂直方向的晶片横截面的横截面观察和分析，高精度和高产量，而不破坏晶片成为样品。解决方案：微小样品处理观察装置包括聚焦离子束光学系统和同一真空装置中的电子光学系统，以及通过带电粒子束分离包含样品所需区域的微小样品的探针成型工作并拾取分离的分样。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2008261891A Sample manufacturing method 有权
标题翻译：样品制造方法
公开(公告)号：JP2008261891A
公开(公告)日：2008-10-30
申请号：JP2008205173
申请日：2008-08-08
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SHICHI HIROYASU , ISHITANI TORU , KOIKE HIDEMI , UMEMURA KAORU , SEYA HIDEKAZU , TOKUDA MITSUO , TOMIMATSU SATOSHI , KASHIMA HIDEO
IPC分类号： G01N1/28
摘要： PROBLEM TO BE SOLVED: To provide a sample manufacturing method for separating a minute sample containing a desired region from a sample such as an electronic component or the like, for example, a semiconductor wafer or device without inclining a sample stage to perform the analysis or observation of a minute region, and a sample manufacturing apparatus.
SOLUTION: The surface of the sample is irradiated with a condensed ion beam at an irradiation angle below 90° to remove the target periphery of a minute sample and subsequently the sample stage is rotated on the segment vertical to the surface of the sample. The irradiation angle of the condensed ion beam to the surface of the sample is fixed to irradiate the sample to separate the minute sample.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种样品制造方法，用于从包含诸如电子部件等的样品例如半导体晶片或器件的样品中分离含有期望区域的微小样品，而不倾斜样品台进行微小区域的分析或观察，以及样品制造装置。
解决方案：以低于90°的照射角度的聚合离子束照射样品的表面以去除微小样品的目标周边，随后样品台在垂直于样品表面的片段上旋转。将凝结的离子束照射到样品表面的照射角度被固定以照射样品以分离微小样品。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2005285776A Method and apparatus for observing processing of minute sample 有权
标题翻译：用于观察分钟采样处理的方法和装置
公开(公告)号：JP2005285776A
公开(公告)日：2005-10-13
申请号：JP2005107007
申请日：2005-04-04
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKUDA MITSUO , FUKUDA MUNEYUKI , MITSUI YASUHIRO , KOIKE HIDEMI , TOMIMATSU SATOSHI , SHICHI HIROYASU
IPC分类号： G01N23/225 , H01J37/20 , H01J37/28 , H01J37/30 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide an apparatus and a method for observing the processing of a minute sample where the cross-sectional observation and analysis of a wafer cross section from a horizontal direction to a vertical direction can be performed with a high resolution, high precision and high throughput, without breaking a wafer being the sample.
SOLUTION: This apparatus is provided with a focused ion beam optical system and an electron optical system in the same vacuum device, and provided with a probe separating a minute sample including the desired area of the sample by charged particle beam molding processing and picking up the separated minute sample.
COPYRIGHT: (C)2006,JPO&NCIPI

10. 发明专利

JP2005044817A Working observation method for minute sample and apparatus 有权
标题翻译：用于分析样品和装置的工作观察方法
公开(公告)号：JP2005044817A
公开(公告)日：2005-02-17
申请号：JP2004317452
申请日：2004-11-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKUDA MITSUO , FUKUDA MUNEYUKI , MITSUI YASUHIRO , KOIKE HIDEMI , TOMIMATSU SATOSHI , SHICHI HIROYASU
IPC分类号： G01N23/225 , H01J37/20 , H01J37/28 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide a minute sample working observation apparatus and a minute sample working observation method where cross-sectional observation and analysis of wafer cross section from horizontal direction up to vertical direction can be performed with high resolution, high precision and high throughput, without breaking the wafer which is to become samples.
SOLUTION: This device is provided with a focused ion beam optical system and an electron optical system in the same vacuum device, and a probe separating a trace sample including a desired region of the sample by a charged particle beam molding work and picking up the separated trace sample.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种微小的样品加工观察装置和微小的样品加工观察方法，其可以以高分辨率，高精度执行从水平方向垂直方向的晶片横截面的横截面观察和分析和高产量，而不破坏将要成为样品的晶片。解决方案：该装置在相同的真空装置中设置有聚焦离子束光学系统和电子光学系统，以及通过带电粒子束成型工作和采摘来分离包含样品的期望区域的痕量样品的探针分离的痕迹样本。版权所有（C）2005，JPO＆NCIPI

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