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21. 发明专利

JPH10253544A METHOD AND APPARATUS FOR VISUAL EXAMINATION 失效
公开(公告)号：JPH10253544A
公开(公告)日：1998-09-25
申请号：JP279398
申请日：1998-01-09
申请人： HITACHI LTD
发明人： TAKAGI YUJI , SHISHIDO CHIE , MAEDA SHUNJI , HIROI TAKASHI , TANAKA MAKI , KUNI TOMOHIRO , AZUMA JUNZO , MATSUYAMA YUKIO
IPC分类号： G01B11/30 , G01B15/04 , G01B15/08 , G01N21/88 , G01N21/93 , G01N21/956 , G01R31/302 , H01J37/22 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To eliminate an erroneous detection by correcting uneven density and distortions of two images containing patterns which should be originally identical and comparing the both to detect and discriminate parts differing from each other as defects. SOLUTION: Images f (x, y) and g (x, y) from an image memory section are inputted by a roughly positioning circuit 21 to be roughly positioned. An uneven density correction circuit 22 receiving the results inputted corrects uneven density values of the patterns which should be originally identical and reduces any uneven density difference existing at parts without defect to such an extent that the difference can be recognized to be normal. Then, to remove effect by unsteady distortions of the images, positional deviations are corrected by a distortion correcting circuit 23 so that any distortion of the images will not be detected and discriminated as defects. The two images subjected to the correction of the distortions further undergoes a highly accurate positioning with a precisely positioning circuit 24. A density circuit 25 performs a comparison processing of the images thus finished with the correction of the uneven density and distortions and the positioning and any different part therebetween is detected and discriminated as defect. This eliminates erroneous detection, thereby enabling highly reliable detection of fine defects.

22. 发明专利

JPH063123A METHOD AND EQUIPMENT FOR VISUAL INSPECTION 失效
公开(公告)号：JPH063123A
公开(公告)日：1994-01-11
申请号：JP16631092
申请日：1992-06-24
申请人： HITACHI ELECTRONICS , HITACHI LTD
发明人： HAYASHI SEIICHI , NAKANISHI MASATAKE , NAKAGAWA YASUO , TAKAGI YUJI
IPC分类号： G01B11/24 , G01B11/245 , G01N21/88 , G01N21/892 , G01N21/956
摘要： PURPOSE:To obtain a method and equipment for visual inspection which make it possible to determine the quality of an object of inspection, accurately and in an optimum state at all times. CONSTITUTION:A plurality of light sources 11 to 17 disposed above an object 3 of inspection are used, the object of inspection is illuminated from different directions sequentially by these light sources and images thereof are picked up by image pickup cameras 21 to 25 in the sequential illuminations, whereby a plurality of image data are obtained. Meanwhile, slit light illumination is conducted by using slit light generating parts 31 and 32 and images are picked up at a prescribed angle from above, whereby optically cut image data are obtained. By using these data together, the state of the object of inspection is recognized and determined. According to this constitution, the content of determination can be substantial, performances of levels of inspection and measurement can be improved sharply and the efficiency of inspection of a soldered state can be improved.

23. 发明专利

JP2013199332A Passenger conveyor 有权
标题翻译：乘客输送机
公开(公告)号：JP2013199332A
公开(公告)日：2013-10-03
申请号：JP2012066941
申请日：2012-03-23
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TAKAGI YUJI , NAKAJO ISATO , OBARA TAKAO
IPC分类号： B66B23/22 , B66B31/00
摘要： PROBLEM TO BE SOLVED: To provide a passenger conveyor in which light emitting diodes are used as light sources of a balustrade illumination, and the maintenance operation or replacement operation of light sources can be readily performed even if the light sources are disposed in a deeper position than an illumination cover to suppress the uneven brightness of the illumination cover to eliminate a unlit portion in the illumination cover.SOLUTION: A passenger conveyor includes: a supporting structure disposed in a building; a plurality of endlessly-coupled step plates that circulate in the support structure; a balustrade vertically provided along the moving direction of the step plates; a moving handrail 4 moving along the circumferential edge of the balustrade; a light source 11 having a plurality of light-emitting element 13 in a longitudinal direction; and a retaining part that is provided in the balustrade and retains the light sources 11 by a plurality of elastic pawls 15a, 15b.
摘要翻译：要解决的问题：提供一种乘客输送机，其中使用发光二极管作为栏杆照明的光源，并且即使光源设置在更深的位置，也可以容易地进行光源的维护操作或更换操作以抑制照明罩的不均匀亮度，以消除照明罩中的未点亮部分。解决方案：乘客输送机包括：布置在建筑物中的支撑结构; 多个在所述支撑结构中循环的环形联接踏板; 沿台阶板的移动方向垂直设置的栏杆; 沿着栏杆周边移动的移动扶手4; 在长度方向具有多个发光元件13的光源11; 以及设置在栏杆中并由多个弹性爪15a，15b保持光源11的保持部。

24. 发明专利

JP2010080969A Method and apparatus for observation of sample 有权
标题翻译：用于观察样品的方法和装置
公开(公告)号：JP2010080969A
公开(公告)日：2010-04-08
申请号：JP2009265869
申请日：2009-11-24
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： OBARA KENJI , TAKAGI YUJI , SHIMODA ATSUSHI , NAKAGAKI AKIRA , ISOGAI SHIZUSHI , OZAWA YASUHIKO , BABA HIDEHARU , WATANABE KENJI , SHISHIDO CHIE
IPC分类号： H01L21/66 , G01N21/956 , H01J37/22
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus for observation of a sample by which, upon detailed inspection of a defective part of the sample by means of magnification or the like, the amount of stage movement is reduced as little as possible to shorten image acquiring time thereby effectively observing defects. SOLUTION: The method for observation of the sample includes the steps of: acquiring a reference image not including a defect of the sample by imaging the sample on the basis of information of the defect of the sample detected by an inspection device; adjusting a position of the sample on the basis of the information of the defect of the sample detected by the inspection device so that the defect comes in sight of imaging; acquiring a defect image including the defect of the sample by imaging the sample whose position has been adjusted; detecting the defect in the defect image by comparing the reference image and the defect image; acquiring a magnified image of the defect by imaging a partial region including the detected defect in the sight of imaging; and displaying the magnified image of the defect on a screen. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于观察样品的方法和装置，通过这种方法和装置，通过借助于放大率等对样品的缺陷部分进行详细检查后，台架移动量减少到少至可能缩短图像获取时间，从而有效地观察缺陷。解决方案：用于观察样本的方法包括以下步骤：基于由检查装置检测到的样本的缺陷的信息，通过对样本进行成像来获取不包括样本缺陷的参考图像; 基于由检查装置检测到的样本的缺陷的信息来调整样本的位置，使得缺陷进入成像; 通过对已经调整了位置的样本进行成像来获取包括样本缺陷的缺陷图像; 通过比较参考图像和缺陷图像来检测缺陷图像中的缺陷; 通过在成像的视觉中成像包括检测到的缺陷的部分区域来获取缺陷的放大图像; 并在屏幕上显示缺陷的放大图像。版权所有（C）2010，JPO＆INPIT

25. 发明专利

JP2009227352A Handrail of passenger conveyer 有权
标题翻译：客船输送机
公开(公告)号：JP2009227352A
公开(公告)日：2009-10-08
申请号：JP2008071824
申请日：2008-03-19
申请人： Hitachi Ltd , Hitachi Mito Engineering Co Ltd , 日立水戸エンジニアリング株式会社 , 株式会社日立製作所
发明人： OKAMURA NAOKO , ICHIGE TOSHIHIKO , OBARA TAKAO , TAKAGI YUJI , KASHIWAKURA SHINYA , NAKAMURA HIDEHIRO , CHIBA HISAO
IPC分类号： B66B23/22 , B66B29/04
摘要： PROBLEM TO BE SOLVED: To provide a handrail of a passenger conveyor capable of avoiding a risk that a passenger is caught between a skirt guard and a step and preventing clothing from being damaged.
SOLUTION: This handrail of the passenger conveyor is constituted of a skirt guard 2 erected on a side of endless traveling steps 1 and fixed to a deck base 4 at an upper end thereof, a handrail panel 6 erected above the skirt guard 2 in a position on the opposite side to the step 1, and an inside deck 8 provided between the handrail panel 6 and the skirt guard 2 and fixed to the deck base 4 on a skirt guard 2 side thereof. A folding end of the inside deck 8 on a skirt guard 2 side thereof is fixed to the deck base 8 so as to be arranged almost flush with the skirt guard 2 or therein, and an upper end fixation part of the skirt guard 2 and the fixation part of the deck base 4 are covered with a molding 10 provided to protrude toward the steps 1, and the molding 10 is fixed to the deck base 4 with a bolt 11 to be housed in the molding 10.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够避免乘客被夹在裙部护罩和台阶之间并防止衣物被损坏的乘客输送机的扶手。
解决方案：乘客输送机的该扶手由在直立于无端行驶台阶1的侧面的裙部护罩2构成，并在其上端固定在甲板基座4上，扶手板6竖立在裙部护罩2的上方在与步骤1相反的一侧的位置和设置在扶手板6和裙部护罩2之间的内侧甲板8，并在其裙部护罩2侧固定在甲板基座4上。内侧甲板8的裙部护罩2侧的折叠端部固定在甲板底座8上，与裙部护罩2或其内部大致平齐，裙部护罩2的上端固定部和甲板底座4的固定部分被设置成朝向台阶1突出的模制件10覆盖，并且模具10用一个螺栓11固定在甲板基座4上，以容纳在模制件10中。 C）2010，JPO＆INPIT

26. 发明专利

JP2006324682A METHOD FOR MONITORING AND CONTROLLING ETCHING PROCESS 审中-公开
公开(公告)号：JP2006324682A
公开(公告)日：2006-11-30
申请号：JP2006174729
申请日：2006-06-26
申请人： HITACHI LTD
发明人： TANAKA MAKI , SHISHIDO CHIE , TAKAGI YUJI
IPC分类号： H01L21/66 , G01B15/04 , G01N23/225 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To obtain cross section shape pattern information useful for determining etching process conditions using in-line SEM images to be observed by non-destructive manner. SOLUTION: Three-dimensional shape information of a pattern corresponding to etching process steps is calculated by using signal quantity variation of the SEM image to evaluate the three-dimensional shape quantitatively. Further, setting of etching process condition and process control are performed based on the three-dimensional shape information obtained. Thus, quantitative evaluation of the three-dimensional shape of the pattern after etching can be conducted non-destructively. Furthermore, efficiency is promoted in the setting of the etching process condition. Moreover, by monitoring or controlling the etching process, a stable etching process can be realized. COPYRIGHT: (C)2007,JPO&INPIT

27. 发明专利

JP2004355300A Printing suppression print system 审中-公开
公开(公告)号：JP2004355300A
公开(公告)日：2004-12-16
申请号：JP2003151780
申请日：2003-05-29
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TAKAGI YUJI , IMAI TSUNEO
IPC分类号： B41J29/38 , G06F3/12
摘要： PROBLEM TO BE SOLVED: To provide a print system for printing only really necessary print data, when the print data are printed by a printer, by suppressing any wasteful print to be performed under the consideration of "for the time being" in the case of print data which need only to be taken notes of.
SOLUTION: When a printer issues a print start instruction, a printer driver instructs a "troublesome operation" to the printer just before the print. The printer is made to perform the "troublesome operation", and when it is confirmed that the operation has been performed, the print start instruction is executed by the printer driver.
COPYRIGHT: (C)2005,JPO&NCIPI

28. 发明专利

JP2004226328A Appearance inspection system, quality evaluation system using the same and quality evaluation information providing system 审中-公开
公开(公告)号：JP2004226328A
公开(公告)日：2004-08-12
申请号：JP2003016749
申请日：2003-01-24
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NAKAGAKI AKIRA , TAKAGI YUJI , HIROI TAKASHI , NAKAGAWA YASUO
IPC分类号： G01N21/956 , H01L21/66 , H05K3/00
摘要： PROBLEM TO BE SOLVED: To provide a technology for miniaturizing an inspector installed at a point of production and easily configuring a process condition of a detected result. SOLUTION: An appearance inspection system for obtaining an image of an inspection object and inspecting an appearance is provided with an image detector 100 for detecting the image of the inspection object and an information processor 200 for processing the image detected by the image detector 100 and determining the existence of abnormality emerging in the image of the inspection object. The image detector 100 and the information processor 200 can be connected through a network 300. The image detector 100 adds a data identifier to at least one of the detected image and its processed data and transmits it to the information processor. The information processor 200 identifies the received image based on the identifier included in the received data and determines the existence of the abnormality. COPYRIGHT: (C)2004,JPO&NCIPI

29. 发明专利

JP2004117229A Defect data analytic method, apparatus for the same and review system 有权
公开(公告)号：JP2004117229A
公开(公告)日：2004-04-15
申请号：JP2002282173
申请日：2002-09-27
申请人： Hitachi Electronics Eng Co Ltd , Hitachi High-Technologies Corp , Hitachi Ltd , 日立電子エンジニアリング株式会社 , 株式会社日立ハイテクノロジーズ , 株式会社日立製作所
发明人： SHIBUYA HISAE , TAKAGI YUJI
IPC分类号： G01B11/24 , G01B5/28 , G01N21/956 , G06T7/00 , H01L21/02
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： PROBLEM TO BE SOLVED: To analyze a defect distribution state based on defect data detected by an inspection apparatus and easily identify a defect reason due to an apparatus or a process in a semiconductor wafer manufacturing process.
SOLUTION: A defect data analytic method analyzes the defect distribution state based on defect location coordinates detected by the inspection apparatus and categorizes the defect distribution state into one of distribution feature categories including repetitive defects, aggregate defects, circular distribution defects, radial distribution defects, linear distribution defects, ring or cluster distribution defects and random defects.
COPYRIGHT: (C)2004,JPO

30. 发明专利

JP2003173948A MANUFACTURING PROCESS MONITORING METHOD AND SYSTEM FOR THE SAME 审中-公开
公开(公告)号：JP2003173948A
公开(公告)日：2003-06-20
申请号：JP2002036131
申请日：2002-02-14
申请人： HITACHI LTD
发明人： TANAKA MAKI , SHISHIDO CHIE , TAKAGI YUJI , YOSHITAKE YASUHIRO , MATSUMOTO SHUNICHI , KOMURO OSAMU , IIIZUMI TAKASHI , MOROKUMA HIDETOSHI , WATANABE MASAHIRO
IPC分类号： G03F7/20 , H01L21/02 , H01L21/027 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To solve the problem that there is no method of detecting variations in conditions (deviation of exposure and focus) of an exposure system at a product wafer level in a lithography process. SOLUTION: The calculation results of features such as electron beam images, line profiles, and sizes for various exposures and focal value are previously stored as libraries, and the calculation result and the electron beam image of a product wafer is compared with each other, so that a variation in exposure and focus can be easily detected, and a comparison result can be easily verified on an image screen. COPYRIGHT: (C)2003,JPO

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