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    • 21. 发明授权
    • Weft inserting device for an air jet loom having reed pieces with
recessed weft guide openings
    • 用于喷气织机的纬纱插入装置,其具有带有凹入引纬开口的簧片
    • US5588470A
    • 1996-12-31
    • US498786
    • 1995-07-05
    • Masao ShirakiFujio SuzukiKazunori Yoshida
    • Masao ShirakiFujio SuzukiKazunori Yoshida
    • D03D47/30D03D49/62
    • D03D47/30D03D47/278
    • A weft inserting device using a profiled reed for an air jet loom is equipped with a plurality of reed pieces each having a C-shaped guide notch. The line of guide notches forms a weft passage where weft injected from a main nozzle flies. Each guide notch has a upper wall parallel to the floor surface on which the device is placed, a deep wall perpendicular to this surface, a lower wall which gradually becomes wider toward an opening, an upper connecting portion which connects the upper wall to the deep wall, and a lower connecting portion which connects the deep wall to the lower wall. The radius of curvature of the upper connecting portion is set equal to or smaller than 1 mm, and the radius of curvature of the lower connecting portion is set greater than the radius of curvature of the upper connecting portion.
    • 使用用于喷气织机的异型簧片的引纬装置配备有多个具有C形导向槽口的簧片。 导向槽的线形成纬纱从主喷嘴喷出的纬纱飞行。 每个引导凹口具有平行于设置在其上的地板表面的上壁,垂直于该表面的深壁,朝向开口逐渐变宽的下壁,将上壁连接到深度的上连接部 壁和连接深壁与下壁的下连接部分。 将上连接部的曲率半径设定为1mm以下,将下连接部的曲率半径设定为大于上连接部的曲率半径。
    • 23. 发明授权
    • Apparatus for detecting an array of wafers
    • 用于检测晶片阵列的装置
    • US4954721A
    • 1990-09-04
    • US330214
    • 1989-03-29
    • Fujio Suzuki
    • Fujio Suzuki
    • H01L21/68
    • H01L21/68Y10S414/138Y10S414/14
    • An apparatus for detecting an array of wafers comprises a reference information generator for generating reference information from the reference condition in which wafers are partly inserted correctly in all grooves formed in side plates of a first wafer carrier, a window setting device for setting wafer-detecting windows at those positions where the wafers are arranged on a second wafer carrier, in accordance with the reference information supplied from said reference information generator, a photosensor for detecting the wafers arranged on the second wafer carrier and generating information representing the presence of the wafers on the second wafer carrier, a signal generator for generating signals from the information generated by the photosensor, and a position detector for collating the signals supplied from the signal generator with said wafer detecting windows, to detect the shape of that portion of any signal that corresponds to a wafer window, and to determine the position of the wafer from the shape of said portion of the signal.
    • 一种用于检测晶片阵列的装置,包括:参考信息发生器,用于从参考条件产生参考信息,其中晶片部分地插入到形成在第一晶片载体的侧板中的所有凹槽中,用于设置晶片检测的窗口设置装置 根据从所述参考信息发生器提供的参考信息,将晶片布置在第二晶片载体上的那些位置处的窗口,用于检测布置在第二晶片载体上的晶片的光电传感器,并且产生表示存在晶片的信息 第二晶片载体,用于从由光电传感器产生的信息产生信号的信号发生器,以及用于将从信号发生器提供的信号与所述晶片检测窗口进行对照的位置检测器,以检测对应于任何信号的那部分的形状 到晶圆窗口,并确定位置o f是晶片从信号的所述部分的形状。
    • 28. 发明授权
    • Batch type heat treatment system, method for controlling same, and heat treatment method
    • 批式热处理系统,其控制方法和热处理方法
    • US06730885B2
    • 2004-05-04
    • US09897908
    • 2001-07-05
    • Fujio SuzukiWenling WangKoichi SakamotoMoyuru YasuharaSunil ShahPradeep Pandey
    • Fujio SuzukiWenling WangKoichi SakamotoMoyuru YasuharaSunil ShahPradeep Pandey
    • H05B302
    • H01L21/67248H01L21/67109
    • There is provided a batch type heat treatment system, control method and heat treatment method capable of appropriately coping with a multi-product small-lot production. A reaction tube 2 comprises a plurality of heaters 31 through 35 and a plurality of temperature sensors, and houses therein a wafer boat 23. A control part 100 stores therein many mathematical models for estimating (calculating) the temperature of wafers W in the reaction tube 2, in accordance with the number and arranged position of the wafers W mounted on the wafer boat 23, and many target temperature trajectories. If the wafer boat 23 is loaded in the reaction tube 2, a mathematical model and a target temperature trajectory corresponding to the number and arranged position of the mounted wafers W are read. If a deposition process is started, the output of a temperature sensor S and the model are used for estimating the temperature of the wafers W in the reaction tube 2, and the powers to be supplied to the heaters 31 through 35 are separately controlled so that the estimated temperature approaches the target temperature trajectory.
    • 提供能够适当应对多产品小批量生产的批式热处理系统,控制方法和热处理方法。反应管2包括多个加热器31至35和多个温度传感器,以及 在其中容纳晶片舟23.控制部分100存储许多用于根据安装在晶片舟23上的晶片W的数量和布置位置来估计(计算)反应管2中的晶片W的温度的数学模型 ,以及许多目标温度轨迹。 如果晶片舟23装载在反应管2中,则读取与安装的晶片W的数量和排列位置对应的数学模型和目标温度轨迹。 如果开始沉积工艺,则使用温度传感器S和模型的输出来估计反应管2中的晶片W的温度,并且分别控制供给到加热器31至35的功率,使得 估计的温度接近目标温度轨迹。
    • 30. 发明授权
    • Power controlling unit and thermal processing unit
    • 电源控制单元和热处理单元
    • US06351105B2
    • 2002-02-26
    • US09817266
    • 2001-03-27
    • Fujio Suzuki
    • Fujio Suzuki
    • G05F114
    • G05F1/14
    • A power controlling unit of the invention includes a power transformer: having a primary side connected to an Alternating-Current power supply source; and a secondary side having an end side provided with a terminal connected to an end of an object whose power is to be controlled, and the other end side provided with a plurality of voltage taps. A switching part is disposed between the plurality of voltage taps and the other end of the object. The switching part selects one from the plurality of voltage taps in order to connect the one to the other end of the object. A storing part stores output values for the object and switching patterns which correspond to the output values respectively. Each of the output values is set correspondingly to a unit of control consisting of a plurality of cycles of the source. Each of the switching patterns defines a voltage tap that should be selected if any in each of the plurality of cycles in order to achieve the corresponding output value. A switching controlling part can read a switching pattern corresponding to an output value from the storing part and control the switching part based on the switching pattern.
    • 本发明的电力控制单元包括电源变压器:具有连接到交流电源的初级侧; 以及二次侧,其端侧设置有连接到其功率要被控制的物体的端部的端子,并且另一端侧设置有多个电压抽头。 开关部分设置在多个电压抽头和物体的另一端之间。 开关部分从多个电压抽头中选择一个,以将一个连接到对象的另一端。 存储部分分别存储对应于输出值的对象的输出值和切换模式。 输出值中的每一个对应于由源的多个周期组成的控制单元来设置。 每个开关模式定义了一个电压抽头,如果在多个周期中的每一个循环中都有任何一个,则为了获得相应的输出值,该抽头应被选择。 切换控制部分可以从存储部分读取与输出值相对应的切换模式,并且基于切换模式来控制切换部分。