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1. 发明专利

JP2006189462A Inspection method and its device 有权
标题翻译：检验方法及其设备
公开(公告)号：JP2006189462A
公开(公告)日：2006-07-20
申请号：JP2006073725
申请日：2006-03-17
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： IKEDA YOKO , KONISHI JIYUNKO , IWATA HISAFUMI , TAKAGI YUJI , OBARA KENJI , NAKAGAKI AKIRA , ISOGAI SHIZUSHI , OZAWA YASUHIKO
IPC分类号： G01N21/956 , G06T1/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To reduce an analysis time and to improve the analysis accuracy by improving a user interface.
SOLUTION: This device comprises an image pickup apparatus for photographing a plurality of images in a workpiece; a storage means for storing the pickup images picked by the image pickup apparatus; and a displaying means having a first area for displaying the plurality of pickup images stored in the storage means and a plurality of second areas classifying the images according to the feature of the pickup images. This device comprises an analysis unit constituted so as to move the plurality of pickup images from the first area to the second areas on the screen and classify the plurality of pickup images on the second areas.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过改进用户界面来缩短分析时间并提高分析精度。解决方案：该装置包括用于拍摄工件中的多个图像的图像拾取装置; 存储装置，用于存储由图像拾取装置拾取的拾取图像; 以及显示装置，具有用于显示存储在存储装置中的多个拾取图像的第一区域和根据拾取图像的特征对图像进行分类的多个第二区域。该装置包括分析单元，其被构造成将多个拾取图像从第一区域移动到屏幕上的第二区域，并将多个拾取图像分类在第二区域上。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2010080969A Method and apparatus for observation of sample 有权
标题翻译：用于观察样品的方法和装置
公开(公告)号：JP2010080969A
公开(公告)日：2010-04-08
申请号：JP2009265869
申请日：2009-11-24
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： OBARA KENJI , TAKAGI YUJI , SHIMODA ATSUSHI , NAKAGAKI AKIRA , ISOGAI SHIZUSHI , OZAWA YASUHIKO , BABA HIDEHARU , WATANABE KENJI , SHISHIDO CHIE
IPC分类号： H01L21/66 , G01N21/956 , H01J37/22
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus for observation of a sample by which, upon detailed inspection of a defective part of the sample by means of magnification or the like, the amount of stage movement is reduced as little as possible to shorten image acquiring time thereby effectively observing defects. SOLUTION: The method for observation of the sample includes the steps of: acquiring a reference image not including a defect of the sample by imaging the sample on the basis of information of the defect of the sample detected by an inspection device; adjusting a position of the sample on the basis of the information of the defect of the sample detected by the inspection device so that the defect comes in sight of imaging; acquiring a defect image including the defect of the sample by imaging the sample whose position has been adjusted; detecting the defect in the defect image by comparing the reference image and the defect image; acquiring a magnified image of the defect by imaging a partial region including the detected defect in the sight of imaging; and displaying the magnified image of the defect on a screen. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于观察样品的方法和装置，通过这种方法和装置，通过借助于放大率等对样品的缺陷部分进行详细检查后，台架移动量减少到少至可能缩短图像获取时间，从而有效地观察缺陷。解决方案：用于观察样本的方法包括以下步骤：基于由检查装置检测到的样本的缺陷的信息，通过对样本进行成像来获取不包括样本缺陷的参考图像; 基于由检查装置检测到的样本的缺陷的信息来调整样本的位置，使得缺陷进入成像; 通过对已经调整了位置的样本进行成像来获取包括样本缺陷的缺陷图像; 通过比较参考图像和缺陷图像来检测缺陷图像中的缺陷; 通过在成像的视觉中成像包括检测到的缺陷的部分区域来获取缺陷的放大图像; 并在屏幕上显示缺陷的放大图像。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2007005818A Pattern matching method and apparatus thereof 有权
标题翻译：图案匹配方法及装置
公开(公告)号：JP2007005818A
公开(公告)日：2007-01-11
申请号：JP2006201138
申请日：2006-07-24
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TAKANE ATSUSHI , YODA HARUO , YOSHIDA MASASHI , IKEDA KOJI , OZAWA YASUHIKO
IPC分类号： H01L21/66 , G01B15/04 , G06T7/00
摘要： PROBLEM TO BE SOLVED: To provide a pattern matching method and apparatus thereof that is operator-free and fully automatic, and can realize a high throughput.
SOLUTION: The pattern matching method and apparatus for carrying out pattern matching between design data and the image taken by a scanning electron microscope converts the design data into a bitmap, and carries out the matching between the bitmapped design data and the image taken by a scanning electron microscope. After the bitmap is edge-enhanced, the matching process is carried out. Furthermore, after a smoothing process is performed on the edge-enhanced bitmap, the matching process is carried out.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种无需操作员和全自动的模式匹配方法和装置，并且可以实现高吞吐量。解决方案：用于执行设计数据和由扫描电子显微镜拍摄的图像之间的图案匹配的图案匹配方法和装置将设计数据转换成位图，并且执行位图设计数据和拍摄的图像之间的匹配通过扫描电子显微镜。位图边缘增强后，进行匹配处理。此外，在边缘增强位图执行平滑处理之后，进行匹配处理。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2013080723A Charged particle beam device 有权
标题翻译：充电颗粒光束装置
公开(公告)号：JP2013080723A
公开(公告)日：2013-05-02
申请号：JP2012286606
申请日：2012-12-28
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YAMAGUCHI SATOSHI , OZAWA YASUHIKO , TAKANE ATSUSHI , SATO MITSUGU
IPC分类号： H01J37/04 , H01J37/147
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam device capable of adjusting the optical axis easily even if the state of a charged particle beam changes, and to provide an adjustment method of a charged particle beam device.SOLUTION: A charged particle beam device including an alignment deflector performing axis adjustment for an optical element is further provided with means for changing the conditions of the optical element to at least two states, means for detecting misalignment between patterns in two images obtained when the conditions of the alignment deflector are changed to at least two states, and the conditions of the optical element are changed by setting means according to respective alignment deflection conditions, and means for adjusting the alignment deflector on the basis of the relationship between at least two misalignments and the deflection conditions of the alignment deflector.
摘要翻译：要解决的问题：为了提供即使带电粒子束的状态改变也能够容易地调节光轴的带电粒子束装置，并且提供带电粒子束装置的调整方法。解决方案：包括对光学元件执行轴调节的对准偏转器的带电粒子束装置还设置有用于将光学元件的条件改变为至少两种状态的装置，用于检测获得的两幅图像中的图案之间的未对准的装置当将对准偏转器的条件改变为至少两个状态时，并且通过根据各自的对准偏转条件的设定装置来改变光学元件的条件，以及用于根据至少两者之间的关系来调整对准偏转器的装置两个不对准和对准偏转器的偏转条件。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2009014739A Irregularity determination method of sample, and charged particle radiation device 审中-公开
标题翻译：样品和充电颗粒辐射装置的非正常性测定方法
公开(公告)号：JP2009014739A
公开(公告)日：2009-01-22
申请号：JP2008247060
申请日：2008-09-26
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TAKANE ATSUSHI , YAMAGUCHI SATOSHI , KOMURO OSAMU , OZAWA YASUHIKO , TODOKORO HIDEO
IPC分类号： G01B15/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide method and device especially suitable for determining irregularity of line & space pattern formed on sample.
SOLUTION: This method is performed as follows; tilt charged particle radiation so as to oblique against its optical axis or tilt sample stage to be scanned on the sample, measure spread of detected signal to line scanning direction of the charged particle radiation, compare the above spread with the one when the charged particle radiation has been scanned along the optical axis, then determine irregularity condition of the above scanning point based on variation in quantity of the spread.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供特别适合于确定样品上形成的线和空间图案的不规则性的方法和装置。
解决方案：该方法如下执行; 倾斜带电粒子辐射使其倾斜抵抗其光轴或倾斜样品台在样品上进行扫描，测量检测到的信号向带电粒子辐射的线扫描方向的扩展，将上述扩散与当带电粒子辐射沿着光轴扫描，然后根据扩散量的变化确定上述扫描点的不规则状态。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2009016361A Charged particle beam device 有权
标题翻译：充电颗粒光束装置
公开(公告)号：JP2009016361A
公开(公告)日：2009-01-22
申请号：JP2008269293
申请日：2008-10-20
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YAMAGUCHI SATOSHI , OZAWA YASUHIKO , TAKANE ATSUSHI , SATO MITSUGI
IPC分类号： H01J37/04 , H01J37/147 , H01J37/153 , H01J37/22 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam device and an adjusting method of the charged particle beam device, in and by which an optical axis can easily be adjusted even if a condition of a charged particle beam is changed.
SOLUTION: In the charged particle beam device provided with a charged particle beam source, an optical element for adjusting the charged particle beam emitted from the charged particle beam source, and an alignment deflecting unit for making an axis adjustment against the optical element, there are also provided a means for detecting centers of gravity of patterns of two images which are obtained when a condition of the optical element is changed, a means for detecting a deviation of centers of gravity of the above two patterns, and a means for calculating a deflection amount of the alignment deflection unit based on the deviation of the centers of gravity of the two patterns.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供带电粒子束装置和带电粒子束装置的调整方法，即使改变带电粒子束的条件，光轴也可容易地被调节。解决方案：在具有带电粒子束源的带电粒子束装置中，用于调节从带电粒子束源发射的带电粒子束的光学元件和用于对光学元件进行轴线调整的对准偏转单元还提供了一种用于检测当光学元件的状况改变时获得的两个图像的图案的重心的装置，用于检测上述两种图案的重心偏差的装置，以及用于基于两个图案的重心的偏差来计算对准偏转单元的偏转量。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2007012624A Pattern matching method and apparatus 有权
标题翻译：图案匹配方法和装置
公开(公告)号：JP2007012624A
公开(公告)日：2007-01-18
申请号：JP2006188798
申请日：2006-07-10
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YAMAGUCHI SATOSHI , IIIZUMI TAKASHI , KOMURO OSAMU , MOROKUMA HIDETOSHI , MAEDA TATSUYA , ARIMA JUNTARO , OZAWA YASUHIKO
IPC分类号： H01J37/22 , G01N23/225
摘要： PROBLEM TO BE SOLVED: To make a scanning electron microscope operate with high precision at high speed by reducing a process for inspection alignment, inputting work or the like.
SOLUTION: The scanning electron microscope having a function specifying a desired position based on a pattern registered beforehand, comprises a means for setting information about the type of the pattern, spaces between a plurality of parts forming the pattern and the size of parts forming the pattern, and a means for forming a pattern image formed of a plurality of the parts based on information acquired by the setting means.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：通过减少检查对准，输入工作等的处理，使扫描电子显微镜以高精度高速运行。解决方案：具有基于预先登记的图案指定期望位置的功能的扫描电子显微镜包括用于设置关于图案的类型的信息的装置，形成图案的多个部件与部件的尺寸之间的间隔形成图案，以及用于基于由设置装置获取的信息形成由多个部分形成的图案图像的装置。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2006074065A Inspection device of sample 审中-公开
标题翻译：样品检验装置
公开(公告)号：JP2006074065A
公开(公告)日：2006-03-16
申请号：JP2005305912
申请日：2005-10-20
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： OBARA KENJI , TAKAGI YUJI , HONDA TOSHIFUMI , NAKAGAKI AKIRA , KUROSAKI TOSHISHIGE , OZAWA YASUHIKO
IPC分类号： H01L21/66 , G01N23/223 , G01N23/225 , H01L21/02
摘要： PROBLEM TO BE SOLVED: To increase inspection efficiency in detailed inspection of defect which is performed on the basis of inspection information of defect inspection.
SOLUTION: For example, contaminations and defects which are detected with a defect inspection device 1 are inspected in detail with a detailed inspection device 3 using SEM and the like, and the cause of the occurrence and the like are clarified. Before performing the detailed inspection, contaminations and defects which are detected with the defect inspection device 1 are inspected with an attribute inspection device using optical microscope and the like, and each attribute is searched for. The defects and contaminations are classified into a type which needs the detailed inspection and a type which does not need the detailed inspection or a type which can not be performed the detailed inspection, based on the attributes. Only contaminations and defects which need the detailed inspection are inspected with the detailed inspection device 3.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：根据缺陷检查的检查信息进行的缺陷的详细检查，提高检查效率。解决方案：例如，使用SEM等详细检查装置3来详细检查用缺陷检查装置1检测的污染物和缺陷，并且说明发生的原因等。在进行详细检查之前，使用光学显微镜等用属性检查装置检查用缺陷检查装置1检测到的污染物和缺陷，并搜索每个属性。根据属性，将缺陷和污染分为需要详细检查的类型和不需要详细检查的类型或不能进行详细检查的类型。只需要详细检查的污染物和缺陷，请仔细检查。3.版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2003022771A Particle beam device 有权
标题翻译：颗粒光束装置
公开(公告)号：JP2003022771A
公开(公告)日：2003-01-24
申请号：JP2001208674
申请日：2001-07-10
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YAMAGUCHI SATOSHI , OZAWA YASUHIKO , TAKANE ATSUSHI , SATO MITSUGI
IPC分类号： H01L21/66 , H01J37/04 , H01J37/147 , H01J37/153 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a particle beam device and an adjusting method of the particle beam equipment, which enable to perform adjustment of a light axis easily, even if the state of the particle beam changes.
SOLUTION: It has an operation means to calculate deflection amount of an alignment deflector which performs axial adjustment to an object lens and the like, memorizes two or more calculating methods for calculating the above deflection amount for this operation means, and has a selection means to choose the calculating method concerned.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：即使粒子束的状态发生变化，也能够容易地进行能够进行光轴的调整的粒子束装置的粒子束装置和调整方法。解决方案：具有计算对物镜等进行轴向调节的对准偏转器的偏转量的操作手段，存储用于计算该操作装置的上述偏转量的两种或多种计算方法，并具有选择装置，选择有关的计算方法。

10. 发明专利

JP2008159061A Pattern matching method and apparatus 有权
标题翻译：图案匹配方法和装置
公开(公告)号：JP2008159061A
公开(公告)日：2008-07-10
申请号：JP2007332968
申请日：2007-12-25
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TAKANE ATSUSHI , YODA HARUO , YOSHIDA MASASHI , IKEDA KOJI , OZAWA YASUHIKO
IPC分类号： G06T1/00 , G01N23/225 , G06T7/00 , G06T7/60 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an operator-free and fully-automated pattern matching method, and to provide an apparatus having high throughput.
SOLUTION: The pattern matching method and apparatus for matching patterns between design data and an image acquired by a scanning electronic microscope, perform matching in each direction between an edge of the design data and that of an image acquired by the scanning electronic microscope.
COPYRIGHT: (C)2008,JPO&INPIT

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